The invention discloses an all-
dielectric terahertz metasurface based on an inverted D-shaped
column structure and a preparation method, and belongs to the technical field of terahertz metasurfaces. According to the preparation method provided by the invention, the
silicon dioxide layer is used as the protective layer, so that the
silicon wafer can be effectively prevented from being oxidized or corroded in the subsequent
processing process; through the steps of
spin coating of a
photoresist layer, baking, placement of a
mask plate,
exposure, development and the like, a pattern of an inverted D-shaped
column structure is formed on a
silicon wafer,
deep reactive ion etching is performed on the silicon
wafer by utilizing
etching reaction gas, the inverted D-shaped
column structure is formed on the silicon wafer, in-plane
rotational symmetry of the all-
dielectric terahertz metasurface is broken, and the
dielectric performance of the all-dielectric terahertz metasurface is improved. Quasi-continuous domain
bound state resonance with a higher Q value and an extremely narrow
resonance line width is obtained, and active and flexible tuning of
formant frequency and the Q value can be realized by controlling the
asymmetry of the structure. And the
photoresist layer is effectively removed by using the
plasma gas, so that the cleanliness and the integrity of the all-dielectric terahertz metasurface are ensured.