7 results about "Nanoimprint lithography" patented technology

This application discloses the formation of vias using imprint lithography and the formation of repositioning vias by imprint lithography. A resist layer is formed on top of a dielectric layer. For example, a pattern of via openings is imprinted in the resist layer using nanoimprint lithography. After imprinting, the pattern of via openings imprinted in the resist layer is transferred to the dielectric layer by anisotropic etching to form via openings in the dielectric layer. Anisotropic etching has low etch selectivity between the resist layer and the dielectric layer. The via openings in the dielectric layer are filled with a conductive material to form vias in the dielectric layer. The centerline of at least one repositioning via is not parallel to the centerline of at least one other via.

This invention relates to the field of lithography technology, specifically to a hybrid series-parallel six-degree-of-freedom mechanism for nanoimprint lithography. It employs a top-down hybrid configuration: the upper part is a high-rigidity ZRxRy parallel micro-motion mechanism, providing linear motion in the vertical direction (Z) and rotational motion around the horizontal axis (Rx, Ry), exhibiting high rigidity, high precision, and high dynamic response; the lower part is a large-stroke XYRz series macro-motion mechanism, providing large-stroke linear motion in the X and Y directions within a plane and rotational motion around the vertical axis (Rz). The substrate support assembly is mounted on top of the parallel mechanism via a three-point connection surface integration. This invention combines the advantages of a large workspace of a series mechanism and the high precision and high rigidity of a parallel mechanism, providing an ideal precision motion solution for nanoimprint lithography equipment.

This invention belongs to the field of nanoimprint lithography technology. It provides a dielectric-driven tunable nanoimprint template, its manufacturing method, and a nanoimprinting method. The tunable nanoimprint template integrates a dielectric active driving layer and an electrode layer on one side of a flexible substrate, and a nanostructure layer on the other side. By applying a voltage to the dielectric active driving layer, the Maxwell strain generated by the dielectric effect causes the thickness of the dielectric active driving layer to compress and the area to expand, inducing in-plane stretching, which in turn changes the geometric parameters of the nanostructure in the front nanostructure layer. This nanoimprint template can achieve a large-scale adjustment of the nanostructure geometric parameters with a change rate of 5% to 20%, with an adjustment accuracy of less than 5 nm. It can withstand typical nanoimprinting pressure and is particularly suitable for hot and soft imprinting. Dynamic adjustment significantly reduces the cost of template remanufacturing and improves R&D iteration efficiency.

This invention belongs to the field of nanoimprint lithography technology. It provides a dynamically adjustable nanoimprint template based on the piezoelectric effect, its manufacturing method, and its applications. The nanoimprint template integrates a piezoelectrically active driving structure on the back side of a flexible substrate and a nanostructure layer on the front side. The piezoelectrically active driving structure includes a first electrode layer, a piezoelectric material layer, and a second electrode layer stacked together, with the first electrode layer close to the flexible substrate. By applying a voltage to the piezoelectric material layer in the piezoelectrically active driving structure, the geometric parameters such as the characteristic size and period of the surface nanostructure can be changed through interlayer transmission of the piezoelectric effect. This template can withstand typical nanoimprint pressure, and the adjustable range of its geometric parameters is 0.1%~5%, with nanometer-level precision. It also has a microsecond-level fast response, making it highly suitable as a nanoimprint template for ultraviolet imprinting, which significantly reduces template remanufacturing costs and improves R&D iteration efficiency.

A template transmission device and a transmission method for nanoimprint lithography belong to the technical field of semiconductor equipment. The template transmission device comprises a plate library, a first transmission part, a pre-alignment unit and a second transmission part. The plate library is used for storing templates. The first transmission part is used for template transmission between the plate library and the pre-alignment unit. The pre-alignment unit is provided with a pre-alignment detection module for detecting the position of the template, is used for carrying the template and aligning the position of the template. The second transmission part is used for template transmission between the pre-alignment unit and the imprint head. The template transmission device and the transmission method are used to solve the problems of template handover and automatic plate up and down in the nanoimprint lithography equipment.

This application belongs to the technical field of nanoimprint lithography and discloses a vacuum chuck and dynamic adjustment system. The vacuum chuck includes a chuck substrate and a driving assembly. The chuck substrate has a negative pressure cavity, a working surface located at the top of the negative pressure cavity, an adsorption port located on the working surface and communicating with the negative pressure cavity, and a through port located on the working surface and communicating with the negative pressure cavity. Multiple through ports are spaced apart. The negative pressure cavity can generate negative pressure under the action of a negative pressure device. The working surface is used to place a substrate. The driving assembly includes multiple driving components located in the negative pressure cavity. Each driving component has a driving part that can move in a direction perpendicular to the working surface. Each driving part can extend to the top of the working surface through its corresponding through port to push the substrate placed on the working surface, thereby reducing the flatness requirements of the working surface and reducing the investment cost of production equipment, thus achieving the effect of reducing the manufacturing cost of the vacuum chuck.

This invention provides an etching process method and apparatus based on nanoimprint lithography. The method is performed by a semiconductor etching device and includes: acquiring a pattern to be etched, the pattern being obtained based on the nanoimprint lithography technique; and etching a substrate to be etched to obtain a target pattern identical to the pattern to be etched. This solution utilizes nanoimprint lithography, adding a single etching step to obtain a target pattern identical to the pattern to be etched. On one hand, this solution solves the problem of distortion during the transfer of complex patterns; on the other hand, this solution requires only one etching step, which helps reduce the overall process time and thus increase throughput.