59 results about "Pulse irradiation" patented technology

To reduce the time required for removing a wafer mask.SOLUTION: Provided is a division method for dividing a wafer (10) along a street (14) by irradiating the wafer with a plasma-activated etching gas (EG), in which the wafer has devices (15) formed in regions divided by the street. A liquid resin (34) is applied to the device and dried to form a mask (17) that masks the device surface while exposing the streets. Plasma-activated etching gas is then applied onto the wafer to form a division groove (18) along the streets. Subsequently, an altered portion (D) on the mask surface is removed by alternating continuous and pulsed irradiation with an oxygen-containing plasma (P), after which the entire mask is removed from the wafer.SELECTED DRAWING: Figure 5

The invention discloses an accurate X-ray radiation dose measurement system based on artificial intelligence, which comprises the following steps: acquiring CT image data of a patient and pulse irradiation parameters of radiotherapy equipment through terminal equipment, and calculating a patient specific anatomical structure dynamic influence factor set, a pulse waveform time domain characteristic factor and a tissue interface scattering correction factor; all the parameters are substituted into a dose measurement formula to obtain an accurate X-ray radiation dose value; through a deep fusion image recognition technology (such as a high-resolution anatomical structure, tissue density gradient and heterogeneous region distribution provided by CT / MRI), a secondary particle scattering effect of a junction region of a tumor and a normal tissue can be accurately represented; and dynamic anatomical information (such as respiratory movement and organ displacement) in the image is combined to correct the time characteristic (such as dynamic change under an instantaneous high dose rate) of the pulse radiation field in real time, so that the dose calculation accuracy of a fast algorithm in a complex scene is remarkably improved.

A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.

The invention relates to a method for pattern recognition to assemble printed circuit boards by digital printing and a system for implementing the method. In the method, pattern recognition techniques are applied to extract information from imaging of the printed circuit board, thereby enabling automated printing of a targeted object on the board. The method comprises digital printing of a material that is uniformly coated on a transparent donor substrate and positioned in parallel to a receiver substrate. A laser pulse irradiates the donor substrate, resulting in detachment and transfer of a portion of the material onto the receiver substrate. The method enables reduction of overall processing time while achieving high alignment accuracy and high printing resolution.

Techniques are described for acquiring data of an examination object and imaging parameters for an acquisition of measured data via an acquisition method in which gradients to be switched for position encoding of the measured data have their full strength during an irradiation of the RF excitation pulses, and a desired flip angle are loaded. The feasibility of the correction, the acquisition method is selectively performed with the loaded imaging parameters and the loaded flip angle. If a feasibility check is negative, a pulse duration of the RF excitation pulses to be irradiated in the acquisition method and / or of the desired flip angle are adjusted into an adjusted flip angle and / or at least one of the desired imaging parameters into an adjusted imaging parameter, and the acquisition method is performed with an adjusted pulse duration and / or with an adjusted flip angle and / or with an adjusted imaging parameter.

A charged particle beam apparatus for scanning a specimen with a charged particle beam and acquiring a scan image. The charged particle beam apparatus including: an optical system that includes a pulse mechanism for illuminating the specimen with pulses of the charged particle beam, and a deflector that deflects the charged particle beam and scans the specimen with the deflected charged particle beam; and a control unit that controls the optical system. The control unit controls the optical system so as to satisfy T=n×t (n is a natural number). T represents a dwell time of the charged particle beam in each pixel of the scan image, and t represents a cycle of pulses of the charged particle beam.

The present invention belongs to the field of semiconductor technology and relates to a patterned controllable droplet epitaxy method for semiconductor molecular beam epitaxy. The method comprises the following steps: maintaining the temperature of the substrate below the melting point of the target droplet material; depositing the target droplet material on the surface of the substrate to form a metal coating layer, the deposition thickness of which is higher than the critical thickness of the target droplet material when normally forming droplets; in-situ introducing laser interference pulse irradiation to act on the metal coating layer to achieve the patterned orderly construction of the target droplets. The method of the present invention can realize the patterned preparation of group III element droplets. The principle and implementation process of the method are fully compatible with the traditional droplet epitaxy process, there is no risk of introducing any material defects, and there is no selection of substrate types, thereby solving the problems commonly existing in the current existing patterning technology, including potential damage to the quality of the material crystal, poor consistency of the droplet composition, and the type of droplets being directly limited by the selected substrate.

