97 results about "Blazed grating" patented technology

The invention discloses an external cavity tunable laser linewidth compression system for realizing wavelength phase locking based on mutual injection of gain chips. The external cavity tunable laser linewidth compression system comprises a red light semiconductor laser main gain chip, a first collimation optical system, a blazed grating, a tuning rotating mirror, a reflector, a power supply driving system and a double-path feedback amplification system, the double-path feedback amplification system comprises a first secondary gain chip, a second secondary gain chip, a second collimation optical system, a third collimation optical system and a polarization-free beam splitter prism; and the red light semiconductor laser main gain chip, the first secondary gain chip and the second secondary gain chip are all connected with the power supply driving system. Therefore, the technical problems of low output infrared light power, poor stability and narrow mode-hopping-free tuning range in the prior art are solved, and high-power, narrow-linewidth, high-stability and large-range mode-hopping-free continuous tuning red light output can be realized.

The invention discloses a system and method for generating, regulating and controlling a partially coherent space-time light field. The system comprises a pulse shaping assembly composed of a plurality of optical elements and an incident light source used for providing a completely coherent ultrafast pulse light field. An optical element in the pulse shaping assembly comprises a first blazed grating, a first cylindrical lens, a two-dimensional dynamic holographic modulator, a second cylindrical lens and a second blazed grating which are sequentially arranged in the light field propagation direction. The focal lengths of the first cylindrical lens and the second cylindrical lens are the same, and the distance between the adjacent optical elements is equal to the focal lengths of the first cylindrical lens and the second cylindrical lens; the two-dimensional dynamic holographic modulator is used for loading a specific complex amplitude modulation function to reconstruct the spatial-spectral characteristics of the light field. According to the invention, the two-dimensional space-spectrum function of the pulse is dynamically modulated, the generation of the partially coherent space-time wave packet is realized, and the amplitude and structure distribution of the space-time coherence can be designed and regulated as required.

The invention provides a high-power external cavity tunable quantum cascade laser output module. The high-power external cavity tunable quantum cascade laser output module comprises a first lens, a first half-wave plate and a first mid-infrared grid polaroid which are sequentially arranged along a light path of a first laser; a second lens, a second half-wave plate, a second mid-infrared grid polarizer and a third half-wave plate are sequentially arranged along the light path of the second laser; emergent light of the first mid-infrared grid polaroid and the third half-wave plate is converged on different surfaces of the third mid-infrared grid polaroid, the first blazed grating is arranged on a reflection light path of the first mid-infrared grid polaroid, and the second blazed grating is arranged on a reflection light path of the second mid-infrared grid polaroid. According to the invention, the problems of wavelength locking and low polarization beam combination efficiency caused by insufficient polarization state of the quantum cascade laser can be effectively solved, narrow linewidth output and wavelength tuning of the quantum cascade laser can be realized, and even high-power dual-wavelength tunable output can be realized through polarization beam combination structure expansion.

The invention is suitable for the field of electrochemical luminescence detection equipment, and provides a dispersion device suitable for electrochemical luminescence detection, which comprises a monochromator body, the monochromator body is composed of a monochromator housing, a reflector assembly, a grating assembly, a collimating mirror assembly, a focus lens assembly, a slit, a flange snap ring and a flange; an M-shaped light path is arranged in the monochromator body, and a slit, a reflector assembly, a collimating mirror M1 in the collimating mirror assembly, a customized blazed grating G1 in the grating assembly and a focusing mirror M2 in the focusing mirror assembly are sequentially arranged in the light propagation direction. The customized blazed grating G1 is designed by adopting specific parameters including the scribed line density, the blazed wavelength, the notch groove depth and the groove width ratio, and primary light energy enhancement and secondary light intensity suppression can be realized; according to the invention, an optical filter is not needed, the diffraction efficiency of a monochromator is improved to 60-86%, the intensity ratio of luminol secondary light to primary light is less than or equal to 1.6%, the detection limit of ruthenium bipyridine is reduced from 100pmol / L to 50pmol / L, and the electrochemical luminescence detection device is suitable for various electrochemical luminescence detection scenes.

