225 results about "Nano manufacturing" patented technology

The invention discloses a multi-component gas detection device and method based on a metasurface quasi-continuous domain bound state. The advanced nanometer manufacturing technology and the deep learning algorithm are adopted, and high-precision, high-sensitivity and high-selectivity gas detection is achieved. According to the invention, the metasurface array with specific design is utilized, and the quasi-continuous domain bound state in the middle-infrared band is realized by accurately regulating and controlling the geometric parameters and material characteristics of the microstructure, so that excellent optical response is obtained. In combination with a deep learning algorithm, complex spectral information is converted into accurate gas composition and concentration information, and a reliable solution is provided for the fields of environmental monitoring, industrial production, safety monitoring and the like.

The invention discloses a self-adaptive adjustment femtosecond laser ultra-precision machining system and method, and relates to the technical field of laser application, and the self-adaptive adjustment femtosecond laser ultra-precision machining system comprises a central control mechanism, a femtosecond laser, an optical adjustment mechanism, a self-adaptive control mechanism, a sample displacement mechanism and a CCD monitoring mechanism. According to the technical scheme, a light beam emitted by a femtosecond laser is utilized, light beam adjustment and collimation are carried out through an optical adjustment mechanism, parameters of the laser are adjusted through a self-adaptive control method, micro-nano manufacturing of a complex structure is achieved through a micro-displacement sample table, and a preparation result is observed through a microscope. The system is simple in light path, the focus of the laser is automatically adjusted, and the technical problem that existing femtosecond laser focusing adjustment is tedious in operation is solved.

The invention relates to the technical field of micro-nano manufacturing, in particular to air pressure type nano-imprinting equipment integrating stepping glue spraying, which comprises an air flotation damping platform, a stepping glue spraying module, air pressure type nano-imprinting equipment 3 and an integrated process unit, precise spraying of a micron-sized colloid array is achieved through a piezoelectric control glue spraying head, and high-uniformity air pressure imprinting is completed in combination with an air flotation damping platform and a six-axis leveling mechanism. The equipment also integrates the functions of glue spraying, impressing, curing and demolding, supports the manufacturing of a multi-region special-shaped structure, has the residual glue amount of less than 10nm, and is suitable for efficient preparation of nano electronic and optoelectronic devices.

The invention belongs to the technical field of three-dimensional micro-nano manufacturing, and discloses a three-dimensional composite film and a preparation method thereof.The method comprises the steps that a conductive functional structure is prepared on the surface of a prepared high-molecular polymer composite double-layer stress film; the high-molecular polymer composite double-layer stress film comprises a first high-molecular polymer film and a second high-molecular polymer film arranged on the surface of the first high-molecular polymer film, and the swelling ratio of the first high-molecular polymer film is different from that of the second high-molecular polymer film; the conductive functional layer is prepared on the surface of the second high-molecular polymer film; then cutting to obtain a planar composite double-layer stress film; and the planar composite double-layer stress film is subjected to swelling deformation in a solvent, and the three-dimensional composite film in a preset shape is obtained. According to the method, a stress difference introduction strategy based on a swelling mechanism is utilized, so that integrated curling forming manufacturing of the flexible polymer functional film is realized.

The invention relates to a preparation method of a micro-channel plate, and the method comprises the following steps: 1) processing a transparent material to obtain a micro-channel plate substrate blank; 2) carrying out ultrasonic cleaning on the micro-channel plate substrate blank; 3) performing femtosecond laser induction on the cleaned micro-channel plate substrate blank to modify a glass substrate to form a modified area array; 4) performing ultrasonic chemical etching on the micro-channel plate substrate blank, and corroding the modified area array to form a through hole array; and 5) forming a micro-channel plate glass substrate, and carrying out ultrasonic cleaning on the micro-channel plate glass substrate. The invention has the following beneficial effects: (1) the problem of high manpower and cycle cost caused by various processes such as glass tube drawing, monofilament drawing, multifilament drawing, leveling and the like in the traditional process is solved; and (2) due to the adoption of accurate control and micro-nano manufacturing technologies, the technical problem of high-performance and low-cost preparation of the micro-channel plate is solved, and the yield is improved.

