42 results about "Nano grating" patented technology

The invention belongs to the technical field of solar cells, and discloses a GaAs solar cell back surface photon structure based on a regenerated silicon wafer template and a preparation method. The method comprises the following steps: 1) carrying out ozone oxidation treatment on a regenerated silicon wafer; forming an oxide layer on the micron-sized textured surface of the regenerated silicon wafer; 2) inclining the processed silicon wafer, then carrying out geometric constraint etching, and generating a periodic gradient Bragg reflection nano grating on the micron-sized suede surface of the silicon wafer; 3) carrying out transfer printing and gas etching on the micron-sized textured surface and the nano grating structure of the silicon wafer on the back surface of the GaAs substrate, and forming micron scattering pits on the back surface of the GaAs substrate; and 4) preparing a back electrode on the back surface of the GaAs substrate with the micron scattering pits, and preparing a positive electrode on the front surface of the GaAs cell. The method is simple, template preparation energy consumption is reduced, atomic-scale conformal combination of the Bragg reflection array and the micron scattering substrate is achieved, and the obtained photon reflection structure has high efficiency and low optical loss.

The application discloses a micro-nano grating and photocathode collaborative design method. The method breaks the traditional isolated design, and considers the micro-nano grating and the photocathode as an organic whole, and takes the spectral response or integral quantum efficiency of the system as a whole as a target function. Specifically, the method comprises the following steps: establishing a system structure model and clearly defining an optimization target and process constraints; establishing a complex refractive index-wavelength correlation model of the photocathode to accurately obtain a complex refractive index distribution; determining a set of parameters to be optimized and setting initial values; calculating the system electric field distribution under the current parameters based on an electromagnetic simulation model; combining the electric field distribution and the photoelectric emission mechanism to calculate the spectral response of the system in the target waveband; and using a parameter optimization algorithm to iteratively search the parameter space, and outputting an optimal parameter combination. The application fully considers the electromagnetic and photoelectric coupling between the two and the actual process constraints, has the advantages of high design accuracy, strong pertinence, good implementability and the like, and can significantly improve the detection sensitivity of a weak light detection device.

The invention discloses a cuff-free blood pressure continuous monitoring method and system based on a light guide film, multiband reflected light signals of fingertip skin are collected through the light guide film attached to a terminal screen, the light guide film realizes directional light guide and stray light filtering through a micro-nano grating array, the light guide film is aligned with screen pixel hardware, and the light guide film is connected with the terminal screen. And the signal to noise is obviously improved compared with a common camera scheme. According to the method, multi-dimensional features such as time difference, rise time and enhancement index between dual-band pulse wave crests are extracted, and systolic pressure and diastolic pressure are calculated in combination with a user personalized baseline model. The system supports dual modes of active measurement and night passive monitoring, motion artifacts are eliminated through an acceleration sensor, ambient light interference is inhibited through an ambient light sensor, and one-machine multi-person exclusive monitoring, local encrypted data storage and user autonomous management are realized through linkage with an applicant spectrum identity recognition patent. The blood pressure monitoring device does not need cuff inflation, does not need electrocardio reference, is free of oppression, can realize non-perception continuous blood pressure monitoring when a user uses a mobile phone daily, and has the advantages of being non-invasive, continuous, low in cost, high in precision and safe in privacy.

The invention provides a personalized ear mold 3D printing technology and an application system thereof. The personalized ear mold 3D printing technology comprises the following printing steps: S1, synchronously acquiring multi-modal data: synchronously finishing by using an intelligent ear canal scanner: (1) physiological data: detecting a high-precision ear canal 3D model and a soft tissue elasticity modulus; according to the 3D ear mold printing technology, a non-European acoustic waveguide structure is optimized through multi-modal data fusion and a quantum annealing algorithm, millimeter-level anatomical matching and dynamic acoustic impedance tuning of the ear canal are achieved, and the acoustic impedance spectrum and the personalized frequency response preference of the ear canal of a user are obtained. According to the invention, femtosecond laser coloring is combined to construct a nano grating color developing layer and StyleGAN3 to generate microvascular bionic textures, so that the traditional single adaptive dimension is broken through, the ear mold has the lifelong evolution ability of acoustic self-adaption, aesthetic self-matching and physiological self-optimization, and a static hearing aid device is upgraded to an intelligent biological function extension body.

