25 results about "Nano fabrication" patented technology

This invention discloses a photolithographically patternable lithium-ion electrolyte, its preparation method, and its applications. The electrolyte is a photolithographically curable lithium-ion electrolyte composition, comprising, by mass percentage, LiTFSI, polyethylene glycol methyl ether methacrylate, bisphenol A ethyl oxide dimethacrylate, fluoroethylene carbonate, succinic acid, 2-hydroxy-2-methyl-1-phenyl-1-propanone (HMPP), 3-(isobutyryloxy)propyltrimethoxysilane, and 2-methyl-2-acrylate-2-hydroxyethyl. This invention also discloses a stepwise preparation method for this composition and its applications in micro-energy storage and ion-electronic devices such as micro solid-state batteries, ion-controlled transistors, and neuromorphic devices. This electrolyte can be patterned at the micro-nano scale using standard photolithography processes, exhibiting excellent lithium-ion conductivity, electrochemical stability, mechanical flexibility, and optical transparency. It also shows good interface compatibility with gold electrodes / silicon wafers, requiring no additional etching or transfer processes. This solves the technical problems of existing solid-state electrolytes being difficult to fabricate at the micro-nano scale and incompatible with microelectronic processes, and has broad application prospects in the fields of micro-nano fabrication and micro-devices.

This invention belongs to the field of supramolecular chemistry and materials technology, and discloses a class of organometallic cages based on polythiol ligands, their preparation methods, and applications; the general chemical formula of the organometallic cages based on polythiol ligands is: [(R n M) x L y (IL) z In this invention, M is a metal center; R is an organic group attached to the metal center M; n is the number of R groups attached to each metal center M; L is an aromatic polythiol ligand; IL is an ionic liquid; x, y, and z are all integers ≥1. This invention uses an ionic liquid as a reaction medium and combines it with a competitive coordination control strategy of organic amines to achieve controllable self-assembly of organometallic cages. These organometallic cages have unique melting and glass transition characteristics, can be used to prepare high-quality thin films through hot pressing film deposition technology, and can also be used as photoresist film deposition materials in various photolithography processes. They have broad application prospects in flexible electronics, packaging materials, micro-nano fabrication, and other fields.

This invention belongs to the field of micro / nano fabrication and optical testing technology, specifically relating to a high-resolution test card for dielectric materials in the EUV and soft X-ray bands. The test card includes a substrate and a Siemens star test pattern formed thereon. The test card uses silsesquioxane (HSQ) as the structural material and is fabricated using electron beam lithography. The structural height can reach 500 nm with a minimum linewidth of 10 nm. This invention utilizes the dual absorption and strong phase modulation capabilities of HSQ in the EUV / soft X-ray bands, making it suitable for both absorption contrast and phase contrast imaging modes in system resolution calibration and performance evaluation. This test card offers advantages such as standardized patterns, high resolution, adjustable contrast, and good fabrication consistency, providing crucial metrological support for the performance testing of high-end EUV / soft X-ray optical imaging and lithography systems.

This invention relates to a near-infrared detector array based on two-dimensional noble metal chalcogenides, its fabrication method, and its applications, belonging to the field of image sensor technology. First, an underpotential deposition method is used to drive noble metal atoms to self-confinedly deposit on the silicon substrate surface using the potential difference between the noble metal and the silicon substrate, obtaining a wafer-level noble metal thin film. Then, chemical vapor deposition is used to sulfide, selenize, or tellurize the wafer-level noble metal thin film, transforming it in situ into a wafer-level two-dimensional noble metal chalcogenide thin film. Finally, a near-infrared detector array is fabricated using micro-nano fabrication processes. The two-dimensional noble metal chalcogenide near-infrared detector of this invention possesses advantages such as good mechanical flexibility, high mobility, and excellent stability, significantly improving the detector's detection performance.

