986results about How to "Reduce exposure time" patented technology

The invention relates to a wheel-type X-ray flaw detection robot device which comprises an X-ray flaw detection device, a remote wireless transmission device, a computer control device, a differential GPS (Global Positioning System), a fuel battery (or lead acid battery pack) and a robot body, wherein four infrared cameras are arranged on the robot body, and real-time images are remotely transmitted to an operator through video transmission equipment; a direct current voltage regulator is adopted in the controller of an X-ray generator; and the regulator is connected with an inverter by a tube voltage regulation knob, so that the tube voltage of the X-ray generator can be regulated. The operational control and operational state of the robot body are as follows: a digital data radio is adopted to transmit filed signals to an upper control computer; video signals are displayed on a display with visual display and convenient operation; isotope sources are not used, thereby meeting the requirement for environment protection; and a suspension system enables the robot body not to deflect and turn laterally on pipelines and rocks.

Systems and methods process blood and blood components for subsequent pathogen inactivation processes prior to long term storage and/or transfusion.

The invention discloses a rib-pillar-free continuous sublevel filling method for mining preparation in a medium-thickness slope crushed ore body vein. The method comprises the following steps of: dividing a mine block into panel structures with a plurality of sections and bunches, namely dividing sections in a panel, not leaving a rib pillar in the sections, and dividing continuous extraction units; arranging a slope ramp of the panel on an ore body hanging wall, and arranging sectional roadways namely rock drilling ore removal gate ways in the vein; making all the sectional roadways in the panel mutually communicated, and the allocation and transportation of trackless equipment flexible and convenient; performing quarry central up cutting before the extraction, and ensuring the deep hole construction in a quarry upward sector in good conditions; performing operation such as multiple-section quarry rock drilling, blasting, supporting, ore removing, filling and paralleling; using a rib-pillar-free continuous extraction way backing from two wings of the panel to the center in the same sectional quarry, wherein an extraction process is performed sequentially; and filling a gob with tailings or waste stones. The invention relates to the rib-pillar-free continuous sublevel filling method suitable for medium-thickness slope crushed ore bodies, which has a low mining preparation ratio, low loss and high efficiency and the extraction is safe.

The objective of the invention is to provide a method of fabricating semiconductor device using a laser crystallization method capable of preventing a grain boundary from being formed on the channel-forming region of a TFT and preventing the mobility of the TFT from extremely deteriorating, on-current from decreasing, or off-current from increasing due to a grain boundary and a semiconductor device fabricated by the fabrication method. Striped (banded) or rectangular concave and convex portions are formed. Then, a semiconductor film formed on an insulating film is irradiated with a laser beam diagonally to the longitudinal direction of concave and convex portions on the insulating film.

A lightweight, adjustable snowplow, able to be lifted, carried, and manipulated by one person (adult or teenager) of normal strength, designed to remove new-fallen or otherwise soft snow or slush. It has a minimum number of parts. A plurality of struts attaches the plow to any kind of towing vehicle, providing horizontal stability. No brackets, hitches, or lifting devices are needed on the towing vehicle.

An image scanning apparatus has an organic CMOS image sensor mounted in a base, and a photoreceptive surface of the image sensor is exposed on a top side of the base. A subject is placed directly on the photoreceptive surface, and the subject and the photoreceptive surface are covered up with a cover light-tightly. Thus the image sensor detects only chemiluminescent light from the subject. As for a fluorochrome-labeled subject, the subject placed directly on the photoreceptive surface is irradiated with excitation light from a light source mounted in the cover. The image sensor is provided with a filter for blocking the excitation light from its photoelectric conversion layers, so the image sensor detects only fluorescent rays generated from the excited fluorochrome-labeled subject. The image scanning apparatus needs no redundant space in perpendicular direction to the photoreceptive surface.

