183 results about "Nano manufacturing" patented technology

The invention discloses a multi-component gas detection device and method based on a metasurface quasi-continuous domain bound state. The advanced nanometer manufacturing technology and the deep learning algorithm are adopted, and high-precision, high-sensitivity and high-selectivity gas detection is achieved. According to the invention, the metasurface array with specific design is utilized, and the quasi-continuous domain bound state in the middle-infrared band is realized by accurately regulating and controlling the geometric parameters and material characteristics of the microstructure, so that excellent optical response is obtained. In combination with a deep learning algorithm, complex spectral information is converted into accurate gas composition and concentration information, and a reliable solution is provided for the fields of environmental monitoring, industrial production, safety monitoring and the like.

The invention relates to the technical field of micro-nano manufacturing, in particular to air pressure type nano-imprinting equipment integrating stepping glue spraying, which comprises an air flotation damping platform, a stepping glue spraying module, air pressure type nano-imprinting equipment 3 and an integrated process unit, precise spraying of a micron-sized colloid array is achieved through a piezoelectric control glue spraying head, and high-uniformity air pressure imprinting is completed in combination with an air flotation damping platform and a six-axis leveling mechanism. The equipment also integrates the functions of glue spraying, impressing, curing and demolding, supports the manufacturing of a multi-region special-shaped structure, has the residual glue amount of less than 10nm, and is suitable for efficient preparation of nano electronic and optoelectronic devices.

The invention belongs to the field of micro-nano manufacturing technology and microelectronic manufacturing, and particularly relates to a method for manufacturing a complex curved surface conformal high-resolution embedded circuit, which comprises the following steps of: firstly, processing a nano groove structure with a specific pattern on a hard curved surface substrate according to a preset path; a metal seed layer is deposited in the groove, then the groove is filled with a conductive material by adopting filling technologies such as precise electroplating / chemical plating, fusion strengthening is generated among various metals by adopting a laser heating mode, and the adhesive force with the hard curved surface substrate groove structure can be further enhanced after the metals are cooled. And the requirements of extremely severe service environments are met. A new solution is provided for low-cost manufacturing of the embedded curved surface circuit which is high in resolution, adjustable in height-width ratio, high in electrical performance, high in adhesive force and capable of combining multiple materials.

The invention belongs to the field of micro-nano manufacturing, and particularly relates to a preparation method of a high-precision large-area ultrathin hollowed-out hard mask. The invention provides a preparation method of a high-precision large-area ultrathin hollowed-out hard mask, and the method comprises the steps: carrying out the multi-step etching of a thin film layer deposited on the front surface of a silicon substrate, keeping a part of thickness of the thin film layer in the first etching process, and completely etching the thin film layer after the wet etching of the silicon substrate is completed. When the pattern size is smaller or the thin film layer is thinner, the thin film layer can be prevented from being broken in the wet etching process.

The invention discloses an electrochemical deposition preparation method of a micro sugarcoated haw-shaped symmetrical antenna structure, which comprises the following steps: S1, carrying out pressurization experiment simulation on the tail end of a glass microprobe in an MCED system through COMSOL software to obtain correlation characteristics of droplet bridge forms at the tip of the glass microprobe under different pressures; s2, adding a pressurizing assembly in the MCED system, and applying pressure to the glass microprobe through the pressurizing assembly under a sealing condition, so that the droplet bridge is expanded and enlarged; s3, feeding back the spatial position of the tail end of the glass microprobe and the droplet form to the MCED controller in real time based on an image processing method of visual detection; and S4, the MCED controller adjusts the droplet form of the tip of the probe and the spatial height of the glass microprobe based on the feedback of the S4, thereby completing the preparation of the micro sugar-coated haw-shaped symmetric antenna structure. According to the electrochemical deposition preparation method of the micro sugar-coated haw-shaped symmetrical antenna structure, under the condition that the preparation stability is guaranteed, micro-nano manufacturing of a complex structure is completed, and the method has wider adaptability.