The invention provides a high-flux large-volume optical tomography system and method, and the system comprises a spatial light modulator which is used for carrying out the wavefront modulation of an incident laser beam, and generating an illumination light beam; a scanning device for generating an illumination light sheet based on the illumination beam; the sCMOS camera is used for detecting signals; the sample table is used for bearing and driving a sample to move; the synchronous control module is configured to control the spatial light modulator to dynamically load a composite phase pattern, and the composite phase pattern is formed by superposition of a depth-of-field phase component used for generating an extended depth-of-field light beam, a blazed grating phase component used for concentrating energy to first-level light and a lens phase component used for controlling a light beam focus to perform axial scanning; the synchronous control module is further configured to synchronously control the refreshing of the composite phase pattern and the deflection angle of the scanning device so as to acquire a three-dimensional image view field block through pure optical scanning during the stationary period of the sample stage. According to the invention, the imaging flux is greatly improved.

The invention relates to a blazed grating preparation method and a blazed grating. The preparation method of the blazed grating comprises the steps that a helical grating is prepared to obtain the helical grating, and the inclined surface of the helical grating is a blazed surface; depositing a cut-off material to the helical tooth grating to form a cut-off layer covering the blazing surface in the gap of the helical tooth grating to obtain a middle grating; grinding the middle grating to remove the redundant cut-off material, so that the upper end of the cut-off layer is flush with the upper end of the helical tooth grating; etching the ground middle grating to remove the helical tooth grating which is not protected by the cut-off layer to form an anti-blazing surface and an anti-blazing angle; and removing the cut-off layer to expose the blazed surface and form a blazed angle to obtain the blazed grating. According to the blazed grating preparation method, the blazed angle and the anti-blazed angle can be accurately controlled. According to the blazed grating preparation method, a flat blazed surface and a vertical anti-blazed angle can be formed, and the angle of the anti-blazed angle can be regulated and controlled.

A method is provided for forming optical elements with different optical element structures in a single element material layer. The method includes forming a patterned hard mask over an element material layer deposited on a top surface of a substrate, and patterning a first region of the element material layer to form a first plurality of optical features. The method also includes depositing a dielectric layer over the patterned hard mask, and selectively etching the dielectric layer and the element material layer to form a second plurality of optical features in a second region of the element material layer. The first plurality of optical features may be a binary grating structure, and the second plurality of optical features may be a blazed grating structure.

The present application relates to a kind of based on spectrometer imaging method and system of blaze grating.From the far field light of incident slit, into plano-convex lens, refract by plano-convex lens and meniscus lens, after again passing through thick catadioptric mirror concave surface reflection, with convergent light beam form is incident to convex blaze grating, after grating diffraction and reflection, form multiple beam single wavelength divergent light beam, in turn through thick catadioptric mirror reflection, meniscus lens and plano-convex lens refract, image on image plane, realize spectral imaging.The present application adopts immersion littrow-Offner structure, incident slit is off-axis in meridian and sagittal direction, so that incident slit and image plane are separated, facilitate engineering implementation;Spectrometer imaging system uses full immersion optical path, so that imaging spectrometer structure is more simple and compact, more convenient to assemble and use;Grating selects convex blaze grating, has high diffraction efficiency, so that the present imaging system can play a role in more extensive application field.

A design method of a Gibbs-Wulff optical vortex array mask plate, steps are as follows: obtaining an electric field expression of a Gibbs-Wulff optical vortex array, combining the amplitude, phase of the Gibbs-Wulff optical vortex array with a blazed grating, obtaining a complex transmittance function of the Gibbs-Wulff optical vortex array mask plate, and the mask plate described based on the complex transmittance function is the Gibbs-Wulff optical vortex array mask plate. The present application utilizes the principle of computer holography, and obtains the amplitude modulation phase mask plate of the Gibbs-Wulff optical vortex array through computer coding, so that the Gibbs-Wulff optical vortex array with controllable boundary and controllable structure and arrangement mode in the boundary can be generated. Thus, the present application has important application value in the fields of particle manipulation and optical micro-machining.

