22 results about "Nanomanufacturing" patented technology

An apparatus for creating pressure gradients in gas, includes a thermoelectric stack that includes a plurality of thin films of thermoelectric material separated by a thermal and electrical insulator, wherein each thin film, of the plurality of thin films, is in communication with a gas in which a pressure gradient is created. The apparatus further includes at least one aperture connecting two volumes of the gas at opposite sides of the thermoelectric stack, at least one electrical conductor connecting the plurality of thin films, where the at least one electrical conductor includes walls of the aperture or a separate element, and an electric current supply to supply electrical current to the plurality of thin film.

Catalyst assisted chemical etching of semiconductor substrate can achieve extreme aspect ratio (better than 1000:1), reproducibility and controlled etching quality for submicron feature size in the direction perpendicular to the substrate. The current patterning methods of the catalyst layer suffer of carbon contamination that affects the etching quality and limits the high-resolution pattern transfer in the semiconductor substrate for high aspect ratio etching. The present method allows to use semiconductor standard manufacturing processes to realize carbon-free pattern of catalyst layer by a physical separation with an interlayer material between the catalyst and the polymeric resist used in common lithographic methods. The present method allows to realize controlled predefined nanostructures with high resolution, high fidelity and high throughput yield during the catalyst assisted chemical etching of silicon for X-ray optics nanofabrication.

A method and system for high-speed 2θ multi-point scatterometry is disclosed. The method includes directing a laser beam from a laser light source to a collimation optical system that collimates the laser beam to a collimated laser beam; adjusting a polarization of the collimated laser beam using a polarization control optics; directing the collimated laser beam that is polarized by a first optical system to illuminate a focal area on a sample surface; receiving reflected light from the focus of the laser light source at the sample surface by a second optical system; detecting the reflected light by a detector system to produce detection signals; and processing the detection signals to measure parameters of the sample surface.

The invention discloses a topological insulator Bi2Te3 nanopore size regulation and control method based on thickness-diameter ratio feedback, and belongs to the field of two-dimensional material nanometer manufacturing. Comprising the following steps: step 1, placing a sample in a transmission electron microscope, and prefabricating nanopores with the diameter of 1-5nm in a bismuth telluride film with the thickness of 2-10nm by utilizing a converged electron beam; step 2, performing irradiation by using an electron beam with 300kV acceleration voltage, wherein the beam density is controlled to be 1.54 * 10 < 5 > A.m <-2 >; 3, feeding back the regulation and control size based on the ratio of the initial aperture of the nanopore to the thickness of the material, and when the thickness-diameter ratio is smaller than 0.5, realizing aperture shrinkage or expansion by adjusting the beam density; and when the thickness-diameter ratio is greater than 0.5, the electron beam irradiation only enables the aperture to be enlarged, and the aperture cannot be shrunk. The method does not need chemical reagents, is green and environment-friendly, can directionally regulate and control the size of the bismuth telluride nanopore, and is suitable for preparing topological quantum devices, nanofiltration membranes and thermoelectric nanostructures.

The invention relates to the field of nano processing, in particular to a graphene modification-based nano Tesla valve and a preparation method thereof. The nanometer Tesla valve comprises a metal substrate, a Tesla valve-shaped channel etched on the metal substrate, a graphene layer attached to the surface of the Tesla valve-shaped channel, and a graphene sheet covering the etching surface of the metal substrate. A specific Tesla valve-shaped channel is etched on a metal substrate by applying a nano etching technology, and graphene is utilized to modify and cover the channel, so that the graphene modification-based nano Tesla valve is successfully designed and prepared, and the graphene modification-based nano Tesla valve has the characteristics of specific structure, excellent performance, unique manufacturing method and the like; under the control of an electric field, the transportation of water molecules can be effectively regulated and controlled, and the method has a wide application prospect in the fields of nanofluids, biomedicine, seawater desalination and the like.

The invention discloses a size measurement method, device and equipment based on a through-focus scanning image and a medium, and relates to the technical field of nanometer device measurement. The method comprises the following steps: determining a size value set according to the prior morphology size of a to-be-measured nano device; establishing a simulation focus-through scanning image of each size in the size value set; performing principal component decomposition on the simulation focus-through scanning image to obtain a principal component coefficient matrix; establishing a regression matrix according to the size value set and the principal component coefficient matrix; performing principal component decomposition on the actually-measured focus-through scanning image of the to-be-measured nano device to obtain an actually-measured principal component coefficient matrix; and performing reverse inversion on the actually measured principal component coefficient matrix according to the regression matrix to obtain a measurement result. According to the method, the problem of out-of-focus image noise interference is effectively solved, the technical performance of the TSOM method is remarkably optimized in the aspects of precision, robustness, efficiency and the like, and key support is provided for large-scale application of the TSOM method in advanced nanometer manufacturing.

