109 results about "Surface relief" patented technology

The disclosure describes an improved drop-on-demand, controlled volume technique for dispensing resist onto a substrate, which is then imprinted to create a patterned optical device suitable for use in optical applications such as augmented reality and / or mixed reality systems. The technique enables the dispensation of drops of resist at precise locations on the substrate, with precisely controlled drop volume corresponding to an imprint template having different zones associated with different total resist volumes. Controlled drop size and placement also provides for substantially less variation in residual layer thickness across the surface of the substrate after imprinting, compared to previously available techniques. The technique employs resist having a refractive index closer to that of the substrate index, reducing optical artifacts in the device. To ensure reliable dispensing of the higher index and higher viscosity resist in smaller drop sizes, the dispensing system can continuously circulate the resist.

The invention provides a rock mass structural surface fluctuation degree identification and evaluation method based on three-dimensional laser scanning, and the method comprises the following steps: S1, carrying out the three-dimensional laser scanning of a set rock mass measurement range through a three-dimensional laser scanner, and obtaining the point cloud of a rock mass in a designated region; s2, preprocessing the point clouds to obtain a point cloud set, screening boundary point clouds from the point cloud set, and fitting a structural surface by using the boundary point clouds; s3, calculating and marking the undulation degree of each structural surface; and S4, evaluating the stability of the rock mass according to the undulation degree of each structural surface. According to the method, the stability degree of the rock mass can be further determined by judging the rock mass structural surface, the fluctuation condition of the structural surface and the feature recognition efficiency of the rock mass structural surface.

A method and apparatus for the etching of variable depth features in a substrate is described. Movement of the substrate relative to an etchant (e.g. into or out of the etchant) during the etching process is utilised to provide a varying etch time, and hence depth, across the substrate, and in various examples this is enabled without requiring a varying mask.

The disclosure describes an improved drop-on-demand, controlled volume technique for dispensing resist onto a substrate, which is then imprinted to create a patterned optical device suitable for use in optical applications such as augmented reality and / or mixed reality systems. The technique enables the dispensation of drops of resist at precise locations on the substrate, with precisely controlled drop volume corresponding to an imprint template having different zones associated with different total resist volumes. Controlled drop size and placement also provides for substantially less variation in residual layer thickness across the surface of the substrate after imprinting, compared to previously available techniques. The technique employs resist having a refractive index closer to that of the substrate index, reducing optical artifacts in the device. To ensure reliable dispensing of the higher index and higher viscosity resist in smaller drop sizes, the dispensing system can continuously circulate the resist.

Aspects of the present invention relate to a resilient multilayer decorative surface covering and a method for producing a resilient multilayer decorative surface covering. The method comprises providing a substrate (36) and digitally embossing a coating on the substrate. Digitally embossing the coating comprises applying a plurality of plastisol or organosol layers (40a, 40b) so as to produce a coating having a three-dimensional surface relief, wherein at least one of the plurality of plastisol or organosol layers is structurally patterned.

The optical system includes: a light guide for guiding an image light ray to a field of view region of a user as a virtual image. The light guide includes a diffraction structure region constituting a surface-relief diffraction grating dividing the image light ray propagating in a first propagation direction intersecting a thickness direction of a body into a plurality of image light rays propagating in a second propagation direction intersecting the first propagation direction, in the first propagation direction. The diffraction structure region includes a first diffraction structure, and a second diffraction structure on an opposite side of the first diffraction structure from an in-coupling region in the first propagation direction. A grating height of the first diffraction structure is greater than a grating height of the second diffraction structure. A grating width of the first diffraction structure is greater than a grating width of the second diffraction structure.

An augmented reality (AR) display system includes a light source and a lens element having a waveguide to direct display light from the light source toward a user's eye. The waveguide includes an incoupler (IC) having surface relief gratings (SRGs) in a first region of the waveguide to incouple the display light and a combined exit pupil expander (EPE) and outcoupler (OC) having surface relief gratings at a second region of the waveguide for exit pupil expansion and surface relief gratings at a third region of the waveguide for outcoupling the display light from the waveguide. The second and third regions at least partially overlap laterally relative to the expected position of the user's eye, with the surface relief gratings of the second region being formed on the same or opposite side of the waveguide as the surface relief gratings of the third region.

