The invention discloses an automatic focusing
system and a thickness measuring
system suitable for a semitransparent
wafer, and the automatic focusing
system comprises the semitransparent
wafer, an objective lens to be focused, a reflector, a
laser light source, a first lens, a small-hole diaphragm, a programmable
liquid crystal device, a collimating lens, a second lens, a third lens, a first
detector, a second
detector, and a motor. Accurate focusing of the objective lens is achieved through detection light spots of two detectors, and the thickness measuring system comprises a semitransparent
wafer, a dispersion objective lens, a reflecting mirror, a
white light source, an
achromatic lens, a small-hole diaphragm, a programmable
liquid crystal device, a collimating lens, a convergent lens, a slit, a lens and the detectors. According to the mapping relation between the transverse displacement on the
detector and the thickness of the semitransparent wafer, the unknown thickness of the semitransparent wafer is measured, a
spectrograph is not needed, and the cost is low.