The invention discloses a device interface
state density and distribution extraction method, device and equipment, relates to the technical field of
semiconductor device interface state characterization, and is used for solving the problems of insufficient precision and insufficient
spatial analysis capability in the existing interface state characterization method. Comprising the following steps: establishing a
physical model representing intrinsic electrical behaviors of a device, performing calibration to obtain a
reference model, and determining carrier transport characteristic parameters; based on the
reference model, analyzing the carrier mobility change caused by the interface state as a
coulomb scattering center, and determining the density of the interface state; a
transistor channel is equivalently discretized into a plurality of ballistic transmission units in the spatial dimension, and the non-uniform
spatial distribution characteristic of an interface state in the channel is quantitatively represented according to carrier transport characteristic parameters and interface
state density. According to the technical scheme provided by the invention, the density of the interface state can be accurately quantified, the
spatial distribution of the interface state can be represented, and the accuracy and comprehensiveness of interface
state representation are improved.