910results about How to "Pollution suppression" patented technology

A system for making extruded cement-based articles. The process can include forming a cement-based feed mixture including water, aggregate and binder and directing the feed mixture to a vacuum zone, wherein sufficient vacuum is maintained in the vacuum zone to remove entrained air and, preferably, excess water, from the feed mixture. The feed mixture is held in the vacuum zone at a negative pressure for a time sufficient to form a vacuum-treated or densified mixture. The vacuum-treated or densified mixture is passed through an extruder at an elevated pressure to provide an extruded cement-based article.

A chip spacing maintaining apparatus for maintaining the spacing between any adjacent ones of a plurality of chips obtained by dividing a workpiece attached to an expand sheet, the expand sheet being supported at its peripheral portion to an annular frame is provided. The chip spacing maintaining apparatus includes a far-infrared radiation applying unit for applying far-infrared radiation toward the expand sheet expanded in a target area between the outer circumference of the workpiece and the inner circumference of the annular frame, thereby shrinking the expand sheet in the target area, and an air layer forming unit provided adjacent to the far-infrared radiation applying unit, the air layer forming unit having a nozzle hole for discharging a gas toward the workpiece in applying the far-infrared radiation from the far-infrared radiation applying unit toward the expand sheet, thereby forming an air layer above the workpiece.

The invention relates to high-salt complex wastewater reuse and zero discharge integrated equipment and a technology. The equipment provided by the invention comprises a pretreatment system, a reuse and reduction system and a zero discharge system. The technology comprises the following steps: carrying out homogenization and averaged quantity on high-salt complex wastewater, successively adding sodium hydroxide, sodium carbonate, PAC and PAM to carry out coagulation treatment, letting a mixed liquor which has undergone coagulation treatment enter a filter tank for sedimentation and filtration by the use of an immersed microfiltration membrane, letting a supernatant enter a reverse osmosis treatment process, letting pure water obtained by reverse osmosis treatment enter a reuse water tank for utilization, further condensing condensed brine, and crystallizing the condensed brine or putting the condensed brine into an evaporation pond for atomization and evaporation processing, wherein the reverse osmosis treatment adopts three-level RO: a medium-pressure membrane element is firstly used for desalination and condensation; a high-pressure membrane element is then used for further desalination and condensation; and a ultrahigh-pressure membrane element is finally used for further desalination and condensation. According to the invention, 95% of reverse osmosis concentrated water or analogous high-salt complex wastewater can be recovered for reutilization, only 5% of high strong brine is left to undergo evaporative crystallization or enter the natural evaporation pond. Water resources are fully recycled, and reuse and zero discharge costs of high-salt complex wastewater are reduced.

An apparatuses, methods and systems for creating, handling and collecting seed portions are highly beneficial. The apparatus includes a carrier having one or more carrying positions adapted to carry a seed. The carrying positions having a seed orienter adapted to orient the seed relative to the carrying position in the carrier for creating seed portions therefrom. The method includes taking a carrier having one or more carrying positions, orienting a seed relative to the carrying position in the carrier, ablating the seed with a seed ablation device, and communicating seed portions through a manifold into a compartment layer. The system includes a seed manifold adapted to dock thereon a seed carrier having pre-positioned and pre-oriented seed therein. Seed and seed portions removed from the seed in the carrier are communicated into a collector and compartment layer respectively using the seed manifold.

In accordance with one embodiment of the present invention, the ion-beam apparatus takes the form of an end-Hall ion source in which the detachable anode module incorporates the outer pole piece and includes an enclosure around the anode that both minimizes the loss of working gas and confines sputter contamination to the interior of this enclosure. This detachable anode module is substantially smaller than the entire end-Hall ion source, weighs substantially less, and can be duplicated for significantly less cost than the duplication of the entire ion source. In general, the components of the magnetic circuit determine the overall size, weight, and much of the cost of a gridless ion source. The reduced size, weight, and cost of the detachable anode module compared to the entire ion source is due to most of the magnetic circuit being excluded from the detachable module.