The application discloses a PPG detection circuit and a biological feature detection system. The PPG detection circuit is used to sense the blood oxygen saturation of a to-be-detected object and generate a blood oxygen saturation sensing value and a confidence result. The PPG detection circuit comprises a driver, a light receiver, a sensing data module and a confidence module. The driver is used to drive a light emitter to emit a plurality of light pulses to the to-be-detected object, wherein the plurality of light pulses generate a plurality of reflected light pulses after irradiating the to-be-detected object, and the light receiver receives the plurality of reflected light pulses and generates a first pulse wave signal. The sensing data module is used to obtain the blood oxygen saturation sensing value according to the first pulse wave signal. The confidence module is used to obtain the confidence result according to the first pulse wave signal. The confidence module comprises a feature calculation module and an interval judgment module. The feature calculation module is used to obtain a feature value according to the change of the first pulse wave signal in the time domain. The interval judgment module is used to obtain the confidence result according to the relative size relationship between the feature value and first and second thresholds.

The application discloses a packaging method of a laminated solar cell and application. The application is characterized in that glass powder is laid around the effective area of the cell between the front plate glass and the back plate glass, laser pulse irradiation is used to make the glass powder melt and solidify to form a packaging structure with a reserved inflation hole, inert gas is filled in the inflation hole after air is extracted, secondary laser irradiation is carried out, water vapor is prevented from entering, and a completed packaging structure is formed, so that the water and oxygen blocking property is improved, optical loss is reduced, the edge dead zone area is reduced, and the stability and photoelectric conversion efficiency of the laminated cell are improved.

The present invention provides an optical atomic clock system comprising: an optical pulse generation component adapted to generate a clock interrogation optical pulse; the atomic furnace is used for generating atomic steam; each subsystem is suitable for capturing and preliminarily cooling atoms in the received atom steam to obtain a cold atomic group, and is used for trapping the atoms in the cold atomic group; the subsystem is constructed to allow clock polling pulse light to enter, so that atoms in a ground state interfere with each other under the action of two clock polling light pulses; the processing component is used for obtaining an error signal of the subsystem according to the interference result in any subsystem; a timing controller configured to: cause atoms within the at least one subsystem to be in an illumination phase of the clock interrogation light pulse or in a free evolutionary phase between two illumination of the clock interrogation light pulse; the frequency of the clock interrogation light pulse is corrected according to the respective error signals of the plurality of subsystems.

A distance measuring device according to an embodiment includes a light projecting section that emits pulsed irradiation light, a light receiving section in which a plurality of pixels each detecting incidence of a photon is arranged, an integration section that creates a first histogram for each of the pixels by using a detection signal output from each of the pixels, and a restoration section that converts the first histogram into a second histogram on the basis of a state of the light receiving section.

This disclosure aims to compensate for the effects of fluctuations in the repetition frequency of a pulsed light source, which cause distance measurement errors, without using a continuous wave light source. [Solution] The present disclosure relates to a distance measuring device that irradiates an object to be measured with a test light pulse and measures the distance to the object using the interference waveform of the signal light pulse reflected by the object and a reference light pulse, wherein the test light pulse and the reference light pulse have a plurality of frequency components, and the distance measuring device includes a correction signal acquisition unit that detects the interference signal of the test light pulse and the reference light pulse of at least two of the plurality of frequency components contained in the test light pulse and the reference light pulse as a correction signal.

In a method for slice-specific correction of scan data recorded for at least two slices simultaneously of an examination object using an EPI-SMS technique, navigator signals encoded in a slice selection direction using a bipolar readout gradient for the at least two slices temporally after a RF excitation pulse radiated into the examination object and temporally before the recording of scan data to be corrected may be simultaneously recorded. Mean navigator signal(s) from at least two of the recorded navigator signals of a same polarity may be determined. Single-slice navigator signals may be determined based on the mean navigator signal and a navigator signal having been recorded with the same polarity as the mean navigator signal(s), but with a different slice selection encoding. Slice-specific correction data from the single-slice navigator signals may be determined, and scan data may be corrected based on the slice-specific correction data.

