141 results about "Blazed grating" patented technology

The invention discloses an external cavity tunable laser linewidth compression system for realizing wavelength phase locking based on mutual injection of gain chips. The external cavity tunable laser linewidth compression system comprises a red light semiconductor laser main gain chip, a first collimation optical system, a blazed grating, a tuning rotating mirror, a reflector, a power supply driving system and a double-path feedback amplification system, the double-path feedback amplification system comprises a first secondary gain chip, a second secondary gain chip, a second collimation optical system, a third collimation optical system and a polarization-free beam splitter prism; and the red light semiconductor laser main gain chip, the first secondary gain chip and the second secondary gain chip are all connected with the power supply driving system. Therefore, the technical problems of low output infrared light power, poor stability and narrow mode-hopping-free tuning range in the prior art are solved, and high-power, narrow-linewidth, high-stability and large-range mode-hopping-free continuous tuning red light output can be realized.

The invention belongs to the technical field of polarization imaging, and relates to a Sagnac broadband linear polarization imaging structure which comprises a second plane mirror, a first polarization beam splitter, a first polarization analyzer, a first imaging lens and a first focal plane array which are sequentially arranged on a first optical axis at intervals. The compensation plate is arranged close to the second plane mirror; the first plane mirror and the first polarization beam splitter are arranged on a second optical axis perpendicular to the first optical axis in a spaced mode and located on the side away from the compensation plate; the first blazed grating and the second blazed grating are reversely arranged at intervals and located on the light path between the first plane mirror and the second plane mirror, and the first blazed grating is close to the first plane mirror. The system provided by the invention is small in adjustment workload, high in accuracy, sufficient in shearing amount compensation, and good in broadband polarization imaging image precision and overall stability.

An MEMS optical fiber surface-mounted strain gauge, configured to be fixed on the surface of an object to be measured to measure the strain of the object under a particular loading condition. The strain gauge is provided with a left side fixing part (1), a right side fixing part (2) and a quadrilateral structure (3) arranged between the left side fixing part (1) and the right side fixing part (2). The quadrilateral structure (3) is connected to the left side fixing part (1) and the right side fixing part (2) by means of diagonal connection parts, a collimator (41) is provided on a first edge (31) of the quadrilateral structure (3), a blazed grating (51) is provided on a second edge (32) of the quadrilateral structure (3), and the first edge (31) and the second edge (32) are two adjacent edges in the quadrilateral structure (3). The deformation of the quadrilateral structure (3) is monitored by means of the change of the angle between the adjacent edges.

The invention discloses a system and method for generating, regulating and controlling a partially coherent space-time light field. The system comprises a pulse shaping assembly composed of a plurality of optical elements and an incident light source used for providing a completely coherent ultrafast pulse light field. An optical element in the pulse shaping assembly comprises a first blazed grating, a first cylindrical lens, a two-dimensional dynamic holographic modulator, a second cylindrical lens and a second blazed grating which are sequentially arranged in the light field propagation direction. The focal lengths of the first cylindrical lens and the second cylindrical lens are the same, and the distance between the adjacent optical elements is equal to the focal lengths of the first cylindrical lens and the second cylindrical lens; the two-dimensional dynamic holographic modulator is used for loading a specific complex amplitude modulation function to reconstruct the spatial-spectral characteristics of the light field. According to the invention, the two-dimensional space-spectrum function of the pulse is dynamically modulated, the generation of the partially coherent space-time wave packet is realized, and the amplitude and structure distribution of the space-time coherence can be designed and regulated as required.

The invention discloses a wavelength and repetition frequency independent adjustable gain-competition-free polarization-maintaining fiber common-cavity double-optical-comb mode-locked laser and an adjusting method, and relates to the technical field of optical frequency combs. In order to solve the problems that a system is easily influenced by an external environment, the anti-interference capability is poor and gain competition exists between optical combs due to the existence of a single-mode optical fiber in an existing optical fiber double-optical-comb structure, the invention provides an optical fiber double-optical-comb structure. According to the technical scheme, the laser comprises a polarization-maintaining pump laser, a first polarization-maintaining optical fiber coupler, a polarization-maintaining optical fiber wavelength division multiplexer, a polarization-maintaining ytterbium-doped optical fiber, a polarization-maintaining collimator and a blazed grating, laser output by a second polarization-maintaining optical fiber coupler is combined through a polarization-maintaining polarization beam combiner, and the polarization-maintaining polarization beam combiner serves as a horizontal polarizer and a vertical polarizer; the separated polarized laser is respectively coupled to a slow axis and a fast axis of a common-end tail fiber, and a semiconductor saturable absorber is used as a reflection end face. According to the invention, a full polarization-maintaining structure is adopted, the external environment resistance is strong, and the stability is greatly improved.