The invention discloses a sub-nano two-dimensional heterojunction nanopore preparation method based on HIM pore preforming and STEM closed-loop control, and belongs to the technical field of micro-nano manufacturing and MEMS. HIM is utilized to form a 1-3 nm primary pore in a two-dimensional heterojunction film, and then level convergence of the pore diameter is achieved in the STEM through HAADF image intensity threshold monitoring and PID self-adaptive control; and the nano titanium dioxide is stably controlled in a range of 0.5-0.9 nm. The prepared hole has the characteristics that mu belongs to [0.50, 0.90] nm, sigma is smaller than or equal to 0.10 nm, RMS is smaller than or equal to 0.30 nm, the drift rate is smaller than or equal to 0.02 nm.h <-1 > and the like, the repeatability of the hole preparation process is high, the edge is smooth and stable, and the method is suitable for DNA sequencing, ion screening and environmental combined pollutant detection.

The invention discloses a longitudinal bending composite type six-degree-of-freedom piezoelectric active vibration isolation platform and a working method thereof. The vibration isolation platform adopts a modular structural design, a vibration isolation connecting platform and a base platform are sequentially arranged from top to bottom and are connected through four uniformly distributed vibration isolation modules, and each vibration isolation module forms a multi-stage vibration transmission structure through a fixed base, a transducer base, a piezoelectric transducer, an amplitude-change pole, a pre-tightening bolt and a small flexible hinge. The control module collects feedback signals of a first acceleration sensor arranged on the vibration isolation connecting platform and feedforward signals of a second acceleration sensor arranged on the base platform, and outputs 12-channel control signals to the piezoelectric transducers of the vibration isolation modules after signal processing. The piezoelectric transducer is driven to generate a composite motion mode of longitudinal vibration and multidirectional bending vibration, and active suppression of longitudinal vibration and radial bending vibration in any direction of a vibration isolation object is achieved. The device has the advantages of multi-degree-of-freedom vibration isolation, compact structure, lightweight design, independent control, high stability and the like, and has important application value in the fields of space reflecting mirrors, micro-nano manufacturing equipment vibration control and multi-degree-of-freedom vibration isolation systems.

The invention relates to the technical field of semiconductor micro-nano manufacturing, and discloses a novel semiconductor test probe manufacturing process which comprises the following steps: preparing an ionic liquid electrolyte containing a high-pressure priority adsorbent and a low-pressure priority adsorbent; a first voltage pulse is applied between the microelectrode and the conductive base, the amplitude of the first voltage pulse enables the high-voltage preferential adsorbent to preferentially adsorb on the surface of the microelectrode, and a flexible probe root and a flexible probe body are formed through deposition; then, a second voltage pulse is applied, and the amplitude of the second voltage pulse is lower than that of the first voltage pulse, so that the low-voltage preferential adsorbent preferentially adsorbs and deposits to form a superhard probe tip. The probe with the functional gradient structure is integrally manufactured by programmed voltage regulation and control in single continuous deposition, high hardness of the needle tip and high flexibility of the needle body are simultaneously realized on a single structure, the manufacturing process is remarkably simplified, and the cost is reduced.

The invention discloses a six-degree-of-freedom magnetic suspension workbench structure and a control method thereof, belongs to the technical field of magnetic suspension workbenches, and aims to solve the problems that the stroke of a traditional workbench is difficult to expand, the modeling precision is low, and the influence of a coil edge effect is large. The magnetic suspension workbench structurally comprises a stator capable of being spliced with a PCB coil array, a rotor of a symmetric two-dimensional Halbach permanent magnet array, a data processing module with an information fusion function and an H-bridge-containing driving and real-time control system. According to the control method, a high-precision electromagnetic force model is established, a magnetic field area is divided, a compensation coefficient is introduced to correct an end effect, a pseudo-inverse method based on least square is adopted to decouple and calculate the size of a driving current, and the saturation suppression of the current and the dynamic gating of the coil are realized in combination with a current calculation result; the method can be applied to the fields of precision machining and micro-nano manufacturing, and high-precision long-stroke motion control is achieved.

