The invention belongs to the technical field of nano material preparation and micro-nano
pattern processing, and particularly relates to a
nanocrystal capable of being directly subjected to photoetching patterning as well as a preparation method and application of the
nanocrystal, a surface ligand of the
nanocrystal comprises molecules containing a conjugated
double bond structure, and light-induced free radical crosslinking can be generated under
ultraviolet irradiation; the preparation method of the nanocrystal comprises the following steps: adding the molecule containing the conjugated
double bond structure as a ligand into a
reaction system in the synthesis process of the nanocrystal, so that the nanocrystal forms a photoetching surface interface; the nanocrystal material can be directly patterned under the conditions of no
photoresist and no
photoinitiator; the nanocrystal is used for photoetching patterning and has the characteristics of high patterning resolution, good film forming uniformity and the like, the
luminescence property of the nanocrystal after photoetching is kept good, the
environmental stability and
mechanical strength of patterns can be enhanced, and the nanocrystal has wide applicability and expandability and can be widely applied to the field of
photolithography. And an efficient and simple preparation means is provided for future high-resolution
quantum dot display.