62 results about "Pulsed radiofrequency" patented technology

Embodiments of the disclosure provide a method that includes delivering a pulsed radio frequency (RF) signal from a source RF generator to an electrode of a processing chamber. A plasma is formed in a processing region of the processing chamber based on the pulsed RF signal. The plasma is disposed between the electrode and a substrate. The pulsed RF signal is caused to have a duty cycle in a range of 5 to 15 percent. The pulsed RF signal is caused to have an off-time in a range of 50 to 250 microseconds. A first material is deposited on a second material of the substrate and a third material of the substrate based on the duty cycle and the off-time.

A plasma processing apparatus includes: a chamber; a substrate support including a RF electrode; a first RF power supply for generating a first pulsed RF signal; a second RF power supply for generating a second pulsed RF signal; a Vpp detector for detecting a bias Vpp value between the second RF power supply and the RF electrode; and a controller for executing: setting at least two power levels of each of the first pulsed RF signal and the second pulsed RF signal; determining plurality of phases in one pulse cycle; setting a bias Vpp target value in at least one of the plurality of phases; acquiring a representative value of the bias Vpp value in each phase; and adjusting the power level of at least one of the first or second pulsed RF signal in at least one selected phase so that the representative value reaches the target value.

The invention provides an impedance matching method, an impedance matching device, radio frequency power supply equipment and a storage medium, the impedance matching method is used for performing impedance matching on a radio frequency source and a load, and the radio frequency source is used for outputting pulse radio frequency electric energy. The impedance matching method comprises the step of performing impedance matching on a radio frequency source and a load at each high level stage of pulse radio frequency electric energy. And determining a target working frequency of the radio frequency source in each low-level stage of the pulse radio frequency electric energy. And in each low-level stage of the pulse radio frequency electric energy, adjusting the working frequency of the radio frequency source to be the target working frequency so as to perform impedance matching on the radio frequency source and the load in each low-level stage of the pulse radio frequency electric energy. Impedance matching can be realized when pulse radio frequency electric energy is output.

Systems and methods for pulsing radio frequency (RF) coils are described. One of the methods includes supplying a first RF signal to a first impedance matching circuit coupled to a first RF coil, supplying a second RF signal to a second impedance matching circuit coupled to a second RF coil, and pulsing the first RF signal between a first parameter level and a second parameter level. The method includes pulsing the second RF signal between a third parameter level and a fourth parameter level in reverse synchronization with the pulsing of the first RF signal.

A power generator has a first plurality of power amplifiers each configured to receive a first common supply voltage and output a plurality of discrete DC voltages. At least one of the plurality of discrete DC voltages may be varied by varying the first common supply voltage. The radio frequency power generator may also include a second plurality of power amplifiers that receive a second common supply voltage different from the first supply voltage or a different supply voltage. At least one discrete DC voltage of the plurality of discrete DC voltages may be varied by varying the second common supply voltage or a different supply voltage. The outputs of each power amplifier are superimposed in series to generate an output voltage for the power generator. One of the plurality of power amplifiers is activated or deactivated at a first time, while another of the plurality of power amplifiers is activated or deactivated at a second time.

Embodiments of this disclosure generally relate to systems used in semiconductor device manufacturing processes. [Solution] Embodiments provided herein generally include apparatus and methods for synchronizing and controlling the supply of RF bias voltage signals and pulsed voltage waveforms to one or more electrodes inside a plasma processing chamber. Embodiments of the Disclosure include methods and apparatus for synchronizing a pulsed radio frequency (RF) waveform with a pulsed voltage (PV) waveform so that the pulsed RF waveform is turned on during a first stage of the PV waveform and turned off during a second stage. The first stage of the PV waveform includes a sheath collapse stage. The second stage of the PV waveform includes an ion current stage.

