59 results about "Surface relief" patented technology

The invention relates to the technical field of manufacturing of electronic components, and discloses an LCM (liquid crystal module) backlight FPC (flexible printed circuit) micro-deformation prevention method, which comprises the following specific steps: S1, implementing large-area copper laying design on an element surface of a flexible printed circuit board, and covering a main area of the element surface with uniformly distributed copper foils to form a continuous conductive layer with consistent thickness, while the conductive layer bears electrical connection of the LED light source, the surface reflection characteristic of the conductive layer is optimized, and the phenomenon of uneven light reflection caused by surface fluctuation is reduced. Through the large-area copper laying design of the element surface and the S-shaped isolation interval layout, thermal stress is effectively guided to be symmetrically distributed in multiple directions and offset each other, plane micro-deformation of the FPC under thermal circulation is remarkably restrained, the deformation quantity is controlled within 50 micrometers, the problems of stress concentration and deformation amplification caused by linear intervals in the prior art are solved, and the reliability of the FPC is improved. And long-term stability and optical performance of the backlight module are ensured.

The invention relates to the technical field of optical waveguide preparation, and discloses an optical waveguide mother set splicing-free preparation method based on a DMD dynamic mask, and the method comprises the steps: obtaining the layout data of an optical waveguide mother set as initial design information, and generating a mask pattern sequence which comprises a plurality of partition mask patterns; establishing a pixel mapping relationship between the on-off state of the micro-mirror unit and the partition mask pattern; driving the transparent substrate to execute partition positioning movement on the platform, and controlling the current exposure area of the photosensitive material layer to be aligned with the projection area of the partition mask pattern; on the basis of the pixel mapping relation and the partition positioning movement result, activating the mask pattern, and carrying out non-interval continuous exposure to form a full-page latent image pattern; the whole latent image pattern is subjected to developing treatment, the embossment structure of the optical waveguide master mask is treated and transferred into the transparent substrate, a waveguide core layer pattern is formed, the effects of non-interval continuous exposure and no segmented splicing are achieved, the preparation period of the surface embossment optical waveguide master mask is shortened, and the processing efficiency and the batch preparation yield are improved.

An augmented reality system includes a projector and projection optics coupled to the projector. The augmented reality system also includes an eyepiece waveguide including hybrid diffractive structure including: one or more first nanofeatures having first material with a first index of refraction; and one or more second nanofeatures having a second material with a second index of refraction.

The display may include a waveguide and an optical coupler. The coupler may include one or more surface relief gratings (SRGs) in a substrate on the waveguide. The SRG may have a central region and a gradient lateral edge separating the central region from a non-diffractive region of the substrate. The SRG may exhibit a peak diffraction efficiency within the central region, and may exhibit a gradient diffraction efficiency from the central region to the non-diffraction region on the gradient lateral edges. The gradient diffraction efficiency may be produced by varying the amplitude of the SRG, the phase of the SRG, the duty cycle of the SRG, the blaze angle of the SRG, and / or the thickness of a high or low refractive index coating laminated over the SRG over the gradient lateral edges. This can be used to prevent the coupler from becoming undesirably visible and to minimize perturbations of the replica pupil.

The invention discloses an AFM (atomic force microscope) and a piezoelectric ceramic driving method applied to high-speed feedback of an AFM (atomic force microscope) system, interaction force borne by a probe is enabled to be the same as preset interaction force by controlling the motion depth of piezoelectric ceramic, and the motion depth change of hardness detection piezoelectric ceramic is controlled to accord with a sine curve. Therefore, the movement depth change of the probe is a superposition waveform curve of the movement depth change of the two piezoelectric ceramics. Therefore, surface fluctuation detection and hardness detection of the to-be-detected surface are realized. According to the invention, the motion depth changes of the two piezoelectric ceramics are controlled to be non-interfering motion depth changes, so that the motion depth change (i.e., sinusoidal vibration) for detecting the viscosity of the surface to be detected and the motion depth change for feedback tracking of the appearance of the surface to be detected are two non-interfering motion depth changes. And the stroke of feedback tracking of the to-be-measured surface topography is ensured. Therefore, under the condition that the scanning speed of the atomic force microscope is high, a sample with large surface fluctuation can be measured.

