177 results about "Quartz substrate" patented technology

The invention belongs to the technical field of optical film measurement, and particularly relates to a method and system for measuring the thickness of a quartz substrate optical film. The method comprises the following steps: acquiring a surface coordinate model of a quartz substrate, and dividing a film area into a parallel measurement area and a non-parallel measurement area; performing parallel measurement and non-parallel measurement on the two types of regions respectively to obtain first thickness data and second thickness data which jointly form original thickness data; determining measurement parameters corresponding to the original thickness data acquisition process, wherein each measurement parameter represents the offset of the corresponding measurement point; and correcting the original thickness data based on the measurement parameters to generate corrected thin film thickness data, and taking the corrected thin film thickness data as the thickness of the thin film area. According to the invention, dynamic error correction is carried out on the original thickness data, the accuracy and reliability of the thickness data of the thin film are improved, and meanwhile, comprehensive scanning of the irregular thin film is realized through a partition measurement strategy.

The invention provides an interposer and a preparation method thereof, and a photoelectric co-packaging structure, and the interposer comprises a substrate which comprises a glass substrate or a quartz substrate; the functional layer is arranged on the substrate, the refractive index of the functional layer is higher than that of the substrate, and the optical structure arranged on the functional layer at least comprises a micro-nano optical structure. The interposer realizes integration of an optical structure through the preset functional layer, and solves the problems of difficult micro-nano processing, difficult alignment, low integration level and the like of a glass material.

The invention discloses a super-resolution micro lens and a preparation method thereof. The lens comprises a photoresist spherical micro lens and a mixed substrate plane lens which are sequentially arranged from top to bottom. The specific preparation method comprises the following steps: S1, preparing a photoresist cylinder on a quartz substrate; s2, reflowing the photoresist cylinder into a micron lens by using a photoresist reflowing process; s3, preparing a mixed substrate plane lens on the surface of the to-be-detected sample; and S4, transferring the micron lens to the surface of the mixed substrate plane lens. By changing the thickness of the mixed substrate plane lens, adjustment of the amplification coefficient and the numerical aperture can be realized, and compared with a micro lens without a mixed substrate, the micro lens has higher imaging resolution. The method has a wide prospect in the technical field of optical imaging.

The invention provides a square quartz substrate double-face grinding method and system and a process production line, and belongs to the technical field of quartz substrate machining. The method comprises the steps that a square quartz substrate workpiece subjected to profiling contour grinding is loaded in a grinding jig of a double-face grinding machine, thickness change dynamic parameters of the square quartz substrate workpiece are collected in real time, and a grinding pressure value is adjusted based on the thickness change dynamic parameters; the method comprises the following steps: mixing artificial carborundum and nanoscale alumina particles according to a mixing ratio of 5-50%, and preparing a multi-stage particle size grinding fluid with the particle size of W5-W28; the rotating speed of the double-sided grinding machine in the coarse grinding stage is set to be 8 r / min-30 r / min, and the rotating speed of the double-sided grinding machine in the fine grinding stage is set to be 8 r / min-25 r / min; and the actual removal amount of the workpiece in the grinding process is obtained, and the grinding time is dynamically adjusted based on the actual removal amount of the workpiece. And the machining efficiency, the thickness uniformity and the surface quality can be improved, so that efficient and precise double-sided grinding of the square quartz substrate is realized.

The application discloses a kind of light field regulation detection method and device based on computing spectral reconstruction, belong to spectral analysis technical field.The method is by introducing medium-metal composite nanostructure, integrates metal nanoisland array and silicon nitride nanocolumn array on quartz substrate, realizes electric field enhancement using the local surface plasmon resonance effect excited by metal nanoisland array, simultaneously realizes wide spectral range phase coding by medium nanocolumn array;Super surface chip is integrated with single point detector, combines pre-calibrated super surface sensing matrix A and enhancement factor matrix E, and reconstructs spectrum using compressed sensing or Tikhonov regularization algorithm.The application keeps the advantages of miniaturization and no moving parts, realizes directional high sensitivity detection to weak signal, and signal-to-noise ratio is improved.

