112 results about "Ion acceleration" patented technology

The invention relates to a high-speed directional molecular flow generating device and application thereof. The device comprises an air supply system, an ion source, a grid electrode assembly, a neutral pore plate and a charged particle swallowing device, the gas supply system is communicated with the gas inlet end of the ion source through a pipeline and provides neutral gas for the ion source; the ion source is used for ionizing the neutral gas into plasma, and the gas outlet end of the ion source is sequentially connected with the grid electrode assembly, the neutral pore plate and the charged particle swallowing device in series; the grid electrode assembly is used for extracting ions, accelerating ions and focusing ions; the neutral pore plate is grounded and is used for enabling passing ion beams to be subjected to an Auger process and converting ions into neutral molecules; and the charged particle swallowing device is used for absorbing unconverted ions and drift electrons. According to the invention, the complexity is low, the generated high-speed oriented molecular flow has good collimation, and an important experimental basis is provided for development and ground calibration of a space vacuum measuring instrument.

The invention belongs to the technical field of ionic wind propellers, and particularly relates to a multi-stage ionic wind propelling device with a common electrode structure, which comprises a plurality of ionic wind generating units which are sequentially arranged along the airflow direction, each unit consists of a conductive support structure and an ionization needle tip on the conductive support structure, and the ionic wind generating units are used for ionizing air under the action of a high-voltage electric field; the multiple units are isolated from one another through the insulation supporting structures and are connected in series, the power supply access module alternately provides positive and negative high-voltage power supplies for all the units, all the conductive supporting structures sequentially serve as ionization electrodes and receiving electrodes in a multi-stage electric field, and the electrode sharing type continuous acceleration structure is achieved. An independent receiving end does not need to be arranged for each stage, the number of electrodes and supporting parts is remarkably reduced, the ion acceleration path is prolonged, the thrust density is improved, a frame-type or non-frame-type structure can be adopted for flexible construction according to requirements, and the advantages of being light in structure, high in thrust-weight ratio and high in expansibility are achieved; the invention is suitable for the fields of micro aircrafts and directional air supply.

The invention discloses an ore gold content detection method and system based on big data, and belongs to the technical field of ore gold content detection.The method comprises the steps that to-be-detected ore is pretreated, a to-be-detected sample solution is obtained, working parameters of an inductively coupled plasma mass spectrometer are initially set, the to-be-detected sample solution is ionized, and the to-be-detected sample solution is obtained; and monitoring the plasma state in real time, completing self-adaptive adjustment of working parameters of the inductively coupled plasma mass spectrometer, accelerating ions to enter the mass spectrometer through an electric field after ionization treatment is completed, completing quantitative analysis of the gold content of a to-be-detected sample solution, and outputting a detection result. According to the invention, the self-adaptive adjustment of the working parameters of the instrument is realized, the problem of gold ionization efficiency difference caused by unstable plasma state is solved, the accuracy and reliability of the detection result are improved, and the efficiency and accuracy of the whole detection process are improved by monitoring the pretreatment process of the to-be-detected ore and judging the dissolution completeness.

Generation of impurity ions is prevented or reduced in a carbon ion generating device in which a laser-driven ion acceleration system is employed. A carbon ion generating device generates a carbonized region by irradiating a film made of an organic compound with a first laser beam, and generates carbon ions by irradiating at least a part of the carbonized region with a second laser beam.

The present invention relates to a spacecraft electric thruster particularly suitable for both propellant-fed and air-breathing electric space propulsion comprising an ionization chamber (11) for plasma generation which develops along a central development axis (X), wherein the ionization chamber (11) has a chamber inlet (12) configured to allow gas inflow and a chamber outlet (13) configured to allow extraction of ionized gas particles; a power injection assembly (30) configured to perform electron heating for plasma generation inside the ionization chamber (11); a magnetic assembly (20) configured to generate a magnetic field for plasma confinement in the ionization chamber (11); and an ion extraction and acceleration assembly (40) configured to extract ionized gas particles from the ionization chamber (11) through the chamber outlet (13) and accelerate them along an ion acceleration direction (Z), wherein the power injection assembly (30) comprises a microwave power delivery system (31) configured to deliver an electric field oscillating at a selected microwave frequency (f) and to inject the generated oscillating electric field in the ionization chamber (11), and wherein the ionization chamber (11) comprises a plurality of walls (11a, 15,16,41) closed to the passage of microwaves apart from a portion of at least one lateral wall (11a) of the plurality of walls (11a, 15,16,41) at which the power delivery system (31) is coupled to inject the generated oscillating electric field in the ionization chamber (11), and is resonant for electromagnetic fields oscillating at the selected microwave frequency.

