38 results about "Electron cyclotron resonance" patented technology

The invention provides a multi-tube ECRH system thermal load management method based on low-power basic operation, and belongs to the field of electron cyclotron resonance heating systems. When the target total power and the operation duration are received, a time period is judged, one gyrotron is dispatched in turn as a rest gyrotron, and the other gyrotrons are dispatched as working gyrotrons; the method comprises the following steps: periodically collecting the operation power and the collector temperature of each gyrotron, calculating the accumulated thermal load of each gyrotron, calculating the thermal load relative deviation of each gyrotron based on the average thermal load of all gyrotrons at the end of each time window, marking the gyrotron with the thermal load relative deviation exceeding a threshold value as a gyrotron to be adjusted, and adjusting the gyrotron to be adjusted according to the thermal load relative deviation. According to the thermal load relative deviation of the gyrotron to be adjusted, the adjustment amount is calculated, the operation power of the gyrotron to be adjusted is adjusted, and the operation power of all the working tubes is dynamically adjusted; the invention further provides a thermal load management system. And the contradiction between quick response and heat management and between power stability and heat balance is broken through.

The application discloses an electron cyclotron resonance ion source, which comprises a plurality of microwave transmission modules, a plurality of microwave resonance cavities, a plasma generation chamber and a magnetic field module, the microwave transmission module comprises a microwave source, an impedance matcher and a waveguide, the microwave source is used for generating and emitting microwaves, the microwave sources generate microwaves with the same or different frequencies, the inlet of the waveguide is connected with the microwave source, and the outlet is connected with the microwave resonance cavity, each waveguide is connected with one microwave resonance cavity, the impedance matcher is used for adjusting the frequency and standing wave of the microwaves and realizing impedance matching of microwave feeding, the inlet of the plasma generation chamber is connected with the outlets of the plurality of microwave resonance cavities, free electrons are formed at the boundary of the plasma generation chamber and the plurality of microwave resonance cavities, and the magnetic field module is used for generating a magnetic field, so that the free electrons make spiral motion in the plasma generation chamber and collide with background gas introduced into the plasma generation chamber to generate plasma. The electron cyclotron resonance ion source can realize multi-frequency microwave feeding and improve the uniformity of plasma.

The invention relates to an accelerator mass spectrometer system based on positive and negative double ion sources, and the system comprises a double ion source subsystem which comprises a solid sample introduction negative ion source, a gas sample introduction positive ion source, a reversible electrostatic analyzer, and a high-voltage rack. The gas sample injection positive ion source is an electron cyclotron resonance ionization source and can generate 1 +, 2 +, 3 + and full-stripping-state positive ion beams; according to the invention, the dual-ion source subsystem is arranged, the solid sample introduction negative ion source and the gas sample introduction positive ion source are respectively adopted, the measurement requirements of positive ions and negative ions in the same accelerator mass spectrometer system are met, the gas sample introduction positive ion source adopts an electron cyclotron resonance ionization source, positive ion beams in various charge states can be generated, and the measurement accuracy is improved. Covering nuclides from hydrogen to over uranium; the solid sample injection negative ion source adopts a sputtering negative ion source, meets the generation of various negative ion beams, is suitable for measuring long-life isotopes, and realizes quick switching of the two ion sources by arranging a reversible electrostatic analyzer.

This invention relates to the field of fusion device technology and discloses a mounting assembly for installing an electron cyclotron resonant heating reflector. The mounting assembly includes a first mounting plate, a second mounting plate, and a mounting base. The second mounting plate is spaced apart from the first mounting plate, and the mounting base connects between the first and second mounting plates. A reflector and an adjustment assembly are mounted on the mounting base. The adjustment assembly can control the rotation of the reflector relative to the mounting base and / or control the vertical movement of the reflector. The mounting assembly for installing an electron cyclotron resonant heating reflector according to this invention allows for angle and position adjustment of the reflector by controlling its rotation and / or vertical movement. This enables the reflector to reflect, focus, and adjust the direction of microwaves, achieving precise waveguide transmission, improving the installation performance of the mounting assembly, and also reducing the processing precision and cost of the mounting assembly to a certain extent.