A metalens with a hybrid surface topology that includes a collection of nanopillars and a collection of nanogratings.

The invention provides a micro light-emitting structure, a micro light-emitting device and a preparation method of the micro light-emitting structure. The miniature light-emitting structure comprises a plurality of light-emitting units, and each light-emitting unit comprises a first semiconductor layer, a light-emitting layer and a second semiconductor layer which are stacked; the plurality of nano grating units are arranged in an array, the plurality of nano grating units are arranged on the side, away from the light emitting layer, of the first semiconductor layer, and the grating period between every two adjacent nano grating units is smaller than the wavelength of light emitted by the light emitting unit; each nano grating unit comprises a plurality of first grating layers and second grating layers which are alternately stacked in the direction away from the first semiconductor layer, the first grating layer is arranged at one end, facing the first semiconductor layer, of each nano grating unit, and the first grating layers and the second grating layers are made of non-metal dielectric materials; the refractive index of the first grating layer is smaller than that of the second grating layer.

The application discloses a kind of micro-nano grating diffraction angle measurement system and measurement method, comprising: multi-frequency laser module, grating fixture module, light beam shrinkage module, light spot detection module, light spot imaging analysis module, electric control translation stage module.This method is by the wavelength control of laser emission light, excites the diffraction spot under different light beams;Through light beam shrinkage module shrinkage, again the light beam after shrinkage is transmitted to light spot detector module and is measured to the diffraction angle, solves the problem that the diffraction angle is too large, and the detection area of detector cannot cover all diffraction spots.In general, by the device and method, the direct measurement reading of the diffraction angle of micro-nano grating under different incident wavelengths can be realized, compared with traditional measurement method, with the advantages of simple operation, high measurement accuracy, large measurement angle range, etc., and the relative energy distribution of diffraction spot, light spot shape, relative position between light spots and other information can be imaged and recorded.

The invention relates to the technical field of anti-counterfeiting, and discloses a titanium substrate nano iridescent anti-counterfeiting structural color and a composite laser processing method and application thereof, and the method comprises the following steps: providing a titanium metal substrate; the titanium metal substrate is pretreated through a wide-pulse-width laser light source, so that a self-flowing layer is formed on the surface of the titanium metal substrate; and an ultrafast laser light source is adopted to carry out scanning processing on the titanium metal substrate on which the self-flowing layer is formed according to the anti-counterfeiting encryption icon, a nano grating structure capable of extracting a period is induced, and the titanium substrate nano iridescent anti-counterfeiting structural color is obtained. According to the technical scheme provided by the invention, the quality and environmental friendliness of anti-counterfeiting iridescent structural color processing can be ensured.

The invention discloses an ultraviolet scraping printing device and method.The scraping printing device comprises an unwinding shaft, a coating device, a mold scraping printing device, a plane rolling shaft, an ultraviolet curing device and a winding shaft, and continuous feeding of a polymer substrate is achieved through the winding and unwinding shaft; a coating device is used for coating the surface of the substrate material with the UV colloid with the specified thickness; under the condition that the edges of the die scraping and printing device do not make contact with a base material, the micro-nano grating structure is carved on the UV colloid, abrasion of the die is effectively avoided, and the size and shape of the die are determined by the grating die structure; curing the UV colloid with the micro-nano structure after flowing through the grating mold by using an ultraviolet curing device, keeping the micro-nano structure morphology, and conveying the UV colloid to a rolling shaft; a servo motor is used for accurately adjusting the distance between the grating mold and the substrate; adjusting the tension of the roller to ensure that the substrate is straight; the mold scraping and printing device is connected with a force sensor, the contact condition of the mold and the substrate is judged through a force value, a contact gap is adjusted, and therefore the thickness of the UV colloid is controlled.