The invention belongs to the field of micro-nano manufacturing technology and microelectronic manufacturing, and particularly relates to a method for manufacturing a complex curved surface conformal high-resolution embedded circuit, which comprises the following steps of: firstly, processing a nano groove structure with a specific pattern on a hard curved surface substrate according to a preset path; a metal seed layer is deposited in the groove, then the groove is filled with a conductive material by adopting filling technologies such as precise electroplating / chemical plating, fusion strengthening is generated among various metals by adopting a laser heating mode, and the adhesive force with the hard curved surface substrate groove structure can be further enhanced after the metals are cooled. And the requirements of extremely severe service environments are met. A new solution is provided for low-cost manufacturing of the embedded curved surface circuit which is high in resolution, adjustable in height-width ratio, high in electrical performance, high in adhesive force and capable of combining multiple materials.

The invention belongs to the technical field of three-dimensional micro-nano manufacturing and sensing, and discloses a self-curling spiral strain sensor and a preparation method thereof, and the method comprises the steps: preparing a patterned graphene conductive film in situ on a top-layer high-molecular polymer film of a flexible film substrate through a laser processing mode; cutting the flexible thin film substrate with the graphene conductive thin film into strip-shaped structures; the swelling effect of the bottom-layer high-molecular polymer film of the flexible film substrate is greater than that of the top-layer high-molecular polymer film, so that the strip-shaped flexible film substrate is subjected to swelling deformation in a solvent, and the self-curling spiral strain sensor can be obtained. The preparation of the flexible spiral structure is realized by utilizing a swelling mechanism, the in-situ preparation of the graphene conductive film is realized by adopting a laser-induced graphene processing mode, the preparation of a multi-level spiral functional structure can be realized by adjusting characteristic parameters, and strain sensors with different sensitivities and working ranges are obtained.

The invention belongs to the field of micro-nano manufacturing, and particularly relates to a preparation method of a high-precision large-area ultrathin hollowed-out hard mask. The invention provides a preparation method of a high-precision large-area ultrathin hollowed-out hard mask, and the method comprises the steps: carrying out the multi-step etching of a thin film layer deposited on the front surface of a silicon substrate, keeping a part of thickness of the thin film layer in the first etching process, and completely etching the thin film layer after the wet etching of the silicon substrate is completed. When the pattern size is smaller or the thin film layer is thinner, the thin film layer can be prevented from being broken in the wet etching process.

The invention provides a mesoporous substrate seepage-guided colloid self-assembly collaborative printing cross-scale micro-nano manufacturing method, which comprises the following steps: placing an open container containing colloid suspension in a closed environment for slow evaporation, and forming a mesoporous substrate with a flat surface in the container; a mesoporous base material is used as a substrate, colloidal suspension liquid is injected / jetted onto the substrate, colloidal liquid drops are rapidly spread and strongly imbibed by the substrate, so that colloidal particles in the liquid are induced to be rapidly assembled on the surface of the substrate, and finally an ordered colloidal photonic crystal structure is formed. The technology of combining the mesoporous base material with printing technologies such as slit coating, ink-jet printing and direct writing printing is utilized to realize ultrafast self-assembly of colloidal particles on the surface of the mesoporous base material, and the large-area patterned colloidal photonic crystal is obtained. The method is simple in process, more importantly, efficient, rapid and cross-scale preparation of the patterned colloid photonic crystal can be achieved, and the preparation time is shortened by two orders of magnitude on the premise that the quality of a colloid assembly is guaranteed.