The invention relates to a method for determining a reference time point (t0) by means of a light microscope (1), wherein a sample (2) is illuminated by first light pulses (P1) in order to excite light-emitting entities in the sample (2), wherein a light signal generated by means of the first light pulses (P1) is detected, and wherein the reference time point (t0) is determined based on the detected light signal, and wherein the light signal is detected in at least two measurements each in a first detection time window (G1), wherein a starting time point of the first detection time window (G1) is adjusted for each of the measurements. The invention further relates to a light microscope (1) and a computer program for carrying out the method.

An apparatus (500) for spectroscopic measurements, the apparatus comprising: - an illumination unit (110) for forming narrowband light pulses (B2 t1 , B2 t2 ) having different wavelengths (l1, l2) for illuminating an object (OBJ1) with the narrowband light pulses (B2 t1 , B2 t2 ), - a sensor (SEN1) for detecting light (B3) received from the object (OBJ1), - a control unit (CNT1) for controlling an operation of the sensor (SEN1), wherein the illumination unit (110) comprises: a broadband light source (LS1) for generating broadband light pulses (B1), a Fabry-Perot interferometer (FPI1) for forming the narrowband light pulses (B2) by filtering the broadband light pulses (B1), wherein the broadband light source (LS1) is configured to generate a first broadband light pulse (B1 t1 ) at a first trigger time (t1) and a second broadband light pulse (B1 t2 ) at a second trigger time (t2), wherein the Fabry-Perot interferometer (FPI1) is tunable by moving a mirror (M2) of the Fabry-Perot interferometer, wherein the illumination unit (110) is configured to operate such that the movement of the mirror (M2) does not stop between the first trigger time (t1) and the second trigger time (t2), wherein a start time (t EX1 ) of a first exposure time (Deltat A1 ) and a duration of the first exposure time (Deltat EX1 ) of the sensor (SEN1) are controlled such that the illumination unit (110) forms the first broadband light pulse (B1 EX1 ) and the second broadband light pulse (B1 t1 ) during the first exposure time (Deltat t2 ).

The invention relates to a method and a sensor (100) for determining an angular acceleration of an external rotation, comprising preparing a plurality of atoms (100) in a first internal electron state (12) in a trap (200), irradiating a first pulse of a first analysis laser beam (26) and a second analysis laser beam (28) onto the atoms (100) trapped in the trap (200) to generate a uniformly distributed superposition between a first and second angular momentum state (13, 15) of a center of gravity movement of the atoms (100); irradiating a second pulse of the first and second analysis laser beams (26, 28) onto the atoms (100) to exchange a population (50) of the atoms (100) between the angular momentum states (13, 15); irradiating a third pulse of the analysis laser beams (26, 28) onto the atoms (100); Determine the population (50) of atoms (100) in the first internal electron state (12).

The invention discloses a femtosecond laser directional induction etching system and method based on nanopore anchoring. The system comprises a femtosecond laser, a beam expander L1, a half-wave plate L2, a polarization beam splitter L3, a first reflector L4, a second reflector L5, a long-wave-pass dichroscope L6, a non-polarization beam splitter L7, an infinity correction objective lens L8, a semi-reflecting and semi-transmitting mirror L9, a convex lens L10, a third reflector L11, a sleeve lens L12, a power meter and a CCD camera. And in the multi-pulse irradiation process, by means of the local field enhancement effect, a subsequent structure is induced to be etched in the direction perpendicular to laser polarization with the nanopore as the starting point, and controllable machining of the nanostructure with the line width as low as 15 nm on the surface of the dielectric material is achieved. According to the invention, the growth path of the groove structure is determined by the anchoring position of the nanopore and the polarization direction of the laser, so that the method has good processing control capability and system stability.

To provide an annealing system and a method for avoiding thermal influence on a material and a structure of a lower layer even for a material having poor heat resistance without giving thermal damage to a substrate.SOLUTION: A laser annealing system 10A that anneals a thin film on a substrate by irradiating the thin film with pulsed laser light includes a laser apparatus 12 that outputs pulsed laser light, an emission optical system 70 that is an optical system that emits pulsed laser light to the thin film, and a laser annealing control processor 100 and a laser control processor 28 that are processors that control emission of pulsed laser light to the same location of the thin film by performing burst emission in which a burst period in which the pulsed laser light is continuously emitted and a suppression period in which continuous emission of the pulsed laser light is suppressed are repeated.SELECTED DRAWING: Figure 7

The invention provides methods and apparatus comprising a laser source that uses a single unfocused pulse of a low intensity but high power laser over a large sample area to collect Raman scattered collimated light, which is then Rayleigh filtered and focused using a singlet lens into a stacked fiber bundle connected to a customized spectrograph, which separates the individual spectra from the scattered wavelengths using a hybrid diffraction grating for collection onto spectra-specific sections of an array photodetector to measure spectral intensity and thereby identify one or more compounds in the sample.