The utility model provides a power supply detection device for a proton heavy ion accelerator. The power supply detection device comprises a measuring probe and a controller module. The input end of the measuring probe is electrically connected to the output end of the power supply equipment so as to measure the output voltage of the power supply equipment; the output end of the measuring probe is electrically connected to the controller module and inputs the output voltage of the power supply equipment to the controller module, and the controller module controls the measuring probe to measure the output voltage of the power supply equipment according to a preset frequency. According to the scheme, the troubleshooting time of the beam fault caused by the unstable power supply is greatly shortened, the problem is found in advance when the power supply function is unstable, the replacement time is set to the non-treatment time, and downtime caused by thorough damage of the power supply is avoided.

An ion implantation system has a first linear accelerator for accelerating ions of an ion beam to a first energy along a beam path. A second linear accelerator positioned downstream of the first linear accelerator along the beam path accelerates the ions to a second energy. A charge stripper is positioned between the first and second linear accelerators and is at ground potential. A gas source enclosure selectively encloses a plurality of stripper gas containers in an enclosure environment at ground potential. Each of the plurality of stripper gas containers contains a respective stripper gas. A flow control apparatus can have one or more valves, mass flow controllers, and conduits that selectively fluidly couples each of the plurality of stripper gas containers to the charge stripper and that selectively controls a flow of each respective stripper gas to the charge stripper.

The invention discloses an in-situ device and method for measuring curvature change of a sample in an ion irradiation process, and the in-situ device comprises a sample clamping and beam measurement assembly which is used for positioning the sample in the irradiation direction of an ion beam, can achieve the safe clamping of the sample and the free generation of curvature change at the same time, and is used for measuring the curvature change of the sample. The measurement of irradiation fluence, temperature and curvature can be realized at the same time; the temperature measurement and control assembly can measure and control the temperature of the sample; the in-situ profile measurement assembly can realize in-situ surface curvature measurement of the sample in the irradiation and heating processes; the vacuum component is used for providing a vacuum environment for the components; and the in-situ device is arranged at the terminal of the ion accelerator to measure the curvature change of the sample in the ion irradiation process. The method can be used for researching material size change, modulus, thermal expansion rate change and the like caused by factors such as defects, crystal growth and helium bubbles in the irradiation process of materials, and provides means for research, development, screening and evaluation of nuclear materials.

An ion implantation system has a first linear accelerator for accelerating ions of an ion beam to a first energy along a beam path. A second linear accelerator positioned downstream of the first linear accelerator along the beam path accelerates the ions to a second energy. A charge stripper has a stripper tube with a passageway positioned between the first and second linear accelerators. A charge stripping medium is provided in the passageway to strip at least one electron from the ions as the ion beam passes through the charge stripping medium. A focusing apparatus is associated with the stripper tube to control a trajectory of the ions within the passageway of the stripper tube. The focusing apparatus can be two or more quadrupoles and include an electrostatic lens, a magnet, a solenoid, or a Einzel lens.