The invention provides a high-power external cavity tunable quantum cascade laser output module. The high-power external cavity tunable quantum cascade laser output module comprises a first lens, a first half-wave plate and a first mid-infrared grid polaroid which are sequentially arranged along a light path of a first laser; a second lens, a second half-wave plate, a second mid-infrared grid polarizer and a third half-wave plate are sequentially arranged along the light path of the second laser; emergent light of the first mid-infrared grid polaroid and the third half-wave plate is converged on different surfaces of the third mid-infrared grid polaroid, the first blazed grating is arranged on a reflection light path of the first mid-infrared grid polaroid, and the second blazed grating is arranged on a reflection light path of the second mid-infrared grid polaroid. According to the invention, the problems of wavelength locking and low polarization beam combination efficiency caused by insufficient polarization state of the quantum cascade laser can be effectively solved, narrow linewidth output and wavelength tuning of the quantum cascade laser can be realized, and even high-power dual-wavelength tunable output can be realized through polarization beam combination structure expansion.

The invention is suitable for the field of electrochemical luminescence detection equipment, and provides a dispersion device suitable for electrochemical luminescence detection, which comprises a monochromator body, the monochromator body is composed of a monochromator housing, a reflector assembly, a grating assembly, a collimating mirror assembly, a focus lens assembly, a slit, a flange snap ring and a flange; an M-shaped light path is arranged in the monochromator body, and a slit, a reflector assembly, a collimating mirror M1 in the collimating mirror assembly, a customized blazed grating G1 in the grating assembly and a focusing mirror M2 in the focusing mirror assembly are sequentially arranged in the light propagation direction. The customized blazed grating G1 is designed by adopting specific parameters including the scribed line density, the blazed wavelength, the notch groove depth and the groove width ratio, and primary light energy enhancement and secondary light intensity suppression can be realized; according to the invention, an optical filter is not needed, the diffraction efficiency of a monochromator is improved to 60-86%, the intensity ratio of luminol secondary light to primary light is less than or equal to 1.6%, the detection limit of ruthenium bipyridine is reduced from 100pmol / L to 50pmol / L, and the electrochemical luminescence detection device is suitable for various electrochemical luminescence detection scenes.

A super-resolution microscopic imaging method and apparatus based on common-path parallel fluorescence emission difference microscopy. In the method, a liquid crystal spatial light modulator is used to modulate excitation light in fluorescence emission difference microscopy super-resolution microscopic imaging, and two parts of the spatial light modulator are respectively loaded into 0-2π vortex phase modulation and blazed grating, so that the common-path excitation light forms solid spot and doughnut-shaped spot with a certain distance on a sample surface at the same time, and parallel scanning is carried out, thereby ensuring that the imaging speed is doubled compared with that of ordinary fluorescence emission difference super-resolution microscopic imaging, and at the same time, the two excitation lights are not easily affected by noise, drift and other interferences due to the common path.

The present invention provides a blazed grating and a method for fabricating the same. The method comprises: depositing a titanium dioxide optical film of uniform thickness on a target substrate; spin-coating an imprint adhesive onto the titanium dioxide optical film using a coating process; imprinting and patterning the imprint adhesive; selecting inductively coupled plasma etching parameters that match the target substrate for etching the titanium dioxide optical film; using the inductively coupled plasma etching parameters to etch the titanium dioxide optical film onto the target substrate to obtain a corresponding blazed grating; and transferring the nanoimprinted pattern using a corresponding inductively coupled plasma etching process based on the inductively coupled plasma etching parameters, thereby etching the titanium dioxide optical film onto the target substrate to obtain a corresponding blazed grating. Through process design and parameter optimization, the present invention fabricates a blazed grating with low roughness, high line density, good pattern fidelity, good blaze angle consistency, and high uniformity.

