2results about How to "Increase inductance" patented technology

The application discloses a kind of plasma source assembly and semiconductor process chamber, belong to the field of semiconductors.A kind of plasma source assembly, applied to semiconductor process chamber, the plasma source assembly includes: insulating medium pipe, Faraday shield, coil and magnetic conducting piece;The insulating medium pipe is used to communicate with the cavity of the semiconductor process chamber;The coil is wound on the outside of the insulating medium pipe;The magnetic conducting piece is encircled in the outer periphery of the coil.A kind of semiconductor process chamber includes the above-mentioned plasma source assembly.The application can at least solve the problem that high power in coil leads to higher power loss.

The utility model relates to filter technical field, specifically disclose a compact multistage LC filter, the filter includes rectangle insulating substrate, its four corner position is equipped with mounting hole, the filter shell is fixedly installed above the insulating substrate, the both ends of filter shell are equipped with input and output port, in the filter shell, the insulating substrate top is equipped with at least two stages filter unit, and each stage filter unit contains spiral inductance and interdigital capacitance, and they are connected through microstrip line between the filter unit of adjacent stage alternately cascaded. Two insulating shield baffles are arranged between the adjacent filter units, which are connected with the insulating substrate and the filter shell, and the shielding layer formed between the insulating shield baffles is connected with the bottom ground plane through the metallized via on the insulating substrate. The filter realizes compact volume, excellent filtering performance and anti-interference ability through three-dimensional inductance, shielding structure and optimized layout.