1444 results about "Laser etching" patented technology

The invention provides a printing piece defect detection method and system based on machine vision, and relates to the technical field of machine vision, and the method comprises the steps: determining an optimal detection scale through image enhancement processing, multi-scale gradient pyramid construction and mutual information calculation, extracting key points through a curvature value, and carrying out the shape discrimination. And finally, generating a laser etching compensation path based on defect characteristics and performing layered compensation processing. According to the method, the automobile part surface printing flaws can be accurately identified, the compensation strategy is adaptively generated according to the defect types, and the defect repairing precision and efficiency are improved.

The invention relates to the technical field of laser engraving, and discloses a laser engraving method and system capable of automatically correcting coordinates of a galvanometer and a camera, and the method comprises the following steps: calculating a target conversion coefficient based on a calibration size and a pixel size of an image collected by the camera, and controlling the galvanometer to perform laser etching on a cross mark on the surface of a PCB (Printed Circuit Board), recording origin data of a galvanometer coordinate system; adjusting the position of the camera to enable the cross center of the view of the camera to coincide with the cross mark, and calculating the coordinate offset; coordinate space transformation is carried out on all the points to be machined, and galvanometer marking coordinate data are obtained; after laser engraving is carried out on the galvanometer marking coordinate data, an engraving area image is collected, the position residual error and the size proportion deviation are calculated, laser engraving is carried out again, and a laser engraving result is obtained. The technical problem that the visual positioning coordinate and the galvanometer marking coordinate in the laser engraving system are not consistent is effectively solved.

The invention relates to the technical field of laser etching, and discloses a laser double-sided etching stress control method and system for a quartz crystal, and the method comprises the steps: generating a double-sided complementary etching path based on the initial stress distribution of the quartz crystal; and front and back laser energy input is synchronously controlled, so that a double-sided thermal stress field forms dynamic balance. And obtaining the stress gradient distribution of the etching area in real time based on spectral analysis. And according to the deviation value of the stress gradient and a target threshold value, a laser processing parameter combination is dynamically adjusted, and a morphology-stress coupling optimization mode is started in a final processing stage. By accurately controlling the thermal stress balance and the stress gradient distribution in the laser processing process, the residual stress of the quartz crystal can be effectively reduced, and the shape and the performance of the quartz crystal are optimized, so that the processing precision, the material stability and the device reliability are improved.

The present invention provides a method and device for controlling the heat-affected zone of a perovskite battery laser processing, the method comprising: performing multi-source data collection and calibration processing on the perovskite battery stack structure to obtain a calibration data set including temperature distribution, surface morphology and electrical characteristics; based on the calibration data set, comprehensively analyzing the area where ion thermosensitive reactions are generated to obtain the risk zoning result of the heat-affected zone; based on the risk distribution result of the heat-affected zone, differentially configuring the energy output and movement path of the laser etching to obtain a control instruction set for local etching; according to the control instruction set, executing the laser etching process to obtain an etching control scheme for managing the heat-affected zone. The method monitors and identifies heat-sensitive areas in real time based on the collection and analysis of multi-source data, controls the temperature distribution and local thermal stress during laser processing, reduces thermal damage by accurately adjusting the laser power and scanning path, and improves the long-term stability of the perovskite battery.

The invention discloses a femtosecond laser etching method and system for a perovskite thin film, and relates to the technical field of semiconductor processing, and the system comprises a laser light source module which is used for generating a femtosecond laser pulse which is high in repetition rate and adjustable in laser power, frequency and beam spread angle; the optical path control module is provided with an optical element group, an optical element alignment system, a beam shaper and a self-adaptive optical element, and is used for adjusting the path, focusing and energy distribution of the laser beam; wherein the adaptive optical element comprises an adjustable deformable mirror and a liquid crystal spatial light modulator. According to the femtosecond laser etching method and system for the perovskite thin film, by combining real-time wavefront monitoring, distortion correction and an optical element driving system, the stability and consistency of an optical path are ensured, and the problem that etching consistency and uniformity are difficult to maintain on a large-area thin film through a traditional etching method is solved; and the performance of the device is unstable and reduced.