The invention provides a high-flux large-volume optical tomography system and method, and the system comprises a spatial light modulator which is used for carrying out the wavefront modulation of an incident laser beam, and generating an illumination light beam; a scanning device for generating an illumination light sheet based on the illumination beam; the sCMOS camera is used for detecting signals; the sample table is used for bearing and driving a sample to move; the synchronous control module is configured to control the spatial light modulator to dynamically load a composite phase pattern, and the composite phase pattern is formed by superposition of a depth-of-field phase component used for generating an extended depth-of-field light beam, a blazed grating phase component used for concentrating energy to first-level light and a lens phase component used for controlling a light beam focus to perform axial scanning; the synchronous control module is further configured to synchronously control the refreshing of the composite phase pattern and the deflection angle of the scanning device so as to acquire a three-dimensional image view field block through pure optical scanning during the stationary period of the sample stage. According to the invention, the imaging flux is greatly improved.

The invention relates to a blazed grating preparation method and a blazed grating. The preparation method of the blazed grating comprises the steps that a helical grating is prepared to obtain the helical grating, and the inclined surface of the helical grating is a blazed surface; depositing a cut-off material to the helical tooth grating to form a cut-off layer covering the blazing surface in the gap of the helical tooth grating to obtain a middle grating; grinding the middle grating to remove the redundant cut-off material, so that the upper end of the cut-off layer is flush with the upper end of the helical tooth grating; etching the ground middle grating to remove the helical tooth grating which is not protected by the cut-off layer to form an anti-blazing surface and an anti-blazing angle; and removing the cut-off layer to expose the blazed surface and form a blazed angle to obtain the blazed grating. According to the blazed grating preparation method, the blazed angle and the anti-blazed angle can be accurately controlled. According to the blazed grating preparation method, a flat blazed surface and a vertical anti-blazed angle can be formed, and the angle of the anti-blazed angle can be regulated and controlled.

A method is provided for forming optical elements with different optical element structures in a single element material layer. The method includes forming a patterned hard mask over an element material layer deposited on a top surface of a substrate, and patterning a first region of the element material layer to form a first plurality of optical features. The method also includes depositing a dielectric layer over the patterned hard mask, and selectively etching the dielectric layer and the element material layer to form a second plurality of optical features in a second region of the element material layer. The first plurality of optical features may be a binary grating structure, and the second plurality of optical features may be a blazed grating structure.

The present invention discloses a design method for a mask capable of rotating a light beam parallel to the optical axis. The present invention proposes a light beam that can be rotated parallel to the optical axis. By segmenting the shaped light beam and separately modulating additional Fourier phase shifts, and then superimposing them to obtain the hologram transmittance function of the light beam, combining the hologram transmittance function and a blazed grating, a mask capable of rotating a light beam parallel to the optical axis can be obtained. Using this mask, a light beam that can be rotated parallel to the optical axis can be generated. The rotation angle, beam size, and rotation radius of the light beam generated by this technology can all be arbitrarily modulated, thereby realizing longitudinal micro-manipulation of particles. This technology solves the problem that structured light beams cannot achieve longitudinal micro-manipulation of particles, and theoretically can endow structured light beams with the ability to support multi-particle longitudinal micro-manipulation in three-dimensional space. This technology is easy to operate and use, providing great potential for the future development of structured optical tweezers.

The present application relates to a kind of based on spectrometer imaging method and system of blaze grating.From the far field light of incident slit, into plano-convex lens, refract by plano-convex lens and meniscus lens, after again passing through thick catadioptric mirror concave surface reflection, with convergent light beam form is incident to convex blaze grating, after grating diffraction and reflection, form multiple beam single wavelength divergent light beam, in turn through thick catadioptric mirror reflection, meniscus lens and plano-convex lens refract, image on image plane, realize spectral imaging.The present application adopts immersion littrow-Offner structure, incident slit is off-axis in meridian and sagittal direction, so that incident slit and image plane are separated, facilitate engineering implementation;Spectrometer imaging system uses full immersion optical path, so that imaging spectrometer structure is more simple and compact, more convenient to assemble and use;Grating selects convex blaze grating, has high diffraction efficiency, so that the present imaging system can play a role in more extensive application field.