The invention provides an array glue spraying type nanoimprint device and method, and relates to the technical field of micro-nano manufacturing, and the device comprises a substrate adsorption unit which is used for adsorbing a substrate to drive the substrate to move; the flexible leveling unit is used for adsorbing the mother set, and the substrate adsorption unit drives the substrate to move so as to enable the substrate to be aligned with the mother set, enable the substrate to be in contact with the mother set and apply imprinting force; the glue spraying unit is used for spraying imprinting glue drops which are preset in glue drop size and are arranged in an array to the surface of the substrate; the optical alignment unit is used for observing an alignment mark between the substrate and the mother set and determining the alignment state of the substrate and the mother set; the electric displacement unit is used for driving the substrate adsorption unit to move; the exposure unit is configured to expose the imprinting glue under the condition that the substrate and the master mask are aligned and compressed, so that the imprinting glue is cured; and the control unit is used for controlling all the units to execute corresponding actions.

The invention discloses a step height and flatness measuring method based on a laser interference method, which comprises the following steps of: determining that a calibrated step is put into a laser interference measuring device, moving a reflector distance to obtain an interference image, and processing the interference image to obtain a step surface phase distribution diagram. Determining the position of a calculation point according to a step boundary, calculating a step measurement result, optimizing device parameters according to the step measurement result and step calibration value deviation to obtain optimal device parameters, and constructing a step device parameter library; and according to the step parameters of the to-be-measured step, matching the optimal device parameters in the step device parameter library to obtain reference device parameters, adjusting the laser interference measurement device, and measuring the to-be-measured step by using the adjusted laser interference measurement device to obtain the step height and the step flatness. The method can timely and accurately measure the height and flatness of the step, and has important significance for promoting the development of a high-precision measurement technology in the field of micro-nano manufacturing.

The invention provides an ultramicro dispensing device and method based on air pressure-vision double closed-loop control, and belongs to the technical field of micro-nano manufacturing, the device comprises an air source, a pressure reducing valve, a Venturi tube, an electronic pressure controller, an electromagnetic valve circuit, a digital-to-analog conversion module, a calculation module, an air pressure sensor, a dispensing needle tube, a vision module and a dispensing platform, the method comprises the following steps: detecting the diameter of a glue spot in real time by adopting a visual unit, dynamically identifying an air pressure-glue spot diameter nonlinear compensation model, and adjusting the air pressure of a dispensing needle tube by adopting a closed-loop controller to realize accurate control of the glue spot. Experimental results show that the glue spot control with the minimum diameter of 9.87 microns can be realized, the quantitative dispensing of 10 microns, 20 microns, 30 microns and 40 microns can be completed, the error is within 8.3%, and the glue spot control device has the advantages of high precision and high stability.

The nanoimprint equipment and the nanoimprint method can improve the production efficiency and can be applied to the technical field of micro-nano manufacturing. The nanoimprint device comprises at least two platforms, wherein each platform is used for placing a substrate; the platform moving guide rail is provided with a preset position and is used for bearing the at least two platforms, so that the at least two platforms can move to or out of the preset position along the platform moving guide rail, and only one platform is allowed to be located at the preset position at the same time; and the imprinting head is arranged on the opposite side of the preset position in the platform moving guide rail and is used for placing an imprinting template, and the imprinting template is used for carrying out imprinting operation on the substrate on the platform at the preset position. The embodiment of the invention has the advantage that the nanoimprint efficiency can be improved.