The invention discloses a machining method for controlling the height of a nano periodic structure through a tool movement track, and belongs to the technical field of micro-nano machining. According to the specific scheme, the machining method for controlling the height of the nanometer periodic structure through the tool motion trail comprises the following steps that firstly, according to a motion equation, under the condition that the machining period is fixed, different nanometer down-milling machining motion trails of a tool are obtained by regulating and controlling parameters RX, Rz and phi; step 2, calculating the forming amount of the processing material in each period by adopting a numerical calculation method, adjusting the sizes and the relationship of the three parameters, and controlling the size of the forming amount of the material; selecting a proper motion trail of the cutter according to the forming amount of the nano grating material; 3, under different parameter combinations, tool paths are different, according to the tool paths, driving signals are set, the nanometer grating structure is machined, and morphology measurement is carried out; and 4, carrying out quality evaluation on the morphology measurement result, determining the optimal geometric characteristics of the processing track, and establishing a functional equation for predicting the height of the nano grating structure. By means of the machining method, efficient and high-quality machining of the surface nanometer periodic structures with different heights can be achieved, and the application performance of the surface nanometer periodic structures is improved.

The application provides a micro-nano grating structure optical topography coordinated feedback preparation method, comprising the following steps: rounding off the grating period and duty cycle based on the pixel size of a laser direct writing device, and eliminating the design end quantization error; establishing a proxy model of the structure parameters to the zero-level transmittance and the +1 and-1 order diffraction efficiency through parameter scanning and strict electromagnetic field theory calculation; performing line topography characterization simulation including proximity effect, development and etching on the design meeting the functional positioning, quantitatively extracting the period error, line width error, height error and surface roughness; feeding the topography error to the proxy model for iterative optimization, taking the minimum optical performance deviation as the target to iteratively pre-compensate the design parameters until convergence; and outputting a mask file and process guidance parameters to execute one-time preparation of the micro-nano grating. The application introduces the process topography error as a feedback quantity into the design optimization closed loop, realizes active compensation of the design to the process deviation before preparation, and significantly improves the first-time preparation success rate of the micro-nano grating.

The present application relates to a kind of silicon carbide diffraction optical waveguide structures and preparation method, the silicon carbide diffraction optical waveguide structure includes: high refractive index semi-insulating silicon carbide substrate, form on the surface of the substrate and have specific angle of inclination inclined grating, and the anti-reflection film covered in the top of the grating.This structure uses the high refractive index of silicon carbide material to realize the light transmission of ultra-thin, large field angle, concentrate diffraction energy by inclined grating design, and interface reflection loss is inhibited by means of anti-reflection film, and the comprehensive promotion of optical efficiency and imaging quality.The present application also discloses the preparation method of the above structure, and the micro-nano grating structure is accurately processed on the silicon carbide substrate by photoetching, pattern transfer and inclined etching process.The waveguide structure of the present application is suitable for high-performance augmented reality (AR) display and optical sensing system.

The invention relates to the technical field of semiconductor laser devices, in particular to a high-power-density distributed feedback type laser chip and a preparation process thereof. According to the technical scheme, the chip comprises a chip body, the chip body comprises a back electrode, a substrate, a lower waveguide layer, a lower limiting layer, an active layer, an upper limiting layer, an upper waveguide layer, a highly-doped layer and a front electrode which are sequentially stacked from bottom to top, and graphene layers are arranged on the sides, close to the active layer, of the lower limiting layer and the upper limiting layer. According to the invention, the graphene heat conduction layer and the conical bulge and micropore array are introduced between the active layer and the limiting layer, so that heat is directly and quickly dredged, thermal resistance and interface strain are reduced, heat accumulation is relieved from the source, and the reliability of the chip is improved; the artificial micro-nano grating formed by the conical structure and the DFB built-in grating cooperatively enhance longitudinal mode feedback, and improve the side mode rejection ratio and the light field limiting factor. Meanwhile, mode locking and 1 microsecond-level wavelength tuning are achieved through array type current injection, and the light spot and coupling efficiency is improved in cooperation with a unit-level micro lens.