A design method of a Gibbs-Wulff optical vortex array mask plate, steps are as follows: obtaining an electric field expression of a Gibbs-Wulff optical vortex array, combining the amplitude, phase of the Gibbs-Wulff optical vortex array with a blazed grating, obtaining a complex transmittance function of the Gibbs-Wulff optical vortex array mask plate, and the mask plate described based on the complex transmittance function is the Gibbs-Wulff optical vortex array mask plate. The present application utilizes the principle of computer holography, and obtains the amplitude modulation phase mask plate of the Gibbs-Wulff optical vortex array through computer coding, so that the Gibbs-Wulff optical vortex array with controllable boundary and controllable structure and arrangement mode in the boundary can be generated. Thus, the present application has important application value in the fields of particle manipulation and optical micro-machining.

The present invention belongs to the field of micro-nano optics and beam shaping technology, and discloses a beam shaping method and system based on a metasurface blazed grating. The present invention places a first metasurface blazed grating and a second metasurface blazed grating in a shaping optical path; an asymmetric laser beam is incident on the first metasurface blazed grating along a first direction, and the first metasurface blazed grating is used to compress the beam along a second direction; the compressed beam is incident on the second metasurface blazed grating, and the second metasurface blazed grating is used to reorganize the beam along a third direction, shaping the beam after passing through the second metasurface blazed grating into an orthogonal symmetrical laser beam propagating along the first direction. The present invention uses the metasurface as a blazed grating to achieve beam shaping, and has a small size, light weight, and can be highly integrated, adapting to the development of miniaturization and micro-processing.

This application discloses an internal tilted blazed grating structure for optical glasses and its manufacturing method. The method includes forming a surface-modified photoresist pattern on a silicon carbide substrate; performing a first etching on the exposed surface of the substrate using the photoresist pattern to form a first trench with vertical sidewalls, filling it with a protective layer, and planarizing it; forming a triangular polysilicon pattern on the planarized substrate, and forming an oxide layer and a sidewall layer on its sides; using the polysilicon pattern with the sidewall layer as a mask to perform a second etching on the exposed surface of the substrate until the polysilicon pattern is completely etched away; and forming a second trench connected to the first trench and having a tilted sidewall on one side at the top of the first trench. This application reduces the complexity of the manufacturing process, facilitates the patterning of vertical and tilted sidewall structures, improves sidewall roughness, and is suitable for enhancing optical performance, increasing diffraction efficiency, and improving long-term stability.

The invention discloses two identification methods for a mark with a blazed grating structure on a substrate, and the method comprises the steps: carrying out the photoetching or etching of the blazed grating structure in the mark, carrying out the feature matching through recording the reflection efficiency in a wave band according to the characteristic that the blazed grating structure shines at a specific wavelength, and carrying out the recognition of the mark. The influence of interference factors such as falling dust and impurities on the substrate, photoresist spin coating defects and the like on mark grabbing can be effectively avoided. The accuracy of mark identification can be improved, the blazed grating structure has a unique diffraction efficiency characteristic, and under a specific blazed wavelength, the diffraction efficiency of the grating has a maximum value and forms an obvious difference with an interferent, so that the mark and the interferent can be accurately distinguished, and misjudgment of a visual positioning system is avoided.

The invention provides a three-dimensional object encryption and decryption method and system based on vortex light array regulation and control. The method comprises the steps that a three-dimensional model is constructed, and depth information and intensity information of the three-dimensional model are extracted; performing layering processing on intensity information through depth information of a three-dimensional object by utilizing a chromatography technology, and then combining with a sampling point array to generate a target image; a generated target image is modulated by using a random phase, then a reserved hologram containing depth information is generated by using angular spectrum diffraction, and then a selected hologram is constructed by combining a specific spiral phase index and a radial index. Further introducing an off-axis holographic technology and a digital blazed grating technology to splice the selected holograms, and modulating to generate a multiplexing encrypted hologram; and decryption processing is carried out on the multiplexing encryption hologram, and high-fidelity independent reconstruction of three-dimensional object information can be realized only by matching the Laguerre-Gaussian mode vortex light used during encryption, arrangement of the Laguerre-Gaussian mode vortex light and the depth of corresponding three-dimensional information. According to the three-dimensional object encryption and decryption method and system based on vortex light array regulation and control, interlayer crosstalk for decrypting three-dimensional information is effectively reduced, the accuracy of the three-dimensional information encryption and decryption system is improved, and the safety of the encryption system is remarkably enhanced.