The invention relates to the technical field of laser processing, and discloses a laser processing device and method suitable for TGV forming, and the method comprises the steps: S1, a glass substrate is scanned in a confocal manner, a three-dimensional topological graph is obtained, and the three-dimensional topological graph comprises the three-dimensional coordinate, the thickness gradient and the positioning mark of the glass substrate; s2, based on the three-dimensional topological graph, a through hole body is formed through ultraviolet femtosecond laser etching, and intermediate infrared laser is synchronously and dynamically controlled to etch the side wall of the through hole body to generate a taper through hole with a preset taper angle; and S3, the incident angle of the ultraviolet femtosecond laser is adjusted on the side wall of the taper through hole according to the three-dimensional topological graph, and a plurality of heat dissipation grooves are etched through the ultraviolet femtosecond laser. According to the laser processing device and method suitable for TGV forming, signal integrity optimization and active heat dissipation functions are achieved in the same through hole, the application range of the TGV is widened, and the stability of the TGV during use is improved.

The embodiment of the invention relates to the photovoltaic field, and provides a back contact cell and a manufacturing method thereof, a back contact laminated cell and a photovoltaic module, and the manufacturing method comprises the steps: providing a substrate with a first surface and a second surface which are opposite to each other, and the second surface comprises a first region and a second region which are alternately arranged along a second direction; forming a laminated structure comprising a tunneling layer, a doped polycrystalline silicon layer and a first protection layer which are stacked on the first region; forming an initial second passivation lamination layer which covers the second surface and comprises an intrinsic amorphous silicon film and a doped amorphous silicon film which are stacked; forming a second protection layer on one side, far away from the substrate, of the doped amorphous silicon film; etching the first region by adopting a first laser etching process; and taking the second protection layer on the second region as an etching barrier layer, taking the first protection layer as an etching stop layer, and removing the initial second passivation lamination layer or the second protection layer and the initial second passivation lamination layer remaining on the first region by adopting a first etching solution, thereby at least facilitating the improvement of the photoelectric conversion efficiency of the back contact battery.

The invention discloses a frequency selective surface conformal pattern electric jet printing and laser etching combined machining device for a complex curved surface and a control method of the frequency selective surface conformal pattern electric jet printing and laser etching combined machining device, and belongs to the field of additive and subtractive combined machining and manufacturing, the device comprises a bed body module, a movement module, a jet printing module and a control module, and a numerical control G code program is generated through complex curved surface functional structure laying software; a machine tool driving box is controlled by an upper computer to be matched with a machine tool body and a movement module, accurate execution of a complex curved surface jet printing path in the jet printing-laser manufacturing process is completed, and on-demand manufacturing of functional structures of different types and different materials can be achieved by changing printing parameters of a flow field controller and an electric field controller in the jet printing module.

The invention relates to the technical field of new energy power plant construction data processing, in particular to a construction site personnel track recognition system based on a two-dimensional code, which adopts laser etching to dynamically encrypt a two-dimensional code label, and improves the weather resistance of the label in a salt fog environment through a salt-dredging nano coating and antistatic packaging. And a double-fixing structure combining the elastic binding band and the magnetic fastener is suitable for high-strength operation scenes. Industrial-grade scanning base stations are deployed in a construction area in a gridding mode, three-dimensional coordinate data are captured through a multi-base-station cooperative scanning mechanism, high-reflection interference of photovoltaic panels is eliminated through a signal intensity difference algorithm, and a de-noising coordinate set is generated. The closed-loop calibration module corrects scanning angle offset and earth surface reflection weight parameters through a three-level check link, the environment adaptation module triggers an ultrasonic multi-frequency cleaning program to maintain optical performance, and the cooperative control unit adjusts the light supplementing intensity and the data fusion proportion in a linkage mode. Accurate identification of personnel tracks and multi-working-plane dynamic management and control in a complex environment are realized.

The invention relates to a manufacturing method of a solar cell and the solar cell, the back surface of the solar cell is provided with a first region and a second region, and a second electrode of the solar cell is arranged in the second region; the manufacturing method of the solar cell comprises the following steps: texturing a cell piece; carrying out boron diffusion on the battery piece; performing laser etching on the first region; the first area is subjected to groove type cleaning; and carrying out chain type cleaning on the second area. In the invention, the back surface of the battery piece is selectively etched through laser to remove the borosilicate glass layer in the first area and reserve the borosilicate glass layer in the second area, so that the first area of the battery piece is cleaned and polished in the subsequent preparation steps; the borosilicate glass layer of the second region protects the textured structure of the second region in the subsequent preparation step, so that the tunneling dielectric layer and the doped conductive layer in the second region also have textured structures, thereby increasing the contact area between the second electrode and the doped conductive layer, and improving the photoelectric conversion efficiency of the solar cell.

The invention discloses an etching forming method and system based on a laser scanning strategy, and relates to the technical field of computer platform load balancing, and the method comprises the steps: importing a three-dimensional etching model into a coordinate system for hierarchical division, and generating a two-dimensional plane etching pattern for region division; the laser energy input of each etching area is dynamically adjusted; and performing additive manufacturing to supplement materials in real time, and controlling the etching depth and the surface quality. According to the etching forming method based on the laser scanning strategy, laser energy input of each etching area is dynamically adjusted, the etching forming method is suitable for deep etching and micromachining of a complex structure, and more accurate depth control and surface quality optimization are achieved. Path optimization is carried out by combining curvature and local laser energy requirements, minimization of a laser etching path and maximization of energy efficiency are achieved, and the overall performance of laser etching can be remarkably improved in the field of fine structure and complex surface machining.

The invention relates to the field of metal surface treatment, and discloses a multi-layer vacuum coating method for enhancing the surface of a high-precision metal part, which comprises the following steps: S1, surface treatment: removing surface pollutants and oxide layers through plasma cleaning, and coarsening the surface of a base material through laser etching; s2, coating deposition is conducted, specifically, a metal transition layer and a multi-layer nano hard coating are deposited in an enhanced mode through plasma; s3, depositing a self-lubricating coating: depositing the self-lubricating coating by pulse laser; s4, post-treatment: carrying out ion beam assisted post-treatment; s5, heat treatment: performing low-temperature heat treatment to eliminate stress. Through the plasma enhanced PVD and pulse laser deposition technology, the multi-layer nano coating is deposited under the low-temperature condition, the problem of thermal deformation of a heat-sensitive metal base material caused by a traditional high-temperature process is solved, and it is ensured that the multi-layer coating with high hardness and high compactness can still be formed on the premise that the size precision of the base material is not affected; and therefore, the method can be widely applied to surface treatment of high-precision parts.

The invention discloses a dust removal mechanism and a dust removal method of an inverted laser etching machine for LOW-E glass, relates to the field of dust removal for LOW-E glass laser etching, and solves the problems of dust dissipation, interference between an air curtain and negative pressure airflow, poor adaptability of adsorption force and easy blockage of a filter membrane in the etching process. The mechanism comprises a dynamic sealing dust removal cover, an annular air curtain guiding module, a negative pressure dust collection module, a multi-stage filtering module, a composite adsorption positioning module and an intelligent control module. The method comprises six steps of pretreatment positioning, air curtain-negative pressure collaborative initialization and the like. According to the scheme, airflow interference is eliminated through an air curtain-negative pressure collaborative PID algorithm, an adsorption force two-factor adjustment algorithm is matched with glass characteristics, pre-dedusting is achieved through a dust concentration LSTM prediction algorithm, and the filtering efficiency is guaranteed by combining a multi-stage filtering module with a filtering membrane self-cleaning function; dust concentration can be effectively controlled, glass film layer damage is avoided, dedusting stability is improved, and filtering life is prolonged.

The invention discloses a preparation method and application of a pressure and humidity integrated flexible sensor based on MXene, and relates to the field of pressure sensors and humidity sensors. The preparation method comprises the following steps: firstly, preparing MXene dispersion liquid; then preparing a template through a laser etching method and using PDMS reverse mold to obtain a PDMS thin film with a micro-bulge structure, then spraying an MXene dispersion liquid on the PDMS thin film, and obtaining a pressure sensing sensitive layer (MXene-PDMS) after airing; thirdly, three interdigital electrodes are prepared in a magnetron sputtering mode, and the middle electrode and MXene-PDMS are assembled to obtain a pressure sensor; and dispensing MXene dispersion liquid on the other two electrodes, and airing to obtain the humidity sensor. The pressure and humidity integrated flexible sensor has the advantages of being capable of responding to pressure and humidity signals at the same time and high in sensitivity, and the detection accuracy of the sensor is greatly improved.

The invention provides a preparation technology of a three-dimensional camera shooting sonar sparse sensing array, and the method comprises the following steps: forming a patterned electrode on a PVDF or P (VDF-TrFE) piezoelectric film through vacuum adsorption and silk-screen printing according to sparse array element coordinates, and arranging a virtual transition array element at the periphery; performing laser etching on the edge contour and the exhaust hole of the piezoelectric film; designing a bonding positioning auxiliary tool, combining an ultrathin double-sided adhesive tape and a single-sided mask adhesive tape, and utilizing conductive silver paste to realize accurate electric connection between the array element and the PCB bonding pad; designing a polytetrafluoroethylene-metal flattening module, and laminating the array in a vacuum environment for curing and bonding; the matching layer is made of a low-impedance sound transmission material, glue filling and vacuum defoaming are performed from the back side in batches, and the sparse sensing array is prepared in combination with a polyimide film and a metal super-flat plate. The preparation problem of the large-aperture high-frequency imaging sonar on the sensing array is solved, and the array element position accuracy, the array element consistency and the imaging resolution can be improved.

The invention relates to the technical field of torque sampling inspection, in particular to a torque sampling inspection method and system. Comprising the following steps: tool identity digitization: performing laser etching on an encrypted two-dimensional code in a tool stress concentration area, and associating and storing tool specification parameters, detection standards and use constraint conditions to a central database; intelligent task allocation: the system generates a dynamic detection plan according to a production line real-time state, an equipment service cycle and an operator skill level; multi-source data acquisition: acquiring tool identity information through a scanning device, and synchronously acquiring a physical signal of a torque detection device and a digital image of a tool identification file; grading judgment processing: performing process conformity verification on the measurement data, and generating a process stability evaluation report in combination with historical detection records; according to the closed-loop control strategy, the detection scheme is automatically adjusted according to the quality fluctuation characteristics. According to the scheme, the problem that a traditional method is seriously insufficient in the aspects of detection efficiency, abnormal traceability, process control and the like can be solved.

The invention provides a preparation method of a silicon substrate and a heterojunction solar cell, and the preparation method of the silicon substrate comprises the steps: an initial silicon substrate comprises a first surface and a second surface, a first mask layer is formed on the first surface, and a second mask layer is formed on the second surface; performing first dot matrix laser etching treatment on the first mask layer to form a first intermediate mask layer; the second surface is provided with a target area, the target area is used for arranging a grid line, and second dot matrix laser etching processing is carried out on the second mask layer corresponding to the target area to form a second middle mask layer; performing alkali etching treatment on the first surface through the first intermediate mask layer, and performing alkali etching treatment on the target area through the second intermediate mask layer; and removing the first intermediate mask layer to obtain a first suede, and removing the second intermediate mask layer to obtain the silicon substrate with the target area as the second suede. The silicon substrate with excellent adhesiveness between the second surface and the grid lines and ultralow reflectivity on the first surface is prepared by using the method.

