Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

605 results about "Multiple exposure" patented technology

In photography and cinematography, a multiple exposure is the superimposition of two or more exposures to create a single image, and double exposure has a corresponding meaning in respect of two images. The exposure values may or may not be identical to each other.

Atomic layer removal process with higher etch amount

Higher overall etch rate and throughput for atomic layer removal (ALR) is achieved. The reaction is a self-limiting process, thus limiting the total amount of material that may be etched per cycle. By pumping down the process station between reacting operations, the reaction is partially “reset.” A higher overall etch rate is achieved by a multiple exposure with pump down ALR process.
Owner:NOVELLUS SYSTEMS

Multi-exposure pattern for enhancing dynamic range of images

The specification and drawings present a new method, apparatus and software product for enhancing a dynamic range of an image with a multi-exposure pixel pattern taken by an image sensor of a camera for one or more color channels, wherein a plurality of groups of pixels of the image sensor have different exposure times (e.g., pre-selected or adjusted by a user through a user interface using a viewfinder feedback, or adjusted by a user through a user interface after taking and storing RAW image, etc.). Processing of the captured image for constructing an enhanced image of the image for each of the one or more color channels can be performed using weighted combination of exposure times of pixels having different pre-selected exposure times according to a predetermined criterion.
Owner:NOKIA TECHNOLOGLES OY

Method and system for combining multiple exposure images having scene and camera motion

A panoramic high-dynamic range (HDR) image method and system of combining multiple images having different exposures and at least partial spatial overlap wherein each of the images may have scene motion, camera motion, or both. The major part of the panoramic HDR image method and system is a two-pass optimization-based approach that first defines the position of the objects in a scene and then fills in the dynamic range when possible and consistent. Data costs are created to encourage radiance values that are both consistent with object placement (defined by the first pass) and of a higher signal-to-noise ratio. Seam costs are used to ensure that transitions occur in regions of consistent radiances. The result is a high-quality panoramic HDR image having the full available spatial extent of the scene along with the full available exposure range.
Owner:MICROSOFT TECH LICENSING LLC

Multiple exposure high dynamic range image capture

Techniques for creating a High Dynamic Range (HDR) image within a consumer grade digital camera from a series of images of a scene captured at different exposure levels, and displaying the HDR image on the camera's built-in display are provided. The approach employs mixing images of the series to incorporate both scene shadow and highlight details, and the removing of “ghost” image artifacts appearing in the mixed HDR image resulting from movement in the scene over the time the series images are captured. The low computational resource utilization of the image mixing and ghost removal processing operations, along with the ability to commence image mixing and ghost removal prior to the acquisition of all series images, can significantly reduce the time required to generate and display a tone mapped HDR image.
Owner:QUALCOMM INC

Resolution-enhancement method for digital imaging

A method for resolution enhancement of a still-image made by a digital imaging device. The method allows the use of high-aperture-ratio sensing arrays that produce resolution-enhancement, independent of the angle of view. Resolution-enhancement is achieved using a multiple-exposure technique of a sub-pixel overtap in conjunction with a whole-pixel shift. The method suppresses color-aliasing in a multiple-exposure native-resolution mode and enables the use of a single camera for single-exposure and multiple-exposure modes.
Owner:HOWELL

Multiple exposure high dynamic range image capture

Techniques for creating a High Dynamic Range (HDR) image within a consumer grade digital camera from a series of images of a scene captured at different exposure levels, and displaying the HDR image on the camera's built-in display, are provided. The approach employs mixing images of the series to incorporate both scene shadow and highlight details, and the removing of “ghost” image artifacts appearing in the mixed HDR image resulting from movement in the scene over the time the series images are captured. The low computational resource utilization of the present invention's image mixing and ghost removal processing operations, along with the present invention's ability to commence image mixing and ghost removal prior to the acquisition of all series images, can significantly reduce the time required to generate and display a tone mapped HDR image.
Owner:QUALCOMM INC

Adaptive Exposure Control

A method for constructing a final image using adaptive exposure control in multiple exposure photography, comprising: (a) capturing an exposure; (b) analyzing the exposure at least to determine deficiencies in the exposure; (c) setting exposure parameters for at least one next exposure adapted to construct the final image with ameliorated deficiencies; (d) capturing the at least one next exposure using the set exposure parameters; and, (e) constructing a final image utilizing portions of at least the two exposures.
Owner:MEP IMAGING TECH