The utility model provides a display panel, a limiting layer of the display panel is provided with a groove at a position corresponding to a light source, a limiting part is formed corresponding to a first gap between adjacent light sources, a color conversion unit is arranged in the groove, a blazed grating is arranged on the groove wall of the groove, and the blazed grating is located between the limiting part and the color conversion unit. A second gap is formed between the color conversion unit and the adjacent blazed grating, and the emergent light of the light source is converted by the color conversion unit to directly form display light, or is converted by the color conversion unit, is reflected by the blazed grating and then is emitted from the second gap to form the display light. Therefore, light converted by the color conversion unit is directly emitted from the second gap after passing through the blazed grating and does not pass through the color conversion unit again, light loss caused by multiple times of reflection by the metal coating and scattering and re-absorption by the color conversion unit can be reduced, and the brightness can be improved.

The invention discloses an axisymmetric blazed grating precision displacement sensor and a measurement system, and relates to the technical field of grating precision displacement sensor measurement, the sensor adopts an axisymmetric distribution mode, a blazed grating assembly comprises a first blazed grating and a second blazed grating, and the first blazed grating and the second blazed grating are installed on the two sides of a displacement bearing assembly in an axisymmetric distribution mode; the laser outputs laser; the polarization beam splitting assembly divides the laser into two beams of polarized light with the same light intensity. The wave plate assembly performs polarization state conversion on the polarized light; the reflection assembly reflects the polarized light to the first blazed grating and the second blazed grating at a Littrow angle so as to diffract the polarized light; the polarization beam splitting assembly combines two beams of diffracted light diffracted by the first blazed grating and the second blazed grating and reflected by the reflection assembly; the light splitting detection assembly carries out light splitting and signal detection on the combined light to obtain interference signals, and displacement measurement is achieved. According to the invention, the displacement measurement precision and the diffraction efficiency can be improved.

Embodiments described herein provide for methods of forming optical device structures. The methods relate to forming staircase or blazed angle grating structures using nanoimprint lithography (NIL) in combination with other forming techniques. In certain embodiment, the methods provide for forming staircase or blazed angle grating structures for optical devices without the need for multiple repeated lithographic patterning and etch processes.

The application provides a complex amplitude SLM adaptive optical path alignment system and method for aligning a to-be-aligned light beam in a disturbed channel, wherein the to-be-aligned light beam in the disturbed channel is decomposed into target light and reference light after passing through a beam splitter; a wavefront sensor receives the reference light, acquires phase information of the reference light and inputs the phase information into a processor; the processor calculates a superimposed compensation amount of complex amplitude regulation according to an alignment position and generates a phase hologram, and inputs the phase hologram into a liquid crystal controller; the phase hologram comprises a plurality of concentric circles, and is used for simulating a ring-shaped blazed grating of focused light rays at a preset alignment position; a liquid crystal of a phase SLM receives the target light, the liquid crystal controller converts the phase hologram into a control voltage, and controls the liquid crystal to perform alignment output on the target light; and the application can continuously correct and align the light beam transmitted in the disturbed optical channel based on pure phase SLM complex amplitude regulation.

A method for multifocal energy gradient laser holographic cutting of hard and brittle materials includes the following steps: S1, determining the parameters of the incident beam and the high numerical aperture focusing objective; S2, determining the three-dimensional multifocal beam and parameters of the target hard and brittle material; S3, setting a two-dimensional linear phase distribution on the spatial light modulator plane as the initial phase for subsequent iterative calculations; S4, establishing a forward-backward propagation iterative loop based on phase optimization to calculate the multifocal holographic phase distribution; S5, superimposing a linear blazed grating phase on the multifocal holographic phase distribution, and generating a composite diffraction phase hologram using MATLAB code and inputting it into the spatial light modulator; achieving uniform holographic cutting with consistent actual absorbed energy in each layer. This invention features controllable three-dimensional focal positions, adjustable energy gradients along the depth direction at each focal point, strong deep-layer energy compensation capability, simultaneous aberration correction, and high consistency in cutting at different depths.

The embodiment of the present application discloses a manufacturing method of a blazed grating. First, a substrate for manufacturing the blazed grating is provided, and a patterned mask is covered on the substrate. Then, the substrate is etched by using a first etching rate and taking the patterned mask as a mask. A section perpendicular to a plane where the substrate is located is formed on the substrate. Then, the substrate is continuously etched by using a second etching rate, and the height of the section is reduced. The first etching rate is N times of the second etching rate. That is, the manufacturing method of the blazed grating provided by the embodiment of the present application first etches the substrate by using a higher etching rate to obtain a general structure of the blazed grating, and the structure includes the section. Then, the substrate is continuously etched by using a lower etching rate to repair the section formed by the first etching rate, so that the blazed grating with better structure parameters is finally formed.