The application discloses a grating diffraction efficiency detection system and a detection method thereof, which comprises a bearing platform, a sample platform rotatably arranged above the bearing platform, an incident assembly, a lens assembly, a first imaging lens, a beam splitter, a first photoelectric detection device, a second photoelectric detection device and a second imaging lens. The incident assembly comprises a light source aligned with the sample platform, a beam modulator arranged on an outgoing light path of the light source and a polarization modulator arranged on an outgoing light path of the beam modulator. The lens assembly is aligned with a micro-nano grating to be detected and a diffraction beam thereof. The first imaging lens is arranged on an outgoing light path of the lens assembly. The beam splitter is arranged on an outgoing light path of the first imaging lens. The first photoelectric detection device is arranged on a reflected light path of the beam splitter. The second imaging lens is arranged on a transmitted light path of the beam splitter. The second photoelectric detection device is arranged on an outgoing light path of the second imaging lens. The application solves the problem that a traditional macroscopic grating diffraction efficiency measurement scheme cannot detect the diffraction efficiency of a micro-nano scale diffraction grating.

The application relates to a 2D / 3D switchable stereoscopic display device based on a binary nanometer grating, which comprises a polarization-controllable light source, a light collimator, a pixel array light modulator and a binary nanometer grating phase modulation plate; light emitted from the polarization-controllable light source is collimated through the light collimator, the collimated light emitted from the light collimator passes through the pixel array light modulator and enters the binary nanometer grating phase modulation plate; when TM light is turned on and TE light is turned off, the binary nanometer grating does not produce deflection to the TM light, the pixel array light modulator provides a plane image, and 2D display is realized; when TE light is turned on and TM light is turned off, the binary nanometer grating produces light deflection to the TE light, the phase of the TE light is controlled through the period, height and depth-width ratio of the binary nanometer grating, and then the deflection angle and convergence position of the light are controlled, and 3D display is realized. The device has a simple structure, a wide field of view angle of naked-eye 3D display, high brightness and simple and fast switching.

A method for preparing micro / nano structures with enhanced hydrophobicity using a combination of picosecond and femtosecond lasers is disclosed. The method involves pre-treating a TC4 titanium alloy substrate to obtain a clean and smooth surface; using a picosecond laser to ablate the surface of the TC4 titanium alloy substrate to prepare a periodically arranged array of micron-sized square truncated pyramids as a primary microstructure; selectively irradiating the top platform of the micron-sized square truncated pyramids with a femtosecond laser to induce the formation of a periodic nanograting structure as a secondary nanostructure, thereby forming a micro / nano composite structure; and finally, cleaning and drying to obtain a superhydrophobic TC4 titanium alloy surface with a micro / nano composite structure.

The invention discloses a SiC micro-nano chute grating and a method for processing the SiC micro-nano chute grating based on ion implantation induction and electric spark, and the method comprises the following steps: S1, processing by adopting a silicon carbide substrate, then depositing a Cr / SiO2 composite mask layer on the substrate, exposing, developing and etching to form a Cr / SiO2 composite mask structure with a periodic grid pattern; s2, introducing ions into the exposed SiC region as an n-type dopant by adopting a large-angle inclined ion implantation method to form a conductive modified region, and obtaining a locally modified silicon carbide substrate; and S3, adopting electric spark machining to stably form a single-pulse-scale directional corrosion pit in the target ion implantation region, and realizing linear scanning etching along the grid bar direction to obtain the SiC micro-nano chute grating with the nano-scale groove structure. According to the method, the problems of low processing efficiency, poor processing surface quality, poor morphology control and the like of the SiC substrate grating are solved, and directional induction etching with a specified side wall inclination angle is realized.