The invention discloses an electrochemical deposition preparation method of a micro sugarcoated haw-shaped symmetrical antenna structure, which comprises the following steps: S1, carrying out pressurization experiment simulation on the tail end of a glass microprobe in an MCED system through COMSOL software to obtain correlation characteristics of droplet bridge forms at the tip of the glass microprobe under different pressures; s2, adding a pressurizing assembly in the MCED system, and applying pressure to the glass microprobe through the pressurizing assembly under a sealing condition, so that the droplet bridge is expanded and enlarged; s3, feeding back the spatial position of the tail end of the glass microprobe and the droplet form to the MCED controller in real time based on an image processing method of visual detection; and S4, the MCED controller adjusts the droplet form of the tip of the probe and the spatial height of the glass microprobe based on the feedback of the S4, thereby completing the preparation of the micro sugar-coated haw-shaped symmetric antenna structure. According to the electrochemical deposition preparation method of the micro sugar-coated haw-shaped symmetrical antenna structure, under the condition that the preparation stability is guaranteed, micro-nano manufacturing of a complex structure is completed, and the method has wider adaptability.

The invention discloses a sub-nano two-dimensional heterojunction nanopore preparation method based on HIM pore preforming and STEM closed-loop control, and belongs to the technical field of micro-nano manufacturing and MEMS. HIM is utilized to form a 1-3 nm primary pore in a two-dimensional heterojunction film, and then level convergence of the pore diameter is achieved in the STEM through HAADF image intensity threshold monitoring and PID self-adaptive control; and the nano titanium dioxide is stably controlled in a range of 0.5-0.9 nm. The prepared hole has the characteristics that mu belongs to [0.50, 0.90] nm, sigma is smaller than or equal to 0.10 nm, RMS is smaller than or equal to 0.30 nm, the drift rate is smaller than or equal to 0.02 nm.h <-1 > and the like, the repeatability of the hole preparation process is high, the edge is smooth and stable, and the method is suitable for DNA sequencing, ion screening and environmental combined pollutant detection.

The invention relates to the technical field of micro-nano manufacturing, and particularly discloses a multi-layer overlay alignment method for a micro-nano device. Comprising the following steps: pre-aligning a substrate, calibrating unit length of a coordinate system of a microscopic camera system, selecting a main observation area, resolving a deflection angle between the coordinate systems and an axis deflection angle of a coordinate system of a workbench, adjusting a phase attitude of the substrate and a mask plate, adjusting a relative position of the substrate and the mask plate, performing alignment judgment on the relative position attitude, and the like. According to the method, the error correction and compensation function is integrated, the influence of machining errors, assembly errors, mechanism repeated positioning errors and the like of parts such as a precision workbench and a microscopic camera system on the alignment adjustment process is weakened, and the alignment precision and efficiency are improved.

The invention discloses a longitudinal bending composite type six-degree-of-freedom piezoelectric active vibration isolation platform and a working method thereof. The vibration isolation platform adopts a modular structural design, a vibration isolation connecting platform and a base platform are sequentially arranged from top to bottom and are connected through four uniformly distributed vibration isolation modules, and each vibration isolation module forms a multi-stage vibration transmission structure through a fixed base, a transducer base, a piezoelectric transducer, an amplitude-change pole, a pre-tightening bolt and a small flexible hinge. The control module collects feedback signals of a first acceleration sensor arranged on the vibration isolation connecting platform and feedforward signals of a second acceleration sensor arranged on the base platform, and outputs 12-channel control signals to the piezoelectric transducers of the vibration isolation modules after signal processing. The piezoelectric transducer is driven to generate a composite motion mode of longitudinal vibration and multidirectional bending vibration, and active suppression of longitudinal vibration and radial bending vibration in any direction of a vibration isolation object is achieved. The device has the advantages of multi-degree-of-freedom vibration isolation, compact structure, lightweight design, independent control, high stability and the like, and has important application value in the fields of space reflecting mirrors, micro-nano manufacturing equipment vibration control and multi-degree-of-freedom vibration isolation systems.