The invention relates to the technical field of image processing, in particular to a laser etching label paper surface flaw detection method based on machine vision. The method comprises the following steps: acquiring a laser etching label paper surface image set A acquired in a historical etching time period; acquiring a defect identification result of each laser etching label paper surface image in A; for the defect identification result of any image in A, if the defect identification result comprises defects, comparing the identified defects with corresponding real defects, and obtaining the defects which are different from the corresponding real defects in the identified defects; if the ratio of the number of the different flaws corresponding to all the images in A to the number of the real flaws is larger than or equal to a preset proportion threshold value, the movement speed adjusting amount of the laser etching equipment is obtained according to the different flaws, and the target movement speed of the laser etching equipment in the current time period is obtained in combination with V0. According to the invention, the laser etching speed matched with the parameters of the image acquisition equipment can be determined.

A decorative radome including a radio-transmissive substrate having a first surface on a first side and a second surface on a second side; and a first surface radio-transmissive decorative coating; methods of manufacturing a PVD coated system include applying a hard coating to the substrate; applying a PVD coating by magnetron sputtering to the substrate; and laser etching one or more of a pattern or a graphic into the PVD coating; and A decorative PVD coated item, comprising: a substrate; a hard coating applied to the substrate; a PVD coating provided on the hard coating and the substrate, wherein the PVD coating is laser etched with one or more of a pattern or a graphic so that the PVD coating is at least partially removed and the pattern or the graphic is revealed as a result of the contrast between the substrate and the PVD coating.

The embodiment of the invention relates to the photovoltaic field, and provides a back contact cell and a processing method thereof, a back contact laminated cell and a photovoltaic module, and the processing method comprises the step of texturing a substrate. And carrying out boron diffusion on the substrate to form a boron-doped layer and a borosilicate glass layer on the surface of the substrate. And performing laser etching on the first region and the second region of the substrate, and removing the boron-doped layer, the borosilicate glass layer and part of the substrate in the first region and the second region. And carrying out phosphorus expansion on the substrate, and forming a polycrystalline silicon layer and a phosphorosilicate glass layer on the surface of the substrate. And performing laser etching on the substrate to remove the phosphorosilicate glass layers in the second area and the third area. And texturing the substrate and removing the phosphorosilicate glass layer in the first region and the polycrystalline silicon layers in the second region and the third region to form a textured surface in the second region. And forming a passivation layer on the substrate. Electrode paste is printed in the first area and the third area and sintered. And sintering the back surface of the substrate. The design can improve the double-sided rate and the efficiency of the back contact battery.

The invention relates to the technical field of laser etching, and discloses a high-precision laser etching parameter adjusting method and device, and the method comprises the steps: obtaining basic parameters and preliminary processing parameters of a processing material; according to the preliminary processing parameters, equipment is controlled to perform sample preparation to obtain a processing sample plate of the processing material, and etching depth measurement operation is performed on the surface of a photoetching structure of the processing sample plate to obtain the etching depth of the processing sample plate; performing data processing operation according to the etching depth to obtain an average etching rate; establishing a relation model of laser etching data by utilizing a linear regression formula according to the average etching rate; performing laser power adjustment operation according to the relation model and the basic parameters to obtain a laser power adjustment scheme; and according to the laser power adjustment scheme, completing adjustment of process parameters of all the processing materials. By means of the method, finer technological parameter setting can be achieved, and the high-precision machining requirement is met.