The invention discloses a whole process management and control-based environment sampling management system and method. The system comprises an environment sampling whole process management system, a laboratory data management system, a background database management system, one or more embedded system secondary development-based field sampling handheld management terminals, one or more cloud information distribution systems, one or more directed wireless data reception/transmission ends, one or more remote sampling terminals and one or more remote sampling tools, wherein the one or more cloud information distribution systems are supplied to the public for accessing environment sampling test data and reports, and the one or more directed wireless data reception/transmission ends are used for field short-distance data transmission. According to the system and method disclosed by the invention, the whole process management and control in an environment sampling process can be realized by utilizing technological means such as real-time video uploading, two-dimensional code encryption and task pushing.

The invention discloses an adjustable bending sheath tube, which comprises a tube body, a traction fiber and a handle. The traction fiber can slide in the tube body and the handle, the tube body has a near end and a far end, the near end is connected with the handle, the handle comprises a branch which is arranged on one side near the near end of the tube body, a movable part which can transversely move along the branch is mounted on the branch, a near end of the traction fiber is fixed on the movable part, a far end of the traction fiber is fixed on the far end of the tube body, an elastic section is positioned near the far end of the tube body, the bending angle of the elastic section is changed when the movable part moves transversely on the branch, and the movable part is threaded with the branch. Compared with bending sheath tubes in prior art, the bending sheath tube is capable of shortening the effective lengthen of the handle and improving the accuracy of the angle controlling, and the operating process is enabled to be convenient and easy to control.

There is provided an image capturing apparatus, comprising an image capturing unit configured to acquire video data at a first frame rate or a second frame rate higher than the first frame rate; and a control unit configured to perform control of an aperture and an exposure time within a range in which the exposure time is shorter than or equal to a maximum exposure time that is a reciprocal of a frame rate of the image capturing unit, so that luminance of the image signal acquired by the image capturing unit is at a predetermined level, wherein when the image capturing unit is operating at the first frame rate, the control unit performs the control within a range in which the exposure time is shorter than a first time that is a reciprocal of the first frame rate.

The invention relates to a mask plate and a manufacture method thereof. The mask plate comprises a lightproof region, a fully transparent region and a partial transparent region; the partial transparent region is formed in a such way that a semi-transparent part and a transparent part are alternatively arranged. The invention is a new mask plate manufactured by combining a grey mask plate technique and halftone mask plate technique; the mask plate ensures that the exposure of photoresist at the lower part of the partial nonopaque region is uniform when in use, which is beneficial to forming the smooth surface of a partial maintaining region of the photoresist, thereby facilitating the TFT groove etch and improving the yield of array substrates, at the same time, the obliquity of the photoresist at the edge of the partial maintaining region of the photoresist is increased, thereby the technique can be accurately controlled in the process of forming the TFT groove.

A disposable device for treatment of infections of human limbs, particularly limbs having long bones susceptible to stabilization by intramedullary nailing. The device includes a tubular member made of a relatively rigid and biologically compatible material, having pores for impregnation with drugs or medicaments for infection treatment prior to or during insertion thereof in the stabilization site. An assembly for treatment of human limb infections including such device.

A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n′<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter D_max and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y′. With COMP=D_max/(Y′·(NA/n′)²) the condition COMP<15.8 holds. Preferred embodiments have relatively small overall numbers of lenses which allows to fabricate the projection objectives relatively small in size with relatively low material consumption, yielding high performance, light weight, compact reduction projection objectives for dry lithography.

An embodiment of the invention discloses a terminal and a method for terminal shooting. The method comprises the steps of acquiring a current shooting scene state when the terminal enters a shooting mode; and when the shooting scene state satisfies a preset shooting condition, combining adjacent pixels in a shot image of the terminal according to a preset pixel processing strategy to obtain the processed shot image.

A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal such as W and Mo is selectively exposed and developed to be patterned in a predetermined form. The incompletely oxidized transition metal herein is a compound having an oxygen content slightly deviated to a lower content from the stoichiometric oxygen content corresponding to a possible valence of the transition metal. In other words, the compound has an oxygen content lower than the stoichiometric oxygen content corresponding to a possible valence of the transition metal.

