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341 results about "Ultra high density" patented technology

Ultra High Density Modules provides an interface between MPO Trunks and LC interface of active equipment. Pre-assembled MPO modules improve the speed of installation. Modules with external MPO ports can be easily connected to trunks or fanouts.

Process for making and programming and operating a dual-bit multi-level ballistic MONOS memory

A fast low voltage ballistic program, ultra-short channel, ultra-high density, dual-bit multi-level flash memory is described with a two or three polysilicon split gate side wall process. The structure and operation of this invention is enabled by a twin MONOS cell structure having an ultra-short control gate channel of less than 40nm, with ballistic injection which provides high electron injection efficiency and very fast program at low program voltages of 3~5V. The cell structure is realized by (i) placing side wall control gates over a composite of Oxide-Nitride-Oxide (ONO) on both sides of the word gate, and (ii) forming the control gates and bit diffusion by self-alignment and sharing the control gates and bit diffusions between memory cells for high density. Key elements used in this process are: 1) Disposable side wall process to fabricate the ultra short channel and the side wall control gate with or without a step structure, and 2) Self-aligned definition of the control gate over the storage nitride and the bit line diffusion, which also runs in the same direction as the control gate. The features of fast program, low voltage, ultra-high density, dual-bit, multi-level MONOS NVRAM of the present invention include: 1) Electron memory storage in nitride regions within an ONO layer underlying the control gates, 2) high density dual-bit cell in which there are two nitride memory storage elements per cell, 3) high density dual-bit cell can store multi-levels in each of the nitride regions, 4) low current program controlled by the word gate and control gate, 5) fast, low voltage program by ballistic injection utilizing the controllable ultra-short channel MONOS, and 6) side wall control poly gates to program and read multi-levels while masking out memory storage state effects of the unselected adjacent nitride regions and memory cells. The ballistic MONOS memory cell is arranged in the following array: each memory cell contains two nitride regions for one word gate, and ½ a source diffusion and ½ a bit diffusion. Control gates can be defined separately or shared together over the same diffusion. Diffusions are shared between cells and run in parallel to the side wall control gates, and perpendicular to the word line.
Owner:HALO LSI INC

Process for making and programming and operating a dual-bit multi-level ballistic flash memory

An fast program, ultra-high density, dual-bit, multi-level flash memory process, which can be applied to a ballistic step split gate side wall transistor, or to a ballistic planar split gate side wall transistor, which enables program operation by low voltage requirement on the floating gate during program is described. Two side wall floating gates are paired with a single word line select gate, and word lines are arranged to be perpendicular both the bit lines and control gate lines. Two adjacent memory cells on the same word line do not require an isolation region. Also, the isolation region between adjacent memory cells sharing the same bitline is defined by the minimum lithography feature, utilizing a self align fill technique. Adjacent memory cells on the same word line share bitline diffusion as well as a third poly control gate. Control gates allow program and read access to the individual floating gate. In addition to the dual-bit nature of the cell, density can be even further improved by multi-level storage. In one embodiment, the dual multi-level structure is applied to the ballistic step split gate side wall transistor. In a second embodiment, the dual multi-level structure is applied to the ballistic planar split gate side wall transistor. Both types of ballistic transistors provide fast, low voltage programming. The control gates are used to override or suppress the various threshold voltages on associated floating gates, in order to program to and read from individual floating gates. The targets for this non-volatile memory array are to provide the capabilities of high speed, low voltage programming (band width) and high density storage.
Owner:HALO LSI DESIGN & DEVICE TECH

Process for making and programming and operating a dual-bit multi-level ballistic MONOS memory

A fast low voltage ballistic program, ultra-short channel, ultra-high density, dual-bit multi-level flash memory is described. The structure and operation of this invention is enabled by a twin MONOS cell structure having an ultra-short control gate channel of less than 40 nm, with ballistic injection which provides high electron injection efficiency and very fast program at low program voltages of 3~5V. The ballistic MONOS memory cell is arranged in the following array: each memory cell contains two nitride regions for one word gate, and ½ a source diffusion and ½ a bit diffusion. Control gates can be defined separately or shared together over the same diffusion. Diffusions are shared between cells and run in parallel to the side wall control gates, and perpendicular to the word line. The features of fast program, low voltage, ultra-high density, dual-bit, multi-level MONOS NVRAM of the present invention include: 1) Electron memory storage in nitride regions within an ONO layer underlying the control gates, 2) high density dual-bit cell in which there are two nitride memory storage elements per cell, 3) high density dual-bit cell can store multi-levels in each of the nitride regions, 4) low current program controlled by the word gate and control gate, 5) fast, low voltage program by ballistic injection utilizing the controllable ultra-short channel MONOS, and 6) side wall control poly gates to program and read multi-levels while masking out memory storage state effects of the unselected adjacent nitride regions and memory cells.
Owner:HALO LSI INC

High density interconnect module

A cost-effective packaging system (10) for ultra high density input/output (integrated circuits (14). The packaging system includes a first circuit chip (14) that has a first pattern of contacts (16) distributed across a surface area of the chip (14). The first pattern of contacts (16) represents input/output connections (16). A three-dimensional circuit (18) is disposed spatially parallel with respect to the first circuit chip (14) and organizes the input/output connections (16) into a second pattern of contacts (24, 30) suitable for connection to a second circuit (22). In a specific embodiment, the three-dimensional circuit (18) is a double sided DECAL (18). The double-sided DECAL (18) includes a substrate (18) having a first circuit pattern (28) spatially parallel with a second circuit pattern (30) on or in the substrate (18). The first and second circuit patterns (28 and 30) are interconnected. The first circuit pattern (28) has a third pattern of contacts (16) coincident with the first pattern of contacts (16) on the first circuit chip (14). The first circuit pattern (28) and/or the second circuit pattern (30) are ball grid arrays or coaxial connector arrays. The second circuit (22) is disposed spatially parallel with respect to the three-dimensional circuit (18). The second circuit (22) is a ceramic or laminate interposer that facilitates further organization of the input/output connections (16, 24). The interposer (18) includes a ball grid array (24) or a coaxial connector grid array (18) to facilitate the organization. A z-axis adhesive (20) is disposed between the interposer (22) and the three-dimensional circuit (18). A non-hermetic sealer (12) disposed over the first circuit chip (14).
Owner:RAYTHEON CO

