62results about "Electroforming nanostructures" patented technology

The embodiment of the invention provides a forming method of a nanocrystalline special-shaped thin-wall part and the nanocrystalline special-shaped thin-wall part, and relates to the technical field of precision forming. The forming method comprises the steps that a polymer prepolymer and a metal ion solution are mixed, metal ions are made to generate nano conductive particles in situ through a liquid phase reaction, and the nano conductive particles are formed; adding micron conductive particles into the polymer prepolymer containing the nano conductive particles, and performing uniform ultrasonic dispersion to obtain polymer conductive slurry; a curing agent is added into the polymer conductive slurry, the mixture is poured to the surface of the original template after being evenly stirred, demolding is conducted after curing forming, and a polymer core mold with an original template structure is obtained; immersing the polymer core mold serving as a cathode into the electroforming solution, reducing metal ions in the electroforming solution into metal atoms through electrodeposition, and depositing the metal atoms in the core mold cavity until the core mold cavity is fully cast; and the nanocrystalline special-shaped thin-wall part is demolded from the core mold cavity, and the nanocrystalline special-shaped thin-wall part is obtained. The preparation cost can be reduced, and the performance can be improved.

The present application provides a cobalt nano-interconnect and a preparation method thereof, which belongs to the field of integrated circuits. The present application deposits an Au layer on one side of a double-pass PC film by magnetron sputtering, electro-deposits a Cu layer on the Au layer, electro-deposits a cobalt nano-interconnect in the pores of the double-pass PC film, peels off the Au layer from the double-pass PC film, dissolves the double-pass PC film and centrifuges to obtain the cobalt nano-interconnect. The present application combines magnetron sputtering and electro-deposition technology to achieve controllable growth of cobalt nano-interconnects, which has high compatibility with current chip interconnection processes; by controlling the electro-deposition process parameters, the texture and aspect ratio of the cobalt nano-interconnect can be regulated. The method has simple steps, is easy to realize industrial production, reduces production costs, and the prepared cobalt nano-interconnect has broad application potential in the fields of chip interconnection and the like.

Embodiments of the present disclosure pertain to a material that includes: (1) a first copper-based layer; (2) a copper nanowire layer above the first copper-based layer, which generally includes a plurality of copper nanowires embedded with a polymer; and (3) a second copper-based layer positioned above the copper nanowire layer such that the copper nanowire layer is sandwiched between the first copper-based layer and the second copper-based layer. Additional embodiments of the present disclosure pertain to methods of forming a material of the present disclosure.

The present invention discloses a method for manufacturing a MEMS probe with a high aspect ratio, which comprises selecting porous anodized aluminum as a substrate material; performing photolithography on the substrate, coating photoresist and performing pattern development; performing etching in the nanopores of the substrate; performing electroplating in the etched grooves, stacking multiple layers of metal; performing CMP treatment on the top metal layer; removing the substrate to obtain a MEMS probe. The present invention etches the nanopores of the porous anodized aluminum into an electroplating mold, which can achieve a higher aspect ratio and a stronger mechanical structure, so that the MEMS probe can maintain its structural stability when a large needle pressure is applied, is not easy to deform or break, and ensures the accuracy and reliability of the test process.

A hyperbolic metamaterial is provided. The hyperbolic metamaterial includes a substrate and sub-wavelength nanostructures arrayed on the substrate. Each sub-wavelength nanostructure has a decreasing cross-sectional area with increasing height from the substrate and includes dielectric or semi-metallic material layers and metal-insulator transition (MIT) material layers respectively interleaved with the dielectric or semi-metallic material layers. Each MIT material layer and each dielectric or semi-metallic material layer of each sub- wavelength nanostructure has a cross-sectional shape characterized in that current is induced in one or both of the dielectric or semi-metallic material layers and the MIT material layers by exposure to a magnetic field.

Provided is a fine metal linear body having a lower sintering temperature than the conventional one. The fine metal linear body has a length of 0.5-200 µm and a thickness of 30 nm or more and 10 µm or less. Where the length of a metal crystal constituting the fine metal linear body along the extension direction of the fine metal linear body is denoted by X and the length along the direction orthogonal to said direction is denoted by Y, the value of X / Y, which is the ratio of X to Y, is 4 or less at three points in boundary regions obtained when the length of the fine metal linear body is divided into four equal parts along the extension direction thereof.