This application discloses an internal tilted blazed grating structure for optical glasses and its manufacturing method. The method includes forming a surface-modified photoresist pattern on a silicon carbide substrate; performing a first etching on the exposed surface of the substrate using the photoresist pattern to form a first trench with vertical sidewalls, filling it with a protective layer, and planarizing it; forming a triangular polysilicon pattern on the planarized substrate, and forming an oxide layer and a sidewall layer on its sides; using the polysilicon pattern with the sidewall layer as a mask to perform a second etching on the exposed surface of the substrate until the polysilicon pattern is completely etched away; and forming a second trench connected to the first trench and having a tilted sidewall on one side at the top of the first trench. This application reduces the complexity of the manufacturing process, facilitates the patterning of vertical and tilted sidewall structures, improves sidewall roughness, and is suitable for enhancing optical performance, increasing diffraction efficiency, and improving long-term stability.

The invention provides a three-dimensional object encryption and decryption method and system based on vortex light array regulation and control. The method comprises the steps that a three-dimensional model is constructed, and depth information and intensity information of the three-dimensional model are extracted; performing layering processing on intensity information through depth information of a three-dimensional object by utilizing a chromatography technology, and then combining with a sampling point array to generate a target image; a generated target image is modulated by using a random phase, then a reserved hologram containing depth information is generated by using angular spectrum diffraction, and then a selected hologram is constructed by combining a specific spiral phase index and a radial index. Further introducing an off-axis holographic technology and a digital blazed grating technology to splice the selected holograms, and modulating to generate a multiplexing encrypted hologram; and decryption processing is carried out on the multiplexing encryption hologram, and high-fidelity independent reconstruction of three-dimensional object information can be realized only by matching the Laguerre-Gaussian mode vortex light used during encryption, arrangement of the Laguerre-Gaussian mode vortex light and the depth of corresponding three-dimensional information. According to the three-dimensional object encryption and decryption method and system based on vortex light array regulation and control, interlayer crosstalk for decrypting three-dimensional information is effectively reduced, the accuracy of the three-dimensional information encryption and decryption system is improved, and the safety of the encryption system is remarkably enhanced.

The utility model provides a display panel, a limiting layer of the display panel is provided with a groove at a position corresponding to a light source, a limiting part is formed corresponding to a first gap between adjacent light sources, a color conversion unit is arranged in the groove, a blazed grating is arranged on the groove wall of the groove, and the blazed grating is located between the limiting part and the color conversion unit. A second gap is formed between the color conversion unit and the adjacent blazed grating, and the emergent light of the light source is converted by the color conversion unit to directly form display light, or is converted by the color conversion unit, is reflected by the blazed grating and then is emitted from the second gap to form the display light. Therefore, light converted by the color conversion unit is directly emitted from the second gap after passing through the blazed grating and does not pass through the color conversion unit again, light loss caused by multiple times of reflection by the metal coating and scattering and re-absorption by the color conversion unit can be reduced, and the brightness can be improved.

The invention discloses an axisymmetric blazed grating precision displacement sensor and a measurement system, and relates to the technical field of grating precision displacement sensor measurement, the sensor adopts an axisymmetric distribution mode, a blazed grating assembly comprises a first blazed grating and a second blazed grating, and the first blazed grating and the second blazed grating are installed on the two sides of a displacement bearing assembly in an axisymmetric distribution mode; the laser outputs laser; the polarization beam splitting assembly divides the laser into two beams of polarized light with the same light intensity. The wave plate assembly performs polarization state conversion on the polarized light; the reflection assembly reflects the polarized light to the first blazed grating and the second blazed grating at a Littrow angle so as to diffract the polarized light; the polarization beam splitting assembly combines two beams of diffracted light diffracted by the first blazed grating and the second blazed grating and reflected by the reflection assembly; the light splitting detection assembly carries out light splitting and signal detection on the combined light to obtain interference signals, and displacement measurement is achieved. According to the invention, the displacement measurement precision and the diffraction efficiency can be improved.

Embodiments described herein provide for methods of forming optical device structures. The methods relate to forming staircase or blazed angle grating structures using nanoimprint lithography (NIL) in combination with other forming techniques. In certain embodiment, the methods provide for forming staircase or blazed angle grating structures for optical devices without the need for multiple repeated lithographic patterning and etch processes.