This invention provides a micro / nano fabrication device, a design method for a fabrication probe, and a fabrication method based on near-field thermal radiation technology. The device includes: an xy-plane high-precision moving platform, a fabrication probe, and a z-axis high-precision displacement platform. The xy-plane high-precision moving platform and the z-axis high-precision displacement platform are positioned opposite each other. The fabrication probe is fixed below the z-axis high-precision displacement platform. The sample to be processed is placed above the xy-plane high-precision moving platform and positioned opposite the fabrication probe. The fabrication probe includes a quartz glass substrate, a frustum-shaped separator medium, a double-helix metal wire electrode, and a pattern to be processed. The double-helix metal wire electrode is disposed on the upper surface of the quartz glass substrate, the frustum-shaped separator medium is disposed on the outer periphery of the lower surface of the quartz glass substrate, and the pattern to be processed is disposed at the center of the lower surface of the quartz glass substrate. Compared with traditional photolithography processes, this method reduces processing costs while improving processing efficiency.

This invention relates to a method for fabricating horizontal heterojunction photodetector matrices based on single-crystal nanoribbons, belonging to the field of nanomaterials and optoelectronic devices. A two-step chemical vapor deposition process is employed: first, a first type of single-crystal nanoribbon array is directionally grown on a single-crystal substrate with a stepped surface; then, using this as a template, a second material is epitaxially grown along the lateral edges of the nanoribbons, directly forming a large-area, oriented, continuous single-crystal horizontal heterojunction nanoribbon array. This avoids material damage at the heterojunction interface caused by traditional patterning processes, achieving high-quality, high-uniformity, and controllable interface fabrication. The nanoribbon array is then segmented into a high-density discrete PN junction matrix using micro / nano fabrication techniques, and electrodes are fabricated to construct the photodetector matrix. This achieves controllable growth of a high-quality single-crystal heterojunction array and efficient integration of the optoelectronic device matrix. The resulting device exhibits advantages such as high pixel density, no crosstalk between units, low dark current, and fast response, providing a feasible solution for ultra-high resolution optoelectronic integrated systems.

This invention discloses a semi-flexible sealed composite material beam-membrane-island structure for micro / nano devices and its fabrication method. The invention employs both rigid and flexible materials to construct the beam-membrane-island structure of the micro / nano device. The beam and island structures are made of rigid materials that can be fabricated in micro / nano dimensions, while flexible materials fill the periphery of the beam and island structures. The flexible filling layer acts as a "displacement coordination layer," ensuring a clear mechanical response while maintaining the high modulus of the silicon beam. Simultaneously, the local deformation of the flexible layer absorbs lateral coupling stress, allowing strain fields in different directions to be separated and amplified in the beam / island region. The flexible material forms a stress transition zone between the beam and island, preventing strong stress concentration in the pure silicon beam-island structure under concentrated loads. This invention still uses materials compatible with micro / nano fabrication processes as the main structural material, enabling integration with standard photolithography, reactive ion etching, deep silicon reactive ion etching, anodic bonding processes, through-silicon vias (TSVs), and glass vias, among other micro / nano processes.

This invention belongs to the field of quartz resonator technology, specifically to a high-frequency quartz resonator wafer and its manufacturing process. It includes a wafer body with grooves on both sides. A vibration electrode is positioned at the center of the bottom of each groove, and the vibration electrode is connected to a surface electrode via wiring. The surface electrode is connected to an electrode excitation area. This invention provides two manufacturing processes for electrodes made of different materials: the first uses a photolithography-etching-sputtering micro-nano fabrication process to manufacture a high-frequency quartz resonator wafer with gold-chromium composite electrodes. The second method, based on the first, modifies the electrode material system and deposition method, using a solution deposition method with multi-component composite electrode ink. The quartz resonator wafer prepared by this invention can achieve frequencies exceeding 200MHz and can be easily packaged.