The disclosure relates to a grating coupler, the grating coupler comprising: a substrate comprising a first major surface and a second major surface; and a surface relief structure located on at least one of the major surfaces of the substrate wherein: the grating coupler has a first order diffraction efficiency of at least 0.3 (30%) across at least a 20° incident light angle range. The surface relief structures described herein can comprise a plurality of notches, each of the notches facing substantially in a x-direction and having a radius of curvature greater than about 50 nm.

Improvements to gratings for use in waveguides and methods of producing them are described herein. Deep surface relief gratings (SRGs) may offer many advantages over conventional SRGs, an important one being a higher S-diffraction efficiency. In one embodiment, deep SRGs can be implemented as polymer surface relief gratings or evacuated periodic structures (EPSs). EPSs can be formed by first recording a holographic polymer dispersed liquid crystal (HPDLC) periodic structure. Removing the liquid crystal from the cured periodic structure provides a polymer surface relief grating. Polymer surface relief gratings have many applications including for use in waveguide-based displays.

A display may include a waveguide. An input coupler may couple image light into the waveguide and an output coupler may couple the image light out of the waveguide. A surface relief grating on the waveguide may couple infrared light into the waveguide and may couple the infrared light out of the waveguide. The surface relief grating may additionally or alternatively couple reflected infrared light into the waveguide and out of the waveguide and towards an infrared sensor. The surface relief grating may also form a cross-coupler for the image light. The infrared sensor may gather infrared sensor data based on the reflected infrared light. Control circuitry may perform gaze tracking operations based on the infrared sensor data. The input and output couplers may also be formed from surface relief gratings or may include other optical components.

The invention relates to the technical field of manufacturing of electronic components, and discloses an LCM (liquid crystal module) backlight FPC (flexible printed circuit) micro-deformation prevention method, which comprises the following specific steps: S1, implementing large-area copper laying design on an element surface of a flexible printed circuit board, and covering a main area of the element surface with uniformly distributed copper foils to form a continuous conductive layer with consistent thickness, while the conductive layer bears electrical connection of the LED light source, the surface reflection characteristic of the conductive layer is optimized, and the phenomenon of uneven light reflection caused by surface fluctuation is reduced. Through the large-area copper laying design of the element surface and the S-shaped isolation interval layout, thermal stress is effectively guided to be symmetrically distributed in multiple directions and offset each other, plane micro-deformation of the FPC under thermal circulation is remarkably restrained, the deformation quantity is controlled within 50 micrometers, the problems of stress concentration and deformation amplification caused by linear intervals in the prior art are solved, and the reliability of the FPC is improved. And long-term stability and optical performance of the backlight module are ensured.

The disclosure describes an improved drop-on-demand, controlled volume technique for dispensing resist onto a substrate, which is then imprinted to create a patterned optical device suitable for use in optical applications such as augmented reality and / or mixed reality systems. The technique enables the dispensation of drops of resist at precise locations on the substrate, with precisely controlled drop volume corresponding to an imprint template having different zones associated with different total resist volumes. Controlled drop size and placement also provides for substantially less variation in residual layer thickness across the surface of the substrate after imprinting, compared to previously available techniques. The technique employs resist having a refractive index closer to that of the substrate index, reducing optical artifacts in the device. To ensure reliable dispensing of the higher index and higher viscosity resist in smaller drop sizes, the dispensing system can continuously circulate the resist.

Provided are an optical system and an image display device capable of improving the utilization efficiency of image light from a display element. An optical system is provided with a light guide member (4) that guides image light as a virtual image to a field of view region of a user. The light guide member (4) has a diffraction structure region (61), which is a surface relief type diffraction grating, for dividing, in a first propagation direction, image light propagating in a first propagation direction intersecting the thickness direction of the main body section into a plurality of image light propagating in a second propagation direction intersecting the first propagation direction. The diffractive structure region (61) includes a first diffractive structure (611) and a second diffractive structure (612) located on the opposite side of the first diffractive structure (611) from the coupling region in the first propagation direction. The grating height of the first diffraction structure (611) is higher than the grating height of the second diffraction structure (612). The grating width of the first diffraction structure (611) is wider than the grating width of the second diffraction structure (612).

