The invention relates to an online monitoring method for WEE
exposure performance. According to the online monitoring method, information of the shortest
exposure duration needed by sufficient
exposure of a WEE
machine is obtained online and monitored, the exposure performance of a
light source of the WEE
machine is obtained according to a monitoring result, and the step of obtaining the information of the shortest
exposure duration online comprises the substeps that the WEE
machine is used for carrying out a
wafer edge exposure process on a test
wafer and developing, and the exposure performance of the
light source of the WEE machine is obtained according to the exposure performance of the
light source of the WEE machine. The test
wafer comprises a plurality of edge exposure areas, and the edge exposure areas are exposed by adopting different exposure durations; and detecting whether each edge exposure area is fully exposed or not, and obtaining the information of the shortest
exposure duration required by the current full exposure of the WEE machine according to the edge exposure area which is fully exposed and has the shortest
exposure duration. According to the online monitoring method, when the exposure performance of the light source of the WEE machine is obtained, shutdown detection is not needed, operation can be simplified, and production efficiency can be improved.