32 results about "Radio frequency plasma" patented technology

This invention discloses a radio frequency (RF) power control system and method, and an RF plasma system. The method includes: before the electrostatic chuck cleaning begins, loading a preset parameter set of an impedance matching network associated with the selected cleaning process recipe, and driving the variable capacitors and variable inductors in the impedance matching network to their preset initial positions in the preset parameter set before applying continuous wave RF power; applying continuous wave RF power to the electrostatic chuck and initiating the cleaning process; during the cleaning process, acquiring the load impedance in the impedance matching network in real time at a preset sampling rate, generating a real-time impedance trajectory, and calculating the impedance change rate; determining the current cleaning stage of the electrostatic chuck based on the magnitude of the load impedance and the impedance change rate, and dynamically switching to the impedance matching algorithm corresponding to the cleaning stage to adjust the positions of the variable capacitors and variable inductors in the impedance matching network. This invention achieves low-reflection power matching throughout the entire cleaning process.

This invention discloses a CrN-W / DLC composite coating for WE43 magnesium alloy and its preparation method, belonging to the field of surface engineering and materials processing technology. The preparation method includes: pretreating the WE43 magnesium alloy substrate, placing it in a thin film deposition system, evacuating the system, introducing an Ar / N2 mixed gas, and using a Cr target for reactive magnetron sputtering deposition to form a CrN transition layer. During the deposition process, a W target is simultaneously introduced and co-deposited with the Cr target using reactive magnetron sputtering to obtain the CrN-W transition layer. Using a PECVD process, a carbon source precursor gas is introduced, and under the action of radio frequency plasma, it dissociates to form highly reactive species. These species are adsorbed, recombined, and cross-linked on the surface of the CrN-W transition layer to form a DLC functional layer, resulting in the CrN-W / DLC composite coating. The composite coating of this invention exhibits excellent bonding strength, wear resistance, and low friction performance, significantly improving the service performance of WE43 magnesium alloy.

This application provides an arc detection and processing method and apparatus for a radio frequency plasma processing system, belonging to the field of semiconductor equipment technology. The method includes: acquiring analog voltage and current signals from the matching unit side as analog electrical signals; acquiring image data within the reaction chamber; fusing the analog electrical signals and image data to obtain arc level information and spatial location information; executing real-time arc extinguishing control based on the level information; and executing a location-based processing strategy based on the spatial location information. This application achieves accurate arc detection and location through the fusion of electrical signals and image information, efficiently realizes arc extinguishing control based on a graded arc extinguishing strategy, and guides root cause management through a location-based processing strategy. This solves the problem of high arc misjudgment rate in existing technologies and helps to eliminate the causes of arc occurrence at their source.

This invention belongs to the field of thin film deposition technology and relates to a method for improving the uniformity and quality of DLC coatings prepared by PECVD. Based on PECVD equipment, a method for preparing uniform, highly wear-resistant / corrosion-resistant DLC coatings on irregularly shaped workpieces by controlling a rotating magnetic field is provided. The method includes a vacuum chamber system, a dynamic magnetic field generator, a radio frequency plasma excitation system, a dual-path gas supply system, and a vacuum and pressure regulation system. The dynamic magnetic field generator uses two sets of ring-arranged neodymium iron boron permanent magnets, driven by a motor to rotate the magnetic field vector. The top spray electrode and the bottom ring ground electrode form the main discharge circuit. The rotating magnetic field increases the number density of active groups and molecular kinetic energy during deposition. Different gas ratios are used during coating deposition to achieve high-density, high-quality DLC coatings. The workpiece for DLC coating deposition is placed at the bottom of the reaction chamber. This method is used to deposit uniform, highly wear-resistant, and highly corrosion-resistant DLC coatings on planar or irregularly shaped workpieces.

