Plasma confinement apparatus and semiconductor processing equipment applying the same

A plasma and confinement device technology, applied in the field of microelectronics, can solve problems such as complicated installation and maintenance, complicated installation and positioning, and complicated mechanical connection, and achieve the effects of convenient installation and maintenance, prolonging service life, and avoiding particle pollution
CN101441983AActive Publication Date: 2009-05-27BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Publication Date
2009-05-27

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Abstract

The invention provides a plasma constraint device for limiting plasma diffusion. The constraint device comprises at least one layer of cylindrical constraint cover, wherein each layer of the constraint cover is provided with a through hole so as to form a constraint passage. The invention also provides semiconductor processing equipment applying to the plasma constraint device, which comprises a reaction cavity, an upper electrode, a lower electrode and the plasma constraint device, wherein the constraint device is positioned in the reaction cavity and encircles the reaction zone between the upper electrode and the lower electrode so as to prevent the plasma from diffusing outside the constraint device. The plasma constraint device and the semiconductor processing equipment are convenient for mounting and maintenance and uneasy to destroy. Meanwhile, the plasma constraint device and the semiconductor processing equipment can reduce and even avoid particle pollution caused by the plasma outside the reaction zone, so as to increase product yield and prolong service life of parts in the reaction cavity.
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Description

technical field

[0001] The present invention relates to the technical field of microelectronics, in particular, to a plasma confinement device used in semiconductor processing / processing technology and semiconductor processing equipment using the confinement device. Background technique

[0002] With the rapid development of electronic technology, people's requirements for the integration of integrated circuits are getting higher and higher, which prompts companies that produce integrated circuits to continuously improve the processing / processing capabilities of semiconductor devices. In the processing / processing of semiconductor devices, semiconductor processing / processing equipment such as plasma processing apparatuses are widely used.

[0003] Currently, existing plasma processing devices generally include various parts such as a reaction chamber, an upper / lower electrode, a gas input part, and a vacuum obtaining part. In the actual process, the working process of the pl...

Claims

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