The invention discloses a real-time control method of electron cyclotron resonance heating power based on model predictive control, and relates to the technical field of electron cyclotron resonance heating control. The method comprises the following steps: a segmented modeling step: dividing the working range of the electron cyclotron resonance heating system into a plurality of power intervals according to output power, and establishing a linear system dynamic model for describing the dynamic characteristics of the system in each interval; and a real-time control cycle step: acquiring real-time output power and a state estimation value in each control period, and determining a currently used target model according to the real-time output power in combination with a hysteresis switching strategy, and based on the target model and a preset power reference trajectory, constructing a quadratic programming problem containing a target function for minimizing a power tracking error and a constraint condition, and solving to obtain an optimal control input and acting on the system. The invention aims to solve the problem that the existing control method is difficult to consider both the regulation speed and the multivariable constraint, realize the rapid and accurate control of the electron cyclotron resonance heating power, and improve the safety and stability of the operation of the system.

The present invention relates to a satellite propulsion device (10) employing electron cyclotron resonance and magnetic nozzles, the propulsion device extending at least partially along a longitudinal axis (X) and comprising an outer conductor (22) extending longitudinally along said axis and an ionization chamber (8), the outer conductor laterally bounding the ionization chamber and the ionization chamber including a circular lateral opening (24) having a diameter D, and further comprising a screen (6) arranged coaxially with the longitudinal axis (X), the screen (6) having a ratio of its maximum lateral dimension D' to D between 3 and 15 and including a portion made of insulating material (61) and / or a portion made of conductive material (62).

The utility model discloses a movable lifting adjusting mechanism for installing and debugging ECR (electron cyclotron resonance) ion source equipment, which comprises a leveling lifting mechanism connected with an equipment support and arranged on a pulley bottom plate. A supporting and adjusting type universal foot cup assembly and a large-wheel-diameter moving wheel assembly are arranged below the pulley bottom plate. According to the movable lifting adjusting mechanism for installing and debugging the ECR ion source equipment, equipment adjusting and positioning can be met, the positioning and butt joint precision can be guaranteed, landing stable supporting can be achieved, and the problems that in the process that existing ECR ion source equipment is precisely connected with a low-energy beam section (LEBT), an RFQ accelerator section and a high-energy beam section (HEBT section), the operation difficulty is large, and the working efficiency is high are effectively solved. And the butt joint precision requirement cannot be met.

An Electron Cyclotron Resonance, ECR, magnetic nozzle thruster comprising: a thruster chamber; an antenna disposed at least partially within the thruster chamber and configured to emit radio frequency radiation into the thruster chamber; a magnetic field source configured to generate a magnetic field within the thruster chamber, the magnetic field comprising a resonance region; and a ferromagnetic structure, wherein the ferromagnetic structure is positioned relative to the magnetic field source so as to increase a volume of the resonance region within the thruster chamber.

The embodiment of the utility model provides a microwave plasma gun and an ion implanter, and the microwave plasma gun comprises a plasma chamber; the plasma chamber is used for accommodating microwaves and gas, and an electron cyclotron resonance area is formed in the plasma chamber; at least one electron escape hole is formed in the side wall of the plasma chamber; in the axial direction of the electron escape holes, the positions of the electron escape holes coaxially correspond to the positions of the electron cyclotron resonance areas, and in the direction perpendicular to the axial direction, the total sectional area of the electron escape holes is smaller than the sectional area of the electron cyclotron resonance areas. According to the technical scheme provided by the embodiment of the utility model, the leakage degree of gas in the plasma chamber can be reduced, and the working performance of the microwave plasma gun is improved.

The invention relates to a method for hardening an anti-reflective treatment layer (20) deposited on a transparent substrate comprising a top surface (22a) and a bottom surface (22b) extending away from the top surface (22a), the anti-reflection treatment (20) comprises the step of depositing at least one anti-reflection layer composed of at least one material on at least one of the top surface (22a) and the bottom surface (22b) of the transparent substrate, the hardening method comprises the step of bombarding the at least one top surface (22a) or bottom surface (22b) on which the at least one anti-reflection layer has been deposited with a single-charge and / or multi-charge ion beam (14) generated by a single-charge and / or multi-charge electron cyclotron resonance (ECR) ion source (1). The invention also relates to a transparent substrate that has undergone an anti-reflection treatment, at least one of the top surface (22a) and the bottom surface (22b) of the transparent substrate being coated with at least one anti-reflection layer consisting of at least one material in which ions are implanted.