The invention belongs to the related technical field of flexible electronic micro-nano manufacturing, and discloses a method for preparing a conductive thin film through plasma-assisted electrospray, the conductive thin film and application of the conductive thin film, and the method comprises the following steps: (1) carrying out surface modification treatment on an insulating substrate by adopting plasma to improve the charge dissipation speed and hydrophilicity of the surface of the insulating substrate; and (2) preparing a thin film on the surface of the insulating substrate in an electrostatic spraying manner to obtain the conductive thin film. The surface of the insulating substrate is subjected to plasma modification treatment to improve the charge dissipation speed and hydrophilicity of the surface of the insulating substrate, electrostatic spraying is adopted to perform electrostatic paint spraying on the surface of the insulating substrate to prepare the conductive film, and the modification treatment improves the electrofluid spraying performance of the surface of the insulating substrate; and the continuous, compact and defect-free conductive film on the surface of the insulating substrate is obtained.

The invention discloses a multi-focus laser micro-nano manufacturing method and system, and relates to the technical field of laser processing, and the method comprises the steps: analyzing SVG vector coding information of a processing pattern; an LCOS-SLM multi-focus array is obtained by adopting an annular segmentation algorithm; adjusting the size of the graph, carrying out discretization processing on the graph, and carrying out interval homogenization processing on coordinate points of the graph; dividing the uniformly dispersed graph into n processing areas, and grouping coordinate information by taking uniform distribution of focus positions as a principle to obtain a processing path; substituting the coordinate information of each partition into an annular segmentation algorithm to generate a holographic phase image set; and splicing parameters between the machining areas are calibrated, and multi-focus parallel machining is completed. The efficient laser parallel machining method is achieved, the efficiency and stability of a laser machining system and the machining uniformity of a curve structure can be improved, and an efficient and reliable solution is provided for the field of micro-nano machining.

The invention discloses an angle-adjustable narrow-band heat radiator based on corner hyperbolic phonon polaritons. The heat radiator sequentially comprises a metal layer, a natural biaxial hyperbolic medium, a vacuum / air spacing layer and a one-dimensional medium grating. According to the angle-adjustable heat radiator, the biaxial hyperbolic medium and the gold layer are twisted as a whole, and the included angle between the radiating surface and the plane where the crystal axis of the natural biaxial hyperbolic medium is located is changed, so that the heat radiation direction is changed. The radiator can be produced on a large scale at low cost by utilizing processes such as nano photoetching and deposition. The narrow-band directional thermal radiation device obtained through the nano manufacturing technology is stable and reliable in performance, can generate thermal radiation with narrow bandwidth and small radiation angle, has the characteristics of adjustable direction, flexibility, convenience and the like, and is expected to be applied to the fields of directional heat dissipation, thermal camouflage and the like.

The invention relates to the technical field of laser micro-nano manufacturing, and discloses a filtering supercapacitor based on nanoparticle-shaped graphene / foam metal and a preparation method thereof, and the preparation method comprises the following steps: preparing a cyanate resin / foam metal composite film by employing foam metal with an open pore structure and a liquid cyanate monomer; carrying out laser processing by adopting an intermediate infrared large-size light spot laser beam and an ultraviolet small-size light spot laser beam, and carrying out in-situ laser induction on the surface of the foam metal to grow the nanoparticle-shaped graphene so as to prepare a nanoparticle-shaped graphene / foam metal electrode raw material; cutting the electrode raw material into an electrode, and attaching a second mask; and preparing an interlayer type filtering supercapacitor. The conductivity of the generated nanoparticle-shaped graphene / foam metal thin film is as high as 909.09 S / cm, the prepared supercapacitor still keeps a relatively good capacitance behavior at a scanning rate of 2500V / s, the phase angle is as high as-70 degrees at 120Hz, the surface specific capacitance is 245 [mu] F / cm < 2 >, and meanwhile, the supercapacitor has a cut-off frequency as high as 3kHz and an RC time constant as low as 0.33 ms.

