394 results about "Radio frequency plasma" patented technology

Reactive halogen-ion plasmas, having for example, generating chloride ions, generated from low-pressure halogen gases using a radio-frequency plasma are employed for producing low-friction carbon coatings, such as a pure carbon film, at or near room temperature on a bulk or thin film of a compound, such as titanium carbide.

The invention discloses a method for preparing a spherical powder material used for three-dimensional printing. The method includes the steps of raw material selecting, high-energy ball milling and radio-frequency plasma spherizing. Selected raw materials are metal or alloy powder in the step of raw material selecting; the step of high-energy ball milling is carried out under the argon shielding condition, petroleum ether serves as the ball milling medium, and the metal or alloy powder is aluminum alloy powder, or titanium alloy powder, or nickel-base alloy powder, or stainless steel powder or tungsten alloy powder; according to the step of radio-frequency plasma spherizing, the total gas flow is 100 L/min-200 L/min, the input power of plasma is 50 kW-100 kW, the negative pressure of a gas outlet of a system is minus 1000 Pa-minus 2000 Pa, and the powder conveying amount is 50 g/min-150 g/min. The manufactured spherical powder is high in sphericity degree, even in granularity, low in oxygen content and good in liquidity, has few defects and is suitable for three-dimensional printing. The method for preparing the spherical powder material used for three-dimensional printing has the advantage that the process is accurate and controllable.

The invention provides a short-flow preparation method of micro-sized spherical titanium powder, which belongs to the technical field of powder preparation. The hydrogenation-dehydrogenation technique and the radio frequency plasma body fusion spheroidization technique are integrated, and the titanium hydride powder is selected as raw material; the titanium hydride powder absorbs heat in the high-temperature plasma and quickly decomposes and dehydrogenates, and the titanium hydride power is cracked and crushed in the process of dehydrogenation to produce the micro-sized titanium powder. By using the method, the processes of the dehydrogenation and the spheroidization of the generated titanium powder are finished in one step directly through the plasma processing, and the short-flow preparation of the micro-sized spherical titanium powder is realized. The invention has the advantages that the hydrogenation-dehydrogenation technique and the radio frequency plasma fusion spheroidization technique are combined, so as to shorten the production flow, enhance the production efficiency and reduce the production cost. Simultaneously, the prepared spherical titanium power has fine and even particles, good liquidity, high sphericity and low oxygen content, thereby the requirements of technical industrial production such as the injection figuration, the gel die casting figuration, and the like are satisfied.

The invention discloses a method for manufacturing micro-fine spherical titanium powder, which includes the steps: using sponge titanium as raw materials, mixing the sponge titanium with hydrogen, holding the positive pressure of the hydrogen at 0.05-0.1MPa, preserving heat at the temperature of 650-730 DEG C, and cooling after ensuring the sponge titanium and the hydrogen to sufficiently react; crushing the hydrogenated sponge titanium with an air-stream mill, controlling the revolving speed of the air-stream mill within 1000r/min-1300r/min, and obtaining titanium hydride powder with a grain size smaller than 45 micrometers by means of crushing; and dehydrogenizing and balling the titanium hydride powder by using radio frequency plasma. The method for manufacturing the micro-fine spherical titanium powder has the advantages that the grain size of the powder and grain size distribution can be effectively controlled, and the powder is low in oxygen content, few in production procedure, low in cost, high in balling rate, fine in sphericility and suitable for industrialized popularization.

A method for growing bone cells. In one aspect, the present invention provides a method for growing bone cells, comprising the steps of (a) anodizing a titanium substrate to form an array of titanium dioxide nanotubes on a surface of the titanium substrate, (b) subjecting the anodized titanium substrate to a radio frequency plasma discharge to chemically modify the array of titanium dioxide nanotubes formed on the surface of the titanium substrate, (c) seeding bone cells onto the surface of the titanium substrate that has an array of titanium dioxide nanotubes thereon after the subjecting step, and (d) incubating the seeded bone cells for a period of time effective for the cells to grow and proliferate.

An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma.