A developing apparatus using a two-component developer constituted by a magnetic carrier and a toner, and an image forming apparatus comprising the developing apparatus. A developing unit and a stirring unit are provided, and in order to suppress toner scattering that may occur after a development operation has been halted for a long time, and thereby suppress contamination of the apparatus interior, the developer in a developing machine is transferred to a stirrer serving as a developer storage unit on the exterior of the developing machine when the development operation ends. Further, to extend the life of the developer, a range in which an angle of a restricting member upstream side central angle α, which is a central angle of the surface of a developing roller serving as a developer carrier on the upstream side of a restricting member opposing position opposing a doctor blade serving as a developer amount restricting member in a surface motion direction of the developing roller, is not less than 0[°] and not more than 60[°] is set as a low magnetic flux density area γ in which the maximum value of a normal direction magnetic flux density on the surface of the developing roller is not more than 30 [mT].

A developer supply container is detachably mountable to a developer receiving apparatus having a receiving opening for receiving a developer and a shutter for opening and closing the receiving opening, the developer supply container includes an engaging portion which is engageable with the shutter and movable to open and close the shutter by movement of the developer supply container; and a cleaning member for cleaning the shutter when the developer supply container is moved relative to the shutter between a removal position permitting removal of the developer supply container from the developer receiving apparatus and a supply position at which the developer is supplied from the developer supply container to the developer receiving apparatus.

An applying apparatus, which applies paste in a preset pattern to a substrate, includes a stage having a holding surface on which the substrate is placed, a beam member extending above the stage in a direction along the holding surface, a moving device which relatively moves the beam member and the stage in a direction along the holding surface and perpendicular to the extending direction of the beam member, a guide member provided on the beam member and along the extending direction of the beam member, an applying head which is supported by the guide member and movable along the guide member, and a plurality of suction nozzles which are provided along the guide member and suck air in the vicinity of the guide member.

The present invention provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a mainframe having a mainframe wafer transfer robot, a loading station disposed in connection with the mainframe, one or more processing cells disposed in connection with the mainframe, and an electrolyte supply fluidly connected to the one or more electrical processing cells. Preferably, the electro-chemical deposition system includes a spin-rinse-dry (SRD) station disposed between the loading station and the mainframe, a rapid thermal anneal chamber attached to the loading station, and a system controller for controlling the electro-chemical deposition process and the components of the electro-chemical deposition system.

A process for treating sewage by integrating sequential active sludge method with membrane-bioreactor features that the membrane assembly is put in bioreacting pool, its outlet is respectively connected to air inlet pipe and water outlet pipe via two control valves, the whole system sequentially passes through flow-in, reaction, discharge and idle steps, that is, anaerobic, aerobic and anoxic states, and said membrane assembly plays the roles of aerating unit in reaction step or separator in discharge step. Its advantages are simple structure and high effect.

In apparatus of the invention, a transport pod (1) can be coupled to an article-passing opening (11) of process equipment (9) in leaktight manner with sealing being provided by an interposed interface peripheral gasket (16). The pod door (4) can be secured selectively to the interface door (12) so that they can be moved together as a unit along an axial stroke followed by a transverse stroke under drive from door actuator means (14). The transport pod (1) is held by retaining means (15). The peripheral volume (21) around the two doors can be pumped out by means of a pump (22) and a duct (23). The pod door (4) can be locked on the transport door (1) by locking means (20) that guarantee good sealing while the transport pod (1) is separate from the process equipment (9). This ensures good sealing of the transport pod (1), and enables the doors (4, 12) to be opened under a vacuum without polluting the inside atmosphere.

Biaxially-drawn polyester film for fabrication which is characterized in that it is a film comprising polyester in which ethylene terephthalate units and/or ethylene naphthalate units are the chief structural component, and the melting point of said film is 180-270° C., the angle of contact to water is 70°-120°, and the planar orientation coefficient is 0.08-0.15. This film shows outstanding release properties following repeated use, use after fabrication and use in an aqueous environment and, furthermore, it exhibits stable properties with little variation and, in particular, following lamination to metal sheet such as steel or aluminium, when used as the inner face of a fabricated metal can, it is outstanding in its non-stick properties to the contents, and provides a combination of heat resistance and processability.

A substrate processing device and a substrate processing method for general purpose capable of suppressing the contamination of atmosphere in a processing chamber through carriers, continuously performing a stable conveyance and a high quality substrate processing, and coping with further upsizing substrates and various substrate dimensions, the device comprising a load lock chamber allowing the carriers having the substrate mounted thereon to be carried therein, a substrate transfer chamber having a transfer mechanism for transferring the substrate between the carriers, and a substrate processing chamber for applying a specified processing to the substrate, characterized in that the first carrier moves between the load lock chamber and the substrate transfer chamber and the second carrier moves between the substrate transfer chamber and the substrate processing chamber, and the substrate is transferred between the first carrier and the second carrier by the transfer mechanism.

A wet flue gas desulfurization and demercuration process and a system thereof based on two-stage oxidizing reaction. The process does two-stage oxidizing treatment to the simple substance HgO in flue gas utilizing to ultraviolet radiation and oxidant of halogen series, transmutes the gas phase divalent ion Hg2+ therein to liquid phase divalent ion Hg2+ using the modified limestone-gesso wet desulfurization process, and then transmutes the liquid phase divalent ion Hg2+ to the stable mercuric sulfide-HgS deposition via stabilizer of liquid phase divalent ion Hg2+. The system comprises desulfurization and demercuration equipments such as an ultraviolet irradiator, an electrical precipitator, an oxidant spraying unit and a reaction absorber etc, gesso treatment equipments of desulfurization byproduct, and a treating equipment for mercuric sulfide-HgS deposition. The process and the system thereof can raise the oxidation rate of simple substance Hg in the flue gas effectively, and at the same time effectively overcome the reduction release of divalent ion Hg2+ to avoid secondary pollution and be capable of raise desulfurization and demercuration efficiency of limestone-gesso wet desulfurization system.

A control unit for a medical device wherein the control unit comprises a pump, a conduit and control means for controlling the flow of fluid from the pump through the conduit; and wherein the conduit is a rigid internal passage located in the control unit.

The invention relates to a wet ammonia flue gas purification process for the combined sulfur and mercury removing and the system thereof. The process adopts chlorine gas as oxidizing agent to completely oxidize elemental mercury in the flue gas, and gas phase divalent mercuric ion after being oxidized is converted into liquid phase divalent mercuric ion through the improved wet ammonia desulphurization process, and further the liquid phase divalent mercuric ion is converted into stable mercuric sulfide sendimentation through liquid phase divalent mercuric ion stabilizing agent. The system comprises a flue gas oxidizing demercuration preprocessing system composed of an oxidizing agent injection device and an electrostatic precipitator, a wet ammonia flue gas sulfur and mercury removing system composed of a reaction absorbing tower, a sulfur removing accessory substance processing system composed of a cyclone cleaner, a dewaterer, and a dryer, and a mercuric sulfide HgS sendimentation processing system composed of a wastewater buffer pool, a liquid phase mercuric ion reaction chamber, and a settling pond. The process and the system can effectively improve the oxidation rate of the elemental mercury in the flue gas, overcome the defaults that the divalent mercuric ion is easy to be reduced and released and the secondary pollution problem is caused by excess oxidizing agent, and greatly improve the efficiency of sulfur removing and mercury removing.

The present invention relates to an illumination control system comprising a plurality of outdoor luminaries and a motorized service vehicle. Each luminaire comprises a controllable light source producing a light illuminance. The motorized service vehicle comprises a light sensor configured to detect the light illuminance generated by the controllable light source at the motorized service vehicle. The motorized service vehicle computes light illuminance data based on the detected light illuminance and transmits these to the outdoor luminaire through a wireless communication link or stores the light illuminance data on a data recording device of the motorized service vehicle. The outdoor luminaire receives may use the light illuminance data to set or adjust a light illuminance of the controllable light source.

A substrate includes fluid control walls for controlling the liquid crystal fluid closer to the liquid crystal dropped spot of a display area or frame-like fluid control walls between a sealing material and the display area. After the liquid crystal is dropped on the display area, a pair of substrates are pasted and then picked out in the atmosphere for applying pressure onto the pair of substrates and diffusing the liquid crystal. The liquid crystal fluid control walls serve to control the liquid crystal fluid, thereby suppressing the liquid crystal contamination caused by the contact of the unhardened sealing material with the liquid crystal and the relevant display failure.