22 results about "Blazed grating" patented technology

A method is provided for forming optical elements with different optical element structures in a single element material layer. The method includes forming a patterned hard mask over an element material layer deposited on a top surface of a substrate, and patterning a first region of the element material layer to form a first plurality of optical features. The method also includes depositing a dielectric layer over the patterned hard mask, and selectively etching the dielectric layer and the element material layer to form a second plurality of optical features in a second region of the element material layer. The first plurality of optical features may be a binary grating structure, and the second plurality of optical features may be a blazed grating structure.

The application provides a complex amplitude SLM adaptive optical path alignment system and method for aligning a to-be-aligned light beam in a disturbed channel, wherein the to-be-aligned light beam in the disturbed channel is decomposed into target light and reference light after passing through a beam splitter; a wavefront sensor receives the reference light, acquires phase information of the reference light and inputs the phase information into a processor; the processor calculates a superimposed compensation amount of complex amplitude regulation according to an alignment position and generates a phase hologram, and inputs the phase hologram into a liquid crystal controller; the phase hologram comprises a plurality of concentric circles, and is used for simulating a ring-shaped blazed grating of focused light rays at a preset alignment position; a liquid crystal of a phase SLM receives the target light, the liquid crystal controller converts the phase hologram into a control voltage, and controls the liquid crystal to perform alignment output on the target light; and the application can continuously correct and align the light beam transmitted in the disturbed optical channel based on pure phase SLM complex amplitude regulation.

A method for multifocal energy gradient laser holographic cutting of hard and brittle materials includes the following steps: S1, determining the parameters of the incident beam and the high numerical aperture focusing objective; S2, determining the three-dimensional multifocal beam and parameters of the target hard and brittle material; S3, setting a two-dimensional linear phase distribution on the spatial light modulator plane as the initial phase for subsequent iterative calculations; S4, establishing a forward-backward propagation iterative loop based on phase optimization to calculate the multifocal holographic phase distribution; S5, superimposing a linear blazed grating phase on the multifocal holographic phase distribution, and generating a composite diffraction phase hologram using MATLAB code and inputting it into the spatial light modulator; achieving uniform holographic cutting with consistent actual absorbed energy in each layer. This invention features controllable three-dimensional focal positions, adjustable energy gradients along the depth direction at each focal point, strong deep-layer energy compensation capability, simultaneous aberration correction, and high consistency in cutting at different depths.

This invention provides a method for simulating the morphological evolution of blazed grating etching, including: pre-constructing an etching mask structure based on a pre-defined blazed grating structure; determining etching contour lines at different times and positions based on the morphological evolution of the mask structure during etching, and determining the motion properties of different contour lines; determining the linear equation of each contour line and the motion mode of each contour line; determining the motion direction of each contour line in combination with different etching processes; and determining and updating the position and linear equation of each contour line at different etching times based on the motion direction and motion rate of each contour line; and judging the simulated etching endpoint of the blazed grating etching morphology based on different etching processes. This invention can more accurately describe the influence of different processes and process parameters on the final etching result, perform in-depth processing of discrete technical data, and thus predict and control the ion beam etching process.

This disclosure relates to a method (100) for fabricating a blazed grating. The method (100) comprises providing a substrate and a patterned mask layer (110) on the substrate, performing primary dry etching (120) of the substrate such that primary ions are accelerated towards a primary etch direction to impinge on the substrate, and performing secondary dry etching (150) of the substrate such that secondary ions are accelerated towards a secondary etch direction to impinge on the substrate. A primary projection of the primary etch direction and a secondary projection of the secondary etch direction onto the grating cross-sectional plane extend perpendicular to one and the other of a blaze facet direction and an anti-blaze facet direction, respectively, and ions accelerated towards a direction with a projection onto a grating cross-sectional plane perpendicular to the blaze facet direction are collimated to form a collimated ion beam for etching the substrate.

The application discloses an ultra-narrow linewidth Littman tunable laser, comprising a semiconductor laser diode, a collimating lens, a blazed grating and a tunable mirror which is arranged opposite to the grating plane of the blazed grating and is angle-adjustable, wherein the semiconductor laser diode, the collimating lens and the blazed grating are located on the same optical axis, and the grating plane of the blazed grating is distributed in intersection with the optical axis; and the application further comprises a cavity length-adjustable F-P etalon, which is located on the output light path of the zero-order diffraction light of the blazed grating, and the zero-order diffraction light is output as laser after passing through the F-P etalon. In this way, the semiconductor laser diode, the collimating lens, the blazed grating and the tunable mirror form a standard Littman tunable laser, and the cavity length-adjustable F-P etalon is additionally arranged, so that the cavity distance of the F-P etalon is adjusted to match the narrow-band filtering characteristics of the F-P etalon with the output wavelength of the semiconductor laser diode.