The application discloses a kind of aberration correction method and device under high numerical aperture objective lens two-photon lithography, and it is related to micro-nano manufacturing and laser processing technical field.The method comprises the following steps: establishing the two-photon lithography system parameter model for aberration correction;According to the preset target focal point distribution, the focal point phase to be loaded into spatial light modulator is calculated using GS algorithm;Calculate depth-dependent aberration and generate compensation phase;Superimpose total loading phase and generate SLM hologram;Adjust objective lens to make it align with the sample on translation stage, make immersion oil and sample surface closely contact, complete the immersion alignment of objective lens and sample;Make sample and focal point produce relative displacement, complete two-photon lithography processing under the condition of spherical aberration compensation;After processing after exposure sample, obtain three-dimensional microstructure with different depth voxel.The method can improve the consistency and forming quality of deep three-dimensional micro-nano processing.

The invention discloses a visible light dual-wavelength polarization multiplexing metasurface hologram and a preparation method thereof, and relates to the technical field of micro-nano manufacturing. The super-surface hologram is composed of a super-atom array based on a nanoimprint technology, wherein the period of the super-atom array in the x direction and the period of the super-atom array in the y direction are 450 nm, and the height of the super-atom array is 800 nm. In the superatom array, all superatoms are of cuboid columnar structures, and a main body is composed of a polymer doped with titanium dioxide nanoparticles; the size and the position of each super atom are determined according to a GS algorithm; the GS algorithm is used for calculating the phase information of the target image under the polarized light with the corresponding wavelength; the wavelength polarized light comprises X polarized light of 532 nm and Y polarized light of 671 nm. According to the method, the problems of long manufacturing process period, small scale, high cost and the like of a traditional metasurface device can be solved, and a new development thought is provided for a multi-color imaging technology based on metasurface holography.

The invention discloses an array flexible tactile sensor packaging layer micro-nano manufacturing method and device, and the method comprises the steps: obtaining a performance demand of a packaging layer, and selecting a packaging material of the packaging layer according to the performance demand; forming a packaging substrate based on the packaging material, coating the packaging substrate to form a pre-packaging layer, and constructing a nano-pore structure on the pre-packaging layer; and curing the nano-pore structure, aligning the cured nano-pore structure to a sensing unit of the arrayed flexible tactile sensor by using a micro-nano precise alignment device, recording an alignment position, and fixing the packaging layer on the arrayed flexible tactile sensor according to the alignment position. By preparing the packaging layer with the nano-pore structure, external impurities and interference can be effectively blocked, gas and heat exchange between the sensor and the external environment can be ensured, and the normal working performance of the sensor is maintained.

The utility model provides a kind of micro pattern repair resistance device of ceramic metal film resistor, belong to micro-nano manufacturing technology field, including numerical control machine tool, support plate fixedly installed on the outer surface of numerical control machine tool, and ultraviolet laser is arranged to the outside of support plate;Self-locking mechanism, including the fixed frame fixedly connected to the outer surface of support plate, the connecting shaft fixedly installed in the inner surface of the fixed frame by bearing sleeve, the gear fixedly set in the outer end surface of the connecting shaft, the toothed plate engaged with the outer surface of the gear.The utility model can not only use the automatic gravity of ultraviolet laser to quickly install it by the cooperation between each component in self-locking mechanism, but also can automatically lock it after ultraviolet laser installation by locking assembly, so that ultraviolet laser can complete installation in a short time, and ensure that the laser after each replacement can be firmly locked.

The application provides a KDP crystal surface micro-nano defect DPN water-soluble repair morphology evolution simulation method, and relates to the technical field of micro-nano manufacturing, and aims to solve the problem that there is no quantitative method to simulate the evolution process of the KDP crystal surface micro-nano defect DPN water-soluble repair morphology in the prior art. The method comprises the following steps: step one, constructing a defect local growth mathematical model; step two, performing dimension conversion on the defect depth information, and performing dimension reduction processing on the model; step three, converting the defect local growth mathematical model into a standard partial differential equation form; step four, obtaining the initial value of the defect local growth mathematical model, and setting the model boundary condition; step five, performing parameterization scanning on the undetermined coefficient, and determining the undetermined coefficient value; and step six, simulating the KDP crystal surface micro-nano defect DPN water-soluble repair morphology evolution process. Through dimension conversion, the dimension reduction processing of the model is realized, and finally the simulation of the KDP crystal surface micro-nano defect DPN water-soluble repair morphology evolution process is realized.

