107 results about "Nanoimprint lithography" patented technology

The invention discloses a nanoimprint photoresist with high mechanical strength and high resolution and an ink-jet printing method of the nanoimprint photoresist. The nanoimprint photoresist is mainly designed for compatibility of ink-jet printing and nanoimprint technologies and high-precision manufacturing in the semiconductor field, after screening and blending, photoresist liquid drops can be distributed by an ink-jet printing head according to needs, required patterns can be rapidly printed, and the yield of the nanoimprint photoresist is improved. And finally, exposure is carried out through a nanoimprint lithography machine to realize 50 nm high-resolution imprint. Compared with the nanoimprint photoresist in the prior art, the nanoimprint photoresist disclosed by the invention has the advantages of rapid ink-jet printing, high curing rate, excellent anti-oxygen polymerization inhibition performance, high mechanical strength, high resolution, easiness in demolding and the like. The invention aims to improve the operability and the reliability of the nanoimprint photoresist in practical application, and has potential application prospects in the high-precision manufacturing fields such as advanced semiconductor manufacturing processes and the like.

The invention belongs to the technical field of solar cell materials, and discloses a GaAs solar cell with a moth-eye micro-nano structure anti-reflection layer and a preparation method of the GaAs solar cell in order to enhance the solar spectrum utilization rate and improve the photoelectric conversion efficiency of the solar cell. The method comprises the following steps: growing a thin film with a nano-column structure on a Si substrate with a SiO2 layer in an MBE autocatalytic growth mode, spin-coating PMMA on the surface of the thin film, and transferring the nano-column structure to a GaAs and carbon nanotube heterojunction solar cell through a two-dimensional material wet transfer technology to prepare the solar cell with the moth-eye micro-nano structure anti-reflection layer. Compared with a nanoimprint lithography technology and a photolithography technology, the method provided by the invention is more convenient to operate and more environment-friendly, and does not need to use some harmful gases and harmful chemicals to etch the micro-nano structure. According to the GaAs heterojunction solar cell with the moth-eye bionic micro-nano structure anti-reflection layer prepared by the method, the material used by the anti-reflection layer is not limited, and the utilization rate of sunlight can be remarkably improved, so that the photoelectric conversion efficiency of a device is remarkably improved.

The invention discloses an azobenzene polymer material and an application of the azobenzene polymer material in nanoimprint lithography. The azobenzene polymer is prepared by adopting a one-step simple ring-opening metathesis polymerization method, is endowed with excellent thermal stability and light stability, and can keep excellent performance under the conditions of high temperature and sunlight irradiation. Compared with the traditional nanoimprint photoresist, the nanoimprint photoresist provided by the invention has higher stability and precision in the nanoimprint process, can effectively reduce the problems of distortion, blurring and the like of an imprint pattern, and ensures the accuracy of nanostructure transfer printing. The finished product quality and the production efficiency are improved, and meanwhile, the uncertainty and the cost in the manufacturing process are reduced.

Embodiments of the present disclosure provide methods for forming optical device structures. An exemplary method generally includes disposing a first material device layer on a substrate; patterning a portion of the first material device layer to form a first plurality of device structures in the first material device layer; disposing a second material device layer on an unpatterned portion of the first device material layer; performing a nanoimprint lithography process on the second material device layer to form a second plurality of device structures on the first material device layer; and disposing a metal coating on the second plurality of device structures.

Some embodiments of the present disclosure relate to a manufacturing method using nano-imprint lithography for a diffraction grating waveguide of a near-eye display. The manufacturing method includes: manufacturing an imprint lithography template with a diffraction grating waveguide pattern; transferring the diffraction grating waveguide pattern of the imprint lithography template to a transferring template by nano-imprint lithography, so as to obtain a transferring template with a reverse pattern of the diffraction grating waveguide pattern; and transferring the reverse pattern of the diffraction grating waveguide pattern of the transferring template to a waveguide substrate by nano-imprint lithography, so as to obtain the diffraction grating waveguide of the near-eye display.

