The utility model discloses a
graphite disc cleaning device for improving the appearance of an epitaxial
wafer, which belongs to the technical field of semiconductors, and can completely clean particulate matters which are attached to the surface of a
graphite disc and are not easy to blow off through the blowing of high-pressure
nitrogen and the cleaning of a
brush rotating at a high speed, reduce the particle
pollution of an epitaxial layer and improve the appearance yield. The device mainly comprises a
machine table, a table plate is arranged on the
machine table, a fixing frame is arranged on the
machine table, a
brush motor is arranged on the fixing frame, an output shaft of the
brush motor is connected with a brush frame, a plurality of brush heads are arranged on the brush frame, the brush heads are located above the table plate, a dust cover is arranged in the area above the machine table, a
nitrogen pipe is inserted into the dust cover, and a jet head is arranged at the end of the
nitrogen pipe. The jet head is positioned above the center of the bedplate; a plurality of negative pressure exhaust holes are formed in a platen of the machine table, an exhaust cavity is formed below the platen, the negative pressure exhaust holes are communicated with the exhaust cavity, and the exhaust cavity is connected with an
exhaust pipe. The
graphite disc cleaning device is mainly used for cleaning graphite discs.