The invention discloses a curved magnetron sputtering cathode, closed magnetic field coating magnetron sputtering equipment and application methods thereof. The curved magnetron sputtering cathode comprises a curved target material, a water jacket, an electrode, an insulating bush, a shielding component, a magnetic boot, a magnetic boot rotating component and a supporting and fixing mechanism, wherein the insulating bush performs potential insulation on a cathode component; the shielding component is a suspended potential component in a discharge process; and the magnetic boot rotating component can realize sliding of the magnetic boot. The utilization ratio of the magnetic material is improved; the curved target material is formed by splicing a plurality of metal-based tiles, of which thesurfaces can be bonded with nonmetals, and is fixed on the water jacket which is formed by welding the surface of a stainless steel tube with a water-cooled tube; the electrode is connected with a negative voltage to perform magnetron sputtering glow discharge; and limited by the shape of the cathode, electrons in glow discharge are gathered to produce a hollow cathode effect, so that not only the sputtering rate but also the particle ionization rate is improved. The curved magnetron sputtering cathode can perform magnetron sputtering in a high-vacuum state to generate big-beam high-ionization-rate particles so as to obtain a high-quality coating.