Reduced pitch multiple exposure process

A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
Owner:ASML NETHERLANDS BV

Multiple exposure high dynamic range image capture

Techniques for creating a High Dynamic Range (HDR) image within a consumer grade digital camera from a series of images of a scene captured at different exposure levels, and displaying the HDR image on the camera's built-in display are provided. The approach employs mixing images of the series to incorporate both scene shadow and highlight details, and the removing of “ghost” image artifacts appearing in the mixed HDR image resulting from movement in the scene over the time the series images are captured. The low computational resource utilization of the image mixing and ghost removal processing operations, along with the ability to commence image mixing and ghost removal prior to the acquisition of all series images, can significantly reduce the time required to generate and display a tone mapped HDR image.
Owner:QUALCOMM INC

Active matrix LCD in which a change in the storage capacitance Cs due to having multiple exposure regions is compensated for by a change in the coupling capacitance Cgd

A liquid crystal displaying apparatus which is high in displaying quantity is provided, wherein the displaying quantity reduction such as flickering, image sticking, ununiformly displaying and so on which is caused due to changes for each exposing region of the DELTAVgd. In the liquid crystal displaying apparatus of the present invention, a plurality of scanning wirings and a plurality of signal wirings, TFTs and pixel electrodes are formed. Storage capacitance for retaining the electric charge is connected with the pixel electrode, another electrode opposite to an electrode for forming the storage capacitance and the drain electrode of the TFT are formed at the same time, an array substrate where another electrode is superposed on the scanning wiring and the signal wiring through the transparent insulating film, and a liquid crystal displaying provided with an counter substrate having a common electrode to be arranged opposite to the pixel electrode. The change in the DELTAVgd due to changes in the Cgd to be caused for each exposing area is compensated by changing the Cs value for each exposing region.
Owner:MITSUBISHI ELECTRIC CORP

Merging Multiple Exposures to Generate a High Dynamic Range Image

A method of generating a high dynamic range (HDR) image is provided that includes capturing a long exposure image and a short exposure image of a scene, computing a merging weight for each pixel location of the long exposure image based on a pixel value of the pixel location and a saturation threshold, and computing a pixel value for each pixel location of the HDR image as a weighted sum of corresponding pixel values in the long exposure image and the short exposure image, wherein a weight applied to a pixel value of the pixel location of the short exposure image and a weight applied to a pixel value of the pixel location in the pixel long exposure image are determined based on the merging weight computed for the pixel location and responsive to motion in a scene of the long exposure image and the short exposure image.
Owner:TEXAS INSTR INC

Optical formation device and method

The purpose of the invention is to provide a solid model creation apparatus that is small in size and inexpensive. A multiplicity of blue LEDs are prepared, optical fibers are connected thereto, and GRIN lenses are arranged at the ends of the tips of the respective optical fibers to constitute an exposing head 23. The exposing head 23 forms images of the end faces of the respective optical fibers in a photocurable resin exposure region 24 as light spots 55. The diameter of a light spot 55 is, for example, 0.5 mm, but the size of a pixel 71 within the exposure region 24 is much smaller; for example, 62.5mu. The multiplicity of optical fibers at the exposing head 23 are arrayed in a matrix such that they are displaced in staggered fashion so that respective light spots 55 are lined up at the pitch 62.5mu of the pixels 71 in the primary scan (Y-axis) direction. As the exposing head 23 scans the exposure region 24 in the secondary scan (X-axis) direction, all of the light spots capable of directing light onto appropriate pixels, these being the respective pixels 71 to be cured within the exposure region 24, are turned on and multiple exposure is carried out.
Owner:NABLESCO CORP +1

Apparatus and method for generating high dynamic range image from which ghost blur is removed using multi-exposure fusion

An apparatus and method for generating a High Dynamic Range (HDR) image from which a ghost blur is removed based on a multi-exposure fusion. The apparatus may include an HDR weight map calculation unit to calculate an HDR weight map for multiple exposure frames that are received, a ghost probability calculation unit to calculate a ghost probability for each image by verifying a ghost blur for the multiple exposure frames, an HDR weight map updating unit to update the calculated HDR weight map based on the calculated ghost probability, and a multi-scale blending unit to generate an HDR image by reflecting the updated HDR weight map to the multiple exposure frames.
Owner:SAMSUNG ELECTRO MECHANICS CO LTD

Method, program product and apparatus for performing double exposure lithography

A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. The method includes the steps of: defining an initial H-mask corresponding to the target pattern; defining an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask having a width which is less than a predetermined critical width; identifying vertical critical features in the V-mask having a width which is less than a predetermined critical width; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask. The non-critical features are those features having a width which is greater than or equal to the predetermined critical width. The non-critical features are formed in the H-mask and the V-mask utilizing chrome. The target pattern is then imaged on the substrate by imaging both the H-mask and V-mask.
Owner:ASML NETHERLANDS BV