The application provides a complex amplitude SLM adaptive optical path alignment system and method for aligning a to-be-aligned light beam in a disturbed channel, wherein the to-be-aligned light beam in the disturbed channel is decomposed into target light and reference light after passing through a beam splitter; a wavefront sensor receives the reference light, acquires phase information of the reference light and inputs the phase information into a processor; the processor calculates a superimposed compensation amount of complex amplitude regulation according to an alignment position and generates a phase hologram, and inputs the phase hologram into a liquid crystal controller; the phase hologram comprises a plurality of concentric circles, and is used for simulating a ring-shaped blazed grating of focused light rays at a preset alignment position; a liquid crystal of a phase SLM receives the target light, the liquid crystal controller converts the phase hologram into a control voltage, and controls the liquid crystal to perform alignment output on the target light; and the application can continuously correct and align the light beam transmitted in the disturbed optical channel based on pure phase SLM complex amplitude regulation.

A method for multifocal energy gradient laser holographic cutting of hard and brittle materials includes the following steps: S1, determining the parameters of the incident beam and the high numerical aperture focusing objective; S2, determining the three-dimensional multifocal beam and parameters of the target hard and brittle material; S3, setting a two-dimensional linear phase distribution on the spatial light modulator plane as the initial phase for subsequent iterative calculations; S4, establishing a forward-backward propagation iterative loop based on phase optimization to calculate the multifocal holographic phase distribution; S5, superimposing a linear blazed grating phase on the multifocal holographic phase distribution, and generating a composite diffraction phase hologram using MATLAB code and inputting it into the spatial light modulator; achieving uniform holographic cutting with consistent actual absorbed energy in each layer. This invention features controllable three-dimensional focal positions, adjustable energy gradients along the depth direction at each focal point, strong deep-layer energy compensation capability, simultaneous aberration correction, and high consistency in cutting at different depths.

The embodiment of the present application discloses a manufacturing method of a blazed grating. First, a substrate for manufacturing the blazed grating is provided, and a patterned mask is covered on the substrate. Then, the substrate is etched by using a first etching rate and taking the patterned mask as a mask. A section perpendicular to a plane where the substrate is located is formed on the substrate. Then, the substrate is continuously etched by using a second etching rate, and the height of the section is reduced. The first etching rate is N times of the second etching rate. That is, the manufacturing method of the blazed grating provided by the embodiment of the present application first etches the substrate by using a higher etching rate to obtain a general structure of the blazed grating, and the structure includes the section. Then, the substrate is continuously etched by using a lower etching rate to repair the section formed by the first etching rate, so that the blazed grating with better structure parameters is finally formed.

A lithography mask may include a substrate layer. The lithography mask may include a multilayer reflective film disposed on the substrate layer and forming a first pattern, wherein the multilayer reflective film is configured to receive incident light and reflect a portion of the incident light toward an imaging collection pupil. The lithography mask may include a grating forming a second pattern on the substrate layer and configured to receive the incident light and deflect an additional portion of the incident light outside of the imaging collection pupil. The lithography mask may be inspected by an Actinic Patterned Mask Inspection (APMI) system. The second pattern may include a reflective film deposited on the grating.

The invention relates to the technical field of laser precision machining, in particular to a method for machining a blazed grating on a hard and brittle material through space-time shaping laser based on a Fabry-Perot cavity, and the method comprises the following steps: transmitting an initial ultrafast laser pulse; the initial ultrafast laser pulse is guided into a Fabry-Perot cavity, the Fabry-Perot cavity is composed of two partial transmission mirrors with preset relative inclination angles, the initial ultrafast laser pulse is reflected for multiple times in the Fabry-Perot cavity, and a string of sub-pulse sequences is output; the sub-pulse sequence is guided into a focusing system, the angle difference between the sub-pulses is converted into transverse spatial position offset on a focal plane by using the Fourier transform characteristic of the focusing system, and the transverse spatial position offset is irradiated on a workpiece made of a hard and brittle material; relatively moving the workpiece made of the hard and brittle material and the initial ultrafast laser pulse; and the steps are repeated, and the periodic blazed grating structure is formed on the workpiece made of the hard and brittle material. Therefore, decoupling of time-domain thermal regulation and spatial-domain morphology regulation is realized.

