Method of preparing high-density grating through femtosecond laser weak ablation and small-included-angle interference

A femtosecond laser, high-density technology, used in laser welding equipment, diffraction gratings, optics, etc., can solve problems such as increasing production costs and increasing the complexity of etching, to ensure regularity, strong anti-interference ability, and economical operation. efficient effect

Inactive Publication Date: 2020-04-24
EAST CHINA NORMAL UNIV
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Problems solved by technology

However, this technology still faces challenges in obtaining high surface uniformity, high regularity, and high-efficiency fabrication
In the prior art, the use of Damman gra

Method used

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  • Method of preparing high-density grating through femtosecond laser weak ablation and small-included-angle interference
  • Method of preparing high-density grating through femtosecond laser weak ablation and small-included-angle interference
  • Method of preparing high-density grating through femtosecond laser weak ablation and small-included-angle interference

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Embodiment

[0045] The sample is a silicon wafer, and a high-density grating is prepared on it, including:

[0046] 1) build figure 1 The shown dual-beam femtosecond laser interference system makes the laser beam converge on the sample stage through the optical paths of the first cylindrical lens and the second cylindrical lens respectively. After converging, the spot size is 0.05*1.8mm, and the energy density is 0.136J / cm 2 ;

[0047] 2) Set processing conditions

[0048] Control the two laser beams at a small angle of 6.2° to ensure that the two beams of light are more likely to be coherent in time and space, reducing processing difficulty and making processing more stable and efficient. 0.136J / cm below the ablation threshold of the sample 2 Etching is carried out to avoid the generation of ejecta;

[0049] 3) Fabrication of large-area periodic nanogratings by weak ablation and small-angle interferometry

[0050] Firstly, put the silicon wafer in ethanol for 30min ultrasonic clean...

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Abstract

The invention discloses a method of preparing a high-density grating through femtosecond laser weak ablation and small-included-angle interference. A double-beam laser interference system is built, and etching of a sample is carried out through a light spot obtained through the convergence of a cylindrical lens at a small included angle. In the etching process, the interaction process of the laserand the material is accurately controlled, and under weak ablation, the sample hardly removes any material, and the highly uniform nano grating structure is obtained on the sample through etching. Asample is moved in the Z-axis interference fringe direction by controlling a precise five-axis translation table, and the long-strip-shaped grating with the width being the beam diameter can be prepared by utilizing the characteristic that femtosecond laser induces growth of self-organizing periodic fringes. 0.8-0.9 time of the diameter of the light beam is further translated, and the sample is continuously moved in a direction parallel to the long-strip-shaped grating and opposite to the long-strip-shaped grating, so as to prepare the large-area highly-uniform nano grating. The method has obvious advantages in the aspect of preparing large-size and high-density reticle grating components, and has the advantages of strong anti-interference capability, convenience in operation, economy andhigh efficiency.

Description

technical field [0001] The invention relates to the technical field of laser preparation of micro-nano structures, in particular to a method for preparing high-density gratings by weak ablation and small-angle interference of femtosecond lasers. Background technique [0002] The femtosecond laser direct writing technology has been deeply studied in the processing of surface periodic structures, and it has important applications in the control of material surface properties, such as superhydrophobic surfaces, absorption and luminescence enhancement, metal surface coloring, and subwavelength anti-reflection. Wait. However, this technology still faces challenges in obtaining high surface uniformity, high regularity, and high-efficiency preparation. In the prior art, large-area gratings can be fabricated by using Damman gratings. However, only Damman gratings are used, which undoubtedly increases the complexity of etching and increases the manufacturing cost. How to find anoth...

Claims

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Application Information

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IPC IPC(8): G02B5/18B23K26/60B23K26/362B23K26/067
CPCB23K26/0673B23K26/362B23K26/60G02B5/1857
Inventor 曹凯强陈龙孙真荣贾天卿
Owner EAST CHINA NORMAL UNIV
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