37 results about "Plasma irradiation" patented technology

The application belongs to the technical field of flame retardant materials, and particularly relates to a low-ion-precipitation type halogen-free flame retardant for electronic products and a preparation method thereof. The method uses a phosphorus-nitrogen type halogen-free flame retardant as raw material, first generates active sites on the surface of the flame retardant powder through low-temperature plasma irradiation, then generates a silane coupling agent containing a crown ether group in situ in anhydrous ethanol by pre-reaction of the silane coupling agent and a hydroxymethyl crown ether, adds deionized water to start hydrolysis and polycondensation, forms a crown ether functionalized polysiloxane crosslinking layer in situ on the surface of the particles, and finally drives the free sodium and potassium ions in the particles to diffuse outward and be selectively complexed, captured and fixed by the crown ether layer under the condition of ultrasonic-assisted warm water immersion washing. The application solves the problem of the deterioration of the electrical properties of a polymer insulating material in a humid heat environment caused by residual ion impurities of the flame retardant.

This disclosure describes methods for manufacturing hybrid metal / composite battery shells. The hybrid shells, which can be deep, can consist of a metallic (e.g., steel or aluminum alloy), cross-shaped sub-shell with four rounded polymer / fiber composite corner inserts attached to recessed corners of the sub-shell. Overlapping connection points can be co-molded. Overlapping metallic connection surfaces can be pre-treated by laser ablation and / or plasma irradiation to increase the bond strength between the overlapping metal and polymer / fiber composite surfaces. Mechanical locking features can be used to increase the bond strength. Hybrid metal / composite shells can be manufactured by compression molding of different parts using a mold and a press.Resin Transfer Molding (RTM) with thermosetting resin can be used for co-molding four fiber preform corner inserts onto the cross-shaped partial shell. Alternatively, thermoplastic polymer / fiber composite prepreg corner inserts can be attached to the cross-shaped partial shell by compression molding and curing.

To provide a pattern forming method for a resist underlayer film exhibiting excellent edge roughness by plasma irradiation in comparison to a conventional organic underlayer film pattern.SOLUTION: A pattern forming method includes: a process of forming a resist underlayer on a substrate; a process of forming a silicon-containing resist interlayer on the resist underlayer; a process of forming a resist upper layer on the silicon-containing resist interlayer; a process of forming a pattern on the resist upper layer; a process of forming a resist underlayer pattern by a plurality of times of etching using the resist pattern as a mask; and a process of irradiating the resist underlayer pattern with plasma, wherein a composition containing a resin having an aromatic ring is used as a composition for forming the resist underlayer, and a plasma by which the resist underlayer is less etched than by an etching gas used in the process of forming the resist underlayer pattern is used as the plasma for the plasma irradiation.SELECTED DRAWING: Figure 1

This plasma treatment system and method can be widely applied to any type or shape of object being treated with plasma, and eliminates the problems of cutting and attaching indicators during plasma treatment, as well as the problems of disposing of release paper and used indicators, while also providing flexibility to handle various plasma intensities. [Solution] A plasma processing system that irradiates an object to be processed with plasma, (1) A direct-liquid marker, which is a device loaded with plasma indicator ink, that applies an ink coating film whose optical properties change due to plasma irradiation to the workpiece and / or a peripheral member that is plasma-irradiated together with the workpiece, inside a plasma irradiation device, (2) A plasma irradiation device that irradiates the object to be processed and the surrounding members with plasma, (3) A measuring device for measuring the optical properties of the ink coating film that has been irradiated with plasma, (4) A removal device for removing the plasma-irradiated ink coating, A plasma processing system characterized by comprising the following features.

This invention discloses a plasma irradiation platform for simulating solar wind bombardment of aerospace-grade chips. This platform is designed to simulate the blinding effect of high-speed solar wind plasma particle streams on aerospace-grade electronic chips. Specifically, it relates to the fields of pulsed plasma sources and chip irradiation detection technology, including an irradiation host system, a multi-pulse high-voltage, high-current power supply, a power controller, a vacuum chamber, a vacuum pump assembly, a high-speed pulse intake valve, a stage, and a real-time chip failure monitoring system. This invention can be used to simulate the impact of multi-pulse high-speed plasma irradiation on aerospace-grade chips in space on chip failure. The target plasma generated by the plasma source designed in this invention has parameters close to those of solar wind plasma in a space environment, making it an effective means of simulating the blinding effect of this phenomenon on aerospace-grade electronic chips.