This invention provides a method for simulating the morphological evolution of blazed grating etching, including: pre-constructing an etching mask structure based on a pre-defined blazed grating structure; determining etching contour lines at different times and positions based on the morphological evolution of the mask structure during etching, and determining the motion properties of different contour lines; determining the linear equation of each contour line and the motion mode of each contour line; determining the motion direction of each contour line in combination with different etching processes; and determining and updating the position and linear equation of each contour line at different etching times based on the motion direction and motion rate of each contour line; and judging the simulated etching endpoint of the blazed grating etching morphology based on different etching processes. This invention can more accurately describe the influence of different processes and process parameters on the final etching result, perform in-depth processing of discrete technical data, and thus predict and control the ion beam etching process.

The utility model relates to the technical field of film thickness measurement, in particular to a device for accurately measuring the thickness of a transparent film, which comprises a spectrum system and a spectrum detection circuit, the spectrum system is composed of a light source, two convex lenses, two adjustable slits, a blazed grating and other optical components, the spectrum detection circuit is composed of a photoelectric induction module, a voltage amplifier, a sliding potentiometer, a universal circuit board and other electronic components, compared with the prior art, the spectrum detection device has the advantages of being scientific and reasonable in design, easy to manufacture, low in cost, easy to operate and high in measurement accuracy, and most importantly, the surface of a measured material is not damaged in the measurement process; moreover, the device can be used for actually measuring the thickness of the transparent film in daily production, can also be applied to the field of teaching experiments, and has a prospect of large-scale popularization and application.

This disclosure relates to a method (100) for fabricating a blazed grating. The method (100) comprises providing a substrate and a patterned mask layer (110) on the substrate, performing primary dry etching (120) of the substrate such that primary ions are accelerated towards a primary etch direction to impinge on the substrate, and performing secondary dry etching (150) of the substrate such that secondary ions are accelerated towards a secondary etch direction to impinge on the substrate. A primary projection of the primary etch direction and a secondary projection of the secondary etch direction onto the grating cross-sectional plane extend perpendicular to one and the other of a blaze facet direction and an anti-blaze facet direction, respectively, and ions accelerated towards a direction with a projection onto a grating cross-sectional plane perpendicular to the blaze facet direction are collimated to form a collimated ion beam for etching the substrate.

The application discloses an ultra-narrow linewidth Littman tunable laser, comprising a semiconductor laser diode, a collimating lens, a blazed grating and a tunable mirror which is arranged opposite to the grating plane of the blazed grating and is angle-adjustable, wherein the semiconductor laser diode, the collimating lens and the blazed grating are located on the same optical axis, and the grating plane of the blazed grating is distributed in intersection with the optical axis; and the application further comprises a cavity length-adjustable F-P etalon, which is located on the output light path of the zero-order diffraction light of the blazed grating, and the zero-order diffraction light is output as laser after passing through the F-P etalon. In this way, the semiconductor laser diode, the collimating lens, the blazed grating and the tunable mirror form a standard Littman tunable laser, and the cavity length-adjustable F-P etalon is additionally arranged, so that the cavity distance of the F-P etalon is adjusted to match the narrow-band filtering characteristics of the F-P etalon with the output wavelength of the semiconductor laser diode.

The application provides a blazed grating preparation process, a blazed grating and a diffractive optical waveguide. The blazed grating preparation process comprises the following steps: forming a blazed grating preparation process parameter information query table based on a blazed grating preparation process parameter calculation model; querying the preparation process parameters of a target blazed grating through the blazed grating preparation process parameter information query table by using known related setting parameters of the target blazed grating; and preparing the target blazed grating according to the preparation process parameters of the target blazed grating. The blazed grating preparation process provided by the application can quickly and accurately determine the preparation process parameters of the target blazed grating with the setting target parameters, so that the target blazed grating can be quickly and accurately prepared.