The invention discloses a broadband radar distance extension target detection method and device, a terminal and a medium, and relates to the technical field of radar signal processing, and the method comprises the steps: obtaining each linear frequency modulation pulse radio frequency signal transmitted by a radar; in a walking and stopping mode, performing pulse compression on each linear frequency modulation pulse radio frequency signal by adopting pulse dechirp processing, and determining each dechirp processing signal; coherent energy accumulation is carried out according to the dechirp processing signals, and coherent accumulation signals are determined; converting the coherent accumulation signal to a frequency domain, and determining a dechirp pulse amplitude spectrum; and performing target detection according to the dechirp pulse amplitude spectrum, and determining a target detection result. According to the method, pulse dechirp processing and coherent energy accumulation are carried out on each received linear frequency modulation pulse radio frequency signal to obtain a coherent accumulation signal for subsequent target detection, so that the problem that in the prior art, when the signal-to-noise ratio is reduced, better anti-noise performance is difficult to realize with smaller calculation amount can be effectively solved.

The invention provides an impedance matcher, radio frequency power supply equipment and a radio frequency power supply system, and relates to the technical field of radio frequency. The impedance matcher comprises a series connection matching module, a first parallel connection matching module and a second parallel connection matching module. The series matching module is connected between the radio frequency source and the load. The first parallel matching module is selectively connected or disconnected with the first connection point, the first connection point is a connection point between the radio frequency source and the load, and the first parallel matching module is used for being connected with the first connection point at each high level stage of the pulse radio frequency electric energy and being matched with the series matching module to carry out impedance matching on the radio frequency source and the load. And the second parallel matching module is selectively connected or disconnected with the first connection point, and the second parallel matching module is used for being connected with the first connection point at each low level stage of the pulse radio frequency electric energy and being matched with the series matching module to carry out impedance matching on the radio frequency source and the load. Impedance matching can be realized when pulse radio frequency electric energy is output.

Embodiments of the disclosure provide a method that includes delivering a pulsed radio frequency (RF) signal from a source RF generator to an electrode of a processing chamber. A plasma is formed in a processing region of the processing chamber based on the pulsed RF signal. The plasma is disposed between the electrode and a substrate. The pulsed RF signal is caused to have a duty cycle in a range of 5 to 15 percent. The pulsed RF signal is caused to have an off-time in a range of 50 to 250 microseconds. A first material is deposited on a second material of the substrate and a third material of the substrate based on the duty cycle and the off-time.

Disclosed herein is a system and method for delivering pulsed RF power from a single generator to multiple loads in semiconductor manufacturing processes. Using a Single-Pole Multi-Throw (SPMT) switch, the controller dynamically selects a load in real time to receive one or a group of pulses. Each pulse is configurable with distinct RF power, frequency, and duration, enabling precise and flexible power allocation to components such as plasma source coils, zonal electrostatic chucks, or multiple reactors.

This disclosure provides an automatic cavity radio frequency voltage recovery system and method. The automatic cavity radio frequency voltage recovery system includes a low-level device, a power source, a high-frequency cavity, and a programmable control module. The low-level device is used to control the amplitude stabilization, phase stabilization, and frequency tuning of the radio frequency signal, monitor the pulsed and continuous radio frequency voltages of the high-frequency cavity, monitor the normal signal of the interlocking condition, and switch the output mode of the radio frequency signal. The power source is used to amplify the radio frequency signal input from the low-level device and feed it into the high-frequency cavity, and provide a normal power source signal. The high-frequency cavity is used to resonate the radio frequency power fed by the power source, establish a radio frequency electric field, and adjust the frequency of the high-frequency cavity through a fine-tuning loop. The programmable control module is used to restore the radio frequency voltage of the high-frequency cavity based on the control of the fine-tuning loop by the low-level device after the radio frequency voltage of the high-frequency cavity drops to zero. This automatic cavity radio frequency voltage recovery system and method can quickly achieve automatic recovery of the cavity radio frequency voltage.