The invention relates to the technical field of optical waveguide preparation, and discloses an optical waveguide mother set splicing-free preparation method based on a DMD dynamic mask, and the method comprises the steps: obtaining the layout data of an optical waveguide mother set as initial design information, and generating a mask pattern sequence which comprises a plurality of partition mask patterns; establishing a pixel mapping relationship between the on-off state of the micro-mirror unit and the partition mask pattern; driving the transparent substrate to execute partition positioning movement on the platform, and controlling the current exposure area of the photosensitive material layer to be aligned with the projection area of the partition mask pattern; on the basis of the pixel mapping relation and the partition positioning movement result, activating the mask pattern, and carrying out non-interval continuous exposure to form a full-page latent image pattern; the whole latent image pattern is subjected to developing treatment, the embossment structure of the optical waveguide master mask is treated and transferred into the transparent substrate, a waveguide core layer pattern is formed, the effects of non-interval continuous exposure and no segmented splicing are achieved, the preparation period of the surface embossment optical waveguide master mask is shortened, and the processing efficiency and the batch preparation yield are improved.

A waveguide (1000) configured to propagate light (1001) by total internal reflection, a display device, as well as a method and an apparatus for forming a waveguide are disclosed. The waveguide (1000) comprises a waveguide body (1100) comprising a first face (1110) and a second face (1120) opposite the first face (1110); and a coating (1200) on the first face (1110), the coating (1200) comprising an outer surface (1210) facing away from the first face (1110). The first face (1110) comprises a curved interface region (1111) between the waveguide body (1100) and the coating (1200), and the outer surface (1210) comprises a curved outer region (1211) opposite the interface region (1111). The outer region (1211) comprises a patterned region (1212), and the coating (1200) comprises on the outer surface (1210) a surface relief structure (1220) defining the patterned region (1212).

The invention belongs to the technical field of three-dimensional geological modeling, and provides an intelligent tunnel three-dimensional geological modeling method and system under a complex geological condition, and the technical scheme is as follows: carrying out data reconstruction by combining three-dimensional tunnel profile data, tunnel site area inversion gravity data and magnetic susceptibility, and obtaining a reconstructed tunnel data set; training a geological attribute classifier based on the reconstructed tunnel data set to obtain a trained geological attribute classifier; predicting the geological attribute of each point in the space in the tunnel site modeling area according to the trained geological attribute classifier, and constructing a three-dimensional geological model containing the surface undulation form and structure in combination with the surface elevation data; and performing Boolean operation on the three-dimensional geologic model containing the surface undulation form and structure and a tunnel three-dimensional body model obtained by sweeping along the tunnel three-dimensional path to obtain a tunnel-containing three-dimensional geologic model. According to the invention, three-dimensional model construction can be carried out on the tunnel under extremely complex conditions.

An augmented reality system includes a projector and projection optics coupled to the projector. The augmented reality system also includes an eyepiece waveguide including hybrid diffractive structure including: one or more first nanofeatures having first material with a first index of refraction; and one or more second nanofeatures having a second material with a second index of refraction.

The display may include a waveguide and an optical coupler. The coupler may include one or more surface relief gratings (SRGs) in a substrate on the waveguide. The SRG may have a central region and a gradient lateral edge separating the central region from a non-diffractive region of the substrate. The SRG may exhibit a peak diffraction efficiency within the central region, and may exhibit a gradient diffraction efficiency from the central region to the non-diffraction region on the gradient lateral edges. The gradient diffraction efficiency may be produced by varying the amplitude of the SRG, the phase of the SRG, the duty cycle of the SRG, the blaze angle of the SRG, and / or the thickness of a high or low refractive index coating laminated over the SRG over the gradient lateral edges. This can be used to prevent the coupler from becoming undesirably visible and to minimize perturbations of the replica pupil.