The invention relates to a composite material and metal connecting method based on metal surface femtosecond laser etching, and belongs to the technical field of composite material and metal plate interface and bonding. A metal interface is subjected to texturing treatment through femtosecond laser, a multi-stage microstructure is formed on the metal surface, then plasma treatment is used, the chemical energy and surface activity of the metal surface are improved, and the interlayer bonding strength of a metal plate and a composite material is further improved. Compared with a traditional bolt connection and glue joint of the same size, the connection mode can bear higher loads, energy absorbed before fracture is high, and the composite material has remarkable advantages in the aspects of bearing and weight reduction of a composite material structure and has potential application prospects.

The invention relates to the technical field of capacitive screen processing, and discloses a method for processing a single-layer multi-point capacitive screen based on a laser etching mixed process, which comprises the following steps: executing a heat distribution modeling strategy on each position on the capacitive screen, calculating a heat source distribution function of each position, and calculating heat accumulation of each rectangular area; a correlation function of the area and heat accumulation of the rectangular area is established, division of the capacitive screen is optimized based on the correlation function, and the rectangular area is updated; for the pin on any rectangular area, triple design optimization is executed on the pin, and specifically, the position, connected with the rectangular area, of each pin is obtained; executing a first optimization strategy, and optimizing the connection position of the pin on the rectangular area; executing a second optimization strategy according to the width and the length of the cross section of the pin; and a third optimization strategy is executed on the rectangular area, so that the arrangement of the pins is optimized, the coupling effect is reduced, and the performance and the stability of the capacitive screen are remarkably improved.

The invention relates to a water electrolysis hydrogen production technology, and aims to provide a super-hydrophilic nickel-based electrode with a two-stage array structure and a preparation method of the super-hydrophilic nickel-based electrode. According to the nickel-based electrode, a three-dimensional net-shaped nickel felt made of micron-sized pure nickel fibers serves as a base material, and micron-sized second-stage array structures are periodically arranged on the first-stage surface of the nickel felt; the secondary array structure is any one or two of a ridge-shaped array or a square column array formed on the surface of the nickel felt by using a femtosecond laser etching process. The preparation method of the electrode is simple in preparation step, has super-hydrophilic and super-aerophobic characteristics, is excellent in electrochemical performance and low in cost, and is very suitable for industrial production and application; a femtosecond laser one-step method is used for processing, subsequent treatment is not needed, and the method is simple, easy to operate and suitable for being amplified to an industrial production scale; the surface wettability of the electrode is greatly enhanced, the hydrophilic and aerophobic properties are excellent, and water transmission and bubble desorption in the electrolysis process are facilitated.

The invention belongs to the technical field of composite material casting, and relates to an aluminum / iron bimetal composite material based on a micro-textured intermediate layer and a preparation method thereof.The micro-textured intermediate layer is pre-arranged on the surface of an iron base material in advance in an electro-deposition and laser etching composite mode, and in the liquid-solid composite casting process, the micro-textured intermediate layer is pre-arranged on the surface of the iron base material in advance; the middle layer plays a role in isolating direct contact between the liquid aluminum alloy melt and the solid iron base material, and the microstructure on the surface of the middle layer plays a role in inducing stress coordinated distribution. The problem that the interface is easy to crack can be effectively solved through dual control of the interface phase composition and the interface structure of the aluminum / iron double-metal composite material, so that the interface bonding strength of the aluminum / iron double-metal composite material is stably improved.

The invention relates to the technical field of circuit board processing, in particular to a laser drilling method, a storage medium, laser drilling equipment and a high-frequency high-speed substrate. The laser drilling method comprises the steps that hole machining information of a hole structure is obtained, wherein the hole machining information comprises the hole position, the hole outer contour and the hole depth; taking the hole position as a positioning reference, and performing at least one of laser winding and cutting treatment and laser etching treatment on the high-frequency high-speed substrate to form a hole structure; wherein the laser winding and cutting treatment comprises the steps that first laser is controlled to move along a first closed path matched with the outer contour of the hole, so that the side wall of the hole structure is formed; and the laser etching treatment comprises the steps of controlling a second laser to carry out punching processing on an enclosed area of the outer contour of the hole so as to remove a base material in the enclosed area and form a bottom wall of the hole structure, and the method can be used for manufacturing the high-quality hole structure on the high-frequency and high-speed substrate and also can be used for manufacturing the high-quality hole structure on the high-frequency and high-speed substrate. And the processing efficiency of manufacturing a high-quality hole structure on the high-frequency and high-speed substrate can be obviously improved.