This invention provides a spherical TC4 alloy fine powder, its preparation method, and its application, belonging to the field of alloy material preparation technology. The preparation method of the spherical TC4 alloy fine powder includes the following steps: S1: Hydrogenation pre-crack formation, using spherical TC4 coarse powder particles as raw material, heating to 700~1000℃ in a hydrogen atmosphere, and holding at that temperature for 20~90 min; S2: Preparing spherical TC4 titanium alloy powder using radio frequency plasma hydrogen explosion; the hydrogen explosion gas includes hydrogen and inert gas; S3: After ultrasonic separation of the spherical TC4 titanium alloy powder from step S2, the spherical TC4 alloy fine powder is obtained. This achieves an integrated technical route of TC4 powder refinement and hydrogen explosion spheroidization, obtaining MIM powder with high sphericity and high flowability.

This invention discloses a hydrogen isotope permeation research device based on radio frequency plasma, belonging to the field of hydrogen isotope permeation research technology. The device includes a quartz tube, one end of which is connected to an inlet unit, and the other end has a fixed flange with a gas venting channel. A permeation tube is detachably and sealed to the fixed flange, and the inner cavity of the permeation tube is connected to a permeation flux detection unit. A tubular furnace corresponding to the permeation tube and a coupling coil electrically connected to a radio frequency generator are fitted around the quartz tube. The device also includes an in-situ reverse cleaning unit that can replace the permeation flux detection unit and a plasma diagnostic unit that can replace the permeation tube. This invention uses a radio frequency plasma source, which has high plasma density and a wide parameter adjustment range, effectively processing combined hydrogen isotopes. The in-situ reverse cleaning unit improves the permeation flux and operational stability. The modular structure provides strong engineering scalability and can support the systematic research and engineering development of ultrapermeation pumps.

This invention relates to the field of radiofrequency ablation power control and neurological safety monitoring technology, specifically a data processing system based on dynamic adjustment of radiofrequency plasma power. The system includes: a data acquisition module for real-time acquisition of multimodal input data streams, including instantaneous radiofrequency power, tissue impedance, local tissue surface temperature, and raw signal amplitudes from intraoperative neurophysiological monitoring; an interference identification module for determining interference identification markers; a thermal load estimation module for iteratively estimating the latent thermal load index; a safety verification module for calculating the neurological instability index; an optimal strategy generation module for calculating the optimal power strategy; a conflict detection module for determining model conflict markers; and a power adjustment module for determining the final power output. This invention prevents catastrophic surgical complications, ensures the integrity of biological nerves, and effectively avoids misjudgments caused by relying on only a single data source.

This invention belongs to the field of radio frequency plasma and large-aperture coating ion source (ICP) technology, specifically relating to a large-aperture radio frequency ion source structure with angle adjustment function, including a vacuum-side component and an atmospheric-side component; the side of the radio frequency source housing is rotatably connected to a rotating shaft disk, which is fixedly connected to a connecting box base; bolts passing through oblong holes fix the relative positions of the rotating shaft disk and the radio frequency source housing; a radio frequency coil is installed inside the radio frequency source housing. This solution utilizes the characteristic that radio frequency output cables are less likely to form ineffective feed sections in an atmospheric environment, and wiring is carried out through a connecting cavity (d) in the connecting box base, which belongs to the atmospheric-side environment. The radio frequency output cable is more exposed to the atmospheric environment and less exposed to the vacuum environment; the rotation of the radio frequency source housing is independent of the shape and length of the cable, reducing the formation of ineffective feed sections. The connecting box sealing cover and the connecting box base adopt an inclined installation structure, making operation more convenient; a compression fitting is used, which has a good high-temperature sealing effect.

This invention relates to the field of photomask manufacturing technology and discloses a method for chromium plating using gradient-doped pulsed sputtering photomasks. The method includes cleaning and drying a glass substrate; activating it with an argon-oxygen mixed gas and a radio frequency plasma source to expose active broken bonds on the surface; moving the substrate to a chromium-silicon alloy target; activating a pulsed DC sputtering power supply; and performing a nitrogen linear gradient gas inlet program to deposit a gradient-doped transition layer, constructing a transition band that slowly releases lattice deformation energy; switching to a pure chromium target in situ; co-sponging the pulsed DC and RF power supplies with phase-synchronized triggering modulation to deposit a pure chromium functional layer; bombarding the film surface with a low-energy RF gas using an argon-nitrogen mixed gas; and initiating an in-situ isothermal annealing program for furnace cooling; finally, continuous polishing to obtain the finished product. This invention alleviates lattice mismatch and thermal stress by constructing a compositionally continuous transition band and using dual-power modulated sputtering, thereby improving interfacial adhesion and coating density.

The utility model discloses a plasma high-efficiency processing device for semiconductor parts, which comprises a shell, a partition plate is arranged in the middle in the shell, a mounting rack is arranged on one side of the shell below the partition plate, a gas tank is fixedly mounted on the mounting rack, a fan is arranged on one side of the mounting rack, and a gas outlet is formed in the other side of the mounting rack. The air tank is communicated with the input end of the fan through a first pipeline, the output end of the fan extends to the position above the partition plate through a second pipeline to be communicated with the air outlet disc, a U-shaped supporting frame is arranged in the middle of the position above the partition plate, a motor is arranged in the middle of the lower end of the U-shaped supporting frame, and a rotating shaft of the motor is fixedly connected with the rotating disc. Two sets of symmetrical positioning assemblies are arranged above the rotating disc, and a radio frequency plasma generator is arranged at the bottom in the shell. The processing device is good in positioning effect, semiconductor parts of different sizes can be clamped, the plasma distribution uniformity is good, and the practicability of the processing device is effectively improved.

This invention relates to an enhanced inductively coupled radio frequency plasma discharge device. In this device, a feed post is mounted on the upper flange cover plate. A copper coil passes through the feed post and is fitted with a conical sealing ring and an insulating gasket. The lower end of the copper coil is placed inside a double-layered glass tube, which is pressed against the lower flange cover plate via a flange sealing groove. A PEEK rod is located outside the double-layered glass tube; its lower half passes through a magnet bracket base and is fixed to the lower flange cover plate, while its upper half passes through a through-hole in the upper flange cover plate and is fixed with a nut. The magnet is fixed to the base plate via the L-shaped magnet bracket, the magnet bracket base, and the lower flange cover plate. This invention provides a reference for solving a series of practical engineering problems related to effective radio frequency feed in a vacuum environment, effective heat removal from the discharge chamber, and simple and effective installation of an external multipole magnet. Furthermore, this device features a simple overall structure, modular layout, convenient installation, and easy operation.

This invention discloses a laminar plasma in-situ atomization powder production device and method. The device includes a coaxially integrated laminar radio frequency plasma torch and a supersonic laminar gas atomizing nozzle. A metal wire is vertically fed into the core of the radio frequency plasma torch along its axial center. The end of the wire melts instantaneously without crucible constraint. The resulting melt is then sheared and broken by the supersonic laminar inert gas surrounding the outer ring of the plasma torch outlet, achieving in-situ powder production with simultaneous melting and atomization. This invention integrates plasma heating and melting with supersonic gas atomization within the same coaxial nozzle, eliminating the risk of crucible material contamination, avoiding component segregation problems during the smelting of refractory metals and refractory high-entropy alloys, significantly improving the yield of fine powder, and effectively suppressing the formation of satellite powder. It is suitable for the efficient and high-purity preparation of spherical powders of high-melting-point metals such as tungsten, molybdenum, tantalum, niobium, and rhenium, as well as their multi-component high-entropy alloys.