This invention relates to a high-performance, fast-curing nanoimprint adhesive and its preparation method, belonging to the field of micro / nano fabrication materials technology. This invention provides a nanoimprint adhesive using surface-modified nano-zirconia as a functional filler. The adhesive comprises modified epoxy acrylate resin, fluorosilicone-modified acrylate, expanding monomers, multifunctional crosslinking agents, photoinitiators, and specially surface-treated nano-zirconia particles. Through the surface modification treatment of nano-zirconia and its synergistic effect with the organic resin matrix, the nanoimprint adhesive prepared by this invention achieves high refractive index (≥1.65), high light transmittance, and excellent pattern fidelity while maintaining rapid curing, low volume shrinkage, and easy demolding properties. It is particularly suitable for the manufacture of high-value-added products such as optical components, photonic crystals, and AR / VR waveguide sheets.

This invention provides a method for fabricating a device for measuring the mechanical loss of epitaxial single-crystal thin films and a method for measuring the mechanical loss of epitaxial single-crystal thin films at low temperature, belonging to the field of semiconductor micro-nano fabrication technology. The fabrication method includes: growing an epitaxial single-crystal thin film on the front side of an epitaxial substrate using molecular beam epitaxy to obtain an epitaxial substrate with the epitaxial single-crystal thin film on the front side; performing a coating process on the back side of the epitaxial substrate to compensate for stress on the warpage of the epitaxial single-crystal thin film; directly bonding the surface of the epitaxial single-crystal thin film away from the epitaxial substrate to a cantilever substrate to form a bonding pair, obtaining a composite material; removing the stress compensation film and the epitaxial substrate from the side of the epitaxial single-crystal thin film away from the cantilever substrate in the composite material to obtain the device; the cantilever substrate is made of single-crystal silicon, the epitaxial substrate is a group III-V semiconductor single-crystal substrate, and the epitaxial single-crystal thin film is a group III-V semiconductor single-crystal thin film.

This invention relates to the field of holographic-controlled femtosecond laser micro / nano fabrication technology, and in particular to a flexible holographic femtosecond laser fabrication system and method for overcoming the diffraction limit. The system includes: a laser; an optical path system comprising, sequentially arranged along the laser emission direction, an optical shutter, a beam expander, a first half-wave plate, a first polarizing beam splitter, two laser beam paths, a second polarizing beam splitter, a 4f optical system, an aperture, and a focusing objective; each laser beam path includes a spatial light modulator along the laser emission direction; and a motion platform for clamping, moving, and positioning the material to be processed, positioned in the direction of laser emission from the focusing objective. This invention, by modulating the shape of the laser spot, can achieve two laser spots of arbitrary shapes. By controlling the overlap range of the laser spots and utilizing the principle of phase overlap and energy superposition, material removal is achieved in the overlapping area, ultimately realizing flexible and diverse fabrication of micro / nano structures at sub-diffraction-limit scales.

This invention provides an integrated resistance-of-thermal scanning thermal probe and its fabrication method, belonging to the fields of micro / nano fabrication, nanoscale thermal characterization, and scanning probe technology. The integrated resistance-of-thermal scanning thermal probe of this invention includes a substrate, an oxide layer, a low-resistivity silicon layer, a probe arm, a tip, and a metal electrode. Based on an AFM probe, this invention employs a probe arm separation structure and fabricates electrodes on the separated probe arms to inject current into the probe. Furthermore, this invention uses an ion implantation process to form a high-implantation, low-resistivity region outside the tip, while the tip region is a high-resistivity region without implantation. This ensures that most of the injected electrical energy is generated as heat in the tip region, creating a significant temperature difference between the tip and the sample being measured, facilitating the measurement and determination of the sample's temperature. The tip size of this invention can be reduced to below 10 nanometers, and the scanning thermal probe fabricated by this invention can provide a nanoscale temperature distribution.