Multiple exposure image intensifying method

The method comprises: shooting multi pictures with different exposure levels at same scene; according to the response curve of camera, portioning the each picture into several blocks; selecting the blocks having the most information to make block combination; using a fusion function to remove the edge effects between blocks to finally get an enhanced picture with wide dynamical range.
Owner:SHANGHAI JIAO TONG UNIV

Image stabilization using multi-exposure pattern

The specification and drawings present a new method, apparatus and software product for image stabilization of an image taken with a fixed (i.e., pre-selected) multi-exposure pattern for at least one color channel by an image sensor of a camera, wherein a plurality of groups of pixels of the image sensor have different pre-selected exposure times for said at least one color channel. The camera can be a part of, e.g., an electronic device such as mobile phone or a portable electronic device.
Owner:NOKIA TECHNOLOGLES OY

Method and apparatus for motion artifact removal in multiple-exposure high-dynamic range imaging

Methods and apparatuses for correcting image artifacts in a high dynamic range image formed by combining a plurality of exposures taken at different integration periods. A determination is made as to whether there is motion between the exposures. If motion is detected, pixel signal values chosen are replaced with pixel signal values from another exposure.
Owner:APTINA IMAGING CORP

Method for the fabrication of three-dimensional microstructures by deep X-ray lithography

A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.
Owner:NAT TECH & ENG SOLUTIONS OF SANDIA LLC

Multiple exposure high dynamic range image capture

Techniques for creating a High Dynamic Range (HDR) image within a consumer grade digital camera from a series of images of a scene captured at different exposure levels, and displaying the HDR image on the camera's built-in display are provided. The approach employs mixing images of the series to incorporate both scene shadow and highlight details, and the removing of 'ghost' image artifacts appearing in the mixed HDR image resulting from movement in the scene over the time the series images are captured. The low computational resource utilization of the image mixing and ghost removal processing operations, along with the ability to commence image mixing and ghost removal prior to the acquisition of all series images, can significantly reduce the time required to generate and display a tone mapped HDR image.
Owner:QUALCOMM INC

Multiple-exposure image fusion method and device

ActiveCN103247036AProcessing speedSuitable for situations with high real-time requirementsImage enhancementMultiple exposureProcess rate
The invention discloses a multiple-exposure image fusion device and method. The multiple-exposure image fusion device comprises a reflective area extraction unit and a multiple-exposure image reflective area fusion unit, wherein the reflective area extraction unit is used for extracting a reflective area of each image in a plurality of images with different exposure degree in a same scene; and the multiple-exposure image reflective area fusion unit is used for the fusion of the image with a plurality of reflective areas. The multiple-exposure image fusion device and the multiple-exposure image fusion method only perform the fusion operation on a reflective area rather than a plurality of whole images, so that processing speed is significantly increased; and the device and the method are used for the situation of a high real-time demand.
Owner:RICOH KK

Multi-level image focus using a tunable lens in a machine vision inspection system

A method is provided for defining operations for acquiring a multi-exposure image of a workpiece including first and second regions of interest at different Z heights. The multi-exposure image is acquired by a machine vision inspection system including strobed illumination and a variable focal length lens (e.g., a tunable acoustic gradient index of refraction lens) used for periodically modulating a focus position. During a learn mode, first and second multi-exposure timing values for instances of strobed illumination are determined that correspond with first and second phase timings of the periodically modulated focus position that produce sufficient image focus for the first and second regions of interest. Data indicative of the multi-exposure timing difference is recorded and is subsequently utilized (e.g., during a run mode) to define operations for acquiring a multi-exposure image of first and second regions of interest on a current workpiece that is similar to the representative workpiece.
Owner:MITUTOYO CORP

Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process

A method for forming exposure masks for imaging a target pattern having features to be imaged on a substrate in a multi-exposure process. The method includes the steps of generating a set of decomposition rules defining whether a given feature of the target pattern is assigned to a first exposure mask or a second exposure mask; applying the decomposition rules to each of the features in the target pattern so as to assign each of the features in the target pattern to one of the first exposure mask or second exposure mask; and generating the first exposure mask and the second exposure mask containing the respective features assigned to each mask.
Owner:ASML NETHERLANDS BV

Method and apparatus for performing model-based layout conversion for use with dipole illumination

A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
Owner:ASML NETHERLANDS BV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products