The invention discloses a blanket printing process which comprises the following steps: S1, collaborative pretreatment: carrying out low-temperature soft lustring on a blanket gray fabric to ensure that the surface fibers of the blanket gray fabric are consistent, and then carrying out low-temperature plasma irradiation treatment and digital printing: adopting a digital ink-jet printing mode, the blanket grey cloth treated in the step S1 and with the surface temperature maintained at 25-35 DEG C is subjected to pattern printing and stepped color fixing, specifically, the printed blanket is subjected to pre-color fixing for 5-10 min in a hot and humid environment at 45-55 DEG C and then transferred into saturated steam at 102-108 DEG C to be subjected to main color fixing, and efficient post-treatment is conducted; and finally, carrying out gradient heating and drying under a negative pressure condition at 65-75 DEG C. The low-temperature soft light has the beneficial effects that the fibers are oriented through low-temperature soft light, and a foundation is laid for uniform printing. According to low-temperature plasma treatment with a specific gas ratio, on the premise that fibers are not damaged, micro-etching can be carried out on the surfaces of the fibers, hydrophilic groups are introduced, and the wettability and permeability controllability of ink are greatly improved.

A plasma irradiation apparatus including a container configured to store a liquid to be treated; a plasma generating device configured to generate plasma to irradiate the liquid to be treated stored in the container; and a container temperature measuring instrument configured to measure a temperature of the container.

As an example, the present invention relates to a hybrid bonding method using an organic insulating layer as an insulating layer. In the hybrid bonding method using an organic insulating layer, there may be a difference in thermal expansion between a terminal electrode made of metal or the like and the organic insulating layer due to heating at the time of bonding, and it is necessary to provide a predetermined level difference D between a tip end surface of the terminal electrode and a surface of the organic insulating layer in advance. In the present invention, in order to provide the level difference D, the surface of the semiconductor substrate 100 is irradiated with plasma (e.g. argon plasma). In this plasma irradiation, an organic insulating layer 102 is etched with plasma such that a surface 102a of the organic insulating layer 102 of the semiconductor substrate 100 is on the farther side than a tip end surface 103a of an electrode 103.

The invention discloses a preparation method for bonding a patterned diamond and an inverted AlGaN / GaN high-electron-mobility transistor, and the method comprises the following steps: polishing the surface of the diamond, and reducing the surface roughness of the diamond; patterning the surface of the diamond; growing SiC on the surface of the patterned diamond and the top of the AlGaN / GaN high electron mobility transistor, wherein the interface of the SiC and the diamond / GaN is a coherent interface; and aligning and bonding the patterned diamond and the inverted AlGaN / GaN high-electron-mobility transistor by virtue of Ar plasma irradiation under high vacuum, so as to obtain the Diamond / AlGaN / GaN high-electron-mobility transistor. The near junction bonding shortens the heat dissipation path, the patterned diamond surface increases the heat dissipation contact area, the coherent interface and the SiC with high thermal conductivity are used as the intermediate layer to reduce the interface thermal resistance, and the method provided by the invention lays a research foundation for improving the heat dissipation performance of a new generation of high-frequency and high-power AlGaN / GaN high electron mobility transistor.

An object of the present invention is to provide a plasma processing apparatus for performing plasma processing on a fluid, which is capable of suppressing adhesion of by-products to an electrode unit and suppressing a decrease in plasma processing efficiency.SOLUTION: Plasma emitting device 100 according to the present invention is plasma processing device 100 for performing plasma processing on a fluid, and includes electrodes 20 including at least one 20a of one type of electrodes and at least one 20a of the other type of electrodes facing the 20b of the one type of electrodes, fluid feeder 30 for feeding the fluid toward electrodes 20, and liquid feeder 40 for feeding a liquid to electrodes 20.SELECTED DRAWING: Figure 1

A MXene membrane with gradient pores, its preparation method and application are provided. The MXene membrane with gradient pores, excluding the substrate, includes the following layers in sequence from bottom to top: an ultra large pore MXene membrane layer with a thickness of 0-30 nanometers (nm) and a pore size of 2-5 nm; a large pore MXene membrane layer with a thickness of 0-30 nm and a pore size of 0.9-1.2 nm; a medium pore MXene membrane layer with a thickness of 20-50 nm and a pore size of 0.6-0.8 nm; and a small pore MXene membrane layer with a thickness of 40-60 nm and a pore size of 0.3-0.5 nm. The present disclosure prepares the MXene membrane with gradient pores by repeating spin-coating and plasma irradiation while limiting the irradiation time.