The invention discloses an insulator accumulated charge elimination method and device, terminal equipment and a storage medium, and belongs to the field of insulators, and the method comprises the steps: collecting the charge accumulation amount of a target insulator accumulated charge region in a target high-air-pressure sealed cavity when an accumulated charge elimination instruction is received, gas combination data and air pressure data of the target high-air-pressure sealing cavity are obtained; calculating a charge accumulation influence factor according to the gas combination data and the gas pressure data; selecting a target laser light source type according to the charge accumulation influence factor; determining short-time pulse irradiation times according to the charge accumulation amount and the target laser light source type; and controlling a laser generating device to emit laser corresponding to the target laser light source type until the short-time pulse irradiation times are reached, and obtaining a target insulator after the accumulated charges are dissipated. By implementing the invention, the problem that the accumulated charges on the surface of the insulator cannot be effectively dissipated in the prior art can be solved.

A laser therapy device comprises a pulsed laser light source. Each triggering of tissue irradiation causes application of a first heating laser pulse of a first power and a first pulse duration and at least a second heating laser pulse of a second power and a second pulse duration to the tissue. Changes in volume resulting from the rising and the decreasing power gradient of the first laser pulse are detected. The therapy device, on the basis of the measured values relative to the change in volume and taking into consideration at least the predetermined rises of the power gradients of the first heating laser pulse, determines an estimated value for the temperature increase in the tissue during irradiation of the first heating laser pulse, and generates, from the estimated value, a command that causes adjustment of the second power and / or the second pulse duration of the second laser pulse.

The present disclosure relates to a method for detecting a user (U1) approaching a terminal (T1) within a detection distance (D), the method comprising: feeding a LED, by electrical pulses, between an RC circuit connected to a voltage source and a first resistor connected to ground, the LED illuminating a detection zone with light pulses; capturing by a photodiode light pulses coming from the detection zone; determining a pulse count representative of a time-of-flight of a light pulse emitted by the LED and received by the photodiode; computing a count variation by subtracting a reference count from the pulse count, the reference count being determined when no object is present in the detection zone; comparing the count variation with a threshold corresponding to the detection distance; and triggering an operation when the count variation is lower than the first threshold.

This invention relates to the field of fiber optic temperature measurement technology, specifically to a high-temperature sensor based on a torsion-type long-period fiber grating and its fabrication method. The fabrication process includes: fixing an optical fiber to a rotating fixture and rotating it by a preset angle to prepare an optical fiber with a preset torsional stress field; controlling a laser and a displacement platform to alternately perform fixed-point pulse irradiation and step-by-step movement to induce thermal relaxation of the stress field to prepare the grating; collecting transmission spectral data and controlling the processing equipment based on power loss values; and calculating the temperature sensitivity coefficient. In this invention, by pre-setting a torsional stress field and inducing periodic thermal relaxation of stress, dependence on photosensitive doping materials is eliminated, mechanical strength is maintained, and efficient refractive index modulation is achieved, resulting in excellent thermal stability. Combined with real-time spectral acquisition and loss analysis, a closed-loop feedback is constructed to precisely adjust irradiation parameters, improving temperature sensitivity and linearity, and solving the problems of low yield and poor long-term stability associated with traditional processes.

The present application relates to a kind of non-scanning single-photon polarization three-dimensional imaging method, comprising: constructing pulse laser echo photon number calculation model: pulse laser emits laser pulse, after each light pulse is irradiated to target, the photon number of return to single-photon avalanche photodetector each pixel is related to detection distance;Construct single-photon detector signal and noise model: signal photon and background photon are incident on the photosensitive surface of detector to complete photon injection, based on the quantum efficiency of detector, photoelectric conversion is generated echo electron and canister noise electron, noise electron is generated by thermal current, tunneling current, then carries out electric injection, then based on avalanche probability, avalanche multiplication is completed, and finally, the signal is read out through avalanche signal detection;Construct polarization modulation laser radar ranging model, improve target polarization three-dimensional imaging distance.