The invention provides a high-quality-factor metal arched quartz resonator and a preparation method thereof, and relates to the technical field of sensors. The structure of the metal arched quartz resonator sequentially comprises a lower metal electrode layer, a lower adhesion layer, a quartz substrate, an upper adhesion layer, an upper metal electrode layer and a metal arched structure from bottom to top. And each layer coincides with the geometric center normal of the metal arch structure. The metal arched structures are consistent in height and comprise a central symmetrical metal structure and a plurality of annular metal structures surrounding the periphery of the central symmetrical metal structure, and the two annular metal structures are concentric. The ring widths of the annular metal structures are integrally decreased from the center to the periphery, and the distances are integrally increased from the center to the periphery. According to the design, the metal arched quartz resonator has the advantages of high quality factor, high yield and low processing cost.

The present invention relates to the technical field of graphene, and discloses a quartz-based graphene preparation method, which comprises: placing a quartz substrate in a reducing atmosphere at a temperature of 1160-1200 DEG C, and carrying out heat preservation for 100-140 min, the reducing atmosphere comprising hydrogen and an inert gas, and the hydrogen accounts for 5-10% of the total volume of the hydrogen and the inert gas; and introducing a carbon source gas, and depositing and growing graphene on the surface of the treated quartz substrate. According to the method, the proportion of hydrogen is reduced, the reducing capacity in the atmosphere is reduced, hydroxyl groups are gradually separated out from a quartz bulk phase, the quartz surface is in the oxygen-containing atmosphere, a substrate can be subjected to phase change at the temperature of 1,160-1,200 DEG C and is converted into a cristobalite crystal phase, the melting point of cristobalite can reach 1,700 DEG C, the tolerance temperature of the cristobalite is greatly increased, the deposition environment of graphene is improved, and the quality of graphene is improved.

To provide a high frequency and low CI vibration element, a vibrator, and an oscillator.SOLUTION: A vibration element 1 includes a quartz crystal substrate 10 having a vibration portion 11 including a vibration region 13 and a support portion 12 that is thicker than the vibration portion 11, and excitation electrodes 31, 32 arranged in the vibration region 13, and satisfies the relationship y≤11.4exp(-x / 174.8)+1.8, and y [nm] is the surface roughness in the vibration region 13 of the quartz crystal substrate 10 and x [MHz] is the oscillation frequency.SELECTED DRAWING: Figure 5

This invention provides a highly reliable substrate in which fine through-holes are filled with metal, enabling high-density mounting and high reliability, as well as a method for manufacturing the same. [Solution] The above problem is solved by a micro-through-hole filled substrate 10 in which a plurality of micro-through holes 2 formed in a substrate 1 are filled, wherein the micro-through holes 2 are filled with a conductive layer (at least 3b) formed on their inner wall surface and a metal solder layer 3c formed on the conductive layer, the conductive layer having a copper plating layer 3b formed on the metal solder layer side, and the metal solder layer 3b being filled with nickel-containing molten solder treated with an organic fatty acid-containing solution. The substrate 1 is preferably a quartz substrate or a glass substrate, and an intermetallic compound layer 4 is formed on the conductive layer 3b side of the metal solder layer 3c that combines with the copper component constituting the conductive layer 3b to prevent copper corrosion.

The application relates to a full-quartz-encapsulated doped quartz whispering gallery microsphere sensor and a preparation method thereof, and belongs to the technical field of microcavity lasers. The full-quartz-encapsulated doped quartz whispering gallery microsphere sensor comprises a quartz substrate, a T-shaped groove is engraved on the quartz substrate, a fiber taper is transversely placed in the T-shaped groove of the quartz substrate, a doped quartz whispering gallery microsphere is vertically placed in the T-shaped groove of the quartz substrate, and the doped quartz whispering gallery microsphere is directly in contact with the fiber taper for coupling. The full-quartz-encapsulated doped quartz whispering gallery microsphere sensor provided by the application encapsulates the fiber taper-microsphere coupling system in the groove of the quartz substrate, has the characteristics of miniaturization, high integration and stable structure, and has good reliability in high-temperature, high-pressure and corrosive environments, and is suitable for various high-temperature measurement and detection scenes.

