Prestress-assisted nanoimprint-based high-density diffraction grating making method

Abstract

The invention relates to the technical field of grating making and provides a prestress-assisted nanoimprint-based high-density diffraction grating making method. The method comprises the following steps: a, a nanoimprint process is used to make a grating master plate; b, the grating pattern of the master plate in the step a is transferred to a PDMS thin film to make a patterned PDMS grating thinfilm; c, a PDMS flexible substrate is made; d, the PDMS flexible substrate is stretched to a certain length; e, the patterned PDMS grating thin film is attached to a pre-stretched PDMS flexible substrate; and f, the prestress is released. The grating cycle acquired by the method can be controlled through adjusting the prestress, the maximum reduction ratio of the grating cycle is about 25%, the technical defect that the traditional nanoimprint process can not make a cycle size smaller than a die can be solved, and the problems of expensive devices, complicated process conditions, difficult control, high making cost and long cycle in the existing nano grating making method can be solved.

Description

technical field [0001] The invention belongs to the technical field of grating production, and in particular relates to a method for manufacturing high-density diffraction gratings by prestress-assisted nanoimprinting. Background technique [0002] Diffraction gratings are indispensable optical components in optical systems and are widely used in advanced instruments and optical sensing fields, such as integrated optics, optical communication, optical interconnection and optical measurement, which require high-density diffraction gratings with micron / submicron periods . [0003] Laser holographic lithography is a maskless lithography technology based on the interference effect of coherent light. Usually, holographic lithography is used to manufacture diffraction gratings with a small measurement range. For the manufacture of large-area ion-diffraction gratings, it is necessary to implement the grating splicing process. This means that the entire production process is more ...

AI Technical Summary

Problems solved by technology

[0004] Nanoimprinting is a simple and effective method for realizing nanostructures, but the grating manufactured by nanoimprinting is a 1:1 copy of the master, and the feature structure smaller than the original mold cannot be obtained under the same mold

At extremely small scales, if nano / submicron-level structural feature sizes are required, it is expensive to manufacture extremely small-scale molds, and the process parameters for imprinting at extremely small scales are more strictly controlled. small and destroy mold

[0005] The above technical problems are the main difficulties in the manufacture of high-density diffraction gratings

Images