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54 results about "Power deposition" patented technology

Diffusive plasma air treatment and material processing

The Diffusive Plasma is for effective treatment of contaminated air and material processing. Air is purified and disinfected by passing through the diffusive plasma device which includes a reactor or a plurality of reactors arranged in parallel or series and is energized by a high voltage alternating current power supply. The diffuser, being electrically isolated, provides extra nucleation sites to initiate discharges. It serves to improve the generation of uniform and consistent plasma and to reduce the variation of discharge properties among the reactors. The addition of a diffuser, thereby, enhances the overall effectiveness of decomposing chemicals and destroying microbes to achieve high air treatment and material processing performance. The diffuser can be made of suitable filtering materials to additionally serve as a filter. By incorporating suitable catalytic materials with the diffuser, the reactor becomes a catalytic plasma reactor wherein the plasma environment provides enhanced catalytic functions. Effective plasma power deposition may be obtained by controlling the amplitude, waveform period and shape of the voltage applied to the electrodes of the reactor and hence the operation of the reactors with plasma discharged of selected conditions for optimizing the treatment and processing efficiency while minimizing the generation of unwanted bi-product gases. The present invention also relates to a method for effective air treatment and material processing.
Owner:ALPHATECH INT

Composite diaphragm for alkali metal battery and preparation and application thereof

The invention relates to a composite diaphragm for an alkali metal battery and a preparation method of the composite diaphragm. The composite diaphragm comprises an organic diaphragm matrix layer coated with a ceramic coating and an amorphous alkali metal ion conductor inorganic solid layer, and the preparation method is a vacuum physical deposition method and comprises the following steps of passing an organic diaphragm substrate through a vacuum deposition cavity in a roll-to-roll mode, wherein the vacuum degree of a vacuum box body is 0.5-5 Pa, the reaction gas is nitrogen, the deposition power supply power is 30-180 W, the deposition time is 5-30 min; and depositing to prepare the composite diaphragm. The deposited inorganic solid layer is compact and non-porous, so that the diaphragmhas very strong mechanical property and high-temperature resistance, and the internal short circuit caused by the battery impurities and the metal dendrites and the thermal deformation of the batterydiaphragm can be effectively prevented. Meanwhile, the inorganic solid layer has the alkali metal cation high-speed conduction performance, stability in air and a hetero-ion blocking function, so thatthe safety performance and the cycle life of the battery can be remarkably improved.
Owner:DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI

Low-temperature vapor deposition method for carbon-based super-lubricating thin film with onion structure

The invention relates to a low-temperature vapor deposition method for a carbon-based super-lubricating thin film with an onion structure. The method comprises the following steps of (1) carrying out ultrasonic cleaning on silicon substrate by using acetone and absolute ethyl alcohol, and transferring the silicon substrate to a coating cavity; (2) vacuumizing until the vacuum degree is smaller than 4.0*10<-3> Pa; (3) cleaning under the following conditions: introducing Ar until the air pressure is 2-3 Pa, applying a negative bias voltage of -1000 to -1200 V to the silicon substrate to carry out plasma glow cleaning for 10 min; and (4) depositing the carbon-based super-lubricating thin film with the onion structure, namely keeping the bias voltage at -500 to -1000 V, the frequency at 3.5 KHz and the duty ratio at 15-25%; and keeping the air flow of Ar at 80-200sccm, the CH4 flow at 40-50sccm, the air pressure at 0.45-0.5 Pa, the target power at 800-900 W, the deposition time within 1 h and the deposited thin film thickness at about 1 mu m in the deposition process. The carbon-based super-lubricating thin film with the onion structure, prepared by using the low-temperature vapor deposition method, has the advantages of high hardness, excellent chemical inertness, low frictional coefficient, good wear resistance and the like.
Owner:LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI

Diffusive plasma air treatment and material processing

The Diffusive Plasma is for effective treatment of contaminated air and material processing. Air is purified and disinfected by passing through the diffusive plasma device which includes a reactor or a plurality of reactors arranged in parallel or series and is energized by a high voltage alternating current power supply. The diffuser, being electrically isolated, provides extra nucleation sites to initiate discharges. It serves to improve the generation of uniform and consistent plasma and to reduce the variation of discharge properties among the reactors. The addition of a diffuser, thereby, enhances the overall effectiveness of decomposing chemicals and destroying microbes to achieve high air treatment and material processing performance. The diffuser can be made of suitable filtering materials to additionally serve as a filter. By incorporating suitable catalytic materials with the diffuser, the reactor becomes a catalytic plasma reactor wherein the plasma environment provides enhanced catalytic functions. Effective plasma power deposition may be obtained by controlling the amplitude, waveform period and shape of the voltage applied to the electrodes of the reactor and hence the operation of the reactors with plasma discharged of selected conditions for optimizing the treatment and processing efficiency while minimizing the generation of unwanted bi-product gases. The present invention also relates to a method for effective air treatment and material processing.
Owner:ALPHATECH INT

Laser metal additive deposition temperature control method and system

The invention relates to a laser metal additive deposition temperature control method and system. The laser metal additive deposition temperature control method comprises the following steps that a plurality of current temperatures are acquired when a powder feeding nozzle deposits a current deposition layer at current laser power, wherein the plurality of current temperatures are obtained by performing temperature acquisition on sediments sprayed by the powder feeding nozzle in a set range in a process of forming the current deposition layer; the average temperature of the current depositionlayer is calculated according to the plurality of current temperatures; the laser power of the next layer of the powder feeding nozzle is calculated according to the expected temperature, the averagetemperature of the current deposition layer and the average temperature of the previous deposition layer, the laser power of the next layer is taken as the current laser power, and a plurality of current temperatures obtained by the powder feeding nozzle is returned when the powder feeding nozzle deposits the current deposition layer at the current laser power until deposition ends. According to the laser metal additive deposition temperature control method and system, the control precision of the laser metal additive deposition temperature is improved.
Owner:SUZHOU UNIV
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