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1248 results about "Very large scale integrated" patented technology

Definition of very large scale integration. : the process of placing a very large number (as thousands) of circuits on a small semiconductor chip —abbreviation VLSI.

Coolerless photonic integrated circuits (PICs) for WDM transmission networks and PICs operable with a floating signal channel grid changing with temperature but with fixed channel spacing in the floating grid

ActiveUS20050249509A1Requirements for a hermetically sealed package are substantially relievedEasy to controlLaser optical resonator constructionSemiconductor laser arrangementsElectro-absorption modulatorHermetic packaging
A coolerless photonic integrated circuit (PIC), such as a semiconductor electro-absorption modulator/laser (EML) or a coolerless optical transmitter photonic integrated circuit (TxPIC), may be operated over a wide temperature range at temperatures higher then room temperature without the need for ambient cooling or hermetic packaging. Since there is large scale integration of N optical transmission signal WDM channels on a TxPIC chip, a new DWDM system approach with novel sensing schemes and adaptive algorithms provides intelligent control of the PIC to optimize its performance and to allow optical transmitter and receiver modules in DWDM systems to operate uncooled. Moreover, the wavelength grid of the on-chip channel laser sources may thermally float within a WDM wavelength band where the individual emission wavelengths of the laser sources are not fixed to wavelength peaks along a standardized wavelength grid but rather may move about with changes in ambient temperature. However, control is maintained such that the channel spectral spacing between channels across multiple signal channels, whether such spacing is periodic or aperiodic, between adjacent laser sources in the thermally floating wavelength grid are maintained in a fixed relationship. Means are then provided at an optical receiver to discover and lock onto floating wavelength grid of transmitted WDM signals and thereafter demultiplex the transmitted WDM signals for OE conversion.
Owner:INFINERA CORP

Coolerless photonic integrated circuits (PICs) for WDM transmission networks and PICs operable with a floating signal channel grid changing with temperature but with fixed channel spacing in the floating grid

ActiveUS7636522B2Requirements for a hermetically sealed package are substantially relievedLaser optical resonator constructionSemiconductor laser arrangementsElectro-absorption modulatorPeak value
A coolerless photonic integrated circuit (PIC), such as a semiconductor electro-absorption modulator / laser (EML) or a coolerless optical transmitter photonic integrated circuit (TxPIC), may be operated over a wide temperature range at temperatures higher then room temperature without the need for ambient cooling or hermetic packaging. Since there is large scale integration of N optical transmission signal WDM channels on a TxPIC chip, a new DWDM system approach with novel sensing schemes and adaptive algorithms provides intelligent control of the PIC to optimize its performance and to allow optical transmitter and receiver modules in DWDM systems to operate uncooled. Moreover, the wavelength grid of the on-chip channel laser sources may thermally float within a WDM wavelength band where the individual emission wavelengths of the laser sources are not fixed to wavelength peaks along a standardized wavelength grid but rather may move about with changes in ambient temperature. However, control is maintained such that the channel spectral spacing between channels across multiple signal channels, whether such spacing is periodic or aperiodic, between adjacent laser sources in the thermally floating wavelength grid are maintained in a fixed relationship. Means are then provided at an optical receiver to discover and lock onto floating wavelength grid of transmitted WDM signals and thereafter demultiplex the transmitted WDM signals for OE conversion.
Owner:INFINERA CORP

Preparation method of high-thermal conductivity graphene-Sn-Ag composite brazing filler metal

The invention discloses a preparation method of a high-thermal conductivity graphene-Sn-Ag composite brazing filler metal, ad relates to a preparation method of a high-thermal conductivity composite brazing filler metal. The preparation method has the following purposes: the problem of graphene floating and agglomeration in the preparation and application process of the composite brazing filler metal is solved by reducing a greater density difference between graphene and an Sn-Ag brazing filler metal matrix through plating a metal on the graphene; meanwhile, the graphene is dispersed more uniformly in the brazing filler metal matrix; and the reliability of sealing and brazing is improved by improving the heat conductivity of the composite brazing filler metal through adding the graphene. The method comprises the following steps: (1) the metal is plated on the graphene; and (2) the ball milling, the mixing and the medium-temperature smelting are performed for the metal-plated graphene and the Sn-Ag brazing filler metal to obtain the high-thermal conductivity composite brazing filler metal. The prepared composite brazing filler metal is high in thermal conductivity, has a higher wettability compared with a traditional Sn-Ag brazing filler metal, and is a composite brazing filler metal accordant with the present development tendency of an electronic industry as a connecting material of traditional large-scale integrated circuits.
Owner:HARBIN INST OF TECH

Laminated structure, very-large-scale integrated circuit wiring board, and method of formation thereof

The laminated structure includes a substrate of low dielectric constant material of silicon compound and an electroless copper plating layer laminated thereon with a barrier layer. The barrier layer is interposed between the substrate and the copper layer, and the barrier layer is formed by electroless plating. And the laminated structure is characterized in that the barrier layer is formed on the substrate with a monomolecular layer of organosilane compound and a palladium catalyst which are interposed between the substrate and the barrier layer, the palladium catalyst modifies the terminal, adjacent to the barrier layer, of the monomolecular layer, and the barrier layer includes an electroless NiB plating layer which is disposed on the substrate side, and a electroless CoWP plating layer.The present invention makes it possible to coat the low dielectric constant material of silicon compound in a simple all-wet process with a firmly adhering barrier layer and an electroless copper plating layer as the wiring layer. the advantage of requiring. Thus, the laminated structure formed in this way includes a substrate of low dielectric constant material of silicon compound, a barrier layer, and a copper layer as the wiring layer formed by electroless plating, which firmly adhere to one another. In addition, the laminated structure is suitable for the copper wiring in a ULSI, particularly the one which is to be formed in a narrower trench than conventional one.
Owner:WASEDA UNIV
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