This invention proposes a nano-transparent semiconductor electrothermal structure, its fabrication method, and a semiconductor electrothermal module. The nano-transparent semiconductor electrothermal structure comprises, from bottom to top, a first insulating layer, a substrate, an electrothermal layer, a second insulating layer, and electrodes. Both the first and second insulating layers are nanoscale insulating films formed by pulsed radio frequency synergistic physical vapor deposition of hexagonal boron nitride. The first insulating layer is formed on the back side of the substrate, and the second insulating layer is formed above the electrothermal layer. The electrothermal layer is a nanoscale electrothermal conversion film formed by aluminum-doped zinc oxide, tin-doped indium oxide, and fluorine-doped tin oxide containing yttrium trioxide. At least one of tantalum, beryllium, and niobium is embedded in the lattice gaps of the electrothermal layer. The electrothermal layer is used for electrothermal conversion when energized. Electrodes are disposed on both sides of the electrothermal layer, and the electrodes are in contact with the electrothermal layer and connected to a power source. This invention adds a first insulating layer to the back of the substrate, which, together with the second insulating layer above the heating layer, forms a double-sided hexagonal boron nitride insulating protection structure. This effectively blocks leakage paths on the back of the substrate, improving safety. At the same time, the double-sided high thermal conductivity insulating layers balance the thermal resistance on both sides of the substrate, improving heating uniformity. The two equal-thickness thin films ensure symmetrical stress on both sides of the substrate, preventing warping and deformation. The heating layer uses pulsed radio frequency synergistic physical vapor deposition to improve film uniformity. Moreover, the use of hybrid deposition reduces the indium content while still achieving a better-performing heating layer.

The invention provides a radio frequency power supply device and a radio frequency power supply system. The radio frequency power supply device comprises a radio frequency source, a waveform shaping unit, a first matching unit and a second matching unit. The radio frequency source is used for outputting initial radio frequency electric energy. And the waveform shaping unit is used for alternately conducting and disconnecting at a preset period so as to shape the waveform of the initial radio frequency electric energy to obtain pulse radio frequency electric energy, and outputting the pulse radio frequency electric energy to a load. The first matching unit is selectively connected or disconnected with the first connection point, the first connection point is a connection point between the radio frequency source and the waveform shaping unit, and the first matching unit is used for being connected with the first connection point when the waveform shaping unit is disconnected. The second matching unit is selectively connected or disconnected with the second connecting point, the second connecting point is a connecting point between the waveform shaping unit and the load, and the second matching unit is used for being connected with the second connecting point when the waveform shaping unit is disconnected. Impedance matching can be realized when pulse radio frequency electric energy is output.

The application relates to a capacity calculation method and circuit applied to a low-power Cat1 gateway lithium sulfochloride battery, which comprises the following steps: collecting a sampling resistor voltage signal on a lithium sulfochloride battery power supply circuit at a set frequency and carrying out amplification processing, and recording the amplified voltage signal; charging a reference capacitor in an integration circuit using the amplified voltage signal and recording voltage variation of the reference capacitor to obtain a voltage variation curve segment; calculating power consumption in the collection period based on the voltage variation curve segment, recording the single-time power consumption; and carrying out difference calculation to obtain the residual power of the low-power Cat1 gateway lithium sulfochloride battery. The capacity calculation method and circuit applied to the low-power Cat1 gateway lithium sulfochloride battery disclosed by the application can convert aperiodic high-pulse radio frequency current into a smooth slope voltage, carry out impedance conversion and fast collection, and detect the power to obtain the accurate power of the lithium sulfochloride battery.

Provided is a plasma processing method capable of achieving flat etching process while suppressing vertical etching.The plasma processing method for plasma-etching a titanium nitride (TiN) film that forms a metal gate and contacts an insulating film on both sides includes the step of etching the titanium nitride (TiN) film by using plasmas that are generated by using a mixed gas of boron trichloride (BCl3) gas, nitrogen (N2) gas, and nitrogen trifluoride (NF3) gas and are generated by radio-frequency power modulated by a pulse, wherein the pulse has a first period with a first amplitude as its amplitude and a second period with a second amplitude as its amplitude and wherein the second amplitude is greater than 0 and less than the first amplitude.

