The invention discloses a curved magnetron
sputtering cathode, closed
magnetic field coating magnetron
sputtering equipment and application methods thereof. The curved magnetron
sputtering cathode comprises a curved target material, a
water jacket, an
electrode, an insulating bush, a shielding component, a magnetic boot, a magnetic boot rotating component and a supporting and fixing mechanism, wherein the insulating bush performs potential insulation on a
cathode component; the shielding component is a suspended potential component in a
discharge process; and the magnetic boot rotating component can realize sliding of the magnetic boot. The utilization ratio of the magnetic material is improved; the curved target material is formed by splicing a plurality of
metal-based tiles, of which thesurfaces can be bonded with nonmetals, and is fixed on the
water jacket which is formed by
welding the surface of a stainless
steel tube with a water-cooled tube; the
electrode is connected with a
negative voltage to perform magnetron sputtering
glow discharge; and limited by the shape of the cathode, electrons in
glow discharge are gathered to produce a hollow cathode effect, so that not only the sputtering rate but also the particle
ionization rate is improved. The curved magnetron sputtering cathode can perform magnetron sputtering in a high-
vacuum state to generate big-beam high-
ionization-rate particles so as to obtain a high-quality
coating.