The application provides a blazed grating preparation process, a blazed grating and a diffractive optical waveguide. The blazed grating preparation process comprises the following steps: forming a blazed grating preparation process parameter information query table based on a blazed grating preparation process parameter calculation model; querying the preparation process parameters of a target blazed grating through the blazed grating preparation process parameter information query table by using known related setting parameters of the target blazed grating; and preparing the target blazed grating according to the preparation process parameters of the target blazed grating. The blazed grating preparation process provided by the application can quickly and accurately determine the preparation process parameters of the target blazed grating with the setting target parameters, so that the target blazed grating can be quickly and accurately prepared.

This invention discloses a square lattice structured light-illuminated super-resolution microscopy system and method. The system integrates a square blazed grating hologram generation module, a digital lens hologram generation module, and a composite hologram generation module on its phase modulator. Wavefront phase modulation of the incident beam is achieved by loading the composite hologram onto the incident beam. The acquired raw image is pre-filtered, multiplied by a pre-calculated weighting function, and superimposed to obtain an intermediate image. Finally, deconvolution is performed on the intermediate image to obtain the final super-resolution image. This invention concentrates light energy into effective diffraction orders through the loaded square blazed grating hologram, improving the system's light energy utilization efficiency. Combining the digital lens hologram and adjusting the lens focal length allows control of the focusing position of the diffraction orders. Furthermore, adjusting optical elements enables switching between different magnification objectives, meeting the needs of multi-scale sample observation.

This invention provides a method for forming a waveguide structure and a blazed grating. The method for forming the waveguide structure includes: step S11: providing a silicon material layer; step S12: etching a portion of the silicon material layer to form multiple steps on the surface of the silicon material layer; step S13: oxidizing the surface of the silicon material layer using a thermal oxidation process to form a silicon oxide layer; step S14: wet etching the silicon oxide layer; step S15: repeating steps S13 to S14 to make the surface of the stepped silicon material layer become a smooth slope shape. In the waveguide structure of this invention, the smooth slope of the silicon material layer can form a waveguide structure with gradually varying thickness, thereby reducing coupling loss.

A high-throughput miniature Raman spectrometer, belonging to the field of spectroscopic analysis instruments, includes a laser module, an external optical path system, and a beam splitting system. The laser module comprises a narrowband laser module and a collimating mirror; the external optical path system includes a dichroic mirror, an aspherical lens, a stage, a long-pass filter, a cemented doublet lens, and a slit; the beam splitting system includes a collimating mirror, a blazed grating, a focusing mirror, and a linear charge-coupled device (CCD). By integrating the laser module and external optical path system with the beam splitting system, signal attenuation during fiber optic transmission is avoided; a large numerical aperture aspherical lens is used to achieve efficient sample excitation and signal collection; the cemented doublet lens converges the beam to the slit, reducing the optical path size and eliminating axial chromatic aberration; and the cascaded filtering structure of the dichroic mirror and long-pass filter effectively suppresses Rayleigh scattering interference. While maintaining resolution, the luminous throughput is significantly improved, offering low cost, high precision, and portability, making it suitable for fields such as food safety testing.

This invention discloses an optical waveguide module, relating to the field of optical device technology. It includes a substrate, an optical waveguide layer on top of the substrate, and a buffer layer with a continuously curved, wave-shaped design between the substrate and the waveguide layer. This invention forms a stress-relieving structure based on the wave-shaped buffer layer, substrate, and waveguide layer, achieving thermal expansion coefficient matching and bending stress dispersion between the substrate and the waveguide layer. Simultaneously, combined with various adhesion enhancement layers, it ensures the long-term stability of the multi-layer interface. Furthermore, the input coupling layer employs a composite design of a blazed grating and a subwavelength grating, significantly improving the coupling efficiency from visible light to near-infrared. The output coupling layer achieves wide field-of-view output through a gradient periodic grating, adapting to large viewing angle requirements. Additionally, it integrates a modulator and a graphene thermal conductive layer, simultaneously solving the problems of high-speed modulation and heat dissipation, significantly improving the optical performance, thermal stability, and mechanical reliability of the optical waveguide module.