The present application relates to the technical field of optical detection, and more particularly to a micro-nano grating line deviation rapid detection method and system; the present application adopts coding illumination technology to construct a structured complex light field, breaks through the single-channel detection limit through multi-channel parallel illumination; based on Fourier space multi-frame imaging, composite diffraction spot distribution data is obtained; the coherence and time correlation characteristics that cannot be obtained by traditional intensity measurement are obtained by using the second-order intensity correlation function; a joint forward physical model is constructed, and the grating complex amplitude distribution and line edge roughness parameters are reconstructed by using an iterative inversion algorithm to detect the micro-nano grating line deviation; the present application combines multi-channel coding illumination and second-order intensity correlation function analysis, reduces the measurement time through parallel detection, improves the detection reliability by using the redundant information between channels, and significantly improves the detection efficiency while ensuring the accuracy.

The application discloses a high-definition structural color image copying method based on a cross-scale structure. In the process of copying the image, elliptical vibration is applied to an ultrasonic elliptical vibrating tool, and cosine vibration is applied to a workpiece, so that a grating micro-pit array is cut on the surface of the workpiece. The grating micro-pit array is formed by superimposing a nanometer grating array and a micro-pit array, and through the complex optical effect between the nanometer grating array and the micro-pit array, more rich colors can be presented. In the process of machining, the cutting process parameters of the ultrasonic elliptical vibrating tool can be controlled according to the hue of the original image, and the vibration trajectory of the workpiece can be controlled according to the saturation and brightness of the original image, so as to adjust the grating pitch of the nanometer grating array and the depth-width ratio of the micro-pit cross-section profile, realize the two-dimensional regulation of the grating micro-pit array feature structure on the structural color, make the structural surface present an image with more rich colors, and more accurately copy the required high-definition structural color image.

The application belongs to the field of biochemical test, and particularly relates to a silver particle gold nanometer grating flexible substrate and a preparation method and application thereof. The polycarbonate layer in DVD or CD is used as a stamping mold, a three-dimensional periodic nanometer grating structure is prepared by stamping on a polyvinyl chloride (PVC) film, a gold layer is plated on the PVC, silver nanoparticles are uniformly decorated on the surface of the gold nanometer grating by using an interface self-assembly method, and the flexible substrate is prepared. The research results show that the electromagnetic field of the substrate is greatly enhanced, the uniform distribution of the silver nanoparticles and the periodic grating structure of the substrate enable the substrate to generate high-density and uniformly-distributed surface enhanced Raman scattering (SERS) hot spots, and the sensitivity and accuracy of detection are greatly improved. The application has the advantages of simple process, low cost and suitability for large-scale preparation, and provides a feasible idea for large-area preparation of a SERS substrate with high sensitivity, uniform signal and good stability.

The invention discloses a rapid micro-nano grating defect detection method and system based on Fourier space imaging, and relates to the technical field of ghost imaging systems.The method is characterized by comprising the steps that an ultraviolet spectrum image and a visible light spectrum image of a to-be-detected micro-nano grating are obtained; obtaining the defect type of the micro-nano grating according to the ultraviolet spectrum image, the visible light spectrum image and the dual-channel convolutional neural network; according to the ultraviolet spectrum image and two-dimensional short-time Fourier transform, determining the position of a non-periodic defect; bayesian reasoning is carried out according to the ultraviolet spectrum image and the visible light spectrum image, the position of the mixed defect is determined, the global spectrum is decomposed into the local spectrum through two-dimensional short-time Fourier transform, the defect area is obtained through the local outlier factor, accurate mapping of frequency anomaly and the spatial position is achieved, and the accuracy of the mixed defect is improved. The problem of position information loss caused by traditional Fourier transform is solved, and non-periodic defects and mixed defects can be effectively detected.