The invention discloses a controllable preparation method of a glass surface micro-pit structure based on high-temperature viscoelastic drawing, and relates to the technical field of optical glass precision forming and surface micro-nano manufacturing. The method comprises the following steps: preparing a micron-order or submicron-order microstructure on the molding surface of a mold; placing a glass prefabricated part between the upper and lower parallel molds, and heating the glass prefabricated part to a viscoelastic state; the glass prefabricated part is pressed to the specified compression amount, so that the glass prefabricated part-mold interface is in an adhesion state; drawing displacement is applied, and the glass prefabricated part and the mold are relatively separated; and cooling the glass preform to room temperature to obtain the glass sample with the micro-concave structure formed on the surface. The micro-pit nucleation is induced by utilizing the micro-texture on the surface of the mold, and the micro-pit structure can be directly formed on the surface of the glass by combining the interface adhesion and viscoelastic drawing effects.

The utility model discloses an ultrahigh-resolution piezoelectric controller, and relates to an ultrahigh-resolution piezoelectric control technology. In order to solve the problems of limited DAC resolution, slow closed-loop control response speed, large signal noise and drift, multi-DAC superposition error accumulation and the like, the utility model provides a controller circuit board which comprises a power supply unit, a main control unit, a driving unit and a sensing servo unit. The power supply unit provides a stable multi-stage power supply; the master control unit adopts a 32-bit single-chip microcomputer and integrates a DA conversion circuit, an AD conversion circuit and an analog signal input unit. The driving unit amplifies the main control signal and drives the piezoelectric ceramic actuator. The sensing servo unit comprises a signal conditioning circuit and a PID closed-loop control circuit. The utility model also discloses an ultrahigh-resolution piezoelectric controller comprising the circuit board. The piezoelectric driving device is widely applied to the fields of precise motion control, nanoscale positioning, micro-nano manufacturing, acoustic equipment, medical equipment and the like, and high-precision, low-noise and stable piezoelectric driving control is achieved.

The application discloses a silicon steel-based micro-magnetic pole design method and a magnetic field enhancement method, relates to the technical field of micro-nano manufacturing and magnetic control micro-operation, and comprises the following steps: obtaining micro-magnetic pole basic parameters and traditional four-pole magnetic tweezers basic parameters; performing micro-magnetic pole structure design according to the micro-magnetic pole basic parameters to determine a micro-magnetic pole basic structure; the micro-magnetic pole basic structure is an isosceles triangle; performing micro-magnetic pole structure simulation according to the micro-magnetic pole basic structure and the traditional four-pole magnetic tweezers basic parameters to determine micro-magnetic pole optimal geometric structure parameters; and preparing a formed micro-magnetic pole from a crystal grain-oriented silicon steel sheet as a material according to the micro-magnetic pole optimal geometric structure parameters. The application can provide sufficient magnetic driving force while keeping the original working space of a magnetic control system, and can enhance the magnetic field.

The application discloses an ultra-precision air static pressure rotary table, which comprises a radial brass bearing sleeve, a table top, a base, a feedback grating system, an axial thrust, a gas distribution block and an air bearing core. The application has the advantages that: for the 300mm nominal disc diameter specification, the four core performance requirements of focusing low speed / low-medium speed operation, large load bearing, ultra-high structural rigidity and nanometer level rotation accuracy can be met, and the application can be widely applied to 300mm semiconductor wafer detection and calibration platforms, optical element ultra-precision grinding / polishing machine tools, diamond tool ultra-precision cutting rotary tables, large-size part high-precision measurement detection instruments, micro-nano manufacturing system rotary tables, aerospace precision component processing equipment and other national strategic high-end manufacturing equipment. The application is a core basic component for supporting modern ultra-precision machining, semiconductor detection, optical manufacturing and precision measurement industry to realize low-speed stable operation, heavy load support, high rigidity precision protection and nanometer level positioning.