This invention discloses a square lattice structured light-illuminated super-resolution microscopy system and method. The system integrates a square blazed grating hologram generation module, a digital lens hologram generation module, and a composite hologram generation module on its phase modulator. Wavefront phase modulation of the incident beam is achieved by loading the composite hologram onto the incident beam. The acquired raw image is pre-filtered, multiplied by a pre-calculated weighting function, and superimposed to obtain an intermediate image. Finally, deconvolution is performed on the intermediate image to obtain the final super-resolution image. This invention concentrates light energy into effective diffraction orders through the loaded square blazed grating hologram, improving the system's light energy utilization efficiency. Combining the digital lens hologram and adjusting the lens focal length allows control of the focusing position of the diffraction orders. Furthermore, adjusting optical elements enables switching between different magnification objectives, meeting the needs of multi-scale sample observation.

The application discloses a narrow linewidth tunable Raman laser and an emission method, relates to the field of Raman lasers, and comprises a half-wave plate, a pump source and a focusing lens which are arranged on the two sides of the half-wave plate, a laser resonant cavity is arranged on the other side of the focusing lens, a cavity locking frequency doubler is arranged on the other side of the laser resonant cavity, a shaping lens group is arranged between the laser resonant cavity and the cavity locking frequency doubler, a dichroic mirror is arranged on the other side of the cavity locking frequency doubler, the laser resonant cavity is arranged in a V-shaped cavity structure which is composed of an input mirror, an output mirror and a reflective blazed grating, a diamond crystal is arranged between the input mirror and the output mirror, and the reflective blazed grating is arranged below the diamond crystal. The stability of the laser resonant cavity is improved through the design of the cavity mirror, the wavelength adjustment is accurate to 0.01 nm, and the loss in the transmission process is reduced through the cavity locking frequency doubler of the ring-shaped cavity structure.

This invention provides a method for forming a waveguide structure and a blazed grating. The method for forming the waveguide structure includes: step S11: providing a silicon material layer; step S12: etching a portion of the silicon material layer to form multiple steps on the surface of the silicon material layer; step S13: oxidizing the surface of the silicon material layer using a thermal oxidation process to form a silicon oxide layer; step S14: wet etching the silicon oxide layer; step S15: repeating steps S13 to S14 to make the surface of the stepped silicon material layer become a smooth slope shape. In the waveguide structure of this invention, the smooth slope of the silicon material layer can form a waveguide structure with gradually varying thickness, thereby reducing coupling loss.

Embodiments of the present application provide a grating structure, a preparation method thereof, a waveguide structure, a display panel and a display device. The grating structure comprises a substrate and a blazed grating arranged on one side of the substrate. The blazed grating comprises a plurality of grating substructures arranged in sequence and at intervals along a direction parallel to the substrate. The first-order diffraction efficiency of the blazed grating is at most improved by 4 times by setting parameters of the blazed grating. The parameters of the blazed grating include at least one of a period, a duty cycle, a material of the grating substructure, a height and an inclination angle. Embodiments of the present application can improve the diffraction efficiency of the grating.

A reflective spectral purity filter (SPF) for extreme ultraviolet (EUV) light includes a substrate having a reflective surface and an angle of incidence of at least 60 degrees, and a blazed diffraction grating formed on the substrate, the blazed diffraction grating having a grating pitch and blaze angle (fixed or variable) configured to simultaneously diffract incident EUV light into a higher-order diffraction angle and confine out-of-band (OOB) light to a Oth order reflection angle to angularly separate the EUV light and the OOB light. An imaging system including the reflective SPF, the imaging system having a field of view (FOV) configured to collect the spatially filtered EUV light and reject the OOB light based on angular separation of the lights.

The application discloses a WSS port diffraction energy phase modulation method, device, medium and product, relates to the wavelength selective switch port diffraction energy modulation technical field, and the method comprises the following steps: respectively inputting a plurality of groups of combinations into a synthetic phase topography expression, obtaining the synthetic topography of a blazed grating under each combination; the combination comprises the harmonic order of the harmonic component, the phase of the harmonic component and the amplitude of the harmonic component; the synthetic topography of the blazed grating under each combination is simulated in simulation software, and the diffraction energy of a target port under each combination is obtained; according to the diffraction energy of the target port under each combination, the diffraction energy of the target port is adjusted, and the application realizes fine adjustment of the wavelength selective switch main energy level port diffraction energy.