The application relates to the technical field of laser packages, in particular to an in-situ optical shaping VCSEL array integration method and an optical interconnection module, which comprises the following steps: S1, a quartz substrate is used, a femtosecond laser pulse is focused and scanned in the quartz substrate, and a three-dimensional profile of a micro hole is defined in advance; S2, a VCSEL chip is precisely placed into the micro hole in an array arrangement with the VCSEL chip facing upwards, and epoxy resin is cured by heating; S3, a metal layer is sputtered on the quartz substrate, and an electrical interconnection track is formed through photolithography; S4, a two-photon polymerization direct writing system is used to initiate two-photon polymerization of photoresist, solidification is realized, and the production of a polymer lens is completed. The application selects fused quartz glass as the only passive integrated substrate; the substrate has four characteristics of optical transparency, electrical insulation, thermal stability and three-dimensional micro machining at the same time, replaces the multilayer composite substrate in a traditional scheme at one time, and realizes the original integration design basis of an optical path, an electrical circuit and a thermal path.

This invention discloses a tool setting system and process for automatic machining of FMS semiconductor quartz rings. The tool setting system is an in-machine tool setting system of the MC, and its functional modules are integrated with the machining center's mechanics and signals. It includes the following functional modules: Control module: composed of the machining center and a built-in CNC control system. The CNC control system has a preset tool setting macro program, which is used to control the automatic execution of the entire tool setting process, the calling of machining parameters, and the coordination of signals of each module. This invention achieves high repeatability positioning accuracy of the tool setting instrument and the machining fixture on the machine tool guide rail through the integrated device of the fixed positioning module. Combined with the precise matching of the positioning pin and the center guide sleeve, it effectively reduces clamping misalignment error. At the same time, for the multi-point tool setting process of wax-bonded quartz substrate and product design, it can completely establish the workpiece coordinate system to ensure that the concentricity, height, and flatness of the quartz ring and the substrate meet the stringent requirements of semiconductor processing.

The application belongs to the technical field of inertial devices, and particularly relates to a quartz base planar differential quartz vibrating beam accelerometer and a packaging method thereof. The accelerometer comprises a shell, a circuit board, VIA chips, a quartz substrate and conductive pins. The inside of the shell is a vacuum cavity. The quartz substrate is composed of a quartz body, a rectangular step and a solder film. The rectangular step is used for positioning and fixing the VIA chips. The solder film realizes the soldering connection of the chips. Two VIA chips output positive and negative signals through differential detection. The circuit board provides driving signals for the chips and amplifies the output signals. The conductive pins transmit signals and receive control signals to regulate the working state of the chips. Through the vacuum cavity design, the differential detection technology, the high-precision assembly method and the reliable packaging process, the application solves the instability caused by the mismatch of the adhesive process and the thermal expansion coefficient and the performance problem affected by the assembly error in the prior art, and improves the measurement accuracy, the anti-interference ability and the assembly stability of the accelerometer.

The invention relates to the technical field of terahertz photoelectric detection. A traditional terahertz frequency mixer generally adopts a semiconductor material with a low dielectric constant, the heat dissipation requirement of a high-frequency circuit is difficult to meet, the dielectric loss of a traditional substrate structure is remarkably increased along with the increase of the frequency of the frequency mixer, a large amount of energy loss is generated when a signal is transmitted in a micro-strip, and the transmission efficiency of a high-frequency signal is influenced; the invention provides a terahertz harmonic mixer structure of a hollow structure substrate and a preparation method thereof, a quartz substrate with a hollow structure is provided with a mixer circuit, the quartz substrate is arranged between a mixer upper cavity and a mixer lower cavity, and the quartz substrate is combined with a metal structure to realize transmission of terahertz signals. The thermal performance of the mixer is improved by the hollow structure, so that the mixer has better stability in a high-temperature environment, parasitic parameters are changed by modifying the structure of the quartz substrate, the impedance matching efficiency is improved, and the mixer is ensured to work stably and efficiently under the terahertz frequency.

This invention relates to a quartz optical window for enhancing solar-blind ultraviolet detection, its fabrication method, and its application. The method includes: etching a periodic array of hollow micro / nano structures with gradually changing morphology on the emitting end face of a quartz substrate with high transmittance in the solar-blind ultraviolet band; cleaning to obtain a quartz element; depositing a solar-blind ultraviolet-transmittance thin film material as the filling material for the hollow structure on the emitting end face of the obtained quartz element; polishing the coated emitting end face to obtain a functional layer of a periodic array of micro / nano structures with a period of 100nm–300nm, a thickness of 80nm–300nm, and a duty cycle greater than or equal to 0.5; cleaning to obtain a quartz optical window for enhancing solar-blind ultraviolet detection with the periodic array of micro / nano structures. This invention improves the quantum efficiency of the cesium telluride photocathode in a solar-blind ultraviolet image intensifier by using a quartz optical window with a micro / nano structure functional layer, thereby improving the cathode sensitivity and achieving long-distance, high-definition detection.