A method of making a polarizer can include applying a liquid with solid inorganic nanoparticles dispersed throughout a continuous phase, then forming this into a different phase including a solid, interconnecting network of the inorganic nanoparticles. This method can improve manufacturability and reducing manufacturing cost. This method can be used to provide an antireflective coating, to provide a protective coating on polarization structures, to provide thin films for optical properties, or to form the polarization structures themselves.

A surface-enhanced Raman scattering substrate, including: a base layer; a nanopillar structure layer, which is formed on the base layer by means of nanoimprint lithography, and has a nanopillar array structure; and a thin film, which covers and is formed, by means of an oblique deposition evaporation process, on the top of the nanopillar array structure and at least one vertical side wall of the nanopillar array structure, wherein the thin film has a surface-enhanced Raman scattering effect and has an oblique angle.

Undesirable light leakage is reduced in a mixed-reality head-mounted display device using an out-coupling diffractive optical element in a waveguide combiner that is implemented using a surface relief grating (SRG) having a gradient refractive index. The SRG has gratings with modulated depth in which shallower gratings have a lower refractive index and deeper gratings have a higher refractive index. The lower efficiency of the shallower gratings reduces forward-propagating virtual image light leaking into the real-world environment of the HMD device while simultaneously enabling light to propagate to the deeper gratings to thereby improve virtual image uniformity over the entirety of eyebox of the combiner. The SRG with gradient refractive index is alternatively fabricated using an inkjet deposition process with resin inks having different refractive indexes and subsequent nanoimprint lithography grating imprinting or physical vapor deposition by which a thickness-modulated resin layer is applied to a constant-height grating structure.

The invention provides a microcup device mask, an electronic paper screen and a manufacturing method thereof.The manufacturing method of the electronic paper screen comprises the following steps that S1, a substrate material is conveyed to a gluing mechanism through a first feeding roller shaft, and a first ITO electrode layer is coated with a layer of imprinting glue through the gluing mechanism; s2, feeding the substrate material and the imprinting glue to a micro-cup device mask plate, and carrying out imprinting and exposure by a micro-cup manufacturing mechanism to form a micro-cup device; s3, ink adding equipment adds ink into the microcup device; and S4, pressing the second ITO electrode layer of the packaging film on the microcup device and the ink to form the electronic paper screen. Through the composite manufacturing method based on nanoimprint lithography and contact lithography and the packaging method based on roller-to-roller, manufacturing and packaging of the microcup structure needed by the electronic paper screen are achieved, the production efficiency is high, the product precision is easy to guarantee, the depth-to-width ratio of the microcup is large, and the product using effect is good.

An example of a resin composition includes an epoxy resin matrix and functionalized silica nanoparticles incorporated into the epoxy resin matrix. The functionalized silica nanoparticles have an average particle size up to about 10 nm. The resin composition is imprintable using nanoimprint lithography. The resin composition may be used to manufacture a patterned substrate for a flow cell.

A method is for producing a master template with variable height features for imprint lithography on a device substrate includes providing a layer stack comprising a substrate, an etch stop layer on the substrate, and a pattern layer on the etch stop layer. The method involves creating height gradation in the pattern layer to obtain a height graded pattern layer, forming the master template by providing a pattern comprising a plurality of features into the height graded pattern layer. This method enables the production of features with varying heights, which can be particularly useful in applications such as optical devices where such features may influence the functionality and efficiency of the device.

The invention discloses a graphene transfer method based on nanoimprint. The method comprises the following steps: obtaining a photoresist layer / micro-nano structure layer / organic layer composite structure; covering the graphene layer with the photoresist / micro-nano structure layer / organic layer composite structure, and performing nano-imprinting; stripping the metal substrate to obtain an organic layer / micro-nano structure layer / photoresist layer / graphene layer composite structure; the surface of the substrate is covered with the organic layer / micro-nano structure layer / photoresist layer / graphene layer composite structure, so that the graphene layer is attached to the substrate, nano-imprinting is carried out, and the photoresist layer is cured in the nano-imprinting process; and stripping the organic layer / micro-nano structure layer / photoresist layer composite structure to obtain the graphene layer transferred to the substrate. The contact area between the micro-nano structure layer and the photoresist layer is increased through the micro-nano structure layer, the binding force between the organic layer and the photoresist layer is further increased, large-area graphene layer transfer is achieved based on nanoimprint, and the transfer quality is guaranteed.

The present disclosure relates to an optical device and a method for manufacturing an optical device. Wherein the optical device comprises: a first waveguide comprising a first surface; the first waveguide comprises a first surface, the second waveguide comprises a second surface, the first waveguide is in a fixed position relative to the second waveguide, the first surface at least partially faces the second surface, the first surface comprises a first positioning element, and the first positioning element is a nanoimprint lithography structure; the first surface comprises a first positioning element, and the second surface comprises a second positioning element which is a nanoimprint lithography structure; the optical device further comprises an adhesive arranged for attaching the first surface to the second surface, where the first positioning element is arranged to control the position of the adhesive, and the first positioning element comprises a hydrophobic region, the hydrophobic region is adapted to repel the adhesive by having a higher contact angle with the adhesive than the surrounding region.

The invention relates to a method of manufacturing a nanoimprint lithography replica, a mold thereof, and a semiconductor device. A method of manufacturing a nanoimprint lithography replica includes depositing a first resist layer over a substrate and selectively exposing the first resist layer to a first actinic radiation. The selectively exposed first resist layer is developed to form a pattern in the first resist layer. The pattern in the first resist layer extends into the substrate to form a mold in the substrate. The first resist layer is removed from the substrate. A second resist layer is deposited over the replica blank. The second resist layer is in contact with the mold. The second resist layer is exposed to a second actinic radiation. The mold and the exposed second resist layer are separated. A pattern is formed in the exposed second resist layer. The pattern in the second resist layer is extended into the replica blank, and the second resist layer is removed from the replica blank to form a replica.

This disclosure generally describes methods and systems for fabricating high-quality surface relief waveguides for an eyepiece. In particular, this disclosure uses nanoimprint lithography imprinting techniques that reduce or eliminate the presence of gaps within the imprinted features by using a droplet pattern optimized for dispensing photoresist to achieve various optical effects, such as manufacturing waveguides having surface relief features such as diffraction gratings. Further, this disclosure also describes techniques for manufacturing surface relief waveguides having a gradient, such as a substantially continuous gradient or slope, between zones having different residual layer thicknesses of the dispensed photoresist and / or between zones having surface features of different heights (or depths).

A micro- or nanotextured or structured surface and methods of making and using the same are provided. A structured or textured surface can comprise a substrate and a textured surface comprising a plurality of features and configured to reduce surface adhesion of a particulate to the structured surface. The micro- or nanotextured surface can be replicated using highly scalable processes, such as roll-to-roll nanoimprint lithography and roll-to-roll thermal embossing onto the substrate by a master mold, which can be created by ultrasonic nanocoining.

A system and method for controlling the position of a movable stage supporting a substrate are provided. First position information representing the position of the substrate relative to a mark on an object is obtained from a sensor. Alignment prediction information is generated based on the obtained first position, wherein the generated alignment prediction information includes at least one parameter value. First trajectory information including the at least one parameter value is generated based on the obtained first position information and the generated alignment prediction information. Second trajectory information is generated based on the generated alignment prediction information, the first trajectory information, and the second position information, wherein the second position information represents the position of the movable stage. An output control signal is generated based on the second trajectory information, and the output control signal is used to control the movable stage to approach a target position based on the generated output signal.

This application discloses the formation of vias using imprint lithography and the formation of repositioning vias by imprint lithography. A resist layer is formed on top of a dielectric layer. For example, a pattern of via openings is imprinted in the resist layer using nanoimprint lithography. After imprinting, the pattern of via openings imprinted in the resist layer is transferred to the dielectric layer by anisotropic etching to form via openings in the dielectric layer. Anisotropic etching has low etch selectivity between the resist layer and the dielectric layer. The via openings in the dielectric layer are filled with a conductive material to form vias in the dielectric layer. The centerline of at least one repositioning via is not parallel to the centerline of at least one other via.

