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Engraved plate and base material having conductor layer pattern using the engraved plate

一种导体层、凹版的技术，应用在透光性电磁波屏蔽部件,图形化金属箔领域，能够解决折断、生产率下降、工序数增加等问题

Inactive Publication Date: 2009-10-14
RESONAC CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, at this time, the transfer metal layer is also plated on the side of the convex figure, which becomes the resistance of the transfer metal layer to the adhesive transfer, or the transfer metal layer cannot be peeled off from the convex figure, or even if it can be Delamination also causes breakage in the mesh pattern, causing poor electromagnetic wave shielding performance
[0015] In Patent Document 4, as a method of manufacturing a base sheet for metal layer transfer, when including the formation of an anti-corrosion coating on the surface of the base metal layer and etching the surface of the base metal layer exposed without being covered by the anti-corrosion coating , the number of processes increases and productivity decreases

Method used

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  • Engraved plate and base material having conductor layer pattern using the engraved plate
  • Engraved plate and base material having conductor layer pattern using the engraved plate
  • Engraved plate and base material having conductor layer pattern using the engraved plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1A

[0840] (formation of convex figure)

[0841] A resist film (PhoTec RY3315, 10 μm thick, manufactured by Hitachi Chemical Industries, Ltd.) was attached to both sides of a 150 mm square stainless steel plate (SUS316L, mirror polished, 300 μm thick, manufactured by Nisshin Steel Co., Ltd.) (corresponding to Figure 3A ). The bonding conditions were carried out at a roll temperature of 105° C., a pressure of 0.5 MPa, and a line speed of 1 m / min. Then, the line width of the light-transmitting part is 15 μm, the line spacing is 300 μm, and the off-angle is 45° (in a regular quadrilateral, the lines are arranged at an angle of 45 degrees relative to the side of the regular quadrilateral) and the grid-like figure is set in a 120m square Dimensional negative-type films were placed on one side of a stainless steel plate. Using an ultraviolet irradiation device, in a vacuum below 600mmHg, from the top and bottom of the stainless steel plate with the negative film placed, 120mJ / cm 2 U...

Embodiment 2A

[0859] (formation of convex figure)

[0860] A liquid resist (ZPN-2000, manufactured by Nippon Zeon Co., Ltd.) was coated on both sides of a 150 mm square titanium plate (pure titanium, mirror-polished, 400 μm thick, manufactured by Nippon Metal Corporation). Coating was performed three times to obtain a resist film with a thickness of 6 μm. After prebaking at 110°C for one minute, the line width of the light-transmitting part is 5 μm, the line spacing is 300 μm, and the off-angle is 45° (in a regular quadrilateral, the lines are arranged at an angle of 45 degrees relative to the sides of the regular quadrilateral) and A negative-type chromium mask formed with a grid-like pattern in a size of 110mm square was placed on one side of the titanium plate. Use an ultraviolet irradiation device to suck the substrate in a vacuum below 600mmHg, and use 200mJ / cm from the top of the titanium plate with a chrome mask 2 UV rays are irradiated. In addition, at 200mJ / cm 2 Illuminate the ...

Embodiment 3A

[0875] A liquid resist (KMPR-1050, manufactured by Nippon Kayaku Co., Ltd.) was applied to both surfaces of a stainless steel plate (SUS304, 314×150 mm, manufactured by Nisshin Steel Co., Ltd.) in a thickness of 15 μm. After prebaking at 90°C for 10 minutes, the line width of the light-transmitting part is 5 μm, the line spacing is 300 μm, and the off-angle is 45° (in a regular quadrilateral, the lines are arranged at an angle of 45 degrees relative to the sides of the regular quadrilateral) and Two negative-type chrome masks formed with a grid-like pattern in a size of 110 mm square were placed side by side on one side of the stainless steel plate. Use an ultraviolet irradiation device to suck the substrate in a vacuum below 600mmHg, and use 200mJ / cm from the top of the stainless steel plate with a chrome mask 2 UV rays are irradiated. In addition, at 200mJ / cm 2 Illuminate the backside where no mask is placed. After heating at 95°C for 7 minutes, by developing with 2.38% t...

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Abstract

An engraved plate is provided with a base material and an insulating layer on the surface of the base material. On the insulating layer, a recessed section, which has a width that increases toward the opening and has the base material exposed, is formed. A base material having a conductor layer pattern and the conductor layer pattern manufactured by a transfer method by using the engraved plate are also provided.

Description

technical field [0001] The invention relates to an intaglio plate and a manufacturing method thereof. In addition, the present invention relates to a substrate with a conductor layer pattern manufactured using a gravure (conductive substrate for plating) having a plating formation portion, and a substrate manufactured with a substrate with a conductor layer pattern. Translucent electromagnetic wave shielding member. Furthermore, this invention relates to the patterned metal foil manufactured using the gravure (conductive base material for plating) which has a plating formation part. Background technique [0002] Conventionally, various types of fine pattern forming materials such as gravure printing, adhesive coating, resist material transfer coating, and color filters used in color liquid crystal display devices have been used. intaglio. [0003] Patent Documents 1 and 2 disclose the following gravure manufacturing methods: plating an easily etched metal on a metal roll-...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B3/14B41C1/00B41N1/06B41N1/12C25D1/00C25D5/02H05K9/00
CPCB41C1/00B41N1/06B41N1/12C25D1/00C25D1/006H05K3/205H05K9/0096H05K2201/09827Y10T428/2457Y10T428/24612Y10T428/2462Y10T428/30B32B3/14H05K9/00
Inventor 直之进上原寿茂登坂实铃木恭介冈村寿郎菊原得仁根岸正实藤枝忠恭津山宏一
Owner RESONAC CORPORATION
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