The invention relates to the technical field of semiconductor micro-nano manufacturing, and discloses a novel semiconductor test probe manufacturing process which comprises the following steps: preparing an ionic liquid electrolyte containing a high-pressure priority adsorbent and a low-pressure priority adsorbent; a first voltage pulse is applied between the microelectrode and the conductive base, the amplitude of the first voltage pulse enables the high-voltage preferential adsorbent to preferentially adsorb on the surface of the microelectrode, and a flexible probe root and a flexible probe body are formed through deposition; then, a second voltage pulse is applied, and the amplitude of the second voltage pulse is lower than that of the first voltage pulse, so that the low-voltage preferential adsorbent preferentially adsorbs and deposits to form a superhard probe tip. The probe with the functional gradient structure is integrally manufactured by programmed voltage regulation and control in single continuous deposition, high hardness of the needle tip and high flexibility of the needle body are simultaneously realized on a single structure, the manufacturing process is remarkably simplified, and the cost is reduced.

The invention discloses a six-degree-of-freedom magnetic suspension workbench structure and a control method thereof, belongs to the technical field of magnetic suspension workbenches, and aims to solve the problems that the stroke of a traditional workbench is difficult to expand, the modeling precision is low, and the influence of a coil edge effect is large. The magnetic suspension workbench structurally comprises a stator capable of being spliced with a PCB coil array, a rotor of a symmetric two-dimensional Halbach permanent magnet array, a data processing module with an information fusion function and an H-bridge-containing driving and real-time control system. According to the control method, a high-precision electromagnetic force model is established, a magnetic field area is divided, a compensation coefficient is introduced to correct an end effect, a pseudo-inverse method based on least square is adopted to decouple and calculate the size of a driving current, and the saturation suppression of the current and the dynamic gating of the coil are realized in combination with a current calculation result; the method can be applied to the fields of precision machining and micro-nano manufacturing, and high-precision long-stroke motion control is achieved.

The invention discloses a laser-induced fusion atomic layer deposition method for a flexible graphene sensing electrode, which belongs to the field of micro-nano manufacturing and specifically comprises four procedures of laser induction, three-dimensional atomic layer deposition, flexible transfer printing and electrode assembly. Firstly, three-dimensional porous graphene grows on a polyimide film through laser induction, and then a gas-phase precursor is allowed to alternately enter a porous graphene framework and be continuously deposited on hole walls by utilizing the self-limiting layer-by-layer growth characteristic of atomic layer deposition, so that a conductive metal atomic layer covering in a full-step manner is formed; and finally, through liquid silica gel pouring-curing stripping, transferring the porous graphene / metal atomic layer to a flexible substrate, and carrying out electrode packaging. The nano-scale metal atomic layers are in interface contact / disconnection, the micron-scale graphene framework is in bridge connection with the atomic layers at the interface, the functions are different and have complementary advantages, the piezoresistive synergistic effect is contributed under the micro-nano scale, and the sensitivity and the response range of the flexible graphene-based sensing electrode are remarkably enhanced.

The invention provides an array glue spraying type nanoimprint device and method, and relates to the technical field of micro-nano manufacturing, and the device comprises a substrate adsorption unit which is used for adsorbing a substrate to drive the substrate to move; the flexible leveling unit is used for adsorbing the mother set, and the substrate adsorption unit drives the substrate to move so as to enable the substrate to be aligned with the mother set, enable the substrate to be in contact with the mother set and apply imprinting force; the glue spraying unit is used for spraying imprinting glue drops which are preset in glue drop size and are arranged in an array to the surface of the substrate; the optical alignment unit is used for observing an alignment mark between the substrate and the mother set and determining the alignment state of the substrate and the mother set; the electric displacement unit is used for driving the substrate adsorption unit to move; the exposure unit is configured to expose the imprinting glue under the condition that the substrate and the master mask are aligned and compressed, so that the imprinting glue is cured; and the control unit is used for controlling all the units to execute corresponding actions.