A system for RF based frequency encoding utilizing a Bloch-Siegert shift, includes a controller, an RF encoding system, and an injection transformer simultaneous transmit and receive filter. The controller generates RF excitation pulses, RF based frequency encoding pulses, and a cancellation signal. The RF encoding system includes one or more RF coils configured to transmit the RF excitation pulses and RF based frequency encoding pulses, and to receive an MR signal from the subject where the MR signal includes a leakage signal induced by the RF based frequency encoding pulses. The injection transformer simultaneous transmit and receive filter is in signal communication with the controller and the RF encoding system. The injection transformer simultaneous transmit receive filter is configured to receive the cancellation signal, the MR signal including the leakage signal, and to cancel the leakage signal from the received MR signal to generate a filtered MR signal.

The invention relates to the technical field of silicon nitride etching, in particular to an ultra-low power dry etching method for silicon nitride, which comprises the following steps of: S1, fixing a workpiece to be etched on a chuck of a plasma etching machine, closing a cavity, and vacuumizing until the background pressure of the cavity is less than or equal to 2mTorr; s2, composite etching gas is introduced into the cavity; s3, starting a pulse radio frequency power supply to excite the composite gas to generate plasma; s4, regulating and controlling parameters of the chamber; s5, vacuumizing after etching is completed, and then introducing helium gas to purge the chamber until the pressure of the chamber is recovered to atmospheric pressure; s6, mixed gas is introduced, H2 plasma is introduced after ashing treatment, and etching is completed after dangling bonds on the surface of the silicon nitride are repaired. The invention discloses a method for dry etching of silicon nitride with extremely low power, and relates to the technical field of semiconductor manufacturing. According to the method, high-efficiency, high-selectivity and low-damage etching of the silicon nitride layer is realized under the extremely low radio frequency power through the collaborative design of composite gas system accurate proportioning, pulse radio frequency excitation and multi-field coupling process regulation and control.

Disclosed herein is a system and method for delivering pulsed RF power from multiple generators to a load in semiconductor manufacturing processes. The system employs a Multi-Pole Single-Throw (MPST) switch controlled by a controller that coordinates pulse generation timing across the generators. Latencies between pulse generation and switching for each generator are calibrated to a common clock to ensure precise synchronization. Delay elements can be introduced to place precisely each pulse from different generators into a mater pulse train. Additionally, a tailored waveform generator may be incorporated, particularly in providing bias voltage for an electrostatic chuck.

A plasma processing apparatus including a plasma processing chamber, a substrate support that is provided in the plasma processing chamber and on which a substrate is placed, a gas supply for supplying a processing gas to the plasma processing chamber, an RF power source for supplying pulsed RF power to the plasma processing chamber and / or the substrate support, and forming plasma from the processing gas, and a circuitry for controlling the supply of the pulsed RF power, in which the control device controls the RF power source such that an increasing function of a power level from a supply starting point of the pulsed RF power to a peak appearing point is a downward convex function, and / or a decreasing function of a power level from a peak ending point of the pulsed RF power to a supply ending point is a downward convex function.