Various embodiments of the present technology provide for the ultra-high density heterogenous integration, enabled by nano-precise pick-and-place assembly. For example, some embodiments provide for the integration of modular assembly techniques with the use of prefabricated blocks (PFBs). These PFBs can be created on one or more sources wafers. Then using pick-and-place technologies, the PFBs can be selectively arranged on a destination wafer thereby allowing Nanoscale-aligned 3D Stacked Integrated Circuit (N3-SI) and the Microscale Modular Assembled ASIC (M2A2) to be efficiently created. Some embodiments include systems and techniques for the construction of construct semiconductor devices which are arbitrarily larger than the standard photolithography field size of 26×33 mm, using pick-and-place assembly.

The invention relates to the technical field of nanometer manufacturing and braze coating, in particular to amorphous nanometer alloy particles for braze coating and a preparation method of the amorphous nanometer alloy particles. The preparation method comprises the following steps: S1, adopting a metal salt mixture of at least two different metals as a target material, and loading the target material onto a substrate; s2, adding ionic liquid into the liquid-phase organic medium, and dispersing to obtain a composite medium; s3, immersing the substrate into the composite medium, and irradiating the metal salt by adopting double-pulse femtosecond laser to carry out liquid phase ablation; and S4, a passivating agent is added into the reaction liquid obtained in the step S3, mixing is conducted, solid-liquid separation, washing and drying are conducted, a passive film is formed on the surface of alloy particles, and the amorphous nano-alloy particles are obtained. The method disclosed by the invention is a universal method and is suitable for preparing various multi-component amorphous nano-alloy particles; and the prepared nano alloy particles are high in amorphous state degree and excellent in oxidation resistance.

A method and system for high-speed 2Θ multi-point scatterometry is disclosed. The method includes directing a laser beam from a laser light source to a collimation optical system that collimates the laser beam to a collimated laser beam; adjusting a polarization of the collimated laser beam using a polarization control optics; directing the collimated laser beam that is polarized by a first optical system to illuminate a focal area on a sample surface; receiving reflected light from the focus of the laser light source at the sample surface by a second optical system; detecting the reflected light by a detector system to produce detection signals; and processing the detection signals to measure parameters of the sample surface.

A device including a chamber and a nozzle detachably connected to the chamber, the nozzle defining an aperture, a target carousel disposed within the chamber, a first laser configured to generate a first beam directed toward the target carousel to perform in-situ ablation to form a laser plume, a gas flow system configured to supply gas into the chamber, such that the gas interacts with the laser plume and causes condensation and formation of nanoparticles, and a second laser configured to generate a second beam directed through the interior of the chamber, through the aperture of the nozzle, and toward a substrate disposed outside the device, the second laser beam configured to sinter and crystalize on the substrate the nanoparticles exiting the nozzle.

The purpose of the present invention is to provide a method for obtaining conformational information of polymers on particle surfaces in a flow field. This method utilizes nonradiative fluorescence energy transfer from fluorescent groups on polymer chains to achieve real-time detection of the conformation of polymer chains grafted onto particle surfaces in a shear field, with detection accuracy reaching the order of 10000. This method can be used to derive general patterns in how the conformation of polymer chains on the surfaces of nanoparticles of varying molecular weights and grafting ratios changes with shear rate. Therefore, in scenarios where the polymer chains on the nanoparticle surface are required to maintain a specific conformation at a specific shear rate, parameters such as the chain length and grafting density of the polymer grafted onto the target nanoparticle surface can be determined based on these patterns, providing a guarantee for achieving precise nanomanufacturing.

The present invention discloses a method for encapsulating single perovskite nanocrystal particles induced by ammonia vapor and confined by ligands. This method involves purifying perovskite nanocrystals prepared by hot injection, capped with APTES and OA, and repaired with PbX2 for lattice defects, before dispersing them in toluene. A ligand and an organosilane are then added, and the mixture is stirred in an ammonia vapor atmosphere to produce SiO2-encapsulated monodisperse perovskite nanocrystal particles. The CsPbX3@SiO2 core-shell structure particles prepared using this method can nearly intactly preserve the crystal structure and excellent optical properties of CsPbX3, significantly improving the stability of the nanocrystals while maintaining their small size and monodispersity. These particles are suitable as building blocks for advanced nanofabrication technologies, particularly in display technology, anti-counterfeiting, and other fields.

The invention discloses a construction method of a controllable micro-nano array based on 3D printing, which comprises the following steps: synthesizing gold nanorods by a seed crystal growth method and a dual-surfactant method, and modifying the surfaces of the gold nanorods to effectively synthesize gold-silver core-shell nano bricks with solid morphology and uniform size. A simple and effective self-assembly and nanometer manufacturing method is combined with ligand modification, particles are controllably synthesized, the synthesized high-concentration gold and silver core-shell structure nanometer brick solution is used as a spraying material, and the printing process of micro-droplets is controlled through a micro-scale high-precision spraying controllable micro-nano array preparation technology; and micro-nano-scale ordered arrangement of the gold-core silver-shell bimetallic nano bricks is controlled, so that the controllable micro-nano array with macroscopic large scale and microscopic ordered is prepared.