The invention relates to the technical field of plasmas, and discloses a multi-sample plasma irradiation sample table and an irradiation sample fixing bracket thereof. The irradiation sample fixing support comprises a base, an installation assembly, a probe and a cooling assembly, the base is provided with a plurality of installation faces which are sequentially arranged around a rotating axis and connected, and the base can rotate around the rotating axis so that the different installation faces can directly face plasma beams. Therefore, a probe or different samples installed on the base through the first installation assembly or the second installation assembly can directly face the plasma beam, and plasma irradiation is achieved. Multiple samples can be irradiated without repeatedly destroying vacuum, so that the experiment efficiency is improved; meanwhile, plasma parameters of an irradiation area can be measured through the probe, and the experiment accuracy is improved. The multi-sample plasma irradiation sample table comprises a rotating mechanism and an irradiation sample fixing support, and the rotating mechanism drives the base to rotate so that the probe or different samples can directly face plasma beams.

The present application relates to a kind of super-hydrophobic polyester fabric and its preparation method.The fabric can be prepared by the following method: first, polyester fabric is carried out plasma irradiation pretreatment;Second, 2-(perfluorooctyl) ethyl methacrylate and ammonium persulfate are prepared into finishing liquor;Finally, polyester fabric is reacted in finishing liquor, and super-hydrophobic polyester fabric is prepared.The super-hydrophobic polyester fabric prepared by the present application contains low surface energy substance fluorine element on the surface, and the apparent contact angle of water droplet on the surface of polyester fabric ranges between 153°-158°, which shows good super-hydrophobicity;After 10 times washing, the hydrophobic property of polyester fabric is still not obviously weakened.

The invention discloses a temperature stress detection system based on a Bragg grating fiber sensor. The temperature stress detection system comprises a plasma generation system and a temperature strain measurement system, according to the plasma generation system, a helicon wave plasma generator is arranged in an irradiation chamber, and working gas is provided for a plasma generation area in the irradiation chamber; spreading the helicon wave plasma to the sample to be detected in the irradiation chamber along the axial direction; the temperature strain measurement system comprises a strain gauge measurement acquisition instrument, a Bragg grating demodulator, a strain gauge measurement acquisition instrument and a thermocouple measurement acquisition instrument which are used for detecting a to-be-measured sample; and the temperature and strain measurement system is used for detecting the temperature and strain of the to-be-tested sample during the irradiation test. The invention discloses a temperature stress detection system and detection method based on a Bragg grating fiber sensor, which realize in-situ measurement under a plasma irradiation condition and have the functions of strong anti-electromagnetic interference capability, strong expandability and wide application range.

The invention relates to a method for forming a metal-containing film pattern. The purpose of the present invention is to provide a method whereby a pattern having good edge roughness can be formed on a film to be processed by using a metal-containing film pattern irradiated with plasma as an etching mask. In the present invention, provided is a method for forming a pattern on a substrate, the method comprising the steps of: (I-1) applying a metal-containing film-forming composition on a substrate on which a film to be processed is formed, and then performing heat treatment to form a metal-containing film; (I-2) forming a pattern directly or indirectly on the metal-containing film; (I-3) performing plasma irradiation on the metal-containing film pattern; and (I-4) using the metal-containing film pattern irradiated by the plasma as an etching mask to directly or indirectly form a pattern on the film to be processed.

The invention discloses a NiO and Ni (OH) 2 heterostructure oxygen evolution electrocatalyst and a preparation method and application thereof. Air plasma is adopted to irradiate the surface of the Ni (OH) 2 nanosheet growing on the foamed nickel in situ, the high-energy air plasma enables part of Ni (OH) 2 to be subjected to a dehydration reaction to generate NiO, the surface of the nanosheet is promoted to be rapidly reconstructed into a NiO and Ni (OH) 2 heterostructure, meanwhile, high-price Ni < 3 + > is generated, and the lattice oxygen mechanism is more easily excited. In a 1 mol L <-1 > KOH solution, compared with Ni (OH) 2, the overpotential of NiO and Ni (OH) 2 is reduced by 124 mV (at 50 mA cm <-2 >) and 155 mV (at 100 mA cm <-2 >); the Tafel slope is 80.42 mV * dec-1, which is far lower than the Tafel slope of 182.70 mV * dec-1 of Ni (OH) 2; and the turnover frequency is 0.1112 s <-1 > (at 370 mV), which is about 6.2 times of that of Ni (OH) 2 (0.0179 s <-1 >). The results show that the OER activity of the NiO and Ni (OH) 2 heterostructure formed by air plasma irradiation can be greatly improved. In addition, the NiO-coated Ni (OH) 2 self-supporting electrode also shows excellent alkaline oxygen evolution stability.

To provide a method for manufacturing a workpiece with a film-like adhesive, a method for manufacturing a workpiece with a cured adhesive, a film-like adhesive, and a film-like adhesive composite sheet, which can reduce the amount of gouging in the recess of the side wall of the cut film-like adhesive when the film-like adhesive is cut by plasma irradiation compared to conventional methods. [Solution] A method for manufacturing a workpiece with a film-like adhesive, comprising the steps of: irradiating the film-like adhesive exposed between multiple workpieces 90 with energy rays to form an adhesive cured product 132; irradiating the adhesive cured product 132 exposed between the workpieces 90 with plasma to dry etch the adhesive cured product 132 and cut the film-like adhesive 13 along the workpieces 90, wherein the film-like adhesive 13 contains an energy ray curable component (c).

The invention relates to a one-way moisture-conducting cellulose woven fabric as well as a preparation method and application thereof. The invention provides a preparation method of a one-way moisture-conducting cellulose woven fabric, which comprises the following steps: (1) soaking cellulose weft yarns in a water repellent solution, then taking out the cellulose weft yarns, dehydrating and drying the cellulose weft yarns in sequence to obtain fabric weft yarns, and weaving the fabric weft yarns and cellulose warp yarns into a fabric blank; pre-shaping the fabric blank to obtain a pre-shaped fabric; (2) performing plasma irradiation on the warp surface of the preset fabric to obtain the irradiated fabric; the irradiated fabric is soaked in a hydrophilic agent solution, then the fabric is taken out, dewatering and drying are conducted in sequence, and the cellulose woven fabric with the one-way moisture guiding function is obtained. According to the preparation method, the one-way moisture guiding capacity of the cellulose woven fabric is improved, the better wet one-way transmission performance of the fabric is achieved, the wet sticky feeling of the products is improved, the wet comfort of the fabric is improved, and the preparation method is environmentally friendly and has wide application prospects.

This invention discloses a plasma-irradiated porous MXene membrane, its preparation method, and its application, belonging to the field of separation membrane material technology. The method includes the following steps: spin-coating an aqueous dispersion of MXene nanosheets onto a substrate, drying it, and then subjecting it to plasma irradiation to create pores. Repeating the spin-coating, drying, and plasma irradiation steps yields the porous MXene membrane. This invention also discloses the porous MXene membrane prepared by the above method and its application in gas separation. The pore size of the porous MXene membrane obtained by plasma irradiation can be controlled within the range of H2 / CO2 molecular dynamic diameters. Effective in-plane and interlayer dual-stage gas sieving channels endow the porous MXene membrane with ultra-high gas permeability and excellent selectivity.

The invention discloses a hydrophobic membrane, a preparation method of the hydrophobic membrane and a treatment method of high-salt radioactive wastewater. The hydrophobic membrane comprises a polymer, and the polymer comprises polyvinylidene fluoride; the hydrophobic membrane is a hydrophobic membrane subjected to CF4 plasma irradiation treatment. The hydrophobic membrane has high interception performance, the treatment method can achieve the volume minimization of radioactive waste, meanwhile, the purification liquid can reach the natural background radioactivity level, efficient treatment of salt-containing radioactive waste water is achieved, and the treatment method is simple and convenient to operate.