The application discloses a disposable radio frequency plasma electrode hook-knife structure. It comprises a handle, a radio frequency plasma main machine connecting wire arranged on the handle, a knife body, one end of the knife body being detachably connected with the handle, the other end of the knife body being provided with a knife head, and the knife body being electrically connected with the radio frequency plasma main machine connecting wire. The application has the advantages of improving cutting efficiency, improving operation efficiency, avoiding cross infection caused by repeated use, avoiding the problem of reduced cutting efficiency of the hook-knife after repeated use, being easy to popularize, improving the use flexibility of the electrode hook-knife, being simple to operate and convenient to control, improving operation safety, and improving operation convenience.

This application discloses a data update method for radio frequency (RF) power supplies, an RF power supply, and an RF plasma power supply system. The data update method is used to update the data of multiple RF power supplies and includes the following steps: acquiring the same data to be updated synchronously by multiple RF power supplies; establishing a connection between a server and multiple RF power supplies, and simultaneously transmitting the same data to be updated to the memory of multiple RF power supplies using a fast transfer port; each RF power supply, based on the data to be updated, synchronously updating the same data of multiple RF power supplies. This application achieves synchronous updates of the same data of multiple RF power supplies by acquiring the same data to be updated synchronously by multiple RF power supplies, establishing a connection between a server and multiple RF power supplies, and simultaneously transmitting the same data to be updated to the memory of multiple RF power supplies using a fast transfer port. This eliminates the need for repetitive operations when multiple RF power supplies need to update the same data.

The application belongs to the field of biomedical metal materials, and discloses a high-quality medical Ta-xTi alloy powder for additive manufacturing and a preparation method thereof. The powder is composed of titanium powder, tantalum powder, tantalum-doped titanium nitride coated amorphous carbon nanoshell, yttrium-stabilized zirconium coated mesoporous silica nanoparticles and stearic acid in a specific weight ratio. In the preparation process, first, nanometer tantalum powder and two modified compounds are uniformly adsorbed on the surface of micron-sized titanium powder through electrostatic self-assembly technology to form a core-shell structure composite powder; then, the composite powder is spheroidized by radio frequency plasma, and finally, high-quality alloy powder with high sphericity and good fluidity is obtained. The method solves the problems of composition segregation and unmelted particles of high-melting-point tantalum and titanium in the laser selective melting forming process, and at the same time, the method endows the material with lower elastic modulus and enhanced biological activity and antibacterial performance, and is particularly suitable for manufacturing high-performance customized bone implants.

The present application relates to a DNA drug, a gene targeting delivery system and its application in the treatment of lower extremity peripheral arterial disease. Specifically, the present application relates to a microcrystalline nanocarbon targeted drug delivery system and a plasmid containing human interleukin-4 gene loaded thereon. The delivery system comprises a matrix microcrystalline nanocarbon, and folate, polyethyleneimine and polyethylene glycol modified on the surface thereof. The matrix microcrystalline nanocarbon has a size of 5-20 nanometers, a crystallinity of >80%, a rich mesoporous structure, a high specific surface area and good biocompatibility. The present application also provides a preparation method of the system, which comprises the steps of synthesizing a matrix by pulse modulation radio frequency plasma enhanced chemical vapor deposition, surface functionalization modification and plasmid loading. After injection into the lower extremity muscle, the system can actively target the macrophages in the ischemic site, realize long-term expression of the IL-4 gene at the lesion site. It can effectively promote stable, mature functional angiogenesis by inducing macrophages to polarize to the repair M2 phenotype and regulating the OSM / GSNOR / ENG signal axis, thereby improving limb ischemia. The present application has important application value in the field of gene therapy for ischemic diseases, especially peripheral arterial disease and severe limb ischemia.

This application discloses a data update method for an RF power supply, an RF power supply, and an RF plasma power supply system. The data update method includes the following steps: identifying one or more functional components in the RF power supply that require data updates; acquiring update data corresponding to the one or more functional components; optimizing the update data to reduce the computational load and data processing volume per unit time required for data updates; rewriting the original data in the one or more functional components based on the optimized update data; and / or adding update data corresponding to the one or more functional components based on the update data. This application shortens the update time of the RF power supply and improves its update efficiency by first identifying the functional components that need updating, then acquiring the update data, and optimizing the update data.

