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227 results about "Gobio gobio obtusirostris" patented technology

Method, program product and apparatus for performing double exposure lithography

A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. The method includes the steps of: defining an initial H-mask corresponding to the target pattern; defining an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask having a width which is less than a predetermined critical width; identifying vertical critical features in the V-mask having a width which is less than a predetermined critical width; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask. The non-critical features are those features having a width which is greater than or equal to the predetermined critical width. The non-critical features are formed in the H-mask and the V-mask utilizing chrome. The target pattern is then imaged on the substrate by imaging both the H-mask and V-mask.
Owner:ASML NETHERLANDS BV

Flexible clamp

A flexible clamp for clamping and spacing solar panel modules, including a captive flange forming a top portion, which includes a top face, a bottom face, a right side, a left side, a front side, a back side, a substantially planar underside to engage the modules upper surface. It also includes a longitudinal axis and an aperture disposed generally along that axis. First, second, and third horizontal members are disposed under the captive flange and include substantially planar surfaces generally parallel to the underside of the captive flange. Each horizontal member includes a right side, a left side, a front side, a back side, a width slightly less than the width of the captive flange, and an aperture coaxial with the aperture in the captive flange. A first vertical member connects the right side of the first horizontal member with the captive flange at a point slight right of the longitudinal axis and left of the right side, thus forming a right overhang for engaging a first solar panel. A second vertical member connects the left sides of the second and third horizontal members in such manner that a left overhang is formed, and this is adapted for engaging a second solar panel adjacent to the first panel. A third vertical member coplanar with the first vertical member connects the right sides of the second and third horizontal members. When a bolt is passed through the coaxial apertures and tightened, the clamp flexes and bows slightly outwardly.
Owner:ZANTE ANTHONY A

Method and apparatus for performing model-based layout conversion for use with dipole illumination

A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
Owner:ASML NETHERLANDS BV
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