The present invention relates to a method for preparing magnetic nickel tapered nanowires, comprising the following steps: (1) irradiating and sensitizing a polymer template with a latent track by a fast heavy ion beam; (2) sputtering a gold conductive layer on one side of the polymer template with the latent track, and then depositing a copper conductive layer on the surface of the gold conductive layer by electrochemical deposition; (3) etching the side of the polymer template with the latent track without the gold-copper conductive layer using an etching solution to obtain a polymer template with tapered linear channels; (4) electrochemically depositing magnetic nickel tapered nanowires on the side of the polymer template with the tapered linear channels without the gold-copper conductive layer; and (5) stripping the gold-copper conductive layer to obtain the magnetic nickel tapered nanowires. The present invention is simple and efficient, and for the first time achieves the controllable preparation of magnetic nickel tapered nanowire arrays, successfully preparing small-sized magnetic nickel tapered nanowire arrays with excellent microwave absorption performance.

A system for fabricating anisotropic magnetic nanowire composites includes a chamber for containing an ionic fluid. A hole in a wall of the chamber allows for the ionic fluid to be in contact with a porous template outside of the chamber, and a cathode and an anode provide an electric field across the ionic fluid and porous template. The electric field causes ionic materials in the ionic fluid to migrate into the pores of the porous template, therefore plating nanowires in the porous template. Constant distances and positions of the anode, cathode, a reference probe, and a stirring element allow for the fabrication of longer, more uniform nanowires, and for the generation of consistent magnetic nanowire composites across multiple fabrication sessions.

The present invention discloses a super-hydrophobic high-efficiency condensation heat transfer nano-interface and a preparation method thereof. The super-hydrophobic high-efficiency condensation heat transfer nano-interface is composed of a metal nanowire array, the metal nanowires in the metal nanowire array are connected laterally to avoid local collapse, and there are no microcavity defects formed by the collapse or agglomeration of the metal nanowires inside; the preparation of the metal nanowire array is achieved by a metal nano-electrodeposition process using an anodic aluminum oxide nanopore template with controllable nano-scale side pore distribution, and the material of the metal nanowires includes any one of copper, nickel, gold, and silver or a combination of two or more; the super-hydrophobic high-efficiency condensation heat transfer nano-interface is given low-viscosity super-hydrophobic properties through low-surface energy chemical modification. The preparation process provided by the present invention is simple and controllable, and the super-hydrophobic high-efficiency condensation heat transfer nano-interface developed based on this process has excellent water vapor penetration resistance, condensation droplet fusion self-ejection removal and high-efficiency condensation heat transfer functions under steam conditions.

A method of fabricating an array of nanowires on an uneven or curved surface is disclosed. A flexible porous scaffold is used to hold a liquid electrolyte, creating a semi-solid electrolyte for transferring pressure to a template disposed on a target surface to conform the template to and bind to the target surface to substantially eliminate gaps therebetween, and to form a semi-solid electrolyte on the target surface. And the stable and controllable growth of the nanowire array can be realized.

The invention relates to a method of providing a plurality of nanowires (14) on a surface (15), comprising: a) providing an electrolyte dispenser (1); b) providing a foil (16) having a plurality of continuous holes (17); c) arranging the foil (16) between the surface (15) and an outlet side (4) of the electrolyte dispenser (1); d) introducing a liquid electrolyte into the electrolyte dispenser (1) such that the liquid electrolyte is deposited onto the foil (16) at the outlet side (4) of the electrolyte dispenser (1); and e) applying a voltage between the liquid electrolyte and the surface (15) such that the nanowires (14) grow from the liquid electrolyte in the holes (17) of the foil (16) onto the surface (15).