This application discloses a data update method for an RF power supply, an RF power supply, and an RF plasma power supply system. The data update method includes the following steps: determining one or more functional components in the RF power supply that need data updating; acquiring update data corresponding to the one or more functional components; rewriting the original data in the one or more functional components based on the update data; and / or, adding update data corresponding to the one or more functional components based on the update data. This application achieves selective data updating by first determining the functional components that need updating and then acquiring the update data, allowing updates to be performed only on the functional components that need updating, rather than updating all functional components of the RF power supply. This improves update efficiency and saves resources.

The application belongs to the technical field of metal powder preparation, and particularly relates to high-purity rhenium powder and a preparation method thereof. The high volatility of rhenium oxide is utilized, efficient volatilization of rhenium oxide is realized under vacuum conditions, and the high activity of hydrogen radio frequency plasma is utilized to rapidly and completely reduce the rhenium oxide vapor into high-purity rhenium powder, so that the reduction reaction efficiency is significantly improved, efficient and clean preparation of rhenium powder is realized, the problem of impurity introduction in the traditional reduction method can be avoided, and the product purity and particle size can meet the application requirement of high-end fields.

A sensing device for monitoring electromagnetic radiation emanating from a plasma processing system. The sensing device may, for example, comprise at least two of a first probe for detecting a time varying RF electric field, a second probe for detecting a time varying RF magnetic field, and an optical probe for detecting the modulated light emission. The sensing device may, for example, further comprise a signal processing unit configured to receive a signal from each probe and to monitor the electromagnetic radiation with respect to only a single frequency of each signal.

This invention discloses a dielectric barrier discharge plasma-enhanced modified SmMnCo denitrification catalyst and its preparation method, belonging to the field of air pollution control, for the efficient degradation of NO. The catalyst uses Sm as the main active component and Mn and Co as auxiliary agents, and is prepared by co-precipitation combined with radio frequency plasma activation: Mn(NO3)2·4H2O, Sm(NO3)3·6H2O, Co(NO3)2·6H2O, and Co(NO3)2·6H2O are dissolved and then co-dropped with a stabilizer solution into a Na2CO3 precipitant solution (pH=10±0.2) at a rate of 1 mL / min; the mixture is aged in a 60℃ water bath with stirring for 12 h, centrifuged and washed until neutral, dispersed in anhydrous ethanol, stirred, centrifuged, and dried to obtain the precursor; then treated in a nitrogen atmosphere radio frequency plasma (100 W, 40 min) to obtain the final product. Characterization showed that dielectric barrier discharge plasma activation successfully constructed a layered double hydroxide (LDH) precursor with reduced crystallinity and significantly increased specific surface area and acidic sites, which is suitable for the wide-temperature reaction requirements of C3H6-SCR. At the same time, it inhibited particle sintering and agglomeration, maintained the thin-plate morphology and surface uniformity, promoted the uniform exposure of active sites, and improved denitrification performance.

The present application belongs to the technical field of porous metal preparation, and more particularly relates to a dealloying method, a porous metal preparation method and a system. A radio frequency power is applied to an alloy precursor to make a protective gas discharge form an atmospheric pressure radio frequency plasma, and the alloy precursor is dealloyed by the atmospheric pressure radio frequency plasma. During the dealloying process, on the one hand, the alloy precursor is rapidly heated by the atmospheric pressure radio frequency plasma to cause non-equilibrium melting of the alloy precursor, so that the alloy is in a solid-liquid coexisting state; on the other hand, the strong electric field generated by the plasma sheath on the surface of the alloy precursor separates the melted part of the alloy precursor from the alloy precursor, so that the alloy is dealloyed, and a porous metal is prepared. The method is simple and easy to implement, time-saving and efficient, has low equipment cost, and can be processed on a large scale.