Spectrum series are generated based on acquired photons responsive to irradiating a location of a sample with multiple light pulses. The spectrum series is processed with a trained 2D neural network to generate Raman spectrum with reduced fluorescence.

A system includes an optical path configured to irradiate a part of a target with Stokes light pulses, pump light pulses and hybrid probe light pulses including first probe light pulses and second light pulses, with the first probe light pulses and the second probe light pulses overlapping in time in part, with the first and second probe light pulses partially overlapping with the Stokes pulse and the pump pulse, and with at least one of the first probe light pulses and the second probe light pulses varying phases; and a detector configured to detect CARS spectrum and generated by the Stokes light pulses, the pump light pulses and the hybrid probe light pulses to acquire sets of CARS spectrum in association with the phases of the hybrid probe light pulses.

The application provides a phase-change photonic device and a preparation method thereof, and relates to the technical field of semiconductors.The preparation method of the phase-change photonic device in the application is as follows: a ridge-type silicon waveguide is prepared; a phase-change material layer is prepared on the surface of the ridge-type silicon waveguide; then, in sequence, a laser is used to irradiate the surface of the initial phase-change photonic device with short pulses of different energy values in stages, so that the phase-change material layer is gradually cooled in sequence, and the microstructure of the phase-change material layer is adjusted in the gradual cooling process, the phase-change photonic synaptic weight is changed, and the final phase-change photonic device is obtained.Based on this, the phase-change material layer on the ridge-type silicon waveguide is irradiated in sequence by using multi-stage combined pulses, so that the phase-change material layer is gradually cooled in sequence, and the microstructure of the phase-change material layer is adjusted in the gradual cooling process, and the phase-change photonic synaptic weight is changed.

The application relates to the field of semiconductor chip manufacturing, and provides a laser annealing method and device.The scheme of the application is as follows: laser is provided, the laser can form a strip-shaped or linear irradiation area extending along a first direction on a substrate; the laser is used to perform step-by-step pulse irradiation on the substrate along a second direction to perform laser annealing on the substrate, the second direction is perpendicular to the first direction, and the step length between different periods along the second direction is reduced, so that when the laser beam energy performs multiple laser irradiations on the substrate within a certain period, the overlapping part of the laser beam energy irradiated on the substrate is adjusted, thereby converting the low-energy part of the laser beam into high energy on the substrate, so that the crystallization of the low-energy part of the laser beam on the substrate is consistent with the crystallization effect of the high-energy part of the laser beam, the crystallization height on the substrate is uniform, and the production process effect of the chip is improved, and the process window is widened.

This invention belongs to the field of semiconductor device technology, specifically relating to a method for fabricating amorphous gallium oxide photoelectric synaptic devices at room temperature and their applications. Amorphous gallium oxide channels are formed on a gate insulating dielectric layer using room temperature sputtering. By controlling the magnetron sputtering power, the amorphous gallium oxide layer is given an oxygen vacancy concentration suitable for generating continuous photoconductivity and synaptic response. The device generates postsynaptic currents under 254nm ultraviolet pulse irradiation, which can be used for simulating ultraviolet irradiation skin damage perception and pain sensitization. It can also convert sound data into cochlear images and further into postsynaptic current characteristics for snoring recognition. This solution combines room temperature fabrication, low power consumption, complete photoelectric synaptic functionality, and information processing capabilities for medical and health monitoring.

The application discloses a Dendrobium candidum multi-index nondestructive quality evaluation method, and belongs to the technical field of traditional Chinese medicinal material nondestructive detection, and particularly relates to a Dendrobium candidum multi-index nondestructive quality evaluation method. The sample is clamped in a measuring cavity, an effective measuring area between nodes is determined, and zero-perturbation pre-scanning data are obtained, based on which a micro-perturbation script is generated, near-infrared pulse irradiation, air heat exchange perturbation and mechanical light tapping perturbation are applied under a unified time axis, diffuse reflection near-infrared spectrum, a thermal recovery curve, a vibration attenuation waveform and an epidermal texture change sequence are synchronously collected, a moisture-polymer coupling state tensor is constructed, and a quality evaluation result or an abnormal label is output.