The present invention relates to the technical field of isotope separation, and specifically to a circulating cooling device for isotope separation, comprising a support frame, an ion acceleration pipeline, an ion source and a heat exchanger, wherein a servo motor is provided on the support frame, an active bevel gear is provided at the output end of the servo motor, a first driven bevel gear, a U-shaped heat exchange tube, a coolant reflux bin, a wedge-shaped push block and a wedge-shaped top block are provided on the ion acceleration pipeline, and a plurality of evenly distributed heat dissipation copper plates are fixedly arranged on the ion acceleration pipeline. The servo motor of the present invention drives a plurality of wedge-shaped top blocks to rotate through the active bevel gear and the first driven bevel gear, and the wedge-shaped top blocks contact with the top of the wedge-shaped push blocks during the rotation process, and the oblique edges of the two blocks force the wedge-shaped top blocks to slide in the coolant reflux bin, thereby driving the coolant to circulate in the U-shaped heat exchange tube, and cooling the tail end of the U-shaped heat exchange tube through the heat exchanger, thereby achieving the purpose of circulating cooling of the ion acceleration pipeline.

The utility model provides mobile vacuum vehicle equipment for a proton heavy ion accelerator. The mobile vacuum vehicle equipment comprises a vacuumizing device, a first mobile vehicle and an uninterruptible power supply module. The vacuumizing device is used for vacuumizing the vacuum system; the vacuumizing device is arranged on the first mobile vehicle so as to move to a target position along with the first mobile vehicle; and the uninterruptible power supply module is electrically connected to the vacuumizing device and supplies power to the vacuumizing device. By arranging the uninterruptible power supply module, the problem of vacuum leakage caused by closing of the vacuum pump due to instability or switching of an external power grid can be well solved.

The invention provides a hole activation method of p-type nitride, which comprises the following steps: heating an object to be activated to an annealing temperature for annealing by using heating equipment, the object to be activated comprising the p-type nitride or an epitaxial wafer comprising the p-type nitride; and in the annealing process, applying an electric field to the to-be-activated object by applying voltage, and controlling positively charged H ions in the to-be-activated object to move out of a p-type layer of the to-be-activated object in an accelerated manner. According to the method, an electric field is added in the annealing process to accelerate movement of H elements in a p-type layer and escape from an epitaxial wafer, so that the hole concentration of p-type nitride is increased.

An apparatus includes a substrate support for holding a substrate at a cryogenic temperature during etching, a plasma source configured to generate a plasma located above the substrate support, an ion acceleration grid located between the plasma source and the substrate support, wherein the ion acceleration grid is configured to apply a potential difference that, during etching, accelerates ions from the plasma toward the substrate support, and an inlet for an etchant process gas, wherein the inlet is located between the ion acceleration grid and the substrate support.

The invention discloses an element concentration detection method and device, a storage medium and electronic equipment. The method comprises the following steps: acquiring an estimated concentration of a target element in a to-be-detected sample; determining a preset concentration interval to which the estimated concentration belongs and a bias voltage corresponding to the preset concentration interval; the bias voltage is used for controlling the number of ions entering a detector in an inductively coupled plasma mass spectrometer (ICP-MS), so that the detector outputs a pulse signal; controlling the ion acceleration voltage of a collision reaction tank in the ICP-MS to be bias voltage; acquiring a first pulse signal of a target element output by the to-be-detected sample through ICP-MS detection; determining the actual concentration of the target element according to the first pulse signal and a correction model; wherein the correction model reflects the corresponding relation between the element concentration and the pulse signal in the preset concentration interval and the corresponding bias voltage. According to the technical scheme, the detection accuracy of the element concentration can be improved, and the service life of the detector is prolonged.

The invention belongs to the technical field of high-current ion accelerators, and relates to a calibration device for a beam position detector, which comprises a horizontal supporting platform, a two-dimensional moving platform, a signal wire fixing unit, a signal wire adjusting unit and a detector supporting part, the two-dimensional moving platform is arranged on the horizontal supporting platform, the signal wire fixing unit is fixed on the two-dimensional moving platform and is used for fixing a signal wire, the detector supporting part is arranged on the horizontal supporting platform and is used for placing a beam position detector, and the signal wire penetrates through the beam position detector and is fixed on two opposite side surfaces of the signal wire fixing unit. The two side faces for fixing the signal wire are each provided with a signal wire adjusting unit used for tensioning the signal wire. According to the scheme, the device is high in repeated positioning precision, easy to adjust, convenient to disassemble and assemble, simple in structure and stable in performance, and can be used for calibrating beam position detectors with various polar plates with different diameters.