This invention discloses a gradient-density liquid metal-Ecoflex composite material and its preparation method, belonging to the field of ultrasonic impedance matching materials technology. By controlling the rotation speed of a planetary stirrer to obtain EGAIN droplets of different diameters, and utilizing the difference in gravitational settling velocities of droplets of different diameters, combined with a low-temperature settling and high-temperature curing process, a continuous density gradient distribution is formed within the Ecoflex matrix, with the bottom droplets having a large average diameter and high density, and the upper droplets having a small average diameter and low density. This invention features a simple process, requiring no high-precision micro / nano fabrication operations. The prepared gradient-density composite material meets the application requirements of broadband matching layers for ultrasonic transducers, increasing the -6dB bandwidth of a 5MHz transducer to 102% with only 18% signal attenuation, significantly outperforming traditional quarter-wavelength homogeneous matching layers. Furthermore, composite materials of different thicknesses can be flexibly prepared to meet the application needs of various ultrasonic testing scenarios.

This invention discloses a method for fabricating a high aspect ratio X-ray grating and the X-ray grating itself, relating to the fields of micro / nano fabrication and X-ray optical device manufacturing technology. The method includes: using a highly doped, low-resistivity single-crystal silicon wafer as a substrate, cleaning it, and then depositing a silicon dioxide hard mask on its surface; transferring the grating pattern to the silicon dioxide hard mask, and etching it using an improved low-temperature Bosch process to create vertical deep trenches; removing the natural oxide layer on the back side, followed by depositing a metal layer and thermal annealing to construct a conductive back electrode; performing multi-stage cleaning; placing the substrate in a bismuth ion-assisted gold sulfite plating solution for electroplating, ensuring that the gold layer fills the vertical deep trenches from the bottom upwards without voids; removing the silicon dioxide hard mask, cleaning, and drying to obtain the X-ray grating. This invention alleviates the technical problems of uneven performance, poor reliability, high production costs, and low production efficiency and yield of X-ray gratings fabricated by existing technologies.

This invention belongs to the field of gas sensor and intelligent detection technology, specifically providing an electronic nose system and its application based on a nano-tin dioxide MEMS gas sensor. This addresses the problems of high power consumption, poor selectivity, and difficulty in integration found in existing traditional gas sensors. The electronic nose system of this invention includes: a sensor array, a data acquisition circuit, a gas path system, a data processing module, and a pattern recognition module. It combines nanomaterial preparation, MEMS micro / nano fabrication, sensor array integration, and machine learning algorithms to achieve low-power, high-sensitivity, and intelligent gas detection and fruit / vegetable ripeness identification. It possesses advantages such as low power consumption, high sensitivity and fast response, good temperature resistance linearity, excellent thermal uniformity, mechanical reliability, intelligent identification, non-destructive testing, integration, and miniaturization.

This invention proposes a solvent-treated PN polarity reversible field-effect transistor and its fabrication method, aiming to solve the problems of uncontrollable and irreversible doping in two-dimensional semiconductor devices and poor compatibility with standard processes. The transistor comprises a p-type silicon gate, a silicon dioxide dielectric layer, a few-layer indium selenide channel, and gold source / drain electrodes. Initially n-type, it transforms to p-type after immersion in acetone solution, and can be restored to n-type by vacuum or inert atmosphere annealing, achieving completely reversible polarity switching. The fabrication method encompasses channel stripping and transfer, electrode evaporation, acetone treatment, and annealing, requiring no external doping and compatible with existing micro / nano fabrication processes. By controlling the acetone treatment time and annealing conditions, the carrier type can be precisely controlled, and the device maintains good stability during multiple cycles.

This invention discloses a polyimide flexible circuit board and its fabrication method, relating to the fields of micro-nano fabrication and electronic materials technology. The fabrication method includes: coating a photosensitive polyamic acid solution containing halogen bonds onto a substrate to form a film; exposing the film using a grating mask to obtain a polyamic acid thin film substrate with an M-type micro-nano structure; immersing the substrate in a palladium ion activation solution, removing it, washing, drying, and thermal imidizing to obtain a polyimide substrate; and immersing the polyimide substrate in a chemical copper plating solution for chemical plating to form micro-nano fine circuitry with an M-type embedded mechanical interlocking effect. The embedded mechanical interlocking of this invention completely encapsulates the conductive circuitry within the substrate. The substrate material itself has excellent barrier properties, effectively isolating external corrosive media such as oxygen, moisture, and salt spray, significantly slowing down the oxidation and aging process of the circuitry, extending its service life, and meeting the processing requirements of high-density flexible circuit boards.

