11566 results about "Pressure control" patented technology

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

A pump system for applying negative pressure to a wound, including a flow monitor capable of detecting a deviation from a reference airflow rate provided by a controlled leak to determine whether the system is operating normally or abnormally, and a flow status annunciator to indicate a normal operating condition or whether an abnormal condition is a leak or an occluded line in the system. The pump system further includes a pressure controller for regulating operation of a pump to control pressure in the system at a range around a user-selected setpoint. The pump system may also include a waste collector and a level sensor for detecting when the collector is full.

A system and method for providing intermediate reactive species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as intermediate reactive species from the remote plasma unit are provided to the reaction chamber.

A sub-atmospheric downstream pressure control apparatus (200) includes a first flow restricting element (FRE) (202); a pressure control chamber (PCC) (204) located in serial fluidic communication downstream from the first FRE; a second FRE (206) located in serial fluidic communication downstream from the PCC; a gas source (208); and a flow controlling device (210) in serial fluidic communication downstream from the gas source and upstream from the PCC.

A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.

In one embodiment, a method for drilling a wellbore includes an act of drilling the wellbore by injecting drilling fluid through a tubular string disposed in the wellbore, the tubular string comprising a drill bit disposed on a bottom thereof. The drilling fluid exits the drill bit and carries cuttings from the drill bit. The drilling fluid and cuttings (returns) flow to a surface of the wellbore via an annulus defined by an outer surface of the tubular string and an inner surface of the wellbore. The method further includes an act performed while drilling the wellbore of measuring a first annulus pressure (FAP) using a pressure sensor attached to a casing string hung from a wellhead of the wellbore. The method further includes an act performed while drilling the wellbore of controlling a second annulus pressure (SAP) exerted on a formation exposed to the annulus.

A remote control device has a display monitor for rendering an image and a touch screen for user interaction. The touch screen is pressure-sensitive. The device has an operational mode wherein the image is being scaled dependent on a value of the pressure registered by the touch screen.

A processing apparatus includes a process container having a placing table for placing a processing object, an exhaust system having vacuum pumps and a pressure control valve for exhausting atmosphere in the process container. A gas injection unit having a gas ejection hole is provided in the process container, as well as a gas supplying unit for supplying a process gas to the gas injection unit. The entire process apparatus is controlled by a controlling unit. The control unit controls the exhaust system and the gas supplying unit. When starting a predetermined process, the process gas at a flow rate greater than a prescribed flow rate is supplied for a short time while exhausting the atmosphere in the process container by the exhaust system, and then the process gas at a prescribed flow rate is supplied.

A supercharging system for gas turbine power plants (11). The system includes a supercharging fan (30, 32) and controller (50) for limiting turbine power output to prevent overload of the generator (28) at lower ambient temperatures. The controller can limit power output by burner control, inlet temperature control, control of supercharging fan pressure and other options. The system can be retrofit on an existing turbine without replacing the generator and associated parts.

A system and method for controlling formation pressures during drilling of a subterranean formation utilizing a selectively fluid backpressure system in which fluid is pumped down the drilling fluid return system in response to detected borehole pressures. A pressure monitoring system is further provided to monitor detected borehole pressures, model expected borehole pressures for further drilling and control the fluid backpressure system.

A gas supply apparatus including a raw material gas supply system supplying a raw material gas inside a raw material storage tank into the processing container by the carrier gas, the gas supply apparatus includes: a carrier gas passage introducing the carrier gas into the raw material storage tank, a raw material gas passage connecting the raw material storage tank and the processing container to supply the carrier gas and the raw material gas; a pressure control gas passage being connected to the raw material gas passage to supply the pressure control gas; and a valve control unit controlling an opening/closing valve to perform for starting a supply of the pressure control gas into the processing container and simultaneously starting supply of the raw material gas into the processing container from the raw material storage tank, and stopping the supply of the pressure control gas.

The present invention is an oral irrigator comprising a pump, a discharge nozzle and a pressure control. The pump has a generally constant operating speed and feeds the discharge nozzle. The pressure control is adapted to modify a discharge pressure at the nozzle without a significant change in pump speed. The pressure control modifies a level of fluid flow restriction between the pump and the nozzle. The modification of the level of fluid flow restriction is accomplished by modifying aspects of a fluid flow path extending through the pressure control. The aspects modified include the diameter, length and/or number of direction changes of the fluid flow path.

A pressure controlled substrate processing chamber comprising a pressure control ring and a throttling ridge. The pressure control ring is movably disposed proximate the throttling ridge to define a variable flow orifice. The pressure control ring is translated by a ring actuator in response to pressure information retrieved from the processing chamber. The translation of the pressure control ring causes the size of the orifice to change, thus inducing a pressure change within the chamber.

A leakage determining method determines whether or not atmospheric air enters a vacuum transfer chamber for transferring a substrate under a vacuum atmosphere between a preliminary vacuum chamber and a processing chamber. The method includes controlling a pressure in the vacuum transfer chamber to a preset pressure by supplying a pressure control gas into the vacuum transfer chamber; performing supply control, when the substrate is not transferred, by reducing the amount of the pressure control gas supplied into the vacuum transfer chamber or stopping the supply of the pressure control gas; and measuring an oxygen concentration in the vacuum transfer chamber after the supply control of the pressure control gas and determining leakage of atmospheric air into the vacuum transfer chamber by determining whether or not atmospheric air whose amount exceeds a preset allowable level enters the vacuum transfer chamber based on temporal changes of the measured oxygen concentration.