The invention provides a device and method for improving the density of an ion beam output by an ECR ion source, and the device comprises an ionization chamber which is used for generating plasma; the microwave system is used for providing microwave energy for the ionization chamber; the electromagnet system comprises a plurality of electromagnet modules arranged along the axis direction of the ionization chamber; the excitation power supply is used for providing excitation current for each electromagnet module; the ion extraction system is used for extracting an ion beam from the ionization chamber; the electromagnet control executing mechanism is used for driving the electromagnet modules to move in the axial direction so as to adjust the distance between the adjacent modules; and the upper control system is in communication connection with the excitation power supply and the electromagnet control execution mechanism. According to the invention, accurate and flexible regulation and control of axial magnetic field distribution in the ionization chamber are realized through the adjustable spacing of the plurality of electromagnet modules.

This invention discloses a real-time control method for electron cyclotron resonance heating power based on model predictive control, belonging to the field of electron cyclotron resonance heating control technology. The method includes a piecewise modeling step, dividing the operating range of the electron cyclotron resonance heating system into multiple power intervals according to the output power, and establishing a linear system dynamic model describing the dynamic characteristics of the system within each interval; and a real-time control loop step, acquiring the real-time output power and state estimate in each control cycle, determining the target model to be used based on the real-time output power and a hysteresis switching strategy, constructing a quadratic programming problem based on the target model and a preset power reference trajectory, including an objective function and constraints that minimize the power tracking error, solving for the optimal control input and applying it to the system. This invention aims to solve the problem that existing control methods struggle to simultaneously consider adjustment speed and multivariable constraints, achieving rapid and accurate control of electron cyclotron resonance heating power, and improving the safety and stability of system operation.

The application provides a microwave electron gun, a method for generating an electron cyclotron resonance region and an ion implanter, wherein the microwave electron gun comprises: a plasma chamber; the plasma chamber has a first end and a second end; the first end is used for passing in microwaves; the second end is used for passing in gas; an escape region is arranged on the sidewall of the plasma chamber, and the particle escape efficiency of the escape region gradually decreases from the first end to the second end, wherein the particles include electrons and / or gas molecules / atoms. The microwave electron gun provided by the technical scheme reduces the leakage degree of the gas in the plasma chamber and improves the working performance of the microwave electron gun.

The application discloses a DC bus voltage quick recovery control method for a high-voltage power supply module of an ECRH (Electron Cyclotron Resonance Heating) fusion device, and relates to the technical fields of auxiliary heating power supply and power electronic control. Specifically, the method comprises the following steps: obtaining a real-time sampling value of a DC bus voltage, a DC side current sampling value and a grid voltage d-axis component; outputting an active current reference component through a PI regulator according to a voltage deviation; generating a feedforward active current component according to a power balance relationship and superimposing the two to obtain a synthesized d-axis current instruction value as a current inner loop given value. The purpose is to lift the current instruction in advance when a load step occurs, realize quick power matching, reduce the DC bus voltage drop and shorten the recovery time.

This invention discloses a low-energy electron irradiation photolithography method, comprising the following steps: providing a substrate with a polymer film covering its surface; placing the substrate with the polymer film covering its surface in the vacuum chamber of an electron cyclotron resonance plasma nanosurface processing system; covering the surface of the polymer film with a mask having a preset pattern; setting an aperture structure in front of the mask for electron irradiation treatment; developing the electron-irradiated substrate in a developing solution to obtain the desired pattern on the substrate; wherein the electron irradiation treatment uses remote plasma, the diameter of the central hole of the aperture structure is in the range of 0-35 mm, and the irradiation current of the electron irradiation treatment is 0.5-5 mA. This invention allows for precise control of the low-energy electron irradiation area and irradiation dose, resulting in a larger interaction area and higher processing efficiency compared to high-energy electron irradiation, thus solving the problem of low production efficiency in existing photolithography methods.