The present invention discloses a surface-enhanced Raman substrate with high film-substrate binding force and a preparation method thereof, belonging to the fields of molecular recognition and nanomanufacturing. In the present invention, a metal nanostructure with nano-gaps is prepared on the surface of a solid substrate, and an oxide with a nano-scale thickness is used to wrap the metal nanostructure by atomic layer deposition, and then the sample is rolled, so as to form a dense metal-oxide planar composite structure on the substrate, improving the binding force of the metal nanomaterial on the substrate. Subsequently, the wrapped oxide is removed by chemical etching to expose the gaps originally existing between the metal nanostructures, and a high-performance SERS substrate with high film-substrate binding force can be obtained.

Various embodiments of the present technology provide for the ultra-high density heterogenous integration, enabled by nano-precise pick-and-place assembly. For example, some embodiments provide for the integration of modular assembly techniques with the use of prefabricated blocks (PFBs). These PFBs can be created on one or more sources wafers. Then using pick-and-place technologies, the PFBs can be selectively arranged on a destination wafer thereby allowing Nanoscale-aligned 3D Stacked Integrated Circuit (N3-SI) and the Microscale Modular Assembled ASIC (M2A2) to be efficiently created. Some embodiments include systems and techniques for the construction of construct semiconductor devices which are arbitrarily larger than the standard photolithography field size of 26×33 mm, using pick-and-place assembly.

Various embodiments of the present technology provide for the ultra-high density heterogenous integration, enabled by nano-precise pick-and-place assembly. For example, some embodiments provide for the integration of modular assembly techniques with the use of prefabricated blocks (PFBs). These PFBs can be created on one or more sources wafers. Then using pick-and-place technologies, the PFBs can be selectively arranged on a destination wafer thereby allowing Nanoscale-aligned 3D Stacked Integrated Circuit (N3-SI) and the Microscale Modular Assembled ASIC (M2A2) to be efficiently created. Some embodiments include systems and techniques for the construction of construct semiconductor devices which are arbitrarily larger than the standard photolithography field size of 26×33 mm, using pick-and-place assembly.

Various embodiments of the present technology provide for the ultra-high density heterogenous integration, enabled by nano-precise pick-and-place assembly. For example, some embodiments provide for the integration of modular assembly techniques with the use of prefabricated blocks (PFBs). These PFBs can be created on one or more sources wafers. Then using pick-and-place technologies, the PFBs can be selectively arranged on a destination wafer thereby allowing Nanoscale-aligned 3D Stacked Integrated Circuit (N3-SI) and the Microscale Modular Assembled ASIC (M2A2) to be efficiently created. Some embodiments include systems and techniques for the construction of construct semiconductor devices which are arbitrarily larger than the standard photolithography field size of 26×33 mm, using pick-and-place assembly.

A system and method for hyperdimensional imaging includes a three-dimensional nano-fabricated optical structure comprising a porous scaffold material with nanoscale voids and volumetric variations in at least one optical property. The volumetric variations are patterned across three spatial dimensions of the porous scaffold material to encode optical information and implement a plurality of optical functions. The system and method enable integration of multiple optical functions including lensing, dispersion, and phase encoding within a single volumetric structure, providing enhanced pixel utilization and optical throughput for hyperspectral and hyperdimensional imaging applications.

The invention discloses a perovskite nanocrystalline single particle packaging method based on ammonia water vapor induction and ligand confinement. According to the method, APTES prepared by a thermal injection method and OA are terminated, perovskite nanocrystals with lattice defects repaired by PbX2 are purified and then dispersed in toluene, ligands and organosilane are added, a stirring reaction is carried out in the atmosphere of ammonia water vapor, and monodisperse perovskite nanocrystal particles packaged by SiO2 are prepared. The CsPbX3-coated SiO2 core-shell structure particles prepared by the method can maintain the crystal structure and excellent optical performance of CsPbX3 almost without damage, the stability of nanocrystals is remarkably improved, meanwhile, the small size and monodisperse characteristics are maintained, and the CsPbX3-coated SiO2 core-shell structure particles are suitable for serving as a construction unit of an advanced nanometer manufacturing technology and particularly suitable for the fields of display technologies, anti-counterfeiting and the like.

A diagnostic chip for detecting biomarkers and trace amounts of nanoparticles in chemical mixtures or water. The diagnostic chip includes one or more inputs, and a sample containing particles of different sizes is introduced into at least one of the inputs. The diagnostic chip further includes multiple separation regions, and the sample is pressurized as it passes through the separation regions. Each separation region includes a deterministic lateral displacement array, and the deterministic lateral displacement arrays in two or more of the separation regions have different etch depth profiles. In this way, the diagnostic chip effectively detects biomarkers and trace amounts of nanoparticles in chemical mixtures or water.

We provide diagnostic equipment. [Solution] A diagnostic chip for detecting biomarkers and trace nanoparticles in chemical mixtures or water. The diagnostic chip comprises one or more input sections into which a sample containing particles of different sizes is introduced. Furthermore, the diagnostic chip comprises multiple separation regions into which the sample is pressurized as it passes through. Each separation region comprises a deterministic transverse displacement array, and the deterministic transverse displacement arrays in two or more of these separation regions have different etching depth profiles. In this way, the diagnostic chip effectively detects biomarkers and trace nanoparticles in chemical mixtures or water.