The invention belongs to the technical field of
chemical engineering, and particularly relates to a
system and a method for preparing electronic-grade
hydrogen fluoride by utilizing industrial-grade
sodium fluoride. The method comprises the following steps: taking industrial-grade
sodium fluoride as a
raw material, carrying out double
decomposition reaction on the industrial-grade
sodium fluoride and 98% industrial-grade concentrated
sulfuric acid in a'reaction-
filtration-
drying 'three-in-one reactor, and generating
anhydrous hydrogen fluoride gas and a sodium
hydrogen sulfate byproduct under the conditions that the temperature is 200-290 DEG C and the
sulfuric acid is excessive; byproducts are filtered by high-pressure
nitrogen, and
hydrogen fluoride residues are avoided after hot
nitrogen is dried, so that the production safety is remarkably improved. The generated
hydrogen fluoride gas sequentially passes through a '3A
molecular sieve + modified acid-resistant
molecular sieve 'synergistic adsorption column to deeply remove water, SO2, CO2 and other impurities (the
water content is less than or equal to 5ppm, and the content of SO2 and CO2 is less than or equal to 0.5 ppm), and then passes through a light component removal
tower and a heavy component removal
tower for two-stage rectification purification to remove H2, N2, O2 / Ar and other light components and heavy component impurities, and finally an electronic-grade
hydrogen fluoride product with the purity of 5N-8N (99.999%-99.999999%) is obtained. The method overcomes the defects of scarce raw materials and difficulty in
impurity removal of a traditional
fluorite method, is compact in equipment, low in leakage risk and controllable in
energy consumption and cost, solves the industrial problem of efficient purification of electronic-grade hydrogen fluoride, and is suitable for a
wafer processing technology in manufacturing of integrated circuits and super-large-scale integrated circuits.