An electron cyclotron resonance ion source disclosed by the present invention comprises a plurality of microwave transmission modules, a plurality of microwave resonant cavities, a plasma generation chamber and a magnetic field module, each microwave transmission module comprises a microwave source, an impedance matcher and a waveguide, the microwave sources are used for generating and emitting microwaves, the frequencies of the microwaves generated by the plurality of microwave sources are the same or different, inlets of the waveguides are connected with the microwave source, outlets of the waveguides are connected with the microwave resonant cavities, each waveguide is correspondingly connected with one microwave resonant cavity, the impedance matchers are used for adjusting the frequency and standing waves of microwaves and achieving impedance matching of microwave feed-in, and an inlet of the plasma generation chamber is connected with outlets of the microwave resonant cavities. Free electrons are formed at the boundaries of the plasma generation chamber and the microwave resonant cavities, and the magnetic field module is used for generating a magnetic field, so that the free electrons do spiral motion in the plasma generation chamber and collide with background gas introduced into the plasma generation chamber to generate plasma. Multi-frequency microwave feed-in can be realized, and the uniformity of plasmas is improved.

The application discloses a gyrotron integrated test analysis method, and belongs to the field of high-power microwave device testing. The method designs a steady-state working condition debugging starting point according to a starting current curve; and combines experimental power measurement data to correct a simulated power characteristic surface. The method provided by the application combines theoretical simulation with experimental data, realizes rapid identification and optimization of gyrotron working characteristics, improves debugging efficiency and precision, and is suitable for engineering debugging and operation optimization of an electron cyclotron resonance heating system. The method has the advantages of process standardization, high safety and strong migration, and can improve debugging efficiency, enhance calibration precision and reliability.

The application provides a gyrotron steady-state operation stage automatic identification method, and belongs to the field of electron cyclotron resonance heating systems. Control signals and power waveforms of single discharge of a gyrotron are read, and a search range of a steady-state stage is positioned on the power waveforms based on control signal parameters. In the search range, sliding window scanning is performed, the relative standard deviation of power in each sliding window is calculated, and sliding windows with a relative standard deviation less than a threshold value are marked as stable windows. At least N one continuous stable window is identified as a continuous stable section, N a set number, and a continuous stable section with a total steady-state duration longer than a set duration is identified as a steady-state section. A steady-state section with the longest total steady-state duration is identified as a gyrotron steady-state operation stage. The application also provides a gyrotron steady-state operation stage automatic identification system and a gyrotron power prediction method. The problems of high cost, low efficiency and poor universality of a gyrotron steady-state identification method are solved.

The disclosure relates to the technical field of substrate surface treatment by plasma etching and / or atomic layer deposition. A substrate processing apparatus (1) comprising at least one magnet arrangement recipient (13) adapted to receive a magnet arrangement (9) is provided. When the magnet arrangement (9) is received by the magnet arrangement recipient (13), no electron cyclotron resonance (ECR) is provided inside the apparatus (1). Furthermore, a substrate processing apparatus (1) comprising at least one microwave transmissive material window (16) having an electrically conductive frame (17) and one or multiple electrically conductive wires (18) is provided to attract cleaning gas ions. Moreover, a method of in-situ cleaning of a substrate processing apparatus (1) and a use of the apparatus (1) and of the method are provided.

A method for preparing a high-stability inorganic perovskite solar cell. The method comprises the steps of: using a radio-frequency (RF) ion source to remove impurities from the surface of a substrate; performing ion source-assisted RF magnetron sputtering to prepare an ITO electrode on the substrate, performing ion source-assisted RF magnetron sputtering to prepare a hole transport layer and a hole modification layer, performing electron cyclotron resonance source-assisted RF magnetron sputtering to prepare a perovskite absorption layer, performing ion source-assisted RF magnetron sputtering to prepare an electron transport layer, performing RF magnetron sputtering to prepare a barrier buffer layer, performing RF magnetron sputtering to prepare a top electrode, and then performing encapsulation. Compared with the prior art, the present application achieves higher efficiency, better stability and greater flexibility.

The invention discloses a compact high-stability ECR (electron cyclotron resonance) deuterium-deuterium neutron source device, and belongs to the technical field of accelerator neutron sources, the device is composed of an ECR ion source, a vacuum chamber and a target body system, and a vacuum pumping system, a high-voltage feed-in system, a microwave feed-in system, a circulating cooling system, a gas supply system and other multifunctional systems are integrated for cooperative work; the ECR ion source adopts three sets of permanent magnet structures to synergistically generate a uniform 875GS magnetic field, and meanwhile, the newly designed microwave window adopts a micro water channel structure and a tungsten target, so that heat deposited in the microwave window can be greatly reduced on the premise of not influencing microwave feed-in, and the service time of the microwave window is doubled; the target and extraction electrode integrated design is adopted, damage of electrons to peek and other insulating materials is reduced, the service life is prolonged, meanwhile, pure zirconium metal is used as the target material, and the deuterium adsorption capacity under the high-temperature condition is greatly improved. The device has the advantages of small size, long-time stable operation and the like.

