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Oxygen plasma irradiation preparation method of ordered porous array of oxide micro-nano structure

A technology of micro-nano structure and oxygen plasma, which is applied in the field of ion plasma irradiation preparation, can solve the problems of affecting conductivity and device stability, large film on the substrate, unfavorable gas-sensing parameters, etc., and achieves easy operation and uniform thickness , the effect of expanding the application prospect

Active Publication Date: 2018-03-30
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Due to the difference between the thermal expansion coefficient of the film and the substrate, it is easy to cause large cracks in the film on the substrate during the process of synthesis (heating-cooling), which affects the conductivity and the stability of the device, which is not conducive to the gas sensitivity parameters. The control of the synthesis, that is, the repeatability of the synthesis is not good, and it is difficult to carry out practical application

Method used

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  • Oxygen plasma irradiation preparation method of ordered porous array of oxide micro-nano structure
  • Oxygen plasma irradiation preparation method of ordered porous array of oxide micro-nano structure
  • Oxygen plasma irradiation preparation method of ordered porous array of oxide micro-nano structure

Examples

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Effect test

Embodiment 1

[0028] Synthesis of Monolayer 2D Colloidal Crystal Templates:

[0029] (1) Ultrasonic cleaning of ordinary glass in acetone, ethanol, and deionized water for 30-40 minutes respectively, and drying with N2 gas, and cleaning with ozone ultraviolet for 30 minutes to obtain a super-hydrophilic glass surface;

[0030](2) Place the cleaned ordinary glass on a horizontal experimental workbench, take deionized water and evenly drop it on the glass to form a water film with a thickness of 0.2mm; put polystyrene microspheres with a mass percentage of 2.5% The suspension is dispersed in the same volume of ethanol, and the mixed solution is obtained after the dispersion is uniform; the mixed solution is slowly injected along the corner of the glass covered with deionized water film until the self-assembly of PS microspheres on the air / liquid interface is completed; control Ambient temperature to 30-40° C. is supplemented with weak air flow for drying to obtain a single-layer two-dimension...

Embodiment 2

[0034] A colloidal crystal template composed of polystyrene microspheres with a diameter of 500nm was prepared according to the method of Example 1;

[0035] Transfer and float the colloidal crystal template to the surface of the metal oxide precursor 0.05M tin tetrachloride solution, pick up the template soaked in the solution with a single crystal silicon wafer, place it flat for 5 minutes, and then dry it at 100°C 15 minutes; Then place the dried sample in an oxygen atmosphere in a plasma cleaning machine for 40 minutes of irradiation, the power is 10W, and the oxygen flow is 30sccm, to obtain the following: figure 1 The single-layer crack-free ordered hole array film shown in a. Compared with the method obtained by the annealing method, the film synthesized by this method is uniform and crack-free, and has better surface superhydrophilicity. By X-ray diffraction analysis, the phase of the film synthesized by the inventive method is tin dioxide of rutile phase, such as f...

Embodiment 3

[0037] A colloidal crystal template composed of polystyrene microspheres with a diameter of 1000nm was prepared according to the method of Example 1;

[0038] Transfer and float the colloidal crystal template to the surface of the metal oxide precursor 0.1M tin tetrachloride solution, pick up the template soaked in the solution with a single crystal silicon wafer and place it flat for 5 minutes, then place it in 110°C for drying 20 minutes; Then place the dried sample in an oxygen atmosphere in a plasma cleaning machine for 50 minutes of irradiation, the power is 18W, and the oxygen flow is 50sccm, to obtain the following: Figure 4 The shown single-layer crack-free ordered hole array film.

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Abstract

The invention discloses an oxygen plasma irradiation preparation method of an oxide micro-nano structure ordered porous array. It includes a two-dimensional colloidal crystal template method and a plasma irradiation method. The specific steps are as follows: a single-layer two-dimensional colloidal crystal template is synthesized by a gas / liquid interface assembly method. In particular, the template was transferred and floated to the surface of the 0.02‑0.2mol / L precursor solution, the template immersed in the solution was picked up and placed in an 80‑120ºC oven for 15‑30 minutes, followed by a plasma cleaner Irradiated in an oxygen atmosphere for 10-60min, and the plasma power was 5.8-18W. This method does not use any expensive special instruments and surface modifiers, and the preparation process is simple and fast, low cost, high efficiency, safe and environmentally friendly, and can be widely used in photonic crystals, micro / nano processing, catalysis, surface-enhanced Raman scattering, sensing and other fields.

Description

technical field [0001] The invention relates to a method for preparing an oxide micro-nano structure ordered porous array by oxygen plasma irradiation, especially a method for preparing an ordered porous film with less cracks. technical background [0002] Micro / nano-structure ordered porous film, containing periodic and ordered pores, the pore size is micron or submicron scale, and the pore wall or the surface characteristic units (nanoparticles, nanowires) on the single pore are nanoscale, Its structural units (pores) are evenly distributed on the film. Due to its high degree of order and high specific surface area, this thin film has important applications in many fields (such as: photonic crystals, cell culture, information storage, drug release, etc.), and has good compatibility with semiconductor processes. If it is used as a nano-device, not only the uniformity of the film thickness can be guaranteed, but also the uniform distribution of the structural units on the f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/23C04B41/50C04B41/85
Inventor 戴正飞李越贾丽超段国韬蔡伟平
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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