This invention discloses an extreme ultraviolet (EUV) time-delay compensated monochromator, processing method, and electronic device, relating to the field of EUV light processing technology. The monochromator includes: a first optical structure comprising a first planar blazed grating and a first ring mirror, wherein the first planar blazed grating is used to split and diffract the incident light, and the first ring mirror is used to focus and reflect the beam; a second optical structure comprising a second planar blazed grating and a second ring mirror, wherein the second planar blazed grating is used to compensate for the pulse forward tilt introduced by the first planar blazed grating, and the second ring mirror is used to focus and reflect the beam; and a slit plane, disposed between the first and second optical structures to ensure symmetry, for filtering the beam corresponding to the desired wavelength. This invention solves the technical problem in related technologies where monochromators cannot simultaneously achieve performance indicators such as energy transfer efficiency, spectral resolution, and pulse forward tilt compensation.

A design method of a customizable arbitrary shape structured light mask plate, steps are as follows: based on holographic shaping technology and the current model, the electric field expression of the customizable arbitrary shape structured light beam is obtained, the complex transmittance function of the customizable arbitrary shape structured light beam mask plate is obtained by combining the amplitude, phase and a blazed grating of the light beam, and the mask plate described based on the complex transmittance function is the customizable arbitrary shape structured light mask plate. The mask plate designed by the application can generate a customizable arbitrary shape structured light. The topological charge value of the structured light is controllable, and the structured light with amplitude and phase distribution along any preset track can be generated according to actual requirements. Compared with the previous beam shaping technology, the controllability of the structured light is greatly improved.

This invention discloses a method for fabricating a large-aperture convex grating with a high-depth-width blazed groove shape. The method includes: confirming the grating line density using dispersion theory; determining the grating's operating temperature under corresponding wavelength radiation backgrounds; determining the grating substrate material; performing a rough calculation of the blaze angle using scalar diffraction theory; performing a precise calculation of the blaze angle using the finite-difference time-domain method; determining the film material and thickness; designing the consistency of TE and TM diffraction efficiencies; analyzing the grating groove shape difference; confirming the grating groove shape parameters; electron beam exposure and development of the blazed groove shape; designing, exposing, and developing the exposure dose compensation; stitching together the large-aperture grating exposure areas; ion beam etching of the grating; and coating the grating with a metal reflective film. This fabrication method ensures the stability of the diffraction efficiency of the grating substrate and film materials under varying temperatures from room temperature to deep cryogenics, as well as the consistency of TE and TM diffraction efficiencies, thus guaranteeing the imaging quality and response stability of spectroscopic instruments.

This invention discloses an ultrasonic milling method for blazed gratings on metal surfaces, comprising the following steps: calculating the required clearance angle of the milling cutter based on the blaze angle of the blazed grating to be machined; calculating the required torsional and bending ratios of the milling cutter based on the length ratio of the cutting surface to the pressing surface of the blazed grating to be machined; calculating the frequency of the input signal, the feed rate of the milling cutter, and the spindle speed of the milling cutter based on the spacing of the blazed grating to be machined; calculating the predetermined angle between the axial direction of the milling cutter and the surface to be machined, and the milling depth based on the length of the blazed grating to be machined perpendicular to the feed direction; and calculating the amplitude of the input signal based on the height difference between the crests and troughs of the blazed grating to be machined. The ultrasonic milling method for blazed gratings on metal surfaces according to embodiments of this invention has advantages such as high processing efficiency, low machine tool precision requirements, and high degree of freedom.

The application provides a nanoimprint-based blazed grating array structure and a preparation method and application thereof. The application adopts the nanoimprint technology to prepare a right-angle grating array structure on an elastic supporting substrate, forms an elastic body imprint composite template; then the nanoimprint technology is used to copy the right-angle grating array structure on the elastic body composite template into an imprint adhesive layer on a quartz glass substrate, the dry etching technology is used to copy the right-angle grating array structure into a sacrifice layer on the quartz glass substrate, then the vacuum coating technology and the inclination angle etching technology are combined, and a blazed grating array structure with uniform morphology and stable mechanical performance can be simply and efficiently obtained. The preparation method has the advantages of simple operation, low cost and easy mass production, the blazed angle of the blazed grating can be simply and efficiently controlled by adjusting the process parameters in the preparation process, and the method has a wide application prospect in the fields of optical elements and integrated optics.