A technique for providing an inductively coupled radio frequency plasma flood gun is disclosed. In one particular exemplary embodiment, the technique may be realized as a plasma flood gun in an ion implantation system. The plasma flood gun may comprise: a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; and a power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma. Entire inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. In addition, the one or more apertures may be wide enough for at least one portion of charged particles from the plasma to flow through.

The invention belongs to the field of powder metallurgy powder preparation and provides a preparation method of fine spherical tungsten powder. By combining the dispersion and classification of tungsten powder with spheroidization, spherical tungsten powder with a particle size below 10 μm is prepared. The specific process is: disperse and classify the irregularly shaped raw material tungsten powder through the impact of airflow, and then spheroidize the dispersed powder through a radio frequency plasma torch to obtain a fine spherical tungsten powder with a particle size below 10 μm. The invention has the advantages that the combination of airflow impact and radio frequency plasma spheroidization solves the problem that the spherical powder obtained by single radio frequency plasma spheroidization is easy to grow, and the production efficiency is high. The obtained powder has a high degree of sphericity, a particle size of less than 10 μm, a spheroidization rate of 100%, a smooth surface, uniform particle size distribution, and good dispersion.

The invention discloses metal ceramic composite alloy spherical powder and a preparation method thereof. The metal ceramic composite alloy spherical powder is TiCN-Co and at least one of Ni, Mo and Fe or (Ti, Me) CN-Co and at least one of Ni, Mo and Fe or TiCN-MxC-Co and at least one of Ni, Mo and Fe or (Ti, Me) CN-MxC-Co and at least one of Ni, Mo and Fe or (Ti, Me) CN-TiCN-MxC-Co and at least one of Ni, Mo and Fe. Mixed materials are dried, the powder is spherized by the aid of a roller spherizing method, a radio frequency plasma spherizing method or a spray granulation spherizing method, and the spherized powder is sintered to obtain the metal ceramic composite alloy spherical powder. The metal ceramic composite alloy spherical powder serves as a coating material, binding force between a coating and a substrate is improved, and the quality of 3D (three-dimensional) printing products can be improved when the spherical powder serves as a 3D printing material.

The invention provides a preparation method of an ultra-fine spherical nickel coated titanium composite powder, belonging to the manufacturing field of metallic powder material (compound). The preparation method comprises the following steps of: after pre-processing the raw material titanium hydride powder, firstly performing chemical nickel-plating; after radio-frequency plasma spheroidizing, performing dehydrogenation on the titanium hydride powder with large-particles; breaking the powder into ultra-fine spherical powder; and simultaneously reacting the nickel coated on the surface with titanium to obtain the spherical powder coated with nickel on the surface; and obtaining purified ultra-fine spherical nickel coated titanium composite powder after vacuum heat treatment. The preparation method has the characteristics of low oxygen content of power, uniform thickness of the nickel layer coated on the surface, high apparent density, good fluidity, short processing time, and the like,and the short procedure preparation of material is realized.

The intention relates to a device and method for enhancing atomic layer deposition by pulse-modulation radio frequency plasma. The device comprises a vacuum reaction chamber, wherein a substrate is arranged at the inner bottom of the vacuum reaction chamber, and the vacuum reaction chamber is respectively connected with a vacuum mechanical pump and a precursor input pipeline. The device is characterized in that a plasma electrode is arranged at the inner top of the vacuum reaction chamber and is sequentially connected with a radio-frequency power matcher, a pulse modulation radio-frequency power supply and a pulse delay unit. In the method, plasma is generated by the pulse modulation radio-frequency power supply to assist deposition when at least one precursor is deposited. The device and method provided by the invention reduces the impact of ion bombardment on the deposited film during deposition process and prevents the temperature increase of the cavity during deposition process.

This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.

The present invention provides an apparatus and a method of generating and controlling plasma formed in a capacitively coupled plasma region between a plasma electrode and a bias electrode. The plasma electrode includes a plurality of sub-electrodes that are electrically insulated from one another. Radio frequency plasma generating electric power is provided to the plasma electrode. Radio frequency bias electric power, at a lower frequency than the plasma generating radio frequency electric power, is also provided. A first portion of the bias electric power is provided to the bias electrode, and a second portion of the bias electric power is provided to the plasma electrode. At least one filter, impedance matching network, phase shifter, and power splitter are used to affect the electric power provided to the electrodes.