This utility model discloses a four-beam laser interference micro / nano fabrication device, relating to the field of laser interference micro / nano fabrication devices. The device includes a processing apparatus comprising a circular mounting base, an adjustment mechanism, and a linear slide rail. The adjustment mechanism, via an electric slide block and the linear slide rail, enables precise adjustment and positioning of a first Q-switching module, a waveplate, a pulsed xenon lamp unit, a Dammann transmission grating cavity mirror, and an angle-adjusting mirror. Furthermore, the linear slide rail is engraved with a scale, making the adjustment process more intuitive and accurate. Operators can directly read the adjustment position and angle, ensuring precise alignment of the interference beam and high-quality formation of the interference pattern. This automated adjustment significantly shortens adjustment time, improves processing efficiency, and reduces errors that may be introduced during manual adjustment. Additionally, the adjustment mechanism lowers the skill requirements for operators.

This invention belongs to the field of femtosecond laser micro / nano fabrication technology, specifically disclosing a micro-operating system for fiber optic end faces. Its features include: an optical fiber, a Fresnel lens structure, two hydrogel grippers, and a silver nanoparticle layer. The Fresnel lens structure is directly fabricated and fixed at the center of the fiber end face; the two hydrogel grippers are directly fabricated and fixed to the fiber end face, with the two grippers located on opposite sides of the Fresnel lens structure; the silver nanoparticle layer is attached to the surface of the hydrogel grippers. This invention not only solves the technical challenge of integrating multifunctional microstructures on fiber end faces but also achieves the synergistic operation of optical focusing and mechanical clamping, providing a novel technical solution with a compact structure, integrated functions, and flexible operation for applications such as micro / nano manipulation, micro-perforation, and photothermal ablation.

This invention relates to the fields of micro / nano fabrication and micro-assembly technology, specifically to a microneedle array-based mass transfer device and its fabrication method, and a micro / nano device transfer method. The micro / nano device transfer method includes providing a mass transfer device comprising a carrier and a microneedle array. The mass transfer device is moved above the micro / nano device, and near-infrared light irradiation and pressure are applied to the mass transfer device to cause the microneedles to bend. The near-infrared light is removed, and the microneedles are allowed to cool to room temperature. The microneedles then pick up the micro / nano device based on dry adhesion and move it to a target substrate. Patterned near-infrared light is used to irradiate the microneedles, triggering deformation recovery and achieving selective release of the micro / nano device. This solution utilizes the synergy of near-infrared light, photothermal conversion materials, and shape memory polymers to enable the microneedle array to respond rapidly, achieving precise control of the microneedle adhesion force, thereby realizing precise and efficient pickup, mass transfer, and selective release of micro / nano devices.

This invention relates to the field of femtosecond laser micro / nano fabrication technology, and discloses a biomimetic adhesion-based single-arm optical waveguide micro-gripper, comprising: an optical fiber body for conducting excitation light, the optical fiber body including a core and a cladding; and a single-arm flexible waveguide driving structure, the bottom end of which is directly and integrally integrated into the center of the core end face of the optical fiber body. The refractive index of the single-arm flexible waveguide driving structure satisfies the optical waveguide transmission conditions, allowing the light beam emitted from the core to propagate directly within the single-arm flexible waveguide driving structure through total internal reflection. This invention, a biomimetic adhesion-based single-arm optical waveguide micro-gripper, breaks through the traditional technical paradigm of "multi-arm rigid skeleton + mechanical clamping," realizing a skeletonless single-arm hydrogel cantilever beam design, and completely eliminating the risk of mechanical damage to the target object through a biomimetic adhesion capture mechanism.