The present disclosure provides a self-aligned deep ultraviolet lithography method, which can be applied to the field of semiconductor technology. The method comprises: preparing a multilayer structure, wherein the multilayer structure comprises: a substrate; a second metal layer arranged on the substrate; a second photoresist layer arranged on the side of the second metal layer away from the substrate; a first metal layer arranged on the side of the second photoresist layer away from the substrate; a hard mask layer arranged on the side of the first metal layer away from the substrate; and a first photoresist layer arranged on the side of the hard mask layer away from the substrate; performing a first lithography process on the first photoresist layer to obtain a first photoresist pattern; using the first photoresist pattern as a mask to form a nanometer grating in the hard mask layer; and performing a second lithography process on the second photoresist layer using the nanometer grating to obtain a second photoresist pattern, wherein the line width of the second photoresist pattern is smaller than the line width of the first photoresist pattern.

The invention discloses a gold nano grating humidity detection method based on a DVD optical disk, and particularly relates to an optical sensor, the DVD optical disk comprises a DVD optical disk body, and the DVD optical disk body comprises a polycarbonate layer, a dye layer, a reflecting layer, a protective layer and a printing layer from bottom to top in sequence; the grating is formed by spirally pre-carving the plurality of slits around the middle hole; and the grating is positioned on the side surface of one side, which is in contact with the dye layer, of the polycarbonate layer. The preparation process is few, the preparation process is simple, the required materials are cheap, and the repeatability is good, so that the cost is low, mass production can be realized, the response speed is high, the recovery speed is high, the precision is high in actual detection operation, and the sensor has good application in low-humidity and high-humidity environments.

The application discloses a solution for realizing nano-grating imprinting by using laser polarization state, wherein a simple structure is designed, laser-induced nano-grating is used to manufacture super-resolution patterns, the nano-grating remodeling strength and orientation are changed by adjusting laser wavelength, power and polarization direction, two methods for adjusting the polarization state of the illuminating white light to realize color regulation are provided, sensitive sensing of the polarization is realized, and high-resolution and high-saturation colors with a spatial resolution of 0.5 microns are obtained. The formed nano-grating has a polarization regulation effect on reflected light, by using the polarization maintaining and rotating characteristics of the nano-grating on linearly polarized white light, laser polarization states with an angular resolution of 10 degrees can be identified in pixels with a spatial resolution of 0.5 microns, and super-high-density optical storage is realized. Compared with the existing SOI (Silicon-On-Insulator) etching process, the solution has a simple manufacturing method and does not have a complex process.

The application discloses a micro-fluidic chip for processing exosomes and a manufacturing method thereof, and relates to the technical field of biological detection. Based on the structure of the micro-fluidic chip, when the nano-hole electrode layer and the nano-grating sensing electrode layer of the optical biosensing array unit are connected to a power supply, due to the different diameters of the detection channels, the two asymmetric gold nano-electrodes of each detection channel form a non-uniform electric field, the nanoparticles of the exosomes are polarized, dielectrophoresis force is generated on the nanoparticles, and the nanoparticles are driven to move and gather on the surface of the nano-grating sensing electrode layer at the bottom, so that the nanoparticles are effectively detected by the nano-grating sensing electrode layer, and the effect of efficiently and highly sensitively detecting the exosomes is achieved.

This invention relates to the field of microwave photonic devices and terahertz devices, and discloses a terahertz photoconductive antenna chip based on a nanograting structure. By integrating the nanograting structure and interdigitated electrode structure, the absorption of pump laser by the substrate is enhanced, and a strong electric field is generated through the interdigitated electrode structure, effectively improving the ability of the electrodes to collect photogenerated electron-hole pairs on the surface of the substrate. Simultaneously, this invention also discloses a method for fabricating a terahertz photoconductive antenna chip based on a nanograting structure. Dry etching technology is used to effectively control the morphology of the photoconductive chip grating structure, and electroplating is used to fabricate the electrode structure of the photoconductive chip, which can save costs while effectively avoiding problems such as side etching.