This application provides a tuning device and method for an external cavity tunable laser. The device includes: a blazed grating for diffracting a parallel beam to generate a resonant beam; a first adjustment module for carrying and rotating the blazed grating to adjust its rotation angle; a second adjustment module for carrying the first adjustment module and adjusting the longitudinal position of the blazed grating to adjust the cavity length of the external cavity tunable laser; a first control module for controlling the first adjustment module to rotate at a first speed according to an input first signal to adjust the rotation angle of the blazed grating; a second control module for controlling the second adjustment module to longitudinally translate at a second speed according to an input second signal to change the longitudinal position of the blazed grating; and an information processing module for setting the first speed and calculating the second speed according to the current rotation angle information output by the first adjustment module and the current actual position information output by the second adjustment module, and outputting the first signal and the second signal.

The application discloses a kind of based on multi-channel diffraction grating ultrafast laser intensity modulation method and system, method includes: placing optical element according to optical path design, alignment optical axis, adjust the output direction of ultrafast laser and system main optical axis coincide, complete preliminary calibration.Laser is split by blazed grating, focused to each channel electro-optic modulator by microlens array;8 independent electric modulation signals are generated synchronously, and after loading, the intensity modulation of multi-channel sub-beam is completed, and then synthesized by confocal aspherical mirror to eliminate aberration.When the modulation contrast is less than 30dB, based on fast and slow deviation grading mechanism: high-frequency dynamic deviation is compensated by real-time voltage correction optical path, low-frequency slow change deviation is compensated by temperature control refractive index and fine adjustment grating angle to reduce crosstalk, until standard is reached.Finally, linkage control mechanism is established, and parameters are monitored and dynamically adjusted in real time.Modulation speed, precision and stability are improved.

This invention discloses a high-power liquid quantum dot laser amplifier. After the pump beam enters the amplifier, it is split into optical path I and optical path II. Optical path I and optical path II then simultaneously reach a second liquid quantum dot laser medium. Optical path I, along the incident direction of the pump beam, sequentially comprises: a beam splitter, a cylindrical mirror, a first liquid quantum dot laser medium, a reflective blazed grating, a tunable total reflection mirror, an output coupling mirror, a total reflection mirror, an aperture, a collimating lens, and a second liquid quantum dot laser medium. Optical path II, along the incident direction of the pump beam, sequentially comprises: a beam splitter, two mirror-mounted right-angle prisms, a collimating lens, a focusing lens, and a second liquid quantum dot laser medium. The method provided by this invention is stable and universal, achieving stable high-power tunable liquid quantum dot laser output, effectively overcoming the shortcomings of existing organic dye molecular lasers, such as easy deactivation of the gain medium and low operational stability at high power.

This invention discloses a method and structure for order control based on metasurface blazed gratings, relating to the field of metasurface technology. The method independently designs phase gradients for at least two wavelength bands within a single-layer metasurface, arranging two types of phase control units in an alternating manner. Utilizing the differences in the dispersion characteristics of these units, different equivalent phase distributions are formed in different wavelength bands. The diffraction order distribution in each wavelength band is independently controlled by adjusting the phase coverage. The structure includes a substrate and an alternating array of subwavelength nanopillars, achieving polarization-independent dual-band blazed control, capable of single-blazed, mixed-blazed, or dual-blazed operating modes. This invention uses single-crystal silicon nanopillars as control units, independently designed for the visible and near-infrared wavelengths, achieving efficient, spatially separated beam deflection control. The device is polarization-insensitive, suitable for natural light and arbitrary linearly polarized incident conditions, significantly improving practicality and environmental adaptability.

Embodiments herein are generally directed to methods of forming a waveguide structure having a blazed grating. The methods include depositing a photoresist layer on a patterned hardmask disposed above a device layer or a substrate, exposing the photoresist layer to produce a plurality of photoresist segments, etching the device layer or the substrate to produce at least one step forming a blazed grating, trimming the plurality of photoresist segments horizontally, and removing the plurality of photoresist segments and the patterned hardmask. The methods can further include repeating the steps to produce a second step and a third step of the blazed grating.

The application provides a manufacturing method of a high-refractive-index slanted grating, comprising the following steps: S1, forming a seed layer pattern on a grating substrate, the seed layer pattern is a plurality of periodically and spaced lines; and S2, depositing a layer of slanted grating structure material on the seed layer pattern by using a glancing angle deposition technology. The glancing angle deposition technology (GLAD) is used for manufacturing the high-refractive-index slanted grating.