The invention belongs to the technical field of three-dimensional micro-nano manufacturing and energy storage, and discloses a three-dimensional self-curling micro supercapacitor and a controllable preparation method thereof.The method comprises the steps that a double-layer film substrate is prepared, the double-layer film substrate comprises a conductive function layer with the negative thermal expansion coefficient on the top layer and a magnetic film substrate with the positive thermal expansion coefficient on the bottom layer, a high remanence material and a magnetocaloric material are uniformly distributed in the magnetic film substrate; preparing a patterned interdigital electrode on the surface of the conductive functional layer; preparing a positive electrode on one side of the interdigital electrode and preparing a negative electrode on the other side of the interdigital electrode on the surface of the conductive functional layer to obtain the composite planar micro supercapacitor. Bending and deforming the composite planar micro supercapacitor in a magnetic field to obtain a self-curling structure; and adding a liquid crystal electrolyte into the self-curling structure to obtain the three-dimensional self-curling micro supercapacitor. The projection area of the device is further reduced, the space utilization rate of the device is improved, and the energy density of the device in unit area is further improved.

The invention discloses a step height and flatness measuring method based on a laser interference method, which comprises the following steps of: determining that a calibrated step is put into a laser interference measuring device, moving a reflector distance to obtain an interference image, and processing the interference image to obtain a step surface phase distribution diagram. Determining the position of a calculation point according to a step boundary, calculating a step measurement result, optimizing device parameters according to the step measurement result and step calibration value deviation to obtain optimal device parameters, and constructing a step device parameter library; and according to the step parameters of the to-be-measured step, matching the optimal device parameters in the step device parameter library to obtain reference device parameters, adjusting the laser interference measurement device, and measuring the to-be-measured step by using the adjusted laser interference measurement device to obtain the step height and the step flatness. The method can timely and accurately measure the height and flatness of the step, and has important significance for promoting the development of a high-precision measurement technology in the field of micro-nano manufacturing.

The invention provides an ultramicro dispensing device and method based on air pressure-vision double closed-loop control, and belongs to the technical field of micro-nano manufacturing, the device comprises an air source, a pressure reducing valve, a Venturi tube, an electronic pressure controller, an electromagnetic valve circuit, a digital-to-analog conversion module, a calculation module, an air pressure sensor, a dispensing needle tube, a vision module and a dispensing platform, the method comprises the following steps: detecting the diameter of a glue spot in real time by adopting a visual unit, dynamically identifying an air pressure-glue spot diameter nonlinear compensation model, and adjusting the air pressure of a dispensing needle tube by adopting a closed-loop controller to realize accurate control of the glue spot. Experimental results show that the glue spot control with the minimum diameter of 9.87 microns can be realized, the quantitative dispensing of 10 microns, 20 microns, 30 microns and 40 microns can be completed, the error is within 8.3%, and the glue spot control device has the advantages of high precision and high stability.

The nanoimprint equipment and the nanoimprint method can improve the production efficiency and can be applied to the technical field of micro-nano manufacturing. The nanoimprint device comprises at least two platforms, wherein each platform is used for placing a substrate; the platform moving guide rail is provided with a preset position and is used for bearing the at least two platforms, so that the at least two platforms can move to or out of the preset position along the platform moving guide rail, and only one platform is allowed to be located at the preset position at the same time; and the imprinting head is arranged on the opposite side of the preset position in the platform moving guide rail and is used for placing an imprinting template, and the imprinting template is used for carrying out imprinting operation on the substrate on the platform at the preset position. The embodiment of the invention has the advantage that the nanoimprint efficiency can be improved.

The invention belongs to the related technical field of flexible electronic micro-nano manufacturing, and discloses a method for preparing a conductive thin film through plasma-assisted electrospray, the conductive thin film and application of the conductive thin film, and the method comprises the following steps: (1) carrying out surface modification treatment on an insulating substrate by adopting plasma to improve the charge dissipation speed and hydrophilicity of the surface of the insulating substrate; and (2) preparing a thin film on the surface of the insulating substrate in an electrostatic spraying manner to obtain the conductive thin film. The surface of the insulating substrate is subjected to plasma modification treatment to improve the charge dissipation speed and hydrophilicity of the surface of the insulating substrate, electrostatic spraying is adopted to perform electrostatic paint spraying on the surface of the insulating substrate to prepare the conductive film, and the modification treatment improves the electrofluid spraying performance of the surface of the insulating substrate; and the continuous, compact and defect-free conductive film on the surface of the insulating substrate is obtained.