The application relates to the field of anti-counterfeiting technology and discloses a titanium substrate nano-holographic anti-counterfeiting structural color and a composite laser processing method and application thereof, wherein the method comprises the following steps: providing a titanium metal substrate; adopting a wide pulse width laser light source to pretreat the titanium metal substrate, so that a self-flow layer is formed on the surface of the titanium metal substrate; adopting an ultrafast laser light source to scan and process the titanium metal substrate with the self-flow layer in accordance with an anti-counterfeiting encryption icon, nano-grating structures with extractable periods are induced, and the titanium substrate nano-holographic anti-counterfeiting structural color is obtained. The technical scheme provided by the application can ensure the quality and environmental friendliness of anti-counterfeiting holographic structural color processing.

The utility model provides a kind of nanometer grating window structure of improving image intensifier light absorption rate, including substrate, refractive film, aluminium oxide passivation film layer, multi-alkali photocathode layer arranged sequentially from bottom to top, the upper surface of substrate is mixed layer, etching groove is arranged in array on mixed layer, etching groove is filled with refractive column, and the upper end of refractive column is extended to the lower surface of refractive film.The utility model forms refractive index transition between substrate and multi-alkali photocathode layer, reduces interface reflection loss, and greatly improves cathode absorption rate;By cooperating aluminium oxide passivation film, the optical performance of refractive index film is not destroyed.

The application belongs to the technical field of solar cells, and discloses a GaAs solar cell back surface photon structure based on a regenerated silicon wafer template and a preparation method. The method comprises the following steps: 1) the regenerated silicon wafer is subjected to ozone oxidation treatment; an oxide layer is formed on the micron-level rough surface of the regenerated silicon wafer; 2) the treated silicon wafer is inclined, and then subjected to geometric constraint etching, so that a periodic gradually changing Bragg reflection nanometer grating is generated on the micron-level rough surface of the silicon wafer; 3) the micron-level rough surface and the nanometer grating structure of the silicon wafer are transferred to the back surface of a GaAs substrate, and gas etching is performed, so that micron scattering pits are formed on the back surface of the GaAs substrate; and 4) a back electrode is prepared on the back surface of the GaAs substrate with the micron scattering pits, and a positive electrode is prepared on the front surface of the GaAs cell. The method is simple, reduces the energy consumption for preparing the template, realizes atomic-level conformal combination of the Bragg reflection array and the micron scattering base, and the obtained photon reflection structure has high efficiency and low optical loss.

The invention relates to the technical field of aluminum alloy shell processing, in particular to a bright-color reflective aluminum alloy shell preparation method which comprises the following preparation steps: S1, directional sand blasting is performed on aluminum alloy by adopting an oblique spraying angle, unidirectional textures are formed on the surface of the aluminum alloy, and sand-blasted aluminum alloy is obtained; s2, the sand blasting aluminum alloy is electroplated, so that an amorphous Al-O-C-N film is formed on the surface of the sand blasting aluminum alloy, and a plated aluminum alloy is obtained; s3, the plated aluminum alloy is subjected to interference auxiliary laser treatment, and a main laser beam and an auxiliary laser beam are adopted to form an interference field; a nano grating structure is selectively stripped on the surface of the gradient film layer by controlling the phase difference of the double light beams, and the laser aluminum alloy is obtained; s3, the laser aluminum alloy is subjected to sulfuric acid anodic oxidation and hole sealing treatment, and the bright-color light-reflecting aluminum alloy shell is obtained.By means of the technology, the trace defects such as ablation residues are overcome, meanwhile, the high-brightness light-reflecting effect is achieved through mirror reflection cooperation, and the contradiction that traditional high power and low trace cannot be achieved at the same time is solved.