The present invention relates to a method for performing high speed electron beam lithography (EBL). An electron beam source (EBS), capable of emitting an electron beam towards the energy sensitive resist, forms a first pattern (P1) on the substrate, the first pattern defining a first direction (D1) on the substrate. The electron beam source then forms a second pattern (P2) on the substrate. The energy and/or dose delivered to the energy sensitive resist during the exposure of the first and the second pattern is dimensioned so that the threshold dose/energy of the energy sensitive resist is reached on the overlapping portions of the first and the second patterns (P1, P2). The invention provides a high speed technique for the production of substrates with high quality developed patterns, e.g. hole or dot arrays, by electron beam lithography. Each hole or dot may be defined by the mutually overlapping portions of the first and second pattern, e.g. exposed lines forming a grid, instead of addressing each dot or hole separately.

An apparatus and method to generate an image in which images having different exposure amounts are generated, and by synthesizing the generated images, a high-sensitivity (or quality) image can be generated. The apparatus to generate an image includes an exposure adjustment unit to adjust an exposure amount, an image generation unit to generate a plurality of images of different exposure amounts and different resolutions, and an image synthesis unit to synthesize the plurality of generated images.

The invention discloses an exposure control method for a human face image acquisition system under a near-infrared condition. The method is combined with a human face image information entropy and a human face image motion-blur extent to carry out exposure control, and comprises the following steps: a), using the human face image information entropy as an optimal human face image brightness judgment value, and determining the exposure time for optimal human face brightness through finding the maximum value of the human face image information entropy; b), estimating the human face image motion-blur extent through being combined with cepstrum and the interframe movement distance of a human face; c) adjusting the exposure time according to the human face image motion-blur extent. The exposure control method can be applicable to the human face image acquisition system under the near-infrared condition, can overcome the image degradation phenomenon of the human face image acquisition system due to illumination variation and motion blur effectively, improves the quality of the acquired human face images, and ensures the stability and the accuracy of human face image processing analysis.

The invention discloses a cone-beam X-ray luminescence tomography system of combination imaging and a method thereof. The system comprises a charge-coupled device (CCD) camera, an X-ray source, an X-ray detector, an electronic control rotating table and a narrow-band filter, wherein the CCD camera, the X-ray source, the X-ray detector, the electronic control rotating table and the narrow-band filter are coupled with a lens. The CCD camera and the narrow-band filter are fixed in the same direction, and then a to-be-imaged object, the CCD camera and the narrow-band filter are located on the same straight line; the X-ray source and the X-ray detector are placed in the direction perpendicular to the CCD camera, and then the X-ray source, the to-be-imaged object and the X-ray detector are located on the same straight line; and the CCD camera, the electronic control rotating table, the X-ray source and the X-ray detector are controlled to operate by using a computer. According to the cone-beam X-ray luminescence tomography system of the combination imaging and the method thereof, use ratios of X-rays are improved, and medicine of the to-be-imaged object can be fully excited; X-ray irradiation time is shortened, X-ray irradiation doses are reduced, and popularization and application of X-ray excitation imaging are benefited; information fusion of two types of imaging modals is achieved, and more biological characteristics of the to-be-imaged object are acquired.

Scenes captured with an endoscope (201) of a teleoperated surgical system (200) and displayed on a display unit (251) maintain a consistent brightness even though optical output power of an illuminator (210) changes, and working distance (204) between tissue (203) and the distal tip of the endoscope changes. Teleoperated surgical system (200) also automatically detects when endoscope (201) contacts tissue (203) and adjusts the output optical power of illuminator (210) so that tissue damage does not occur.

A liquid crystal display (“LCD”) panel includes a first substrate including a pixel electrode defining pixel areas, a first alignment layer disposed on the pixel electrode and a first reactive mesogen layer disposed on the first alignment layer, a second substrate including a common electrode layer disposed on an entire portion of the second substrate facing the first substrate, a second alignment layer disposed on the common electrode layer and a second reactive mesogen layer disposed on the second alignment layer, and a liquid crystal layer disposed between the first and second substrates and including a first liquid crystal compound represented by Chemical Formula 1, a second liquid crystal compound represented by Chemical Formula 2 and a third liquid crystal compound represented by Chemical Formula 3: