Flexible micro-positioning stage with two degrees of freedom

A technology of micro-positioning and worktable, applied in the field of micro-operating system, can solve the problems of uneven distribution of imprinting force, limitation of processing accuracy and quality, easy stretching and deformation of silicone, etc. Linear, compact effect

Active Publication Date: 2010-06-16
南通致远船舶设计有限公司
View PDF0 Cites 47 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality
Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process
The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Flexible micro-positioning stage with two degrees of freedom
  • Flexible micro-positioning stage with two degrees of freedom
  • Flexible micro-positioning stage with two degrees of freedom

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The specific implementation, structure, features and effects provided by the present invention will be described in detail below in conjunction with the accompanying drawings and preferred embodiments.

[0018] see Figure 1-2The shown two-degree-of-freedom flexible micro-positioning workbench of the present invention includes a base 2 and a cube moving platform 6 arranged in the base, and the first group of adjacent two of the moving platform 6 A flexible branch chain is respectively connected to two vertical side walls and first and second brackets 12 are respectively connected to the second group of vertically adjacent two side walls, and are respectively connected to the two side wall end faces of the base. There are third and fourth brackets 10, the two side walls of the base are respectively parallel to the two vertically adjacent side walls of the second group of the moving platform 6, and one end of the first bracket 12 is connected to the second One end of the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a flexible micro-positioning stage with two degrees of freedom, the design of the flexible micro-positioning stage with two degrees of freedom comprises a flexible mechanism and an integral structure, two piezoelectric ceramic drivers are adopted in the structure, the tail part of each driver is connected with a base through a bolt, and the top end of each driver is connected with a spherical joint through a thread, thereby realizing Hertz contact. The flexible mechanism of the positioning stage mainly comprises three parts of the base, flexible branched chains with entirely consistent structures and a supporting movable platform thereof. Two displacement sensors are used for measuring actual output of the movable platform and respectively fixed between the base and the movable platform through an L-shaped support and a Z-shaped support. The flexible micro-positioning stage is characterized by high resolution and fast dynamic response speed, and can be taken as an auxiliary positioning platform of a nano-imprint lithography positioning system for realizing micro-feeding and precise positioning.

Description

technical field [0001] The invention relates to a micro-operating system, in particular to a flexible parallel micro-positioning workbench with two translational degrees of freedom, which can be applied to an imprint photolithography system. Background technique [0002] Nano-devices include nano-electronic devices and nano-optoelectronic devices, which can be widely used in electronics, optics, micro-mechanical devices, new computers, etc. It is the most dynamic research field in the field of new materials and new devices. , intelligence, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nano-devices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices is in a period of rapid development, and there are various methods, and patt...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 田延岭贾晓辉张大卫
Owner 南通致远船舶设计有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products