Process for making and programming and operating a dual-bit multi-level ballistic flash memory

An fast program, ultra-high density, dual-bit, multi-level flash memory process, which can be applied to a ballistic step split gate side wall transistor, or to a ballistic planar split gate side wall transistor, which enables program operation by low voltage requirement on the floating gate during program is described. Two side wall floating gates are paired with a single word line select gate, and word lines are arranged to be perpendicular both the bit lines and control gate lines. Two adjacent memory cells on the same word line do not require an isolation region. Also, the isolation region between adjacent memory cells sharing the same bitline is defined by the minimum lithography feature, utilizing a self align fill technique. Adjacent memory cells on the same word line share bitline diffusion as well as a third poly control gate. Control gates allow program and read access to the individual floating gate. In addition to the dual-bit nature of the cell, density can be even further improved by multi-level storage. In one embodiment, the dual multi-level structure is applied to the ballistic step split gate side wall transistor. In a second embodiment, the dual multi-level structure is applied to the ballistic planar split gate side wall transistor. Both types of ballistic transistors provide fast, low voltage programming. The control gates are used to override or suppress the various threshold voltages on associated floating gates, in order to program to and read from individual floating gates. The targets for this non-volatile memory array are to provide the capabilities of high speed, low voltage programming (band width) and high density storage.
Owner:HALO LSI DESIGN & DEVICE TECH

Cooling method of heavy and medium plate controlled rolling intermediate blank

The invention belongs to a producing and cooling technique of rolled steel, relating to a cooling method of a heavy and medium plate controlled rolling intermediate blank, which can be realized by both a single-stand heavy and medium plate roll and a double-stand heavy and medium plate roll. The cooling method comprises the following steps of: transmitting a roughly rolled intermediate blank with the thickness range of 30-110 mm in an austenite recrystallization zone into an intermediate controlled cooling zone from a transmission roller way for rapidly cooling to 800-950 DEG C, and then transmitting the intermediate blank into the roll for rolling in a non- recrystallization zone after short-time air cooling and temperature evening. In the intermediate cooling process, an upper collecting pipe and a lower collecting pipe with high density or ultra-high density are adopted to impact, jet and cool the intermediate blank, and specific technological parameters are accurately controlled by a computer. Water is cooling water for the roll with the pressure of 0.3-1.0 MPa in a common water circulating system for workshops. The intermediate cooling holding time is 30-70% shorter than that of the conventional process so that the production efficiency is improved, and due to austenite grain refinement after intermediate controlled cooling, the mechanical properties of a steel plate can be improved.
Owner:UNIV OF SCI & TECH BEIJING

Ultra-high density oil-based drilling fluid and preparation method thereof

ActiveCN105623628AHigh breaking voltageExcellent emulsification stabilityDrilling compositionWater basedUltra high pressure
The present invention discloses an ultra-high density oil-based drilling fluid and a preparation method thereof. Oil-based drilling fluids in the prior art have the problems of poor emulsion stability and rheology, and easily lead to well wall chipping and collapsing, and blocking, long drilling cycle and other complex situations can be caused. The ultra-high density oil-based drilling fluid has a density of 0.93g / cm<3> to 2.80g / cm<3>, and comprises base oil, an emulsifier, a wetting agent, a tackifier, a filtrate loss reducer, a shear strength improving agent, an alkalinity adjusting agent, an aqueous solution of calcium chloride, a blocking agent, a weighting agent and the like, a formula and the preparation method of the ultra-high density oil-based drilling fluid are improved. The ultra-high density oil-based drilling fluid has good emulsifying stability and rheology, as well as mud shale strong inhibition, has the characteristics of small dosages of a variety of treatment agents, low preparation cost, high emulsion-breaking voltage, good rheology, low fluid loss, resistance to water, soil and salt and water-based drilling fluid and strong cement paste pollution performance and the like, and can be used in special drilling work in ultra-high pressure oil and gas wells, shale gas wells and strong water sensitive formation extended reach wells, horizontal wells and the like.
Owner:成都西油华巍科技有限公司 +1

Packaging method for very high density converters

Meeting todays requirement in power supply technology demands significant technological advancement in optimizing circuit topology, components and materials, thermal and packaging designs. These requirements are being pushed mainly by continuously increasing power density and efficiency requirements. Ultimately, these trends will come to a point whereby limitations from the above mentioned technological advancements is dependent on one of the above, which is the packaging design. To realize this dependence, we need to look at the growing power systems for modern equipment out there. Let us enumerate some of the available AC adapters in terms of power densities of a 45 W adapter. Firstly, square type architecture introduced by Apple is about 7 W/in3, considering the packaging has a profile limitation whereby its AC plug is removable thus occupying relatively bigger chunk of the volume. The next one is by Asus of similar profile to Apple incorporating the AC Plug eliminating the socket assembly in the packaging; which packs about 9 W/in3. Lastly, the typical rectangular profile by Eos which is about 7 W/in3. As for this particular embodiment it is about 40% smaller in profile, in contrast to the 45 W Apple packaging, with increase power density of about 12 W/in3. Packaging design method plays a great role in achieving the above requirements for a very high density converters.
Owner:ROMPOWER ENERGY SYST
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