This invention relates to the field of thin film material preparation technology, specifically to a method for preparing a single-crystal transition metal nitride epitaxial thin film with an anti-perovskite structure. In a molecular beam epitaxy (MBE) apparatus, after heating the single-crystal substrate, a transition metal atom beam and an active nitrogen atom beam generated by a radio frequency plasma source are supplied simultaneously and independently. By precisely controlling the beam ratio, growth is kept within a narrow stoichiometric window. During growth, in-situ real-time monitoring is performed using reflective high-energy electron diffraction to ensure the film grows in a two-dimensional layered manner. Finally, the film is slowly cooled in an active nitrogen atmosphere. This method can prepare single-crystal thin films with atomically flat surfaces, high phase purity, excellent crystallinity, and a clear epitaxial relationship, exhibiting fewer nitrogen vacancy defects and significantly optimized magnetic and other physical properties.

This invention provides a molybdenum-chromium-tin-aluminum master alloy, its preparation method, and its applications. The master alloy comprises the following components in the indicated mass percentages: Mo: 24%-30%, Cr: 24%-30%, Sn: 10%-16%, Al: 30%-36%, and unavoidable impurities. The master alloy has a melting point of 1330℃-1350℃ and a density of 4.80 g·cm³. ‑3 -5.00 g·cm ‑3 The particle size D90 is 0.010mm-0.050mm. This molybdenum-chromium-tin-aluminum master alloy is prepared using a one-step method combined with radio frequency plasma spheroidization technology. It exhibits accurate chemical composition, high purity, uniform particle size, minimal elemental segregation, and low impurity content. This molybdenum-chromium-tin-aluminum master alloy shows promising application prospects and large-scale promotion potential in the TC17 titanium alloy field.

The application relates to a surface strengthening treatment process of a semiconductor wafer and belongs to the technical field of wafer treatment. First, ozone water is used in cooperation with ultrasonic cleaning, organic pollutants are decomposed through the strong oxidizability of ozone, inorganic particulate matters are removed through ultrasonic cavitation effect, double purification is realized, and an inert atmosphere is constructed by using nitrogen blowing, so that an atomic-level clean substrate is provided for subsequent processes; second, vacuum laser shallow layer repair is carried out, quasi-molecular laser is used to induce lattice rearrangement, microcracks are eliminated, surface roughness and hardness are improved, and thermal stress deformation is avoided; subsequently, radio frequency plasma chemical vapor deposition technology is used to form a high-density amorphous silicon nitride barrier layer, so that the penetration of alkali metal ions is effectively blocked; finally, methane plasma treatment is carried out to introduce methylsilane, a dynamic cross-linking structure is formed, scratch self-repair is realized, the surface hardness after repair is improved, and the scratch resistance of the wafer is improved.

This invention provides a molybdenum-vanadium-aluminum-chromium-iron master alloy, its preparation method, and its applications. The master alloy comprises the following components in the indicated mass percentages: Mo: 27%-34%, V: 24%-30%, Al: 24%-36%, Cr: 3%-8%, Fe: 4%-8%, and unavoidable impurities. The master alloy has a melting point of 1500℃-1520℃ and a density of 4.90 g·cm³. ‑3 -5.00 g·cm ‑3 The particle size D90 is 0.010mm-0.050mm. The molybdenum-vanadium-aluminum-chromium-iron master alloy of this invention is prepared by a one-step method + radio frequency plasma spheroidization technology. It has uniform composition and particle size, small elemental segregation and low impurity content, which can effectively reduce ingot segregation generated during titanium alloy smelting. This master alloy has good application prospects and large-scale promotion potential in the field of TC18 titanium alloy.