The present application provides a kind of ion spectrometer, it is related to the technical field of low energy ion detection in space, the ion spectrometer includes: energy spectrum screening device, by applying first electric field to multiple ion beams to be measured with different energy, so that multiple ion beams to be measured are deflected and allow target ions with predetermined energy range to exit, energy spectrum screening device includes: first shell;First pole plate is configured as arc and is installed to first shell, first pole plate and first shell are grounded;Second pole plate is electrically insulated and installed in first shell, is configured as arc concentric with first pole plate, by adjusting the voltage applied to second pole plate, variable first electric field is formed between second pole plate and first pole plate;Mass spectrum testing device, second electric field is applied to target ions, so that target ions are accelerated and keep uniform speed flight, to obtain the mass-to-charge ratio of multiple different ions based on the different flight time of multiple different ions in target ions, multiple different ions are separated.

The present invention relates to an ion source (1), in particular an ion propellant for propelling a spacecraft, comprising a reservoir (2) for a propellant (3) having a solid state and being liquefiable to a liquid state, a heater (4) for liquefying the propellant (3) in the reservoir (2), an emitter (5) in fluid communication with the reservoir (2) for receiving a stream (S) of liquefied propellant (3) from the reservoir (2), an extractor (7) in front of the emitter (5) for extracting ions (3') from the liquefied propellant (3) of the emitter (5) and accelerating the extracted ions (3') away from the emitter (5), wherein at least one deflector (11) is disposed upstream of the emitter (3) in the stream (S) of the propellant (3) towards the emitter (5).

This invention relates to the field of ion accelerator cooling technology, and more particularly to a directional cooling device for the high heat load region of an ion accelerator. The device includes a fixed tube, a connecting tube, and a cooling tube. The fixed tube is connected to the outlet end of the ion accelerator vacuum pipe, and the connecting tube is connected to the fixed tube. The cooling tube forms a spiral structure and is fitted onto the outer circumference of the connecting tube. A cooling medium flows inside the cooling tube. The cooling tube includes a first spiral section near the fixed tube and a second spiral section away from the fixed tube. The pitch of the first spiral section is smaller than the pitch of the second spiral section. This invention achieves segmented enhanced cooling in the high heat load region of the ion accelerator through a variable pitch cooling tube. The densely pitched first spiral section enhances high-temperature heat dissipation, while the loosely pitched second spiral section reduces flow resistance, significantly improving the cooling efficiency and maintenance convenience of the ion accelerator cooling device. It achieves directional enhanced cooling for high heat load regions such as the analytical magnet front-end pipe and the accelerator tube outlet, avoiding beam thermal distortion.

The application relates to a structure for improving the acceleration efficiency of a radio frequency accelerating bucket in an ion implantation system. The radio frequency accelerating bucket structure comprises an inductor coil for feeding radio frequency power into an accelerating electrode through a matching circuit, a radio frequency accelerating bucket cavity for providing an insulation environment for the inductor coil and an additional capacitor, a capacitor adjusting ring for matching adjustment of the whole circuit, an accelerating electrode for generating a voltage for accelerating ions in an accelerating unit, ground electrodes 1 and 2 for forming an accelerating gap with the accelerating electrode, SF6 filled in the radio frequency bucket cavity for increasing the high-voltage resistance of the inductor coil, an isolation component for isolating the radio frequency accelerating bucket cavity and the accelerating cavity, an inductor coil adjusting cap for adjusting the size of the inductor, and a radio frequency power feeding head for feeding power into the inductor coil in the radio frequency accelerating bucket cavity. The ion accelerating implantation system can make ions obtain higher accelerating energy under the condition of equal radio frequency power feeding.