The invention discloses a radio frequency assisted freezing system which comprises a radio frequency generation module, a radio frequency processing module, a low-temperature freezing module and an optical fiber temperature measurement module, the radio frequency generation module can provide stable pulse radio frequency signals and comprises a radio frequency generator, a relay pulse generator and an impedance matcher, and the relay pulse generator and the impedance matcher are electrically connected with the radio frequency generator. The radio frequency processing module is used for providing a radio frequency action space for food and comprises a radio frequency processing device, the low-temperature freezing module can provide freezing cooling capacity for the system and comprises a low-temperature refrigerator, the impedance matcher and the radio frequency processing device are arranged in the low-temperature refrigerator, and the optical fiber temperature measuring module is arranged on the outer side of the low-temperature refrigerator; and the optical fiber temperature measurement module is used for accurately monitoring the food temperature. Through the synergistic effect of the radio frequency field and low-temperature freezing, the crystallization process of water molecules in the food can be effectively interfered, the food is promoted to generate an obvious supercooling phenomenon, a large number of ice nucleuses are formed at the temperature lower than the freezing point in an explosive mode finally, and the final quality of the frozen food is greatly improved.

The embodiment of the invention provides a cerebral blood flow synchronous array coil system and a cerebral blood flow detection method, and belongs to the technical field of magnetic resonance imaging. The device comprises a controller, a radio frequency power amplifier, a neck coil, a signal source and a coil connector, the controller is used for receiving a first enable signal generated by the MRI equipment cabinet, generating a second enable signal and triggering the neck coil and the matched radio frequency power amplifier to synchronously enter a working state; the signal source is used for providing a second radio frequency pulse; after receiving the second enable signal, the radio frequency power amplifier enters a working state, amplifies a second radio frequency pulse and sends the amplified second radio frequency pulse to the neck coil; the neck coil receives the second radio frequency pulse and is used for applying a pulse signal to a neck area and receiving a second enable signal to enter a working state; the coil connector is used for signal transmission between execution components. According to the embodiment, the accuracy and efficiency of cerebral blood flow detection of the experimental subject can be improved.

The invention relates to a vascular intervention radio-frequency pulse ablation operation system, and relates to the technical field of medical instruments. The vascular intervention radio frequency pulse ablation operation system comprises an outer sleeve, an inner tube, a guide wire and a pulse radio frequency generating element, the outer sleeve is arranged on the inner tube in a sliding and sleeving mode, and the guide wire penetrates through the inner tube in a sliding mode; an operating handle is fixedly arranged at one end of the outer sleeve; one end of the inner tube is sleeved with an elastic balloon capable of extending out of the other end of the outer sleeve, and the surface of the elastic balloon is coated with a silver paste electrode electrically connected with the pulse radio frequency generation element; a deflection guide head is arranged at the end, close to the elastic balloon, of the guide wire and can deflect and swing when encountering resistance. Through the design of the deflection guide head, the guide wire can deflect and swing when encountering resistance, the navigation capacity of the guide wire in a complex small blood vessel is improved, and the risk of damage to the inner wall of the blood vessel is reduced. The silver paste electrode coated on the surface of the elastic balloon realizes efficient and uniform ablation of plaques, and the treatment effect is improved.

Methods and devices for reducing inflammation by reducing pro-inflammatory cytokines molecules and increasing anti-inflammatory signaling molecules in a mammal are provided. A device can include a power supply; an amplifier; an antenna, and a waveform generator. The one or more signals can have an aperiodic continuous waveform function or an aperiodic pulse train that reduces inflammation, reduce pro-inflammatory cytokines molecules, and / or increases anti-inflammatory signaling molecules in a mammal.

This invention relates to the field of silicon nitride etching technology, specifically a method for dry etching of silicon nitride using extremely low power, comprising the following steps: S1. Fixing the workpiece to be etched on the chuck of a plasma etching machine, closing the chamber, and evacuating to a chamber background pressure ≤2mTorr; S2. Introducing a composite etching gas into the chamber; S3. Starting a pulsed radio frequency power supply to excite the composite gas to generate plasma; S4. Adjusting various parameters of the chamber; S5. After etching is completed, evacuating the chamber, then introducing helium gas to purge the chamber until the chamber pressure returns to atmospheric pressure; S6. Introducing a mixed gas, ashing treatment, and then introducing H2 plasma to repair dangling bonds on the silicon nitride surface to complete the etching. This invention discloses a method for dry etching of silicon nitride using extremely low power, relating to the field of semiconductor manufacturing technology. This method, through the synergistic design of "precisely proportioned composite gas system + pulsed radio frequency excitation + multi-field coupling process control," achieves efficient, highly selective, and low-damage etching of silicon nitride layers at extremely low radio frequency power.