The invention belongs to the field of powder materials and particularly provides a method for preparing micro spherical niobium (Nb)-wolfram (W)-molybdenum (Mo)-zirconium (Zr) alloy powder. According to the method, the mechanical alloying technology is used for preparing Nb-W-Mo-Zr alloy powder, and then the radio frequency plasma spheroidization technology is used for treating the mechanical alloying alloy powder to obtain the micro spherical Nb-W-Mo-Zr alloy powder which is suitable for being used for manufacturing micro thin-wall parts in an injection forming mode, wherein the average particle diameter of the micro spherical Nb-W-Mo-Zr alloy powder is less than 20 micro meters. The method for preparing the micro spherical Nb-W-Mo-Zr alloy powder overcomes the defect that through a traditional niobium alloy powder preparation technology, only powder with particles which are in irregular shapes or have long diameters can be prepared, the average particle diameter of the prepared micro spherical Nb-W-Mo-Zr alloy powder is less than 20 micro meters, and the prepared micro spherical Nb-W-Mo-Zr alloy powder is high in degree of sphericity and good in flowability, is quite suitable for being used for manufacturing thin-wall Nb-W-Mo-Zr alloy parts in a powder metallurgy mode, is especially suitable for being used for manufacturing the thin-wall Nb-W-Mo-Zr alloy parts in the injection forming mode.

A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.

Transistor fin elements (e.g., fin or tri gate) may be modified by radio frequency (RF) plasma and/or thermal processing for purpose of dimensional sculpting. The etched, thinned fins may be formed by first forming wider single crystal fins, and after depositing trench oxide material between the wider fins, etching the wider fins using a second etch to form narrower single crystal fins having undamaged top and sidewalls for epitaxially growing active channel material. The second etch may remove a thickness of between a 1 nm and 15 nm of the top surfaces and the sidewalls of the wider fins. It may remove the thickness using (1) chlorine or fluorine based chemistry using low ion energy plasma processing, or (2) low temperature thermal processing that does not damage fins via energetic ion bombardment, oxidation or by leaving behind etch residue that could disrupt the epitaxial growth quality of the second material.

A method is disclosed for removing a polysilicon layer from a semiconductor wafer, in which a downstream plasma source is used first to planarize the wafer, removing contours in the polysilicon layer caused by deposition over lithographic features, such as via holes. The planarizing process is followed by exposure to a plasma made by a direct, radio frequency plasma source, which may be in combination with the downstream plasma source, to perform the bulk etching of the polysilicon. The invention can produce planar surface topography after the top layer of the film is removed, in which the residual recess height of the polysilicon plug filling a via hole is less than about about 10 nm.

A medicament dispenser comprising a canister and a drug dispensing valve, wherein one or more surfaces of said canister and/or valve has a fluorinated coating provided by a process comprising generating one or more fluorine-containing radical species and polymerising said radicals on said one or more surfaces, provided that the radicals are not generated by a process involving continuous wave radio frequency plasma polymerisation is disclosed.

The invention discloses a method for the surface hydrophilic modification of a polytetrafluoroethylene hollow fiber membrane. The method comprises the following steps: firstly dipping the polytetrafluoroethylene hollow fiber membrane into a solution containing a hydrophilic group, so that the surface of the membrane is coated with a layer of hydrotropic substance; then processing the polytetrafluoroethylene hollow fiber membrane by utilizing a radio frequency plasma, simultaneously bombarding and etching a membrane body and the hydrotropic substance on the surface of the membrane to generate an active free radical, further initiating and grafting the hydrophilic group to the polytetrafluoroethylene hollow fiber membrane body so as to form a stable hydrophilic layer. According to the method disclosed by the invention, on the premise that the inherent excellent performance of the polytetrafluoroethylene hollow fiber membrane is not affected, the hydrophilic modification is performed on the surface of the membrane, so that the surface hydrophilicity of the polytetrafluoroethylene membrane is greatly improved. Therefore, the application scope of the polytetrafluoroethylene hollow fiber membrane in the membrane separation field is widened.