The invention relates to the technical field of printing, in particular to an intaglio printing and overprinting process for a paper packaging box, which is applied to the printing process of the paper packaging box, adopts an intaglio printing mode, combines a laser engraving technology and a micro-nano manufacturing technology, and accurately engraves a micro-nano pit structure corresponding to an original pattern on an intaglio cylinder. The depth of the pits is controlled within the range of 50 nanometers to 50 micrometers, the shapes include but are not limited to circles, ellipses, polygons and complex geometrical shapes, the arrangement density reaches more than one million per square centimeter, surface textures are customized in a personalized mode according to image layers and color requirements, and printing with high precision, high definition, high stereoscopic impression and excellent touch effect is achieved. The gravure printing and overprinting process for the paper packaging box has the beneficial effects that the laser engraving technology and the micro-nano manufacturing technology are combined, the micro-nano level pit structure can be accurately engraved, and the high-precision, high-definition and high-stereoscopic-impression printing effect is achieved.

The invention discloses a multi-focus laser micro-nano manufacturing method and system, and relates to the technical field of laser processing, and the method comprises the steps: analyzing SVG vector coding information of a processing pattern; an LCOS-SLM multi-focus array is obtained by adopting an annular segmentation algorithm; adjusting the size of the graph, carrying out discretization processing on the graph, and carrying out interval homogenization processing on coordinate points of the graph; dividing the uniformly dispersed graph into n processing areas, and grouping coordinate information by taking uniform distribution of focus positions as a principle to obtain a processing path; substituting the coordinate information of each partition into an annular segmentation algorithm to generate a holographic phase image set; and splicing parameters between the machining areas are calibrated, and multi-focus parallel machining is completed. The efficient laser parallel machining method is achieved, the efficiency and stability of a laser machining system and the machining uniformity of a curve structure can be improved, and an efficient and reliable solution is provided for the field of micro-nano machining.

The invention discloses a surface plasmon resonance radiation cooling-heat conduction-liquid film evaporation coupling heat dissipation multi-layer co-construction micro-nano structure and a manufacturing method and application thereof, and belongs to the technical field of micro-nano manufacturing and functional structure surfaces, and the multi-layer co-construction micro-nano structure is composed of three layers of structures; the bottom layer structure is a substrate; the top of the bottom layer structure is a near-infrared wavelength scale grating structure; the middle-layer structure is a high-thermal-conductivity diamond film and covers and fills the bottom-layer structure; the top of the middle-layer structure is of a lyophilic micro-nano structure; the top layer structure is a silicon dioxide film. Radiation cooling, efficient heat conduction and liquid film evaporation / boiling phase change heat transfer are coupled, the heat transfer and heat dissipation level is greatly improved, additional external energy input is not needed, and positive significance is achieved for research and development of a novel high-performance and zero-energy-consumption radiator, promotion of development of a high-heat-flow-density advanced system and improvement of the ecological environment.

The invention discloses a large-area cross-scale super lens rapid preparation method based on a transfer printing process, and relates to the field of micro-nano manufacturing. Comprising the steps of substrate cleaning, primary gluing, primary pre-baking, primary exposure, secondary gluing, secondary pre-baking, transferring, secondary exposure, releasing, developing, deep silicon etching and dry-method photoresist removing. Through the transferable and releasable photoresist near-field contact type photoetching technology, the deep silicon etching technology, the dry photoresist removing technology and the like, rapid and low-cost preparation of the large-area cross-scale super lens is achieved. According to the method, perfect contact exposure can be realized by virtue of the transferable photoresist, and the structural precision of the near-infrared super lens can be easily achieved. The transferable photoresist with excellent mechanical properties is utilized to protect the photoresist with low mechanical properties, the key problem of perfect lossless stripping and release of the large-area double-layer photoresist is solved, and a scheme which is high in efficiency, low in cost, simple and capable of being copied quickly is provided for preparation of the large-area cross-scale super lens.