The invention provides an ion beam generation system based on a gallium ion filament, which comprises an ion source assembly, an emission gun assembly, an ion acceleration assembly, a focusing assembly and a deflection assembly, and is characterized in that the gallium ion filament forms a liquid film through current heating, gallium ions are ionized under a high-voltage electric field, and a primary ion beam is formed; the ion beam is further focused through an accelerating electrode and a multi-pole electrostatic lens in the system, biaxial scanning is achieved through an electrostatic deflection electrode set, and nanoscale beam spot control can be achieved in cooperation with a modular cavity, an anti-interference shielding structure and a vacuum compatible design. The device supports a 10 <-6 > Pa vacuum environment and a gas-assisted process, has the advantages of modular maintenance, high and low voltage signal isolation and the like, and is suitable for micro-nano processing scenes such as semiconductor repair, sample preparation, ion imaging and the like.

In a TOFMS measurement unit, an ion acceleration section accelerates ions to send them into a flight space, within which a flight-field creation section creates, an electric field for causing ions to fly. A controller unit operates the measurement unit so as to repeat a measurement for a predetermined sample while varying a voltage applied to an electrode in the measurement unit, and calculates mass-resolving power based on each measurement result. An approximate function calculator unit finds an approximate function representing a relationship between the voltage and the mass-resolving power, based on data of combinations of the voltage and the mass-resolving power obtained under the control of the controller unit. A voltage determiner unit determines a voltage value corresponding to a target value of the mass-resolving power by the approximate function, and determines the voltage value as a voltage to be applied to the electrode in the TOFMS concerned.

The invention discloses a device suitable for isotope separation and a sealing structure thereof, and relates to the field of isotope separation.The device comprises a supporting table and an ion acceleration pipeline fixedly installed at the top end of the supporting table, one end of the ion acceleration pipeline is communicated with an ion source, and the outer side of the ion acceleration pipeline is sleeved with a spiral cooling pipe in the length direction; one end of the spiral cooling pipe is connected with a pump body, the pump body is connected with a heat exchange pipe, and a cooling circulation system composed of the spiral cooling pipe, the pump body, the heat exchange pipe and the cooling water tank can rapidly take away heat generated during operation of the ion acceleration pipeline, the heat dissipation efficiency is higher, and when the first moving seat and the second moving seat move in the length direction of the spiral cooling pipe, the heat dissipation efficiency is higher. Wind power generated by the fan is evenly blown to the ion acceleration pipeline and the spiral cooling pipe through the exhaust port, auxiliary cooling of the ion acceleration pipeline is achieved, and meanwhile it can be prevented that condensate water is generated on the surface of the spiral cooling pipe due to too low temperature.

This disclosure relates to a method (100) for fabricating a blazed grating. The method (100) comprises providing a substrate and a patterned mask layer (110) on the substrate, performing primary dry etching (120) of the substrate such that primary ions are accelerated towards a primary etch direction to impinge on the substrate, and performing secondary dry etching (150) of the substrate such that secondary ions are accelerated towards a secondary etch direction to impinge on the substrate. A primary projection of the primary etch direction and a secondary projection of the secondary etch direction onto the grating cross-sectional plane extend perpendicular to one and the other of a blaze facet direction and an anti-blaze facet direction, respectively, and ions accelerated towards a direction with a projection onto a grating cross-sectional plane perpendicular to the blaze facet direction are collimated to form a collimated ion beam for etching the substrate.

The present invention relates to a constant-temperature cooling water system for cold capacity compensation of a heavy ion accelerator, comprising: deionized water passing through various systems of the accelerator enters an open water tank; the deionized water flowing out of the open water tank enters a first heat exchanger; a portion of the deionized water flowing out of the first heat exchanger enters a first cooling tower; the remaining portion enters a first water distributor after temperature and pressure testing; the deionized water flowing out of the first cooling tower enters a second heat exchanger; the deionized water flowing out of the second heat exchanger enters a chiller for cooling; the deionized water passing through the chiller passes through a second water distributor, a second heat exchanger, and a first heat exchanger in sequence before entering the first water distributor. The system, based on various physical experiments, such as the power and heat generation of various systems in an ion accelerator, diurnal and seasonal variations, and the cooling effect of the cooling tower, modifies the current cooling water system of a heavy ion accelerator to address the issues of cold capacity and control accuracy of the cooling water system of the heavy ion accelerator.