The invention provides a cobalt nano interconnection line and a preparation method thereof, and belongs to the field of integrated circuits. According to the method, the Au layer is deposited on one side of the bi-pass PC film through magnetron sputtering, the Cu layer is electrically deposited on the Au layer, the cobalt nano interconnection line is electrically deposited in a pore channel of the bi-pass PC film, the Au layer is stripped from the bi-pass PC film, the bi-pass PC film is dissolved, centrifugal separation is conducted, and the cobalt nano interconnection line is obtained. According to the method, the magnetron sputtering technology and the electro-deposition technology are combined, controllable growth of the cobalt nano interconnection line can be achieved, and the method has high compatibility with an existing chip interconnection technology; by controlling electro-deposition process parameters, the texture and the length-diameter ratio of the cobalt nano interconnection line can be regulated and controlled. The method has the advantages that the steps are simple, the industrial production is easy to realize, the production cost is reduced, and the prepared cobalt nano interconnection wire has wide application potential in the fields of chip interconnection and the like.

A low-cost and highly controllable roll-to-roll templated deposition method for fabricating a nanostructured film comprising: creating a stacked structure comprising a conductive substrate, a porous template disposed on the substrate, an ion-conductive layer formed of a porous scaffold or a polymer gel containing electrolytes disposed on the template, and an anode disposed on the ion-conductive layer; providing rollers on the anode; applying pressure to the stacked structure via the rollers so that the first porous template conforms and stays attached to the substrate; applying galvanic potential between the metal anode and the conductive substrate to grow a nanostructure from the substrate into the porous template by electrochemical deposition; and removing the porous template by chemical dissolution or chemical etching to obtain the nanostructured film. Tube rollers comprising, radially, tubes, electrolytes, and anodes may replace the rollers, electrolytes, and anodes. The nanostructured film may also grow on both sides of the substrate.

The present invention relates to a nanohelix-substrate complex for controlling adhesion and polarization of macrophages, a manufacturing method thereof, and a method of controlling adhesion and polarization of macrophages by using the nanohelix-substrate complex, and the method of controlling adhesion and polarization of macrophages may temporally and reversibly control adhesion and phenotypic polarization of macrophages in vivo and ex vivo by controlling application / non-application of a magnetic field to the nanohelix-substrate complex.

A nanowire structure is manufactured by forming islands of conductive material on a substrate, and a conductive sacrificial layer in the space between conductive islands. The conductive islands include an anodic etch barrier layer. An anodizable layer is formed, over the conductive islands and sacrificial layer, and anodized to form a porous template. Nanowires are formed in regions of the porous template that overlie the conductive islands. Removal of the porous template and sacrificial layer leaves a nanowire structure including isolated groups of nanowires connected to respective conductive islands which function as current collectors. Respective stacks of conductive and insulator layers are formed over different groups of the nanowires to form respective capacitors that are electrically isolated from one another. A monolithic component may thus be formed including an array of isolated capacitors formed over nanowires.

The present invention addresses the problem of providing a method for manufacturing a structure capable of achieving excellent post-exposure delay stability when used as an anisotropic conductive joining member. The method for manufacturing a structure of the present invention is a method for manufacturing a structure having: an insulating substrate made of an inorganic material; and a plurality of conductive paths made of a conductive member, which are insulated from each other penetrating the insulating substrate in the thickness direction, the method comprising a protruding step for bringing each of the conductive paths into contact with an organic acid-containing composition to form a protruding portion protruding from the surface of the insulating substrate, wherein each of the conductive paths has the protruding portion.

The present invention discloses a method for manufacturing a MEMS probe based on atomic layer deposition technology, wherein porous anodized aluminum is used as a substrate, nano-channels are etched into a probe mold, and atomic layer deposition is performed in the probe mold to form a stacked multi-layer metal layer; after the top metal layer is subjected to CMP treatment, the MEMS probe can be obtained by demolding. The present invention uses atomic layer deposition technology to prepare the ultra-thin metal layer of the MEMS probe. The atomic layer deposition technology can realize the sequential deposition of single atomic layers, thereby accurately controlling the thickness and composition of the film, which is crucial for manufacturing high-performance MEMS probes.