The invention discloses an angle-adjustable narrow-band heat radiator based on corner hyperbolic phonon polaritons. The heat radiator sequentially comprises a metal layer, a natural biaxial hyperbolic medium, a vacuum / air spacing layer and a one-dimensional medium grating. According to the angle-adjustable heat radiator, the biaxial hyperbolic medium and the gold layer are twisted as a whole, and the included angle between the radiating surface and the plane where the crystal axis of the natural biaxial hyperbolic medium is located is changed, so that the heat radiation direction is changed. The radiator can be produced on a large scale at low cost by utilizing processes such as nano photoetching and deposition. The narrow-band directional thermal radiation device obtained through the nano manufacturing technology is stable and reliable in performance, can generate thermal radiation with narrow bandwidth and small radiation angle, has the characteristics of adjustable direction, flexibility, convenience and the like, and is expected to be applied to the fields of directional heat dissipation, thermal camouflage and the like.

The invention belongs to the field of micro-nano manufacturing and additive manufacturing, and particularly relates to a near-field electrostatic spinning accurate control method and device based on an auxiliary electrode and visual learning. A pair of parallel auxiliary electrodes is mounted in the X-axis direction and the Y-axis direction of the spray head respectively, and it is ensured that uniform horizontal electric fields are generated at the bottom end of the spray head and the area below the spray head to act on a jet flow generation area; setting process parameters of near-field electrostatic spinning, and starting processing; auxiliary electrode voltage in the same direction as the moving direction of the receiving device is set, and a horizontal electric field is formed to counteract the stretching effect of substrate moving on the jet flow; a visual learning system is started, images are collected in real time through a high-speed camera, key features are extracted through an image recognition algorithm, and information such as the jet flow angle, the fiber deposition path and the fiber diameter is collected in real time; according to original data collected by a visual learning system, a machine learning algorithm is applied to realize self-adaptive adjustment of auxiliary electrode voltage so as to improve fiber deposition precision. The device is used for solving the problem of fiber deposition errors caused by high-speed movement of a receiving device in the traditional near-field electrostatic spinning process.

The invention relates to the technical field of laser micro-nano manufacturing, and discloses a filtering supercapacitor based on nanoparticle-shaped graphene / foam metal and a preparation method thereof, and the preparation method comprises the following steps: preparing a cyanate resin / foam metal composite film by employing foam metal with an open pore structure and a liquid cyanate monomer; carrying out laser processing by adopting an intermediate infrared large-size light spot laser beam and an ultraviolet small-size light spot laser beam, and carrying out in-situ laser induction on the surface of the foam metal to grow the nanoparticle-shaped graphene so as to prepare a nanoparticle-shaped graphene / foam metal electrode raw material; cutting the electrode raw material into an electrode, and attaching a second mask; and preparing an interlayer type filtering supercapacitor. The conductivity of the generated nanoparticle-shaped graphene / foam metal thin film is as high as 909.09 S / cm, the prepared supercapacitor still keeps a relatively good capacitance behavior at a scanning rate of 2500V / s, the phase angle is as high as-70 degrees at 120Hz, the surface specific capacitance is 245 [mu] F / cm < 2 >, and meanwhile, the supercapacitor has a cut-off frequency as high as 3kHz and an RC time constant as low as 0.33 ms.

The application discloses a kind of aberration correction method and device under high numerical aperture objective lens two-photon lithography, and it is related to micro-nano manufacturing and laser processing technical field.The method comprises the following steps: establishing the two-photon lithography system parameter model for aberration correction;According to the preset target focal point distribution, the focal point phase to be loaded into spatial light modulator is calculated using GS algorithm;Calculate depth-dependent aberration and generate compensation phase;Superimpose total loading phase and generate SLM hologram;Adjust objective lens to make it align with the sample on translation stage, make immersion oil and sample surface closely contact, complete the immersion alignment of objective lens and sample;Make sample and focal point produce relative displacement, complete two-photon lithography processing under the condition of spherical aberration compensation;After processing after exposure sample, obtain three-dimensional microstructure with different depth voxel.The method can improve the consistency and forming quality of deep three-dimensional micro-nano processing.