The application provides a high-resolution color holographic structure preparation method, and specifically comprises the following steps: S1, obtaining three-dimensional information of an object; S2, extracting and separating three primary color channels of an image array; S3, setting a convolution kernel, and respectively performing convolution on each color channel component of each image; S4, respectively performing pooling on the extracted data; S5, respectively extracting the numerical values of each same coordinate position in the set to form a new data set by using an addressing method; S6, designing three surface relief gratings with different periods according to a grating equation; S7, respectively performing point multiplication on the three primary color matrices and the grating data; S8, re-fusing the encoded three color channel data; and S9, manufacturing the data file into a moldable subwavelength level surface relief structure by a micro-nano processing method. The application converts surface relief micro-nano structures by separating, optimizing, fusing and encoding the multi-angle sampling image array data, and the imaging space has strong stereoscopic sense, bright color, strong detail performance and great imitation difficulty.

This application relates to a method for producing a refractive and diffractive hybrid two-dimensional optical waveguide, belonging to the technical field of optical waveguide design, and includes the following steps: S1, setting the beam transmission path and determining the coupling-in region, transition region, and coupling-out region on the waveguide plate; S2, forming an array coupling-in grating and an array coupling-out grating in the coupling-in and coupling-out regions defined on the waveguide plate using an array waveguide grating process; S3, determining the grating period, transparent portion width, grating width, resolution, and dispersion rate of the transition region based on a preset calculation rule; S4, using the calculation data from S3, forming a diffraction transition grating in the transition region defined on the waveguide plate using a surface relief process. The hybrid refractive and diffractive waveguide results in a lower overall cost, better color, higher brightness and luminous efficiency, simpler process, higher mass production capability, less susceptibility to rainbow patterns, and no light leakage from the back side. It also requires low equipment costs and has a coupling efficiency close to 100%, leading to better performance.

Head-mounted displays with waveguides comprising surface relief gratings made of a transparent conductive material and methods for fabricating said waveguides are described herein. In an embodiment, a head-mounted display comprises an optical element and an image source that provides an image beam to an optical element. The optical element comprises a diffractive grating comprising a transparent conductive material. The diffractive grating diffracts light into, through, or out of the waveguide as well as absorbing any light that is not polarized in the direction of the diffractive grating.

A method for producing a multilayer body and a multilayer body, wherein the method includes: providing a single-layered or multi-layered substrate with a first surface and a second surface, providing one or more sensor films which each have at least one sensor area and have a first surface and a second surface facing away from the first surface, applying the one or more sensor films to the second surface of the substrate such that the first surface of the respective sensor film rests on the second surface of the substrate at least in areas, thermoforming a series of layers comprising the substrate and the one or more sensor films applied to the second surface of the substrate such that, during the thermoforming, on the first surface of the substrate a surface relief is formed which is determined by the shaping, of one or more of the one or more sensor films.

A method for producing a decorative surface covering comprises providing a structural core, including one or more core layers, the structural core carrying a décor layer representing a two-dimensional décor, and generating a three-dimensional surface relief by digitally embossing, in register with the two-dimensional décor, where the three-dimensional surface relief is generated at a distance of at least 0.1 mm from the décor layer by applying a transparent or at least translucent spacer layer against the décor layer, the spacer layer having a thickness that remains unmodified by the digital embossing and that corresponds to the distance, and where the three-dimensional surface relief is generated in one or more coating layers on a side of the spacer layer facing away from the décor layer after application of the spacer layer against the décor layer.

The invention discloses a release film product surface convex pattern detection device, and belongs to the technical field of release film surface convex pattern detection.The release film product surface convex pattern detection device comprises a supporting base and a rotating assembly installed on the supporting base, a second rotating rod is installed on the rotating assembly, a gear is installed on the second rotating rod, and a moving plate is slidably installed on the supporting base; a sliding rod is installed on the moving plate, a sliding ring is installed on the sliding rod in a sliding mode, a side column is installed on the sliding ring, and a pressing plate is installed at one end of the side column. A motor is arranged, when the motor is started, a second rotating rod can be conveniently driven to rotate, when the second rotating rod rotates, a gear can be driven to rotate, when the gear rotates, a rack can be driven to move, then a moving plate can be driven to move, when the moving plate moves, a release film can be driven to move, and then the moving plate can be moved to the position below a lifting frame; the lifting frame can be used for carrying out surface convex pattern detection on the release film, workers do not need to manually move the release film, and manpower is saved.