The application discloses a quartz substrate smooth surface ultrasonic quantitative cleaning process and relates to the technical field of quartz substrate cleaning. In order to solve the problems of inconvenient quartz substrate cleaning process and poor cleaning effect, the application optimizes the composition of the cleaning solution, improves the cleaning efficiency, and realizes efficient cleaning effect through fine solution proportioning and gradual adding in the medium frequency analysis, and the cleaning scheme combines the advantages of low frequency and medium frequency, preliminary cleaning is first carried out to remove most of the dirt, and then fine cleaning is carried out to thoroughly remove the residues in the small gap. Through strict product detection, unqualified products can be found and processed in time in the production process, so that the unqualified products are prevented from flowing into subsequent processes or the market, production cost and quality loss are reduced, the cleaning scheme is re-established according to the comparison difference value, the maximization of the cleaning effect is ensured, the cleaning accuracy and efficiency can be significantly improved, and substrate damage caused by improper cleaning is reduced.

Provided is a bonded substrate having a wide region that is suitable for device processing. A bonded substrate (10) according to the present invention comprises a quartz substrate (11) and a functional substrate (12) bonded to the quartz substrate (11) via a bonding surface, wherein the quartz substrate (11) does not include a seed portion.

The invention discloses a fused quartz substrate integrated laser radar transmit-receive optical module and an adjusting method, and belongs to the technical field of optical instruments. According to the module, all optical elements for transmitting and receiving optical paths are integrated on the same fused quartz substrate, and each element is provided with a micro sensor and a micro adjusting device. The system comprises a first control loop, a second control loop, a first central signal gating and routing unit and comparative judgment and arbitration logic. By means of six predefined paragraph diagnosis modes, the system can accurately position misalignment paragraphs in an optical path and only drives the micro adjusting devices corresponding to the misalignment paragraphs to conduct cooperative closed-loop compensation, and self-adaptive alignment from local fine adjustment to global search is achieved. The method has the beneficial effects of full-life-cycle self-maintenance, accurate and efficient adjustment, global optimization of a transceiving link, remarkable reduction of full-life-cycle cost and the like, and is particularly suitable for the fields of vehicle-mounted laser radars with high reliability requirements and the like.

The invention discloses a method for detecting biomolecules, and relates to the technical field of micro-nano processing technology and LSPR biosensors. An existing LSPR sensor is low in sensitivity and large in spectral formant line width, and an existing MIM structure is complex in machining process, high in cost, tedious in modification step and insufficient in sensing performance stability. A metal-gap-metal composite structure is constructed, a pair of sensing chips is prepared, each sensing chip comprises a quartz substrate and an LSPR gold nanostructure array, a supporting structure is formed on the quartz substrate, buckling assembly is performed to accurately control the distance to form an MIM resonant cavity, and the active regulation and control of the electric field intensity are realized by combining biological modification and detection methods. The sensitivity of the sensor is remarkably improved, the spectral formant line width is reduced, the process is simplified, the cost is reduced, the stability is improved, and the sensor is used for detecting trace tumor marker antigens.

The invention relates to a high-modulation-efficiency phase modulator based on a silicon nitride-lithium niobate waveguide. The modulator comprises an optical transmission unit and an electric transmission unit, the optical transmission unit comprises a quartz substrate layer, a silicon dioxide buffer layer arranged above the quartz substrate layer, a composite waveguide arranged above the middle position of the silicon dioxide buffer layer, and a silicon dioxide cladding covering the outer side of the composite waveguide; the electric transmission unit comprises a metal traveling wave electrode, and the metal traveling wave electrode adopts an embedded double-layer capacitor microstructure load traveling wave electrode. By optimizing the design of the electrode structure and the waveguide structure, the modulation efficiency is remarkably improved, broadband response and low optical loss are considered at the same time, and the device is suitable for application scenes sensitive to phase modulation efficiency and power consumption, such as high-speed optical fiber communication, coherent optical transmission systems, optical phased arrays and quantum optical experiments.