This invention relates to the field of fiber preparation technology and discloses a highly efficient method for preparing flame-retardant monofilaments. The method includes: surface activation of a polyamide matrix using radio frequency plasma to directionally introduce carboxyl functional groups; surface grafting modification of a composite flame-retardant masterbatch using a silane coupling agent to construct an interfacial transition layer; controlling the moisture content of the raw materials using a microwave-airflow combined drying system; achieving a gradient distribution of the flame retardant using a dual-channel spinning assembly; synergistically dispersing the nano-reinforcing phase and the flame retardant to construct a three-dimensional network structure, and forming nascent monofilaments using the spinning assembly; controlling the crystal structure through two-stage stretching involving wetting pre-orientation and dry heat main orientation; and stabilizing the fiber structure using a segmented temperature-controlled thermal relaxation process to obtain a finished monofilament product with flame-retardant properties. This invention achieves efficient and continuous production of flame-retardant monofilaments through the synergistic effect of plasma activation, gradient spinning, and staged orientation.

The application provides a preparation method of nano calcium carbonate for electronic glue, and the steps are as follows: S1, diluting calcium hydroxide slurry with deionized water to obtain lime milk diluent, and adjusting the pH to 11.5-12.5; S2, pumping the lime milk diluent into a carbonization kettle, adding a composite crystal type regulating dispersant, and performing two-stage carbonization under stirring to obtain nano calcium carbonate slurry; S3, dehydrating, drying, crushing and grading the nano calcium carbonate slurry to obtain nano calcium carbonate dry powder; S4, performing radio frequency plasma surface activation modification treatment on the nano calcium carbonate dry powder; S5, dispersing the activated nano calcium carbonate dry powder in deionized water, adding zinc stearate, gamma-aminopropyl triethoxysilane and a reactive hyperbranched modifier to perform surface modification; and S6, dehydrating, drying, crushing and grading the modified slurry to obtain a finished product. The nano calcium carbonate for electronic glue provided by the application has good dispersion stability, and can effectively improve the mechanical properties, dielectric properties and storage stability of electronic glue.

This application discloses a post-processing technology and apparatus for ViGa gas atomization powder production. The process employs a four-step synergistic treatment: graded pre-separation, plasma desorption, vibration densification, and cooling shaping. First, a three-stage airflow classifier removes free fine powder. Then, radio frequency plasma bombardment desorbs attached satellite spheres and melts irregular protrusions on the powder surface. The powder is then densified and residual satellite spheres are removed via an ultrasonically vibrating fluidized bed. Finally, rapid cooling with inert gas shapes and fixes the spherical morphology. The apparatus integrates a feeding system, a grading module, a plasma module, a vibration module, a cooling module, and a control system, enabling precise control of process parameters. This application reduces the satellite sphere content in the powder to below 5%, increases sphericity to above 0.95, achieves a Hall flow rate ≤25s / 50g, a powder deformation rate <2%, and a single-batch energy consumption <200kW·h / ton. It is compatible with various ViGa gas atomization powders and solves the problems existing in the prior art.

The utility model discloses a radio frequency plasma operation electrode, including proximal handle, far end cutter head, the cutter bar of connecting proximal handle and far end cutter head, cable connector, cable connector is connected with the wire in proximal handle, be equipped with damping adjusting mechanism in proximal handle, and damping adjusting mechanism is connected with the bending piece of far end cutter head through at least one traction line, and the other end is fixed in the wire bundling hole of wire bundling disc, and the displacement of traction line is controlled by damping adjusting mechanism to drive the bending part to realize the multi -angle dynamic adjustment of far end cutter head in operation. Through the operation of spanner on handle, and through the damping block and traction line to the bending piece bending and pull, thereby can be convenient to the bending angle of electrode head and carry out accurate control, ensure that electrode head can according to the comfortable adjustment of operation demand, especially suitable for complex cavity environment and the operation direction and area of limited, help to realize ideal operation wound surface contact and operation.