Method for electroplating a plurality of nanowires (1) onto an electrically conductive surface (2), comprising a) Placing a film (3) on the surface (2), wherein the film (3) has a plurality of continuous pores (4), b) Placing an elastic element (7) permeable to a first electrolyte (5) onto the film (3), wherein the first electrolyte (5) is brought into contact with the film (3) via the elastic element (7), c) for a first growth period, electroplating of the plurality of nanowires (1) by deposition from the first electrolyte (5) into the pores (4) of the film (3), while the surface (2) is located in a first growth zone (8), wherein the elastic element (7) is pressed against the film (3) by a pressure device (10) arranged in the first growth zone (8), d) Lifting the elastic element (7) from the film (3), and e) for a second growth period, continuing the galvanic growth of the plurality of nanowires (1) by deposition from the first electrolyte (5) or from a second electrolyte (6) into the pores (4) of the film (3), while the surface (2) is located in a second growth zone (9) different from the first growth zone (8).

The invention relates to a method for preparing a magnetic metal nickel gradually-thinned nanowire, which comprises the following steps of: (1) irradiating and sensitizing a polymer template by using a fast heavy ion beam to obtain a polymer template with a latent track; (2) sputtering a gold conductive layer on one side of the polymer template of the latent track, and depositing a copper conductive layer on the surface of the gold conductive layer by using electrochemical deposition; (3) etching one side, without the gold-copper conductive layer, of the polymer template of the latent track by adopting an etching solution to obtain a polymer template with a gradually-thinned linear pore channel; (4) electrochemically depositing a magnetic metal nickel gradually-thinned nanowire on one side, without the gold-copper conductive layer, of the polymer template with the gradually-thinned linear pore channel; and (5) stripping the gold-copper conductive layer to obtain the magnetic metal nickel gradually-thinned nanowire. The method is simple and efficient, controllable preparation of the magnetic metal nickel gradually-thinned nanowire array is achieved for the first time, and the small-size magnetic metal nickel gradually-thinned nanowire array with excellent microwave absorption performance is successfully prepared.

Disclosed are a cobalt-tungsten alloy and a method of fabricating the same. More particularly, cobalt-tungsten alloy nanowires according to an embodiment are formed using an electroplating method, a grain structure of the cobalt-tungsten alloy nanowires is controlled according to the content of tungsten, and the electrical resistivity of the cobalt-tungsten alloy nanowires can be reduced through annealing.

A method for producing a nano- or micro-sheet element is provided, the nano- or micro-sheet element particularly being made of graphene and / or other sheet-materials. The method is based on a laminate (14) comprising a growth substrate (1), a nano- or micro-sheet layer (2) and a support layer (3). The nano- or micro-sheet layer (2) is adapted to form the nano- or micro-sheet element. The method comprises at least the step of electrochemical delamination of the laminate (14) by means of electrolysis in such a way, that the growth substrate (1) is separated from the nano- or micro-sheet layer (2) and the support layer (3). The step of electrochemical delamination of the laminate (14) is carried out with the support layer (3) having a pattern (31) with a plurality of local depressions (311) and / or elevations (312).

An apparatus (1) for producing a plurality of nanowires (2). The apparatus (1) comprises a conductive surface (3), a foil (4), a first electrolyte permeable layer (8), and a second electrolyte permeable layer (9) that is more compressible than the first electrolyte permeable layer (8), in the order mentioned above. The foil (4) has a plurality of channels (5) extending from a first side (6) of the foil (4) to a second side (7) of the foil (4) opposite the first side (6). The apparatus (1) further comprises an electrode (10). The apparatus (1) is configured such that nanowires (2) can be grown on the conductive surface (3) by electrolytic deposition of an electrolyte in each of the channels (5) of the foil (4) by applying a voltage between the conductive surface (3) and the electrode (10).

A method of electroplating nanograined copper on a substrate includes: providing the substrate; providing an electroplating bath that includes a copper salt, an acid, a leveler, a chlorine compound, an accelerator, a suppressor; and water; and electroplating the substrate in the electroplating bath to form the nanograined copper at room temperature. The suppressor is a ployether polyol compound, the nanograined copper has an average grain size of about 100 nm, and the nanograined copper has a resistivity of about 1.78-1.90 μOhm·cm. A nanograined copper prepared according to the method is also disclosed.