The invention discloses a preparation method of a near-infrared achromatic super lens based on a nanoimprint technology, and relates to the technical field of micro-nano manufacturing. The preparation method comprises the following steps: 1, designing a target super lens by using finite element simulation software based on a time domain finite difference method, a particle swarm algorithm and a scalar diffraction algorithm; 2, preparing a silicon female die corresponding to the super lens according to the designed target super lens parameters by using electron beam lithography and deep reactive ion etching; 3, carrying out surface fluorination treatment on the silicon female die; and 4, preparing a corresponding sub-mold according to the silicon female mold, carrying out imprinting by using a nano imprinting technology and the sub-mold, and finally, etching the a-Si layer on the surface of the substrate through deep reactive ion etching by taking imprinting glue as an etching mask to obtain the super lens. According to the invention, the nanoimprint technology can be used for manufacturing the near-infrared achromatic superlens, so that the near-infrared achromatic superlens gets rid of dependence on a high-precision photoetching machine.

The invention relates to the technical field of micro-nano manufacturing, in particular to a thermal interface material preparation method based on multi-element filler confinement directional arrangement, and the method comprises the following steps: step 1, obtaining filler / matrix composite slurry; 2, removing bubbles in the composite slurry; step 3, preparing a chamber; 4, designing and preparing two structured electrodes; step 5, filling the composite slurry into the cavity; 6, applying an electric signal to directionally arrange the filler confinement in the composite slurry; 7, curing the composite slurry; 8, removing the cavity of the cured and formed composite slurry; and step 9, mounting the thermal interface material after cavity removal on the upper surface of the multi-chip module in an aligned manner. According to the invention, confinement filling and directional arrangement of the high-thermal-conductivity fibers and the high-thermal-conductivity nanosheets in the matrix are realized, and the prepared thermal interface material has the advantages of high energy efficiency, capability of directionally regulating and controlling heat flow, capability of realizing counterpoint heat dissipation of chips in any shape, and the like.

The invention discloses a magnetic-temperature dual-response micro-curl body based on micro-channel shrinkage molding and a preparation method and application thereof, and belongs to the technical field of micro-nano manufacturing and intelligent materials. According to the method, a two-dimensional compression force field is generated by shrinking a micro-channel, a two-dimensional thin film is induced to be curled into a three-dimensional microstructure, and controllable preparation of the micro-curled body is achieved. The obtained micro-curl body integrates magnetic response and temperature-sensitive characteristics, can realize targeted drug delivery through magnetic field navigation and photo-thermal triggering, and has a wide application prospect in the field of biomedicine. The method is simple in process, low in cost and suitable for batch production, and a new thought is provided for intelligent microcarrier development.

The invention discloses a multi-shape micron-sized metal grid structure based on printing shielding and electroplating thickening and a preparation method of the multi-shape micron-sized metal grid structure, and belongs to the technical field of micro-nano manufacturing. The aperture of an opening of the metal grid is 30-70 microns, the line width is 15-30 microns, the height is 5-15 microns, the metal grid is made of copper, nickel or an alloy thereof, grid units are circular, square, triangular, hexagonal or a combination thereof, and the performance can be optimized through periodic or non-periodic arrangement. The ratio of the line width to the opening of the grid is 1: 2-1: 4, the balance light transmittance is larger than or equal to 85%, the sheet resistance is smaller than or equal to 10 omega / square, and the performance and the precision of the grid are optimized through parameter collaboration; printing shielding is adopted to replace traditional photoetching, and the manufacturing cost is reduced by more than 30%; by optimizing printing shielding and electroplating processes and combining multi-shape structure innovation, high-precision and low-cost metal grid manufacturing is achieved, and the method has remarkable application value in the fields of flexible electronics, transparent electrodes and the like.