Embodiments of the present disclosure generally relate to a system used in a semiconductor device manufacturing process. More specifically, embodiments provided herein generally include apparatus and methods for synchronizing and controlling the delivery of an RF bias voltage signal and a pulsed voltage waveform to one or more electrodes within a plasma processing chamber. Embodiments of the disclosure include a method and apparatus for synchronizing a pulsed radio frequency (RF) waveform to a pulsed voltage (PV) waveform, such that the pulsed RF waveform is on during a first stage of the PV waveform and off during a second stage. The first stage of the PV waveform includes a sheath collapse stage. The second stage of the PV waveform includes an ion current stage.

The invention provides a harmonic wave processing method and a related device, the harmonic wave processing method is applied to a harmonic wave processing device with a harmonic wave processing unit, and the harmonic wave processing method is used for filtering target harmonic waves in pulse radio frequency electric energy through the harmonic wave processing unit connected to a transmission path of the pulse radio frequency electric energy. The harmonic wave processing method comprises the following steps: acquiring waveform parameters of pulse radio frequency electric energy; and determining the waveform parameter of the target harmonic wave according to the waveform parameter of the pulse radio frequency electric energy. And controlling and adjusting the filtering parameter of the harmonic processing unit to correspond to the waveform parameter of the target harmonic so as to filter out the target harmonic in the pulse radio frequency electric energy. According to the invention, the target harmonic wave in the pulse radio frequency electric energy can be filtered.

A control method for an energy-based surgical instrument includes activating a combined radio frequency (RF) and ultrasound operation, which may be a sealing operation or a sealing and transection operation. The sealing operation includes activating a pulsed RF operation with an ultrasound sealing operation between pulses of the RF operation. A control method for the energy-based surgical instrument includes determining whether an ultrasonic blade of the surgical instrument contacts a tissue pad of the surgical instrument and, if so, allowing ultrasonic energy delivery at a reduced energy level or preventing ultrasonic energy delivery. Other embodiments are described and claimed.

A system and method for pulsing radio frequency (RF) coils. [Solution] One method includes supplying a first RF signal to a first impedance matching circuit coupled to a first RF coil, supplying a second RF signal to a second impedance matching circuit coupled to a second RF coil, and pulsing the first RF signal between a first parameter level and a second parameter level. The method also includes pulsing the second RF signal between a third parameter level and a fourth parameter level in reverse synchronization with the pulsing of the first RF signal.

The present invention discloses a variable-rate radio frequency pulse design method for sodium magnetic resonance imaging. In response to the requirement for radio frequency pulses to reduce the radio frequency special absorption rate (SAR) value and pulse duration in sodium magnetic resonance imaging, when the pulse duration remains unchanged, the SAR value of the variable-rate radio frequency pulse is optimized to minimize the SAR value of the radio frequency pulse; when the SAR value of the pulse remains unchanged, the duration of the variable-rate radio frequency pulse is optimized to minimize the pulse duration of the radio frequency pulse; and during the optimization process, the maximum gradient intensity and maximum climbing rate constraints are met. By optimizing the SAR pulse, the applicability of sodium magnetic resonance imaging is improved.

An RF power generator having a fixed power generation section, the fixed power generation section including a first plurality of power amplifiers each configured to receive a supply voltage and output a first voltage, and the RF power generator also includes a weighted power generation section including a plurality of weighted power amplifier modules, each weighted power amplifier module including a weighted power amplifier and an associated transformer, each weighted power amplifier of the weighted power amplifier modules receiving a respective weighted supply voltage, the voltage across the transformer of each weighted power amplifier module being a fractional multiple of the first voltage.