The invention provides a planarization method of a semiconductor structure. Preliminary leveling can be carried out on the surface undulation, namely the first height difference, of a film layer through a first ion beam etching process. A second ion beam etching process is utilized, and by means of film layers, structures and density differences, new surface undulation differences and height differences are created among different areas of a second semiconductor structure again, namely, more obvious protrusions and recesses are formed on the surface, so that a height difference window is provided for leveling in a global range, and the flatness of the second semiconductor structure is improved. And performing trimming treatment again by using a third ion beam etching process to realize global planarization, namely, considering the flatness of the pattern surface in a local region and the flatness between different regions in a global range, so that the surface of the semiconductor structure has no obvious height difference. Through the ion beam etching technology, the surface difference of the film layers at different positions of the semiconductor structure can be controlled, and the surface fluctuation degree and fluctuation frequency are reduced, so that the height difference of the film layers at different positions is eliminated, and global planarization is realized.

A lens structure includes a first substrate, located in a first layer; a second substrate, located in a second layer; a first adhesive material layer, located in the second layer and located above the second substrate, wherein the adhesive material layer located in a first region of the second layer is a surface relief structure; a first conductive layer, located in a second region of the first layer corresponding to a projected position of the first region, and located under the first substrate; a second conductive layer, located in the second layer and located above the first adhesive material layer; and a first electrically controlled refractive index layer, located in a third region of a third layer corresponding to a projected position of the first region, wherein the third layer is beneath the first layer and above the second layer.

This diffraction grating for soft X-rays and extreme ultraviolet rays comprises a metal base reflection layer and a non-metal enhanced reflection layer, wherein peeling between the base reflection layer and the enhanced reflection layer is prevented and high diffraction efficiency is achieved. A diffraction grating (2) for soft X-rays and extreme ultraviolet rays according to the present invention comprises: a substrate (21) having a periodic surface relief on the surface; a base reflection layer (22) made of Au and formed on the surface of the substrate; an intermediate layer (23) made of any one of Nb, Cr, Ti, W, or an alloy of two or more thereof and formed on the base reflection layer; and an enhanced reflection layer (24) made of either B4C or C and formed on the intermediate layer.

A security device is provided, comprising one or more surface relief structure(s), each formed of one or more cured material(s), the surface relief structure(s) being disposed on a substantially flat substrate and defining a plurality of raised elements spaced from one another, the raised elements corresponding to elements of an image, whereby the plurality of raised elements varies across the surface relief structure(s) so as to exhibit a multi-tonal version of the image. Methods of manufacturing such devices are also disclosed.

The present invention relates to coating compositions, comprising i) single or mixed metal oxide nanoparticles, wherein the volume average diameter (Dv50) of the metal oxide nanoparticles is in the range of 1 to 20 nm; ii) one or more monomers having at least three thiol groups (—SH) at the terminal end (the first monomer), iii) optional one or more monomers having at least two functional groups at the terminal end being capable of reacting with the thiol groups and a spacer group between the at least two functional groups (the second monomer), iv) one, or more solvents; coatings obtained therefrom and the use of the compositions for coating surface relief micro- and nanostructures (e.g. holograms), manufacturing of optical waveguides, solar panels, light outcoupling layers for display and lighting devices and anti-reflection coatings. Coatings obtained from the coating composition have a high refractive index and holograms are bright and visible from any angle, when the coating compositions are applied to them.

Passive optical devices and methods of assembly are described in which surface relief gratings are formed at wafer level for fine patterning and then transferred to an optically transparent layer as diced grating dies for final assembly and passive optical device singulation at either wafer level or panel level.

The display may include a waveguide and an optical coupler. The coupler may include one or more surface relief gratings (SRGs) in a substrate above the waveguide. The SRG(s) may have a central region and gradient lateral edges separating the central region from a non-diffractive region of the substrate. The SRG(s) may exhibit peak diffraction efficiency in the central region and gradient diffraction efficiency across the gradient lateral edges from the central region toward the non-diffractive region. The gradient diffraction efficiency may be created across the gradient lateral edges by varying the amplitude of the SRG(s), the phase of the SRG(s), the duty cycle of the SRG(s), the blaze angle of the SRG(s), and / or the thickness of a high-index or low-index coating layered on the SRG(s). This may serve to prevent the coupler from being undesirably visible and minimize perturbation of the replicated pupil.

The utility model relates to a laboratory grinding machine, in particular a centrifugal ball mill and / or a planetary ball mill, comprising at least one grinding cup holder for at least one grinding cup (2) and at least one anti-rotation means, the at least one anti-rotation device is used for holding the grinding cup (2) in a defined and preset position relative to the grinding cup holder and / or is used as a positioning aid. According to the invention, the grinding cup holder has at least one surface relief as an anti-rotation means on an axial surface (4) facing the grinding cup bottom in the grinding mode, the at least one surface undulation can be connected in a form-fitting manner with a mating undulation on the axial surface (10) of the grinding cup bottom and complementary to the surface undulation to form an anti-rotation mechanism. In addition, a grinding cup and an assembly having a laboratory grinder and a grinding cup are provided.

Bearing unit (30) having a central axis of rotation (X) and having: - a radially outer ring (31), - a radially inner ring (34), a sealing device (50) provided with a shaped annular shield (60) mounted on the radially outer ring (31), and an annular sealing element (70) made of elastomeric material, which is integrally supported by the shield (60), wherein the shield (60) has: - a thickness between 0.25 mm and 0.35 mm, - a radially external anchoring portion (61), which is housed with interference in the groove (31a) and has an external mounting surface (62a, 69a, 63a) provided with a plurality of surface reliefs (80), - a radially internal flange portion (65) provided with a plurality of circumferentially distributed circular sector-shaped recesses (68), and - an elbow (66) provided with a plurality of circumferentially distributed hollows (67).

A printable structure is configured to create a temporary bind as one half of a hook and loop connection with another half of the hook and loop connection. The printable structure includes a substrate, an adhesive layer, and a print-receptive topcoat. The substrate has two opposing surfaces including a fastening surface that is one of a hook fastening surface and a loop fastening surface of the hook and loop connection and including a textured surface that is textured with surface relief in a direction parallel to a direction of thickness of the printable structure. The adhesive layer is coupled to the textured surface of the substrate. The print-receptive topcoat is coupled to the adhesive layer on a side opposite the substrate. The adhesive layer fills in the surface relief such that there are no un-filled gaps beneath the print-receptive topcoat to level the print-receptive topcoat.

The present disclosure generally describes methods and systems for manufacturing high quality surface relief waveguides for eyepieces. In particular, this disclosure describes techniques for fabricating waveguides with surface relief features (e.g., diffraction gratings) to achieve various optical effects using nanolithography imprinting techniques that reduce or eliminate the presence of gaps in the imprinted features by using optimized droplet patterns for dispensing photoresist. Furthermore, the present disclosure describes techniques for manufacturing surface relief waveguides having a gradient, such as a substantially continuous gradient or slope, between regions of dispensed photoresist having different residual layer thicknesses and / or between regions of surface features having different heights (or depths). This gradient can reduce or eliminate adverse optical effects that may result from more sudden transitions between regions and improve the optical efficiency of the completed waveguide.

The present invention discloses a polarization holographic optical element and a preparation method thereof, comprising: a substrate layer and an anisotropic medium layer; wherein, the substrate layer includes a substrate and a surface relief microstructure layer, the surface relief microstructure layer includes relief microstructures, the relief microstructures are arranged in an array on the substrate, and the anisotropic medium layer uses a liquid crystal material. The polarization holographic optical element and the preparation method thereof provided by the present invention reduce the preparation difficulty of the polarization holographic optical element, and the size and angle controllability of the surface microstructure expand the design and optimization dimensions of the polarization holographic optical system, providing the possibility for the production and application of large-scale polarization holographic optical elements.

The present disclosure relates to a patterned substrate having a surface relief structure that includes a plurality of isolated and laterally separated elements of a cured polymer composition. The present disclosure also relates to an impression, a system, and a method of manufacture. The method comprises: providing an impression (10); depositing a flowable photocurable layer (50) onto the carrier substrate; in one embodiment, the method includes providing a carrier substrate, providing a photocurable layer, imprint the layer by pressing (P) a stamp into the layer, selectively curing the photocurable layer while imprint by providing photon exposure (L) on the photocurable layer, thereby forming a relief structure, and removing uncured residues of the photocurable layer, if present, from the stamp and / or the carrier substrate, the impression projection comprises an opaque cover (13) extending along an end face (14) of the projection, and wherein the cover comprises a polymer or a composite, preferably an elastomer or an elastomer composite.

A method of etching a substrate to produce a plurality of surface relief diffraction gratings by providing a dielectric substrate having a mask formed on an upper surface thereof, the mask having a plurality of apertures. Further, positioning the substrate on a substrate support in a chamber of a plasma etching apparatus. Even further, positioning a Faraday cage so that an upper portion of the Faraday cage is disposed above the upper surface of the substrate and an electrical connection is maintained between the Faraday cage and the substrate support. The upper portion of the Faraday cage has a plurality of discrete regions having open areas through which the substrate can be plasma etched. Yet further, plasma etching the substrate to produce a plurality of surface relief diffraction gratings. The plurality of surface relief diffraction gratings have at least two subsets having different angles and / or orientations.

The invention provides a vertical cavity surface emitting laser and a preparation method thereof, and relates to the technical field of semiconductor optoelectronic devices. A vertical cavity surface emitting laser comprises: a surface blazed grating for separating a diffraction main maximum zero order from an interference main maximum zero order to achieve single beam emission; and the surface embossment structure is arranged on the surface, far away from the single-beam emergent surface, of the surface blazed grating and is used for inhibiting high-order mode loss so as to realize single-mode emergent.

Disclosed in the present invention are a polarization holographic optical element and a preparation method therefor. The polarization holographic optical element comprises: a substrate layer and an anisotropic medium layer, wherein the substrate layer comprises a substrate and a surface relief microstructure layer, the surface relief microstructure layer comprising relief microstructures, and the relief microstructures being arranged on the substrate in an array; and the anisotropic medium layer is made of a liquid crystal material. By means of the polarization holographic optical element and the preparation method therefor provided by the present invention, the preparation difficulty of the polarization holographic optical element is reduced, and the controllability of the size and angle of surface microstructures expands the design optimization dimensions of a polarization holographic optical system, making it possible for the large-scale production and application of the polarization holographic optical element.

Slanted surface relief gratings for use in an optical display system in an HMD device are replicated in a manufacturing process that utilizes non-contact optical proximity recording into a specialized photo-sensitive resin that is disposed over a waveguide substrate. The recording process comprises selective resin exposure to ultraviolet light through a mask to spatially record grating structures by interferential exposure and polymerization. Subsequent resin development evacuates unexposed resin down to the waveguide substrate to remove flat surfaces, referred to as a bias layer, that remain in the grating trenches after exposure. The resin development reduces Fresnel reflections that could otherwise be induced at the media interface between the bias layer and the waveguide substrate. Fresnel reflections may cause a loss of diffraction efficiency and thereby reduce the field of view that may be guided by the SRGs in the optical display system.

Aspects of the present invention relate to a resilient multilayer decorative surface covering and a method for producing a resilient multilayer decorative surface covering. The method comprises providing a substrate (36) and digitally embossing a coating on the substrate. Digitally embossing the coating comprises applying a plurality of plastisol or organosol layers (40a, 40b) so as to produce a coating having a three-dimensional surface relief, wherein at least one of the plurality of plastisol or organosol layers is structurally patterned.

Systems and methods for generating a pattern on an azopolymer film surface is provided. The method may comprise positioning an azopolymer film onto a motorized stage of a laser optical lithography system, setting a desired period, amplitude, and size of surface relief grating to be printed onto a surface of the azopolymer film, and printing an image onto the surface of the azopolymer film. Printing the image may comprise generating spatially uniform linearly polarized light, expanding and collimating the linearly polarized light, converting the linearly polarized light to circularly polarized light, converting the circularly polarized light to elliptically polarized light, converting the elliptically polarized light from a spatial light modulator (SLM) to a final desired linearly polarized light, focusing the linearly polarized light onto the surface of the azopolymer film, and moving the azopolymer film in relation to the final desired linearly polarized light, using the motorized stage.