The invention discloses a nano-cavity sensor for efficiently exciting fluorescence. The nano-cavity sensor comprises a quartz substrate layer, a micro-lens layer and a metal film layer which are sequentially arranged from bottom to top, the micro-lens layer is located above the quartz substrate layer and comprises a plurality of spherical-table-shaped micro-lenses protruding upwards; and the metal film layer is positioned on the quartz substrate layer and the micro lens layer, and is provided with through nano holes which are in one-to-one correspondence with the centers of the top planes of the table-shaped micro lenses. When exciting light enters, the spherical table type micro lens can focus a light beam emitted into the lens cavity from the bottom to the bottom of the nanopore to form a zero-mode waveguide effect, and fluorescent substances in the nanopore are excited through an evanescent field. The spherical table type micro lens modulates the direction of an excitation light beam, the light beam is converted into local enhanced excitation from parallel incidence, modulation of excitation photoelectric magnetic field distribution at the bottom of a nanopore and in a nanocavity in a solution environment is achieved, and distribution of an electromagnetic field is described by using a caustics line. According to the device, the excitation efficiency of a light path system on fluorescence is remarkably improved.

To provide a high-frequency, low-CI-value vibrating element, vibrator, and oscillator.SOLUTION: A vibrating element 1 comprises a crystal substrate 10 having a vibration part 11 and a support portion 12 with a thickness greater than that of the vibrating portion 11, and excitation electrodes 31, 32 positioned on the vibrating part 11, and the oscillation frequency is 300 MHz or higher, and the area of excitation electrodes 31 and 32 is 35% or less of the area of the vibrating part 11.SELECTED DRAWING: Figure 5

The invention relates to the technical field of nitrogen-containing graphene, in particular to a method for preparing nitrogen-containing graphene by taking chitosan as a raw material, which comprises the following steps: dissolving chitosan in an acetic acid solution with the concentration of 3-5% to form a mixed solution, uniformly coating the mixed solution on the surface of a quartz base material by adopting a spin-coating technology, and under a nitrogen protection environment, preparing the nitrogen-containing graphene by taking the chitosan as the raw material. Slowly heating the base material coated with the mixed solution to 200-3500 DEG C, and annealing for 2 hours to obtain a chitosan film; then carrying out two-step carbonization to obtain a pre-carbonized product; and uniformly mixing the obtained pre-carbonized product with a regulation agglomeration agent, carrying out two-step activation treatment, and after the activation is completed, carrying out post-treatment on the product to obtain a nitrogen-containing graphene product. The nitrogen-containing graphene prepared by the method has a D / G ratio of 0.87 and a 2D / G ratio of 0.71, has few defects and has a good layered crystal structure, and the dielectric constant of a nitrogen-containing graphene device prepared subsequently is only 3.53.

The invention discloses a terahertz wavefront regulator based on a liquid crystal programmable phase shifter array, which comprises an array structure composed of a plurality of phase shift units, and is characterized in that each phase shift unit is composed of an upper quartz substrate, an upper metal structure, a liquid crystal layer, a lower metal structure and a lower quartz substrate, and is used for realizing adjustable terahertz wave phase regulation; the array is driven by the programmable logic gate array, and voltage distribution between the upper metal electrode and the lower metal electrode can be independently adjusted, so that orientation of liquid crystal molecules is changed, and accurate control of pixel-level phases is realized. According to the geometric arrangement of the upper-layer metal structure, the array can be designed as a gradient phase plate to realize beam deflection, or can be designed as a spiral phase plate to generate vortex waves; different phase shifter arrays can also be modularly combined so as to realize dynamic regulation and control of complex wavefronts. The Terahertz laser has the advantages of being simple in structure, low in power consumption and flexible in control, and is suitable for various application scenes such as Terahertz communication, imaging and sensing.

A variable temperature load (VTL) or noise source including a grounded coplanar waveguide (GCPW) comprising a first metallization patterned on a fused quartz substrate, the first metallization comprising a first end for connecting to a coaxial connector and a second end for connecting to a coplanar waveguide (CPW); the CPW coupled to a 50 ohm termination and comprising a second metallization patterned on a top surface of a crystal quartz substrate; a temperature sensing diode thermally coupled to the crystal quartz substrate and the second metallization; and a heater resistor coupled to the crystal quartz substrate via contact metallization.