A method of performing negative electron activation dissociation (negative EAD) in mass spectrometry includes introducing a plurality of negatively charged analyte ions into an ion trap positioned in a chamber and trapping said negatively charged analyte ions in a reaction region of said ion trap, introducing a buffer gas into the chamber, using an electron source positioned in the chamber and external to the ion trap to generate electrons, and accelerating the electrons to form an electron beam and introducing the electron beam into the ion trap such that the accelerated electrons are capable of ionizing at least a portion of molecules of the buffer gas to generate a plurality of positively charged ions. The accelerated electrons interact with at least a portion of the analyte ions trapped in said reaction region to cause negative EAD thereof, thereby generating a plurality of fragment product ions.

The application discloses a surface oxide removing method and a quantum circuit preparation method. The surface oxide removing method is applied to a superconducting metal thin film and comprises the following steps: ionizing a set gas, accelerating ions formed after ionization, and forming a first compound composed of the ions and metal after physical and chemical reactions between the ions and surface oxides. In the application, the ions formed after ionization of the set gas and the surface oxides have physical and chemical reactions, and the first compound composed of the ions and metal is formed. The method for removing the oxides does not cause additional damage to the surface and the sidewall, does not affect the surface roughness, and does not cause additional loss channels.

The application relates to an ion accelerator standardized power supply controller and a dynamic local reconfigurable method thereof, which comprises a main plate, a standardized self-defined interface, a main control plate interface and a main control plate; the main plate is provided with a communication interface for communication between the power supply controller and other devices; the standardized self-defined interface is used for connecting the main plate with different function sub-plates, WR sub-plates and power supply modules; the main control plate interface is used for collecting all controllable signals of the main plate to the main control plate; the main control plate is provided with an ARM processor and an FPGA; the ARM processor is configured with an embedded EPICS application program for reading and writing the FPGA and directly publishing related variables in the main control plate into standard EPICS supported PV variables to communicate with an upper computer; the FPGA is configured with a modular bottom layer regulator framework, and the monitoring and control of main circuits of different types of accelerator power supplies are realized by dynamically and locally reconfiguring corresponding modules. The application can be widely applied in the field of ion accelerators.

A charge stripper has a stripper tube 174 with a passageway, which may be positioned between the first and second linear accelerators of an ion implantation system, the first linear accelerator for accelerating ions of an ion beam to a first energy along a beam path, and the second linear accelerator positioned downstream of the first linear accelerator along the beam path accelerates the ions to a second energy. A charge stripping medium is provided in the passageway to strip at least one electron from the ions as the ion beam passes through the charge stripping medium. A focusing apparatus 200 is associated with the stripper tube to control a trajectory of the ions within the passageway of the stripper tube. The focusing apparatus can be two or more quadrupoles 202 and include an electrostatic lens, a magnet, a solenoid, or a Einzel lens.

The present invention provides a focused ion beam apparatus and a control method for a focused ion beam apparatus, which can control a beam to a desired orbit. The focused ion beam apparatus includes: an ion source that generates ions; a first electrostatic lens that accelerates and converges the ions to form an ion beam; a beam booster electrode that further accelerates the ion beam; one or more electrodes that are disposed within the beam booster electrode and electrostatically deflect the ion beam; a second electrostatic lens that is disposed between the one or more electrodes and a specimen stage and converges the ion beam to which a voltage is applied; and a processing unit that acquires measurement conditions and sets at least one of the respective voltages applied to the one or more electrodes and the voltage applied to the electrostatic lens based on the acquired measurement conditions.

The application relates to a device for laser-induced plasma injection into a substrate, which comprises a laser-induced assembly, an ion acceleration assembly, a vacuum injection assembly and a rotating support assembly; the ion acceleration assembly is installed on the upper end of the vacuum injection assembly, the upper side of the ion acceleration assembly is provided with the laser-induced assembly, and the output end of the rotating support assembly is located in the vacuum injection assembly; the plasma formed by the laser-induced assembly is accelerated and selected through the ion acceleration assembly, enters into the vacuum injection assembly and is injected into the substrate on the rotating support assembly. The application is favorable for improving the injection efficiency of the plasma and has simple structure and convenient operation.