A method of electroplating nanograined copper on a substrate includes: providing the substrate; providing an electroplating bath that includes a copper salt, an acid, a leveler, a chlorine compound, an accelerator, a suppressor; and water; and electroplating the substrate in the electroplating bath to form the nanograined copper at room temperature. The suppressor is a ployether polyol compound, the nanograined copper has an average grain size of about 100 nm, and the nanograined copper has a resistivity of about 1.78-1.90 μOhm·cm. A nanograined copper prepared according to the method is also disclosed.

The invention relates to a nano optical fiber-gold nanowire battery expansion sensor and a preparation process thereof. According to the sensor, the nanofibers and the gold nanowires are combined, and the surface plasma resonance (SPR) effect is utilized, so that the real-time high-sensitivity monitoring of the expansion state of the battery is realized. The core structure of the sensor comprises a nano optical fiber, a gold nanowire and a flexible material protection layer. When the battery expands, the SPR strength changes due to the deformation of the gold nanowires, so that the expansion degree of the battery can be accurately judged. The method has the advantages of being compact in structure, high in sensitivity, easy to integrate and the like, and is suitable for safety monitoring of various types of batteries.

The present invention addresses the problem of providing a method for manufacturing a structure capable of achieving excellent post-exposure delay stability when used as an anisotropic conductive joining member. The method for manufacturing a structure of the present invention is a method for manufacturing a structure having: an insulating substrate made of an inorganic material; and a plurality of conductive paths made of a conductive member, which are insulated from each other penetrating the insulating substrate in the thickness direction, the method comprising a protruding step for bringing each of the conductive paths into contact with an organic acid-containing composition to form a protruding portion protruding from the surface of the insulating substrate, wherein each of the conductive paths has the protruding portion.

This invention relates to a femtosecond laser deposition probe and a micro / nano localized deposition device based on a femtosecond laser, which relates to the field of nanofabrication, specifically to the field of surface metallization process equipment technology and the field of probe technology used in this process. It solves the problems of existing probes being unable to simultaneously excite electrochemical reactions and conduct laser light, and the high optical path transmission loss in existing deposition devices. The probe comprises multiple parallel single-mode silica optical fibers, each fiber having a tapered end and its outer surface covered with a metal layer. The laser emitted by the femtosecond laser transmission system in the deposition device is guided by the fiber probe (301) to the surface metallization processing area within the movable reaction pool system (4), and the end of the fiber probe (301) also serves as the working electrode for the chemical reaction within the movable reaction pool system (4). The femtosecond laser deposition probe is suitable for systems combining laser and chemical reactions.

The present disclosure relates to a method for manufacturing a palm trunk-like hierarchical nanostructure and a palm trunk-like hierarchical nanostructure manufactured thereby. Specifically, the palm trunk-like hierarchical nanostructure according to the present disclosure demonstrates high specificity and sensitivity for glucose when glucose oxidase is immobilized on the surface thereof, with excellent reproducibility and stability, thus finding advantageous applications as biosensors.

The present invention discloses a humidity sensor of a nano-gyro-shaped structure array in the technical field of humidity sensor and a preparation method thereof, comprising: a nano-gyro-shaped structure array capable of inducing an F_P mode, and a disk array capable of inducing a disk SPP mode is arranged in the middle of the nano-gyro-shaped structure array, the F_P mode of the nano-gyro-shaped structure array and the disk SPP mode of the disk array are superimposed to form a Fano mode, and a water-absorbing material is also arranged in the nano-gyro-shaped structure array, and the water-absorbing material changes the resonance mode of the nano-gyro-shaped structure array through the change of its own water absorption in air with different humidity, thereby making the nano-gyro-shaped structure array reflect light of different colors under illumination. The present invention solves the defects of the existing sensor, such as short life, poor stability, low precision and poor repeatability.

Disclosed herein is a method for fabricating a nanowire array on an uneven or curved surface. A pliable, porous scaffold is used to hold a liquid electrolyte, creating s semi-solid electrolyte that is used to transfer pressure to a template disposed on the target surface to cause the template to conform to and bond with the target surface to substantially eliminate the gap therebetween, such that a robust and controllable growth of the nanowire array can be realized.