A lithography mask may include a substrate layer. The lithography mask may include a multilayer reflective film disposed on the substrate layer and forming a first pattern, wherein the multilayer reflective film is configured to receive incident light and reflect a portion of the incident light toward an imaging collection pupil. The lithography mask may include a grating forming a second pattern on the substrate layer and configured to receive the incident light and deflect an additional portion of the incident light outside of the imaging collection pupil. The lithography mask may be inspected by an Actinic Patterned Mask Inspection (APMI) system. The second pattern may include a reflective film deposited on the grating.

The invention relates to the technical field of laser precision machining, in particular to a method for machining a blazed grating on a hard and brittle material through space-time shaping laser based on a Fabry-Perot cavity, and the method comprises the following steps: transmitting an initial ultrafast laser pulse; the initial ultrafast laser pulse is guided into a Fabry-Perot cavity, the Fabry-Perot cavity is composed of two partial transmission mirrors with preset relative inclination angles, the initial ultrafast laser pulse is reflected for multiple times in the Fabry-Perot cavity, and a string of sub-pulse sequences is output; the sub-pulse sequence is guided into a focusing system, the angle difference between the sub-pulses is converted into transverse spatial position offset on a focal plane by using the Fourier transform characteristic of the focusing system, and the transverse spatial position offset is irradiated on a workpiece made of a hard and brittle material; relatively moving the workpiece made of the hard and brittle material and the initial ultrafast laser pulse; and the steps are repeated, and the periodic blazed grating structure is formed on the workpiece made of the hard and brittle material. Therefore, decoupling of time-domain thermal regulation and spatial-domain morphology regulation is realized.

A design method of a mask for generating a high-order optical vortex beam by an interference method, which superimposes partial multiple Laguerre-Gaussian beams to obtain an electric field expression of their spatial overlapping field; combines the phases, amplitudes of multiple Laguerre-Gaussian beams and a blazed grating to obtain a complex transmittance function of the mask. The mask for generating a high-order optical vortex beam designed by the interference method of the present invention generates a high-order optical vortex beam with a controllable topological charge value in the far field. The high-order optical vortex beam is determined by the superimposed Laguerre-Gaussian beams, including that the topological charge value of the superimposed beams determines the topological charge value of the high-order optical vortex beam, the weight factor between the superimposed beams determines the intensity distribution of the high-order optical vortex, and the initial phase factor of the superimposed beams j determines the structure of the dark core of the high-order optical vortex. The present invention has the characteristics of contactless generation and miniaturization development, and thus has important value in the fields of optical micro-manipulation, optical communication, quantum entanglement, etc.

This invention provides a method for simulating the morphological evolution of blazed grating etching, including: pre-constructing an etching mask structure based on a pre-defined blazed grating structure; determining etching contour lines at different times and positions based on the morphological evolution of the mask structure during etching, and determining the motion properties of different contour lines; determining the linear equation of each contour line and the motion mode of each contour line; determining the motion direction of each contour line in combination with different etching processes; and determining and updating the position and linear equation of each contour line at different etching times based on the motion direction and motion rate of each contour line; and judging the simulated etching endpoint of the blazed grating etching morphology based on different etching processes. This invention can more accurately describe the influence of different processes and process parameters on the final etching result, perform in-depth processing of discrete technical data, and thus predict and control the ion beam etching process.

The utility model relates to the technical field of film thickness measurement, in particular to a device for accurately measuring the thickness of a transparent film, which comprises a spectrum system and a spectrum detection circuit, the spectrum system is composed of a light source, two convex lenses, two adjustable slits, a blazed grating and other optical components, the spectrum detection circuit is composed of a photoelectric induction module, a voltage amplifier, a sliding potentiometer, a universal circuit board and other electronic components, compared with the prior art, the spectrum detection device has the advantages of being scientific and reasonable in design, easy to manufacture, low in cost, easy to operate and high in measurement accuracy, and most importantly, the surface of a measured material is not damaged in the measurement process; moreover, the device can be used for actually measuring the thickness of the transparent film in daily production, can also be applied to the field of teaching experiments, and has a prospect of large-scale popularization and application.