The invention relates to the technical field of ion beam separation and purification, in particular to a rarefied gas ion beam separation and purification device which comprises an electron cyclotron resonance ion source, the electron cyclotron resonance ion source generates plasma flow mixed with ions, atoms and molecules, and an electric field used for accelerating ions is arranged on one side of the electron cyclotron resonance ion source. A vacuum tank is arranged on one side of a plasma flow advancing direction, a converging section and a bending section which are positioned on a plasma flow advancing path are arranged in the vacuum tank, gaps are distributed on the outer side of the bending section at intervals, and a magnetic field is arranged below the bending section. Ions are accelerated through an external electric field at first, then enter the bending section through the beam collecting section and turn and move downwards under the action of magnetic field Lorentz force at the same time, atomic molecule flow is thrown out of pores of the bending section under the action of inertia and pressure difference, separation of the ions and atomic molecules is achieved, and pure ion beams are obtained. The device has the advantages of simple structure and easy realization.

The invention provides an automatic identification method for a steady-state operation stage of a gyrotron, and belongs to the field of electron cyclotron resonance heating systems, and the method comprises the steps: reading a control signal and a power waveform of single discharge of the gyrotron, and positioning a search range of the steady-state stage on the power waveform based on a control signal parameter; sliding window scanning is carried out in the search range, the relative standard deviation of power in each sliding window is calculated, and the sliding windows with the relative standard deviation smaller than a threshold value are marked as stable windows; at least N continuous stable windows are recognized as continuous stable sections, N is a set number, the continuous stable sections with the total steady-state duration exceeding the set duration are recognized as steady-state sections, and the steady-state section with the longest total steady-state duration is recognized as a gyrotron steady-state operation stage; the invention also provides a gyrotron steady-state operation stage automatic identification system and a gyrotron power prediction method. The problems that a gyrotron steady state identification method is high in cost, low in efficiency and poor in universality are solved.

The present application relates to a kind of electron cyclotron resonance ion source generation pulse multi-ion species beam method and system, it includes plasma discharge chamber, for generating and restricting plasma;Electron cyclotron resonance ion source magnet is arranged outside ion source cavity;Microwave source is arranged in the injection end of ion source cavity, the microwave power generated is transmitted to plasma discharge chamber, and the gas atom molecule existing in the inside of plasma discharge chamber is ionized, generates the required plasma;Pulsed gas feed-in system is arranged in the injection end of ion source cavity, for single gas or multiple gas is fed into ion source cavity, realizes the accurate feed of the gas required by ion source;Ion source cold electron gun is arranged in the injection end of ion source cavity, for preventing the escape of electron in plasma in axial direction and providing additional cold secondary electron injection, to adjust ion beam extraction flow intensity;Ion source extraction component is arranged in the extraction end of ion source cavity, for extracting ion beam flow.The present application can be applied in the field of ion accelerator.

The present application relates to the technical field of magnetic confinement nuclear fusion, and discloses an electron cyclotron resonance heating system transmission state monitoring device and method, wherein the transmission state monitoring device comprises a waveguide switching switch, a microwave full-absorption water load, a directional coupler, a power measuring device and a detector, wherein the microwave full-absorption water load is used for calibrating the directional coupler, and the microwave power passing through the corresponding transmission waveguide can be obtained through the detector integrated on the directional coupler; the transmission efficiency of different transmission sections and the whole transmission system can be obtained through the microwave power measured at different positions of the transmission waveguide; the power measuring device is arranged at a target position, and the transmission efficiency of the whole transmission system can be obtained through the proportion of the target position absorption power and the passing power; and the final transmission efficiency of the transmission system is determined through mutual checking. The present application can obtain the transmission efficiency of the transmission system on line, monitor the transmission state of different transmission sections on line and accurately determine the fault occurrence point.