This invention relates to the field of lithography technology, specifically to a hybrid series-parallel six-degree-of-freedom mechanism for nanoimprint lithography. It employs a top-down hybrid configuration: the upper part is a high-rigidity ZRxRy parallel micro-motion mechanism, providing linear motion in the vertical direction (Z) and rotational motion around the horizontal axis (Rx, Ry), exhibiting high rigidity, high precision, and high dynamic response; the lower part is a large-stroke XYRz series macro-motion mechanism, providing large-stroke linear motion in the X and Y directions within a plane and rotational motion around the vertical axis (Rz). The substrate support assembly is mounted on top of the parallel mechanism via a three-point connection surface integration. This invention combines the advantages of a large workspace of a series mechanism and the high precision and high rigidity of a parallel mechanism, providing an ideal precision motion solution for nanoimprint lithography equipment.

Disclosed are embodiments of a thin-film photovoltaic technology including a single-junction crystalline silicon solar cell with a photonic-plasmonic back-reflector structure for lightweight, flexible energy conversion applications. The back-reflector enables high absorption for long-wavelength and near-infrared photons via diffraction and light-concentration, implemented by periodic texturing of the bottom-contact layer by nanoimprint lithography. The thin-film crystalline silicon solar cell is implemented in a heterojunction design with amorphous silicon, where plasma enhanced chemical vapor deposition (PECVD) is used for all device layers, including a low-temperature crystalline silicon deposition step. Excimer laser crystallization is used to integrate crystalline and amorphous silicon within a monolithic process, where a thin layer of amorphous silicon is converted to a crystalline silicon seed layer prior to deposition of a crystalline silicon absorber layer via PECVD. The crystalline nature of the absorber layer and the back-reflector enable efficiencies higher than what is achievable in other thin-film silicon devices.

Optical devices and methods include a first waveguide having a first surface and a second waveguide including a second surface. The first waveguide is at a fixed position relative to the second waveguide with the first surface at least partly facing the second surface, and the first surface includes a first positioning element. The first positioning element is a NanoImprint Lithography (NIL) structure. The optical device further includes an adhesive arranged for attaching the first surface to the second surface, where the first positioning element is arranged to control a position of the adhesive. The first positioning element includes a philic region adapted to attract the adhesive, or a phobic region adapted to repel the adhesive.

The invention discloses a preparation method of a near-infrared achromatic super lens based on a nanoimprint technology, and relates to the technical field of micro-nano manufacturing. The preparation method comprises the following steps: 1, designing a target super lens by using finite element simulation software based on a time domain finite difference method, a particle swarm algorithm and a scalar diffraction algorithm; 2, preparing a silicon female die corresponding to the super lens according to the designed target super lens parameters by using electron beam lithography and deep reactive ion etching; 3, carrying out surface fluorination treatment on the silicon female die; and 4, preparing a corresponding sub-mold according to the silicon female mold, carrying out imprinting by using a nano imprinting technology and the sub-mold, and finally, etching the a-Si layer on the surface of the substrate through deep reactive ion etching by taking imprinting glue as an etching mask to obtain the super lens. According to the invention, the nanoimprint technology can be used for manufacturing the near-infrared achromatic superlens, so that the near-infrared achromatic superlens gets rid of dependence on a high-precision photoetching machine.

The present invention relates to configuring an optical layer in a nanoimprint lithography process. The nanoimprint lithography method of configuring an optical layer includes imprinting first features having dimensions of a first order of magnitude on one side of a substrate using a patterned template, and simultaneously imprinting second features having dimensions of a second order of magnitude on the side of the substrate using the patterned template, the second feature dimensions being determined and arranged to define a gap between the substrate and an adjacent surface.

Embodiments described herein provide for methods of forming optical device structures. The methods relate to forming staircase or blazed angle grating structures using nanoimprint lithography (NIL) in combination with other forming techniques. In certain embodiment, the methods provide for forming staircase or blazed angle grating structures for optical devices without the need for multiple repeated lithographic patterning and etch processes.