The invention discloses a multi-physics coupling modeling method based on nanosecond laser etching microgroove resistance reduction simulation, relates to the technical field of laser processing, and is used for solving the problem of optimization of a microgroove resistance reduction effect in a laser etching process. According to the method, the drag reduction effect of the microgroove in the laser etching process is simulated by establishing a coupling model of a plurality of physical fields such as heat transfer, fluid dynamics and material removal. Specifically, an adaptive grid technology is adopted to accurately calculate a temperature field and a flow field in an etching process, and meanwhile, a pulse laser equivalent processing method is introduced to model influences of different scanning times and laser power, so that etching process parameters are optimized. According to the method, the drag reduction effect under different parameters can be efficiently predicted, a theoretical basis is provided for microgroove design and laser etching process optimization, and the method has a wide application prospect.

The invention relates to the technical field of organic light-emitting display, and discloses a preparation method of a silicon-based OLED micro-display, which comprises the following steps: S1, cleaning a silicon-based CMOS driving circuit substrate containing an electrode, and removing surface pollutants; s2, performing plasma surface treatment on the substrate through argon, nitrogen or oxygen; s3, forming a molecular layer on the surface of the electrode through a self-assembly monomolecular layer technology; s4, depositing a protective film material on the surface of the treated electrode through a solution deposition method; s5, the protective film is removed through laser etching, and the surface of the electrode is exposed; and S6, cleaning and patterning the electrode by using a developing solution, and further carrying out electrode welding. The surface of the electrode is treated by adopting a self-assembly monomolecular layer technology, and the polarity and the adhesive force of the surface of the electrode can be remarkably enhanced through modification of an amino silane solution, so that the bonding strength among all layers of materials is improved.

The invention discloses a focusing method of a laser, a focusing control device and laser etching equipment, and the focusing method of the laser comprises the steps: taking a current reference height as a starting point, and determining a plurality of different laser heights of the laser according to a current height adjustment step pitch; at each laser height, a laser device is controlled to form a plurality of light spots through laser etching, and the average diameter of the light spots corresponding to each laser height is determined; determining whether the laser height corresponding to the minimum light spot average diameter meets a preset focusing qualification condition or not; if not, the next reference height and the next height adjustment step pitch are determined according to the size relation of the light spot average diameters corresponding to the multiple different laser heights, and the steps are repeated till the laser height corresponding to the minimum light spot average diameter meets the preset focusing qualification condition. According to the technical scheme provided by the invention, laser focusing is accurately and efficiently completed, and the stability and improvement of the laser etching process quality are ensured.

The invention discloses a frequency adjustment control method and device for an ultrahigh frequency wafer, and relates to the technical field of semiconductor production. Determining a target area of the coated wafer, dividing the target area to obtain a plurality of to-be-detected areas, and obtaining the area vibration frequency of the to-be-detected areas; if the area vibration frequency is larger than a preset frequency threshold value, the area to be detected is judged to be an abnormal area, a feature code is added, and the area vibration frequency and the feature code are uploaded to a feature database; working parameters of the laser etching equipment are determined according to the feature database, and the abnormal area is etched according to the working parameters; the vibration frequency of each to-be-detected area is detected, the area with the abnormal vibration frequency is identified, a feature code is added to the area, the area vibration frequency and the feature code are uploaded to a feature database, rapid identification and intelligent marking of the abnormal area are achieved, and data support is provided for subsequent laser etching equipment working parameter optimization. And the accuracy and the high efficiency of the etching operation are ensured.