The invention discloses a
silicon-based high-mobility wide-band-gap
tin-based
oxide film, a preparation method thereof and a
transistor, and belongs to the technical field of low-power-consumption electronic devices. The preparation method of the
tin-based
oxide thin film provided by the invention comprises the following steps: firstly, sequentially preparing a sacrificial layer and a
single crystal tin-based
oxide thin film on a temporary growth substrate to obtain an oxide heterostructure; then preparing a supporting layer, and adhering the
single crystal tin-based oxide thin film by using the supporting layer to realize stripping of the
single crystal tin-based oxide thin film from the
single crystal substrate; and finally, transferring the single
crystal tin-based oxide thin film to the
silicon substrate to realize compatible integration of the single
crystal tin-based oxide thin film and the
silicon substrate. The single
crystal tin-based oxide thin film is transferred to the silicon substrate through a substrate-free transfer technology, dependence on a high-cost
specific substrate is eliminated, a mature silicon-based process is compatible, and a foundation is laid for large-scale
integrated circuit application; and finally, the
thin film transistor with low
power consumption, high performance and low cost is prepared, the cost
advantage is remarkable, and the application prospect is wide.