The invention discloses an anti-dazzle semitransparent organic photovoltaic glass window based on thermal nanoimprint lithography and a preparation method of the anti-dazzle semitransparent organic photovoltaic glass window, and belongs to the technical field of photovoltaic building integration. A submicron grating structure is prepared on the surface of a ternary blending active layer through a thermal nanoimprint process, and a device structure with a metasurface light field regulation effect is formed after spin coating of an electron transport layer and evaporation of a metal top electrode. By introducing a grating structure and utilizing diffraction and scattering effects, energy of reflected light is redistributed to a non-mirror direction, zero-order mirror reflection is remarkably inhibited, glare is effectively inhibited, light pollution is reduced, and meanwhile, the polarization degree of the reflected light is reduced and the visual comfort is improved by differentially modulating S and P polarized light; for transmission light, the grating excites multi-order diffraction, resulting in angle dispersion of a light beam propagation path, increase of the optical path of light in the active layer, and enhancement of photon capture and absorption, thereby significantly improving the short-circuit current density and power conversion efficiency of the device while ensuring high light transmission.

An example of a resin composition includes an epoxy resin matrix and functionalized silica nanoparticles incorporated into the epoxy resin matrix. The functionalized silica nanoparticles have an average particle size up to about 10 nm. The resin composition is imprintable using nanoimprint lithography. The resin composition may be used to manufacture a patterned substrate for a flow cell.

Method of manufacturing a nanoimprint lithography replica includes depositing a first resist layer over a substrate and selectively exposing the first resist layer to a first actinic radiation. The selectively exposed first resist layer is developed to form a pattern in the first resist layer. The pattern in the first resist layer is extended into the substrate to form a mold in the substrate. The first resist layer is removed from the substrate. A second resist layer deposited over a replica blank. The second resist layer is contacted with the mold. The second resist layer is exposed to a second actinic radiation. The mold and the exposed second resist layer are separated. A pattern is formed in the exposed second resist layer. The pattern in the second resist layer is extended into the replica blank, and the second resist layer is removed from the replica blank to form a replica.

Disclosed are embodiments of a thin-film photovoltaic technology including a single-junction crystalline silicon solar cell with a photonic-plasmonic back-reflector structure for lightweight, flexible energy conversion applications. The back-reflector enables high absorption for long-wavelength and near-infrared photons via diffraction and light-concentration, implemented by periodic texturing of the bottom-contact layer by nanoimprint lithography. The thin-film crystalline silicon solar cell is implemented in a heterojunction design with amorphous silicon, where plasma enhanced chemical vapor deposition (PECVD) is used for all device layers, including a low-temperature crystalline silicon deposition step. Excimer laser crystallization is used to integrate crystalline and amorphous silicon within a monolithic process, where a thin layer of amorphous silicon is converted to a crystalline silicon seed layer prior to deposition of a crystalline silicon absorber layer via PECVD. The crystalline nature of the absorber layer and the back-reflector enable efficiencies higher than what is achievable in other thin-film silicon devices.

This invention belongs to the field of nanoimprint lithography technology. It provides a dielectric-driven tunable nanoimprint template, its manufacturing method, and a nanoimprinting method. The tunable nanoimprint template integrates a dielectric active driving layer and an electrode layer on one side of a flexible substrate, and a nanostructure layer on the other side. By applying a voltage to the dielectric active driving layer, the Maxwell strain generated by the dielectric effect causes the thickness of the dielectric active driving layer to compress and the area to expand, inducing in-plane stretching, which in turn changes the geometric parameters of the nanostructure in the front nanostructure layer. This nanoimprint template can achieve a large-scale adjustment of the nanostructure geometric parameters with a change rate of 5% to 20%, with an adjustment accuracy of less than 5 nm. It can withstand typical nanoimprinting pressure and is particularly suitable for hot and soft imprinting. Dynamic adjustment significantly reduces the cost of template remanufacturing and improves R&D iteration efficiency.

A process for fabricating a nano-embossed lithography replica comprises depositing a first resist layer over a substrate and selectively irradiating the first resist layer with actinic radiation. The selectively irradiated first resist layer is developed to create a structure within the first resist layer. The structure in the first resist layer is extended into the substrate to create a shape within the substrate. The first resist layer is removed from the substrate. A second resist layer is deposited over a replica blank. The second resist layer is brought into contact with the shape. The second resist layer is irradiated with actinic radiation. The shape and the irradiated second resist layer are separated. A structure is fabricated within the irradiated second resist layer.The structure in the second resist layer is extended into the replica blank, and the second resist layer is removed from the replica blank to produce a replica.