88 results about "Multiple exposure" patented technology

The application discloses a kind of based on multiple exposure generation fusion's low-light image enhancement system, belong to low-light image enhancement technical field.System includes: adaptive multiple exposure adjustment module (AMEA), joint prediction gamma coefficient, linear modulation factor and compensation parameter, to input low-light image carries out nonlinear and linear combination transformation, generates multiple luminance, contrast and different color response multiple exposure candidate image;Multiple exposure fusion module (MEF), original low-light image and candidate image channel splicing are carried out, and preliminary enhancement image is obtained by fine-grained weighting fusion of channel fusion coefficient and introduction of perception compensation parameter correction;Color refinement module (CRM), using encoder decoder structure and introducing fast fourier representation in bottleneck layer, realize spatial domain and frequency domain joint modeling, carry out global color calibration and local detail optimization to preliminary enhancement image.The overall network uses lightweight design such as depth separable convolution and dense connection, inference is simple, and can be run in real time in edge device.The application generates by adaptive multiple exposure, structure constraint fusion and frequency domain refinement, effectively restores dark texture, suppresses over-enhancement and color deviation, improves visual naturalness and robustness in complex low-light scene.

The invention relates to an exposure sequence adaptive optimization method and device for multi-view automatic measurement, computer equipment, a computer readable storage medium and a computer program product. The method comprises the following steps: acquiring an original exposure time sequence of a plurality of viewpoints; the original exposure time sequence comprises a plurality of exposure segments, and each exposure segment corresponds to one viewpoint; calculating similarity data among the exposure segments, and grouping the exposure segments according to the similarity data to obtain a plurality of initial exposure groups; for each initial exposure group, re-grouping the exposure segments at the boundary position to obtain a plurality of boundary grouping results, and calculating grouping cost data for each boundary grouping result; and selecting a target grouping result from the boundary grouping results according to the grouping cost data, optimizing the target grouping result according to the grouping cost data to obtain a plurality of target exposure groups, and calculating the exposure time of each target exposure group. The method can shorten the measurement period.

A charged-particle writing method for writing a desired pattern on a target using a charged-particle multi-beam processing apparatus includes writing multiple exposure stripes (51) along a main direction. The apparatus includes a plurality of particle-optical columns (411, 413) arranged in an array over the target plane, with said columns forming least two lines extending perpendicular to the main direction. By virtue of a relative movement between said target and the particle-optical columns along the main direction while the particle-optical columns generate pattern portion images on the target, the columns write the exposure stripes (51) on the target, each exposure stripe being exposed by either one single particle-optical column or one group of two or more particle-optical columns arranged along said main direction. In the direction perpendicular to the main direction, the row offset is at least twice the width of the stripes. Between writing the exposure stripes the particle-optical columns are moved relative to the target so that the target bypasses the base points of the particle-optical columns.

The invention discloses a simulation-based high dynamic range image synthesis method, which comprises the following steps of: generating low dynamic range images with different exposure degrees based on a CARLA simulator, and synthesizing a plurality of low dynamic range images into a high dynamic range image by using a multi-exposure fusion algorithm, thereby constructing a large-scale automatic driving high dynamic range simulation data set. According to the invention, through a multi-exposure fusion algorithm, low-dynamic-range images of multiple exposures are concisely and efficiently fused, a high-quality high-dynamic-range image which retains details of a dark part and a bright part at the same time is obtained, and the synthesis speed is relatively high. The method supports the synthesis of a large-scale automatic driving high-dynamic range policy data set, and is used for the research of related tasks.

The invention provides a manufacturing method for improving negative photoresist analysis adhesive force through multiple exposure and a substrate. The manufacturing method comprises the following steps of performing roughening treatment on the surface of the substrate; pressing and pasting a negative type light resistance dry film on the surface of the roughened substrate; performing first exposure on the pressed and attached substrate to form an initial polymerization area; at least one time of local enhanced exposure is carried out on the initial polymerization area, each time of local enhanced exposure adopts second exposure energy higher than the first exposure energy, and the exposure area is completely located in the initial polymerization area; and developing the substrate subjected to all the exposure steps to form a circuit pattern. The initial polymerization area is formed through the first exposure, the polymerization degree and the adhesive force of the middle part are enhanced through the local enhanced exposure, energy distribution is optimized, the contradiction that the resolution and the adhesive force cannot be achieved at the same time in a traditional process is effectively solved, and the method has the advantages that stable manufacturing of the superfine circuit is achieved under the condition of not depending on special materials and high-end equipment; and the production yield is improved.

The application discloses a kind of self-adapting multiple exposure fusion methods and systems based on surface structure light three-dimensional measurement, the method is first based on initial exposure image calculation modulation chart and maximum gray value, and according to modulation degree division multiple regions, and through the gray value correction and local information entropy weighting of pixel, the average gray of each clustering is accurately calculated, and then the optimal exposure time is solved for different regions, in image fusion stage, by analyzing the gray value distribution of high exposure image Dynamic determination of overexposure threshold, and with the pixel modulation degree under each exposure as the core basis, the fusion weight is calculated, and finally the global high-quality fringe image is generated.The application solves the problem that the reconstruction accuracy is low due to local overexposure or underexposure of high dynamic range objects, and significantly improves the three-dimensional measurement accuracy and automation level of high dynamic range objects.

The invention relates to a cross-color gamut phase-guided double-attention fusion HDR imaging method. The method comprises the following steps: step (1), carrying out data preprocessing of denoising and cleaning on an original multi-exposure image sequence; step (2), obtaining standardized image data; (3) mapping a nonlinear pixel value into a linear physical illumination value for the standardized image data through a reverse application camera response curve, and outputting a linearized multi-frame image; step (4), splicing the linearized multi-frame images on a channel dimension, and constructing a unified input tensor containing complete dynamic range information; (5) performing convolution operation on the input tensor, and extracting shallow feature representation of local textures and edges of the image; extracting shallow layer features; and step (6), introducing a double attention mechanism to perform interaction and aggregation of global features, and outputting a fused high dynamic range feature map. The method can stably work in a dynamic scene and under an extreme exposure condition, and promotes the practical application of an HDR imaging technology.

The invention discloses a multi-region time-sharing exposure control method for a single-chip image sensor and an application of the multi-region time-sharing exposure control method. The control method comprises the following steps of: logically partitioning a pixel array of a single-chip image sensor according to a shooting scene to obtain a plurality of exposure areas; according to the exposure time of different partitions, a pixel row decoder is controlled to expose the area needing to be exposed; after exposure is completed, the column reading circuit is controlled to read out, and exposure images of all the partitions at different moments and different exposure times are obtained. The method is used in the star guiding process. According to the method, multi-region time-sharing exposure of the single image sensor is realized, and meanwhile, the multi-region time-sharing exposure is applied to the astronomical field, so that a guided star image is acquired and a target image is shot on the same image sensor, the error is smaller when the guide star deviation is calculated, and more accurate guide star correction can be completed. The complex process problem of adjusting the guide star sensor and the main sensor to be in the same plane and the guide star calculation error caused by the adjustment error are avoided.

A pixel architecture is provided for complementary metal-oxide-semiconductor (CMOS) image sensors for high dynamic range (HDR) capture without introducing multi-exposure motion blur. The pixel architecture combines a low-noise readout in combination with a shuffle-gate circuit which is used for flexible extension of sensor saturation. The shuffle-gate circuit allows for the overflow charge from a photodiode to be selectively skimmed and stored based on a modulated duty cycle that governs signal range extension. Shared elements allow for further pixel size reduction through wafer-to-wafer interconnects and spatial multiplexing.

A distributed imaging that allows for sample relaxation. CPB images are acquired with pulsed exposures of a field of view (FOV) defined in a region of interest of a sample. Multiple exposures are configured with time intervals greater than a phonon lifetime to reduce sample damage caused by CPB exposures. The FOV can be defined to be spaced apart to control effective irradiation dose based on a combination of direct and evanescent exposures.

The invention discloses a light area contour extraction method and device, equipment and a storage medium. The method comprises the following steps: carrying out light area extraction on a high-exposure grayscale picture based on a gradient magnitude to obtain a light response diagram; performing light area boundary expansion on the light response diagram to obtain a boundary expansion diagram; a bright light extraction threshold value is constructed according to the boundary expansion graph, a bright light mask graph is constructed according to the bright light extraction threshold value, and the bright light mask graph comprises effective boundary points; and carrying out connected region filtering and closed operation on the bright light mask pattern to obtain a bright light region contour. A light response diagram and a self-adaptive extraction mechanism are constructed through gradient amplitudes, a real set structure contour of a highlight area can be recovered under the condition of not depending on edge closure and gradient continuity, and the method has higher structure adaptability and interference robustness and is suitable for large-scale popularization and application. Therefore, structural highlight area contour information is stably extracted from a complex industrial image with multiple exposure interferences, uneven illumination and bright area overexposure.

The application belongs to the technical field of precision instruments, and discloses a film surface and interface profile synchronous measurement method and device based on a split-waveband multispectrum, wherein the measurement device comprises a light splitting module, a dichroic mirror, a reference mirror, an imaging lens and a spectrometer; the light splitting module is used for splitting the received light into a first light beam and a second light beam; the first light beam is reflected by the film to be measured in the full waveband; the light in part of the waveband in the second light beam is reflected by the reference mirror and interferes with the light of the corresponding waveband reflected by the film; and the interference light and the remaining light reflected by the film enter the spectrometer. The film sample surface and interface profile can be obtained by processing the spectral image; the filtering function of the dichroic mirror makes it possible to obtain the interference spectrum and the reflection spectrum at the same time, and the measurement of the film sample surface and interface profile under single exposure is realized; and the interference spectrum and the reflection spectrum of the measurement sample can be directly obtained without multiple exposures or reprocessing of the directly obtained light intensity.

The application discloses a high light suppression method and system based on modulation degree truncation average, the method of the application firstly projects a uniform gray scale image to the surface of a measured object, divides reflectivity regions according to the light intensity histogram of a collected image, and predicts an optimal exposure time group of each region; then, based on the time group, a plurality of phase shift grating fringes are adaptively projected; finally, taking the fringe modulation degree as a judgment basis, the effective phase points in the plurality of exposure images are subjected to truncation average processing, a high dynamic range (HDR) grating image is synthesized, and phase demodulation and three-dimensional reconstruction are carried out. The application effectively suppresses the high light overexposure problem of the surface of a high-reflective object such as metal through a software algorithm, overcomes the defects that the multiple exposure method is prone to motion ghosting and relies on hardware devices, and realizes high-precision and high-efficiency three-dimensional topography measurement without increasing the complexity and cost of the system.

In accordance with a method of forming a waveguide in a polymer film disposed on a substrate, a plurality of regions on a polymer film are selectively exposed to a first dosage of radiation. The polymer film is formed from a material having a refractive index that decreases by exposure to the radiation and subsequent heating. At least one region of the polymer film that was not previously exposed to the radiation is selectively exposing to a second dosage of radiation. The second dosage of radiation is less than the first dosage of radiation. The polymer film is heated to complete curing of the polymer film.

The invention discloses a holographic two-dimensional grating exposure method and device and an exposure beam calculation method, and relates to the technical field of holographic two-dimensional gratings, and the exposure beam calculation method comprises the steps: determining wave vectors k1 and k2 of an exposure beam of a first three-dimensional grating vector KG1 according to the first three-dimensional grating vector KG1 and a second three-dimensional grating vector KG2, the wave vector k1 is the wave vector of the common exposure light beam of the three-dimensional grating vector I KG1 and the three-dimensional grating vector II KG2, introducing a tilt vector and constructing a vector triangle to carry out rotation iterative calculation, so as to obtain a three-dimensional grating vector I KG1 and a three-dimensional grating vector II KG2, and the wave vector k1 is the wave vector of the common exposure light beam of the three-dimensional grating vector II KG2; the exposure method and the exposure device are set according to the parameters of the exposure light beams obtained by the calculation method, so that the problem that the operation difficulty is high due to the fact that the two paths of light beams are needed to carry out exposure for multiple times when the holographic two-dimensional grating is manufactured is solved.

CPB images are acquired with pulsed exposures of fields of view (FOVs) defined in a region of interest of a sample. Multiple exposures are configured with a time interval greater than a phonon lifetime to reduce sample damage induced by the CPB exposure. FOVs can defined to be spaced apart to control effective irradiation dose based on a combination of direct exposure and evanescent exposure.

This application provides a two-dimensional grid display and interaction system, employing a scene graph architecture based on a node tree structure. It includes: logical cell nodes, which serve as container nodes acting as abstract containers to manage the rendering of all exposure units within the logical cell; and multiple exposure unit nodes, which serve as leaf nodes representing exposure unit entities and are used for rendering each exposure unit. The logical cell nodes and the multiple exposure unit nodes have at least one of the following relationships based on the node tree structure: a one-to-many relationship, a coordinate relationship, a rendering relationship, and a transformation relationship. In this way, multiple exposure units and irregularly shaped exposure units can be supported through the logical cell nodes (container nodes) and the exposure unit nodes (leaf nodes) of the node tree structure, thereby achieving high-performance, fully functional, and easily integrated two-dimensional grid display and interaction.

This application relates to a lens defect detection method, apparatus, and semiconductor structure fabrication method. The lens defect detection method of this application includes: providing a wafer; the wafer including multiple exposure areas; exposing each of the exposure areas, wherein at least two different exposure energies are used during the multiple exposures; after the multiple exposures, determining whether the lens has a defect based on whether spots appear in each of the exposure areas; if spots appear in the exposure areas, then the lens is determined to have a defect. The lens defect detection method provided by this application, by exposing the same wafer with different exposure energies, can detect less obvious defects on the lens, exhibiting high sensitivity; moreover, the detection process is simple and easy to implement.

Stitched images compiled from base images with non-simultaneous exposures may exhibit unwanted aliasing, despite correction for exposure, particularly when the illumination on or present in the scene changes. Herein, a correction is made by first identifying comparison pixels in an image with greater exposure that have a high light metric. After correction for exposure, the light metrics of the same pixels in the lesser exposed image are determined. A ratio between the light metrics of these comparison pixels in the two images is determined and used to scale one of the images. With the comparison pixels now having the same light metrics, the images are stitched. More than two base images may be used, they may be 1, 2 or 3 dimensional, and may be obtained with a global or rolling shutter.

This invention discloses an FPGA-based method for optimizing and accelerating structured light algorithms. The method includes: a processor receiving image data acquired by a camera and sending the image data to the FPGA; using Gray code projection-based structured light imaging technology, coarsely locating the position of each camera pixel on the optical engine using Gray code, and then finely locating the position of the pixel on the optical engine within each Gray code period using moving fringe technology to reconstruct three-dimensional topographic information; image preprocessing, HDR fusion of multiple exposure images, and Gray code decoding are completed on the FPGA side, while point cloud reconstruction is completed on the PC side; by utilizing parallel processing and a pipelined approach on the FPGA, image preprocessing, HDR fusion, Gray code generation, and moving edge fringe subtraction are completed in real time while data is sent to the PC side; Gray code decoding is performed, and moving fringe decoding is performed simultaneously, and the two are combined to obtain the final phase data; the phase data is then uploaded to a host computer.

The present application relates to the technical field of color restoration detection, and particularly relates to a color restoration detection method, system and device for a mobile phone camera. The method obtains RGB images of multiple scenes and multiple exposure levels, performs multi-bit layering on each channel, and determines hierarchical dynamic weights based on pixel distribution; the method analyzes the cooperativity of weight sequences under different exposures, and constructs a basic color response consistency degree reflecting channel consistency. At the same time, the method evaluates scene complexity in combination with the information entropy of HSV chroma distribution, calculates an exposure deviation index based on bit layer pixel value statistics, and fuses the two to quantify the degree of environmental interference. Finally, the basic color response consistency degree is weighted and corrected according to the environmental interference intensity, to obtain a target color response consistency degree closer to the real use condition, which is used for camera quality evaluation. The method is free from dependence on standard color cards, and effectively improves the reliability and practicability of color restoration evaluation under complex or non-ideal exposure scenes.

A system, method, and computer program product are provided for obtaining multiple exposures with zero interframe time. In use, an analog signal associated with an image associated with an image of an image sensor is received. Amplified analog signals associated with the image are generated by amplifying the analog signal utilizing gains. The amplified analog signals are transmitted to analog-to-digital converter circuits. The amplified analog signals are converted to digital signals utilizing the analog-to-digital converter circuits. The digital signals are combined to create a high dynamic range (HDR) image.

The application provides a wafer abnormality early warning method. When an abnormality occurs in an exposure process station, repeated abnormal points usually occur at the same position of multiple exposure regions on a wafer. The wafer test image of the wafer that needs to be analyzed for abnormality in the exposure test station is obtained first, and then the wafer test image is divided into a plurality of sub-test images, each of which corresponds to an exposure region on the wafer. Then, the proportion between the maximum number of the sub-test images with repeated abnormal points at the same position and the total number of the sub-test images is obtained. Whether wafer abnormality early warning is needed can be determined based on the proportion. In this way, once an abnormality occurs in the exposure process station, it can be found in time and accurately, wafer abnormality can be effectively warned, and batch defective products can be avoided.

Systems, apparatus, and methods for stabilization and blending of exposures. So-called Electronic Image Stabilization (EIS) techniques use image manipulation software to compensate for camera motion. Unfortunately, existing EIS techniques cannot compensate for artifacts introduced by low shutter speed (e.g., blurs). Various embodiments of the present disclosure generate stabilized images from multiple exposures. In one exemplary embodiment, the stabilized exposures are blended using a linear sum of the color data for each pixel of the image. By stabilizing each exposure and linearly summing the light information, the camera shake can be removed, and the scene motion blur can be controlled. The stabilization and blending techniques enable a mathematical emulation of a selected shutter angle from many high-speed exposures.

The application provides a photolithography mask frame and a photolithography mask frame manufacturing method, and relates to the technical field of semiconductor manufacturing. The application introduces a sub-frame unit concept based on different fields of view of different photolithography machines, determines the size of the minimum frame unit according to the greatest common divisor of the number of core particles that can be arranged in the horizontal and vertical directions of each different photolithography machine field of view, and then obtains the final photolithography mask frame through the horizontal and vertical translation replication of the sub-frame unit. In this way, the matching use of different field of view photolithography machines with high degrees of freedom can be realized through the optimization of the photolithography mask frame without sacrificing the maximum exposure field of view used by the photolithography machine. During the matching use of different field of view photolithography machines, complex calculations are not required, and program editing can be performed according to the respective frames, thereby making the photolithography mask frame of the application more practical, enabling the matching use of photolithography machines across multiple exposure fields of view, and effectively improving the utilization rate of photolithography machine capacity.

The invention discloses a compressor valve plate welding positioning method and system based on machine vision, and relates to the field of image welding positioning, polarization structured light is actively projected, the interference of mirror reflection on imaging is inhibited from a physical source by using polarization characteristics, and meanwhile, the structured light technology is used for extracting fragile gray-scale edges from a positioning problem; and more stable light stripes which are deformed or interrupted on the surface of the object are analyzed. And by combining a high dynamic range imaging technology and fusing a multi-exposure frame sequence, it is ensured that feature details of highlight and dark areas are completely reserved. On the basis of the high-quality image, a group of stable and reliable feature point sets can be obtained by decoding the structured light and accurately extracting discontinuous points generated at the outline of the valve plate. And subsequently, contour fitting and pose calculation are carried out based on the point set, so that high-precision and high-robustness positioning of the valve plate is realized.

The invention relates to the technical field of industrial visual inspection, and particularly discloses a wood board surface defect detection method and system.The method comprises the steps that firstly, a multi-exposure image sequence of the surface of a wood board is collected from multiple polarization angles, an unsaturation intensity graph is reconstructed through high-dynamic-range fusion, and a Stokes parameter field representing the whole surface point polarization state is solved; performing physical inversion on the parameter field, resolving a micro-plane normal vector distribution field for describing the surface microscopic geometrical morphology, performing multi-scale decomposition and adaptive fusion on the intensity graph and the normal vector field, generating an enhanced feature graph for simultaneously coding appearance texture and bottom layer geometrical physical information, inputting the feature graph into a pre-trained identification process, and identifying the appearance texture and the bottom layer geometrical physical information. A normal vector field is introduced as an internal geometric consistency constraint for feature correction and guidance, so that accurate positioning, classification and confidence evaluation of defects are realized; according to the method, the accuracy, the robustness and the practicability in surface defect detection of the high-reflection wood board are improved.

The embodiment of the invention provides a laser direct-writing imaging system and method based on a single-axis micro-displacement device, which are used for realizing laser direct-writing imaging of an uneven exposure surface and improving the precision of laser direct-writing imaging. The method provided by the embodiment of the invention comprises the following steps: acquiring 3D surface topography model data of a substrate; according to the 3D surface topography model data, Z-axis target coordinates of exposure point positions of the single-axis micro-displacement device units on a scanning path are generated; issuing Z-axis target coordinates of a plurality of exposure points to each edge computing node, controlling the mobile platform to perform uniform linear scanning motion, and controlling each edge computing node to query a locally stored Z-axis target coordinate query table in real time according to the physical coordinates of the current single-axis micro-displacement device unit; and adjusting the position of the laser light source in the Z-axis direction to be consistent with the Z-axis target coordinate in real time according to the query result, and controlling the laser light source to expose the position of the exposure point.

The present application relates to the field of micro-nano device processing, and particularly relates to a multi-step micro-nano structure and a preparation method thereof. The method comprises the following steps: forming a mask layer on a substrate surface, the mask layer having a plurality of openings with different sizes for exposing the substrate; and performing single etching on the substrate with the mask layer as a mask to obtain the multi-step micro-nano structure on the substrate. The present application realizes the multi-step by designing openings with different sizes to obtain the multi-step through single etching. The complex process flow of traditional multiple exposures and multiple etchings is compressed into one exposure and one etching, which fundamentally eliminates the problems of cumulative error, long production cycle and high cost caused by multiple process cycles. The strict overlay alignment requirement between multiple photolithographies is avoided, the manufacturing precision and yield are greatly improved, the present application is easy to integrate into the existing semiconductor production line, and the present application paves the way for the large-scale and low-cost manufacturing of multi-step devices.