This disclosure generally describes methods and systems for fabricating high-quality surface relief waveguides for an eyepiece. In particular, this disclosure uses nanoimprint lithography imprinting techniques that reduce or eliminate the presence of gaps within the imprinted features by using a droplet pattern optimized for dispensing photoresist to achieve various optical effects, such as manufacturing waveguides having surface relief features such as diffraction gratings. Further, this disclosure also describes techniques for manufacturing surface relief waveguides having a gradient, such as a substantially continuous gradient or slope, between zones having different residual layer thicknesses of the dispensed photoresist and / or between zones having surface features of different heights (or depths).

The invention discloses an AFM (atomic force microscope) and a piezoelectric ceramic driving method applied to high-speed feedback of an AFM (atomic force microscope) system, interaction force borne by a probe is enabled to be the same as preset interaction force by controlling the motion depth of piezoelectric ceramic, and the motion depth change of hardness detection piezoelectric ceramic is controlled to accord with a sine curve. Therefore, the movement depth change of the probe is a superposition waveform curve of the movement depth change of the two piezoelectric ceramics. Therefore, surface fluctuation detection and hardness detection of the to-be-detected surface are realized. According to the invention, the motion depth changes of the two piezoelectric ceramics are controlled to be non-interfering motion depth changes, so that the motion depth change (i.e., sinusoidal vibration) for detecting the viscosity of the surface to be detected and the motion depth change for feedback tracking of the appearance of the surface to be detected are two non-interfering motion depth changes. And the stroke of feedback tracking of the to-be-measured surface topography is ensured. Therefore, under the condition that the scanning speed of the atomic force microscope is high, a sample with large surface fluctuation can be measured.

The application provides a high-resolution color holographic structure preparation method, and specifically comprises the following steps: S1, obtaining three-dimensional information of an object; S2, extracting and separating three primary color channels of an image array; S3, setting a convolution kernel, and respectively performing convolution on each color channel component of each image; S4, respectively performing pooling on the extracted data; S5, respectively extracting the numerical values of each same coordinate position in the set to form a new data set by using an addressing method; S6, designing three surface relief gratings with different periods according to a grating equation; S7, respectively performing point multiplication on the three primary color matrices and the grating data; S8, re-fusing the encoded three color channel data; and S9, manufacturing the data file into a moldable subwavelength level surface relief structure by a micro-nano processing method. The application converts surface relief micro-nano structures by separating, optimizing, fusing and encoding the multi-angle sampling image array data, and the imaging space has strong stereoscopic sense, bright color, strong detail performance and great imitation difficulty.

A method and apparatus for the etching of variable depth features in a substrate is described. Movement of the substrate relative to an etchant (e.g. into or out of the etchant) during the etching process is utilised to provide a varying etch time, and hence depth, across the substrate, and in various examples this is enabled without requiring a varying mask.

This application relates to a method for producing a refractive and diffractive hybrid two-dimensional optical waveguide, belonging to the technical field of optical waveguide design, and includes the following steps: S1, setting the beam transmission path and determining the coupling-in region, transition region, and coupling-out region on the waveguide plate; S2, forming an array coupling-in grating and an array coupling-out grating in the coupling-in and coupling-out regions defined on the waveguide plate using an array waveguide grating process; S3, determining the grating period, transparent portion width, grating width, resolution, and dispersion rate of the transition region based on a preset calculation rule; S4, using the calculation data from S3, forming a diffraction transition grating in the transition region defined on the waveguide plate using a surface relief process. The hybrid refractive and diffractive waveguide results in a lower overall cost, better color, higher brightness and luminous efficiency, simpler process, higher mass production capability, less susceptibility to rainbow patterns, and no light leakage from the back side. It also requires low equipment costs and has a coupling efficiency close to 100%, leading to better performance.

Head-mounted displays with waveguides comprising surface relief gratings made of a transparent conductive material and methods for fabricating said waveguides are described herein. In an embodiment, a head-mounted display comprises an optical element and an image source that provides an image beam to an optical element. The optical element comprises a diffractive grating comprising a transparent conductive material. The diffractive grating diffracts light into, through, or out of the waveguide as well as absorbing any light that is not polarized in the direction of the diffractive grating.

A method for producing a multilayer body and a multilayer body, wherein the method includes: providing a single-layered or multi-layered substrate with a first surface and a second surface, providing one or more sensor films which each have at least one sensor area and have a first surface and a second surface facing away from the first surface, applying the one or more sensor films to the second surface of the substrate such that the first surface of the respective sensor film rests on the second surface of the substrate at least in areas, thermoforming a series of layers comprising the substrate and the one or more sensor films applied to the second surface of the substrate such that, during the thermoforming, on the first surface of the substrate a surface relief is formed which is determined by the shaping, of one or more of the one or more sensor films.

A method for producing a decorative surface covering comprises providing a structural core, including one or more core layers, the structural core carrying a décor layer representing a two-dimensional décor, and generating a three-dimensional surface relief by digitally embossing, in register with the two-dimensional décor, where the three-dimensional surface relief is generated at a distance of at least 0.1 mm from the décor layer by applying a transparent or at least translucent spacer layer against the décor layer, the spacer layer having a thickness that remains unmodified by the digital embossing and that corresponds to the distance, and where the three-dimensional surface relief is generated in one or more coating layers on a side of the spacer layer facing away from the décor layer after application of the spacer layer against the décor layer.

A lens structure includes a first substrate, located in a first layer; a second substrate, located in a second layer; a first adhesive material layer, located in the second layer and located above the second substrate, wherein the adhesive material layer located in a first region of the second layer is a surface relief structure; a first conductive layer, located in a second region of the first layer corresponding to a projected position of the first region, and located under the first substrate; a second conductive layer, located in the second layer and located above the first adhesive material layer; and a first electrically controlled refractive index layer, located in a third region of a third layer corresponding to a projected position of the first region, wherein the third layer is beneath the first layer and above the second layer.

The invention discloses a release film product surface convex pattern detection device, and belongs to the technical field of release film surface convex pattern detection.The release film product surface convex pattern detection device comprises a supporting base and a rotating assembly installed on the supporting base, a second rotating rod is installed on the rotating assembly, a gear is installed on the second rotating rod, and a moving plate is slidably installed on the supporting base; a sliding rod is installed on the moving plate, a sliding ring is installed on the sliding rod in a sliding mode, a side column is installed on the sliding ring, and a pressing plate is installed at one end of the side column. A motor is arranged, when the motor is started, a second rotating rod can be conveniently driven to rotate, when the second rotating rod rotates, a gear can be driven to rotate, when the gear rotates, a rack can be driven to move, then a moving plate can be driven to move, when the moving plate moves, a release film can be driven to move, and then the moving plate can be moved to the position below a lifting frame; the lifting frame can be used for carrying out surface convex pattern detection on the release film, workers do not need to manually move the release film, and manpower is saved.

The invention provides a planarization method of a semiconductor structure. Preliminary leveling can be carried out on the surface undulation, namely the first height difference, of a film layer through a first ion beam etching process. A second ion beam etching process is utilized, and by means of film layers, structures and density differences, new surface undulation differences and height differences are created among different areas of a second semiconductor structure again, namely, more obvious protrusions and recesses are formed on the surface, so that a height difference window is provided for leveling in a global range, and the flatness of the second semiconductor structure is improved. And performing trimming treatment again by using a third ion beam etching process to realize global planarization, namely, considering the flatness of the pattern surface in a local region and the flatness between different regions in a global range, so that the surface of the semiconductor structure has no obvious height difference. Through the ion beam etching technology, the surface difference of the film layers at different positions of the semiconductor structure can be controlled, and the surface fluctuation degree and fluctuation frequency are reduced, so that the height difference of the film layers at different positions is eliminated, and global planarization is realized.

A lens structure includes a first substrate, located in a first layer; a second substrate, located in a second layer; a first adhesive material layer, located in the second layer and located above the second substrate, wherein the adhesive material layer located in a first region of the second layer is a surface relief structure; a first conductive layer, located in a second region of the first layer corresponding to a projected position of the first region, and located under the first substrate; a second conductive layer, located in the second layer and located above the first adhesive material layer; and a first electrically controlled refractive index layer, located in a third region of a third layer corresponding to a projected position of the first region, wherein the third layer is beneath the first layer and above the second layer.