The present invention discloses a process for improving the surface defects of a quartz substrate for a photomask IC chip, which relates to the technical field of quartz substrates. The process aims to solve the problem in the prior art that the surface defects of quartz substrates cannot be effectively improved from material selection to manufacturing to later quality control. The present application uses three methods: visual inspection, automatic optical inspection, and laser scanning inspection to achieve multi-dimensional inspection from macro to micro, from surface to structure, ensuring the accuracy and comprehensiveness of defect identification. By setting clear defect classification standards and maximum defect ranges, defects that may affect product performance can be discovered and handled in a timely manner. The surface laser repair method is suitable for shallow defects, while the internal ion implantation repair method can effectively handle deep defects. The diversified repair strategies increase the flexibility and adaptability of the process, and avoid unnecessary material waste and processing costs through precise repair.

To provide a high-frequency, low-CI-value vibration element, vibrator, and oscillator.SOLUTION: A vibration element 1 comprises a crystal substrate 10 having a vibration portion 11 containing a vibration region 13 and a support portion 12 with a thickness greater than that of the vibration portion 11, and excitation electrodes 31, 32 positioned in the vibration region 13, and when the thickness variation y[nm] in the vibration region 13 of the crystal substrate 10 is taken as the variable and the oscillation frequency x[MHz] is taken as the variable, the relationship y≤329.8exp(-x / 76.7)+4.0 is satisfied.SELECTED DRAWING: Figure 5

The invention discloses a structural material centrosymmetric double-embossment beam combining grating for the central wavelength of 1064 nanometers. The beam combining grating comprises a quartz substrate, a high-reflective film system, a matching layer, two non-centrosymmetric embossments, a lower embossment, an upper embossment and a filling layer between the two embossments which are sequentially plated from bottom to top. The filling layer can be filled by plating Ta2O5, or is filled by air. Under the action of different fillers, the following effects can be realized: under the filling of Ta2O5, under TE polarization, in the bandwidth of 1051-1070.3 nm, the incident-grade 1 diffraction efficiency is greater than 99% at 38.49 degrees, and the highest diffraction efficiency can reach 99.9%; under air filling, under TE polarization, within the bandwidth of 1030-1094.5 nanometers, 38.49-degree incidence-1-level diffraction efficiency is larger than 99%, the highest diffraction efficiency can reach 99.9%, the material has important application value in the fields of high-energy spectrum beam combining laser and ultra-strong and ultra-short laser pulse compression, meanwhile, the material has extremely high structural freedom degree, and the material is suitable for being used in the field of high-energy spectrum beam combining laser and ultra-strong and ultra-short laser pulse compression. And various application scenes in beam combination can be adapted by regulating and controlling the structure.

The invention provides a terahertz amplitude modulator, and the modulator comprises a first quartz substrate layer which is disposed on the incident surface layer of terahertz waves, and is used for carrying out the resonant coupling superposition of a plurality of reflected waves of the terahertz waves; the semiconductor film layer is laid on the lower surface of the quartz substrate in parallel; the gold electrode layer comprises a first gold electrode and a second gold electrode which are arranged in an isolated manner; wherein the first electrode layer is connected with the edge part of the semiconductor film layer; a sealed cavity is formed between the second gold electrode layer and the main body part of the semiconductor thin film layer through the insulating material around the second gold electrode layer; the ionic liquid is contained in the sealed cavity below the semiconductor thin film layer; the reflectivity between the ionic liquid and the semiconductor thin film layer is the same; a dynamic voltage is applied between the first gold electrode and the second gold electrode, the change of the conductivity of the semiconductor film layer causes the change of the reflectivity of the plurality of reflecting surfaces, the terahertz reflected waves reflected by the plurality of reflecting surfaces are subjected to resonant coupling superposition, the amplitude change of the reflected waves is obtained, and the amplitude modulation is realized.

The application discloses an etching process for deep silicon oxide waveguide and groove. The wafer is etched and the wafer to be etched comprises photoresist, shallow silicon oxide, metal chromium, deep silicon oxide, quartz substrate and back metal chromium from top to bottom. The etching process comprises the following steps: S1, using photoresist with a preset thickness as a mask for the shallow silicon oxide and using a first process parameter to perform a first etching process. The first etching process is as follows: introducing fluorine-based gas into the cavity to perform plasma etching on the shallow silicon oxide on the upper layer of the metal chromium, so as to transfer the pattern on the photoresist to the shallow silicon oxide. The etching process for deep silicon oxide waveguide and groove disclosed by the application can realize the etching of an etching structure with a high aspect ratio, high absolute depth, perpendicular sidewall angle and smooth sidewall.