The invention relates to an
impedance matching method of a pulse RF power supply and a matching method of
plasma equipment. The
impedance matching method of the pulse RF power supply comprises a step of (S1) setting an impedance adjusting element at a preset value and setting the
pulse frequency of the pulse RF power supply as a preset
pulse frequency, (S2) judging whether the preset
pulse frequency is larger than a pulse threshold frequency or not, and going to (S3) if so, (S3) allowing the pulse frequency of the RF power supply to be equal to the pulse threshold frequency, starting the pulse RF power supply, realizing sweep
frequency matching under an automatic RF sweep
frequency function, and switching the pulse frequency of the pulse RF power supply as a preset pulse frequency after matching, (S4) starting the pulse RF power supply, and realizing sweep
frequency matching under the automatic RF sweep
frequency function. According to the
impedance matching method of the pulse RF power supply, the difficulty of realizing impedance matching by the RF power supply can be reduced, thus the matching precision and matching stability of the pulse RF power supply can be improved, and thus the stability of the process is improved.