The invention relates to the technical field of microwave plasma generating devices, in particular to a double-frequency microwave synergistic ECR (electron cyclotron resonance) plasma generating device which comprises a vacuum discharge cavity, a 2.45 GHz microwave source, a 915 MHz microwave source and an electromagnet system. The vacuum discharge cavity is of a cylindrical structure, the top of the vacuum discharge cavity is provided with a top microwave coupling window, the bottom of the vacuum discharge cavity is provided with a bottom microwave coupling window and a sample table, and the vacuum discharge cavity is connected with a vacuum pump through a pipeline; and the GHz microwave source is connected with the top microwave coupling window through a 2.45 GHz microwave transmission channel and is used for feeding microwaves from the top of the vacuum discharge cavity. Through the synergistic effect of 2.45 GHz and 915 MHz double-frequency microwaves and in combination with the space decoupling feed-in mode of the top and the bottom, high density and high uniformity are taken into account while the plasma scale is expanded, and the technical limitation of a single-frequency scheme is overcome.

The invention relates to the technical field of substrate surface treatment by plasma etching and / or atomic layer deposition. A substrate processing apparatus (1) comprising at least one magnet arrangement recipient (13) adapted to receive a magnet arrangement (9) is provided. When the magnet arrangement (9) is received by the magnet arrangement recipient (13), no electron cyclotron resonance (ECR) is provided inside the apparatus (1). Furthermore, a substrate processing apparatus (1) comprising at least one microwave transmissive material window (16) having an electrically conductive frame (17) and one or multiple electrically conductive wires (18) is provided to attract cleaning gas ions. Moreover, a method of in-situ cleaning of a substrate processing apparatus (1) and a use of the apparatus (1) and of the method are provided.

The application provides a multi-tube ECRH system thermal load management method based on low-power foundation operation, belongs to the field of electron cyclotron resonance heating systems, and sequentially starts the gyrotron to the foundation power; when the target total power and operation duration are received, a time period is determined, one gyrotron is scheduled as a rest tube in turn, and the rest gyrotrons are working tubes; the operation power and collector temperature of each gyrotron are periodically collected, the cumulative thermal load of each gyrotron is calculated, at the end of each time window, the thermal load relative deviation of each gyrotron is calculated based on the average thermal load of all gyrotrons, the gyrotron with the thermal load relative deviation exceeding a threshold value is marked as a to-be-adjusted gyrotron, the adjustment amount is calculated according to the thermal load relative deviation of the to-be-adjusted gyrotron, the operation power of the to-be-adjusted gyrotron is adjusted, and the operation power of all working tubes is dynamically adjusted; and the thermal load management system is also provided; the contradiction between fast response and thermal management, power stability and thermal balance is broken through.

The invention relates to a diamond-like carbon wear-resistant coating and a preparation method and application thereof.The preparation method comprises the steps that first deposition is conducted on the surface of a metal base material through a magnetron sputtering method, and a transition layer is formed; and then, ion beam enhanced deposition and a magnetron sputtering method are combined on the surface of the transition layer for second deposition, a metal-doped DLC layer is formed, and the diamond-like carbon wear-resistant coating is obtained. The ion source for ion beam enhanced deposition includes an electron cyclotron resonance ion source. According to the method, ion beam enhanced deposition and a magnetron sputtering method are combined, meanwhile, an electron cyclotron resonance ion source is adopted, and the prepared metal-doped DLC layer can be matched with the complex surface of a metal part of a kitchen appliance and has the advantages of high hardness, low internal stress, high adhesive force, low friction coefficient and high chemical stability; after the diamond-like carbon wear-resistant coating is attached to the surface of the metal part of the kitchen appliance, the hardness, the wear resistance, the corrosion resistance and the long-term stability can be effectively improved, and meanwhile the attractiveness is improved.

The present invention relates to a device 100 for reflecting microwave radiation during electron- cyclotron resonance heating (ECRH). The device 100 comprises a bulk portion 200 and at least one reflective layer 300a, 300b, 300c, wherein the bulk portion 200 includes dielectric material and the at least one reflective layer 300a, 300b, 300c is made of an electrically conductive material which has an electrical conductivity in a range of 0.1 - 70 MS / m, and wherein the thermal expansion coefficient of the bulk portion 200 differs from the thermal expansion coefficient of the at least one reflective layer 300a, 300b, 300c by an amount in a range of 0 - 20x10-6 / K, and wherein a cooling means 400a, 400b, 400c is provided at or at least partially within the bulk portion 200.