This invention relates to the field of micro / nano fabrication technology, and discloses a method for fabricating and applying a microbridge-shaped superconducting bicrystalline Josephson junction device. The fabrication method includes: preparing a self-supporting single-crystal thin film by sacrificial layer wet etching; transferring the film to a single-crystal substrate at a preset torsion angle (0° < α ≤ 45°) to create an artificial bicrystalline substrate with in-plane crystal orientation torsion; depositing a superconducting thin film layer on the artificial bicrystalline substrate using pulsed laser method to form a bicrystalline superconducting thin film; then depositing a gold film as a protective layer by electron beam evaporation, followed by photolithography and argon ion milling to fabricate a microbridge-shaped superconducting bicrystalline Josephson junction device spanning the bicrystalline grain boundary. This invention develops a flexible and low-cost bicrystalline substrate construction strategy for fabricating superconducting Josephson junctions by transferring a self-supporting single-crystal thin film to a substrate at a controllable torsion angle. This method can be widely used for the free definition of various substrate templates, overcoming the technical cost and material limitations of traditional bicrystalline substrates.

This invention discloses a novel optical device belonging to the field of sensory intelligence. Its structure and formation method are as follows: it is composed of a large number of precisely arranged optical fibers, with a hammer-shaped form. Its large end face, i.e., the light-incident end face, is a convex or concave curved surface structure, while its small end face, i.e., the light-outceasing end face, is a planar microarray structure of optical fibers or a curved microarray structure of optical fibers. Its main functions are: mimicking the retinal nerve function of human and animal eyes, it can collect light signals in space and transmit them in parallel to a photoelectric conversion array for visual perception signals, forming high-dimensional voxel signals; and it can amplify and reduce these high-dimensional voxel signals for further signal processing by brain-like sensory integrated circuits. This invention also discloses the fabrication methods of this novel optical device, including optical fiber drawing, micro-nano fabrication, and 3D printing.

A room-temperature gas sensor with sub-second ultrafast response based on a channelless device design and its fabrication method are disclosed, belonging to the field of gas sensor technology. The sensor comprises a substrate, a bottom electrode, a signal transmission thin film, a measurement electrode, and a gas sensing thin film. The gas sensing thin film constitutes the first-stage device, while the bottom electrode, signal transmission thin film, and measurement electrode constitute the second-stage device. The target gas is adsorbed on the gas sensing thin film, and the interaction between the two generates an electrical signal. This electrical signal is rapidly extracted to the second-stage device through the heterogeneous interface formed by the perpendicular contact between the gas sensing thin film and the signal transmission thin film, achieving charge transfer. This decouples the gas-solid interaction from the electrical signal extraction process, thereby achieving a sub-second ultrafast response for the target gas. The gas sensor described in this invention can be fabricated using various mature micro / nano fabrication or solution methods, exhibits good compatibility with existing semiconductor processes, facilitates large-scale production and integration into portable devices, and demonstrates good stability.

A method for preparing a super-absorbing material surface, belonging to the field of micro-nano fabrication technology, addresses the problems of complex preparation methods, odd shapes, long processing times, and difficulty in large-area fabrication in existing technologies. This method is based on template manufacturing technology and high-temperature annealing to form metal microspheres, as well as nanoimprint transfer and isotropic chemical etching with moldable materials to form an ultra-high aspect ratio conical structure. The conical structure formed by the high-temperature annealing process and noble metal-induced etching in this invention has an ultra-high aspect ratio, achieving anti-reflection and super-absorption properties in the visible to infrared bands. This invention can be applied to infrared imaging, thermal emitters, electromagnetic shielding, photoelectric detection, and photoelectric signal detection. This invention has advantages such as super-absorption performance, good extinction properties, good durability, good adaptability, and high productivity, enabling large-scale production of super-absorbing material surfaces and allowing for their widespread application in various optical devices.