This infrared thermometry method is applicable to materials in certain extreme plasma environments and belongs to the field of temperature measurement of materials in high-temperature plasma environments, such as tokamak. The method employs a multi-band colorimetric infrared camera, filters, a thermocouple temperature measurement system, a vacuum chamber, a temperature-controlled heating stage (containing the sample), and a distance and angle measurement system. This method effectively eliminates the interference of plasma on infrared thermometry, avoids the dependence on emissivity of traditional infrared thermometry methods by utilizing image reproduction, and eliminates the need for sample preparation and calibration in complex plasma environments. Only the sample after plasma irradiation needs to be protected. While ensuring accuracy, it greatly reduces the workload of multi-band infrared thermometry calibration and significantly reduces the interference of heat accumulation phenomena on temperature measurement in extreme plasma environments.

The invention relates to a pattern forming method. Provided is a method for forming a resist underlayer film pattern which exhibits excellent edge roughness compared to a conventional organic underlayer film pattern by performing plasma irradiation. The invention provides a pattern forming method. The method includes forming a resist underlayer film on a substrate, forming a silicon-containing resist intermediate film on the resist underlayer film, forming a resist upper layer film on the silicon-containing resist intermediate film, forming a pattern on the resist upper layer film, and forming a resist underlayer film pattern by a plurality of times of etching using the resist pattern as a mask. Subjecting the resist underlayer film pattern to plasma irradiation; the resist underlayer film is etched less than the resist underlayer film in the step of forming the pattern of the resist underlayer film by using a resin containing an aromatic ring as the composition for forming the resist underlayer film and using an etching gas used in the step of forming the pattern of the resist underlayer film as the plasma used in the plasma irradiation.

To provide a nozzle of a plasma irradiation device having a structure in which plasma is emitted from the nozzle, capable of performing plasma treatment on a long treatment object more uniformly, and a plasma irradiation device using the nozzle.SOLUTION: A nozzle 2 is provided with a cylindrical jig portion 23 having an opening at at least one end in an axial direction for inserting and removing an object to be processed. The jig portion 23 has a through-hole 23a formed for guiding plasma into the jig portion 23, causing the plasma flow to swirl within the jig portion 23.SELECTED DRAWING: Figure 2

The application discloses a kind of photo plasma generating device and clothes processing equipment, the photo plasma generating device includes: shell, gas chamber is formed in the shell;Photo plasma tube, for the gas in gas chamber is irradiated;Connecting pipeline, the air inlet end of the connecting pipeline is communicated with the gas outlet of gas chamber;Plugging piece, for controlling connecting pipeline and gas chamber communication or disconnect, the plugging piece can reciprocate along the inside of connecting pipeline.This application, photo plasma irradiation air in gas chamber to form sterilization gas, by sterilization gas to drive plugging piece to open connecting pipeline, realize connecting pipeline and gas chamber communication, to control photo plasma generating device to input sterilization gas to clothes processing equipment inside, realize to clothes sterilization and deodorization, the structure of plugging piece is simple, easy to operate, reduce the use amount of parts, reduce production cost.

The invention relates to a super-hydrophobic spandex fabric and a preparation method thereof. The fabric can be prepared by adopting the following method: firstly, extracting low-surface-energy substances from lotus leaves; secondly, performing plasma irradiation treatment on the spandex fabric; thirdly, dissolving a low surface energy substance in dimethylformamide to prepare a spinning solution; and finally, spraying the spinning solution on the surface of the spandex fabric by adopting an electrostatic spinning technology to prepare the super-hydrophobic spandex fabric. The surface of the prepared super-hydrophobic spandex fabric contains low-surface-energy substances in lotus leaves, the apparent contact angle range of water drops on the spandex fabric ranges from 155 degrees to 158 degrees, and the super-hydrophobic spandex fabric shows good super-hydrophobicity; after 10 times of water washing, the hydrophobicity of the spandex fabric is still not obviously weakened.

This invention discloses a plasma irradiation sample stage in a vacuum environment, belonging to the field of fusion reactor material irradiation and testing. It includes a sample holder, a rotating mechanism, a sample clamping device mounted on the sample holder, and a rotating mechanism that drives the sample holder to rotate, thereby changing the attitude of the sample mounted thereon. The sample holder has a water box with a notched partition inside. Two thermocouples are mounted on both sides of the water box. The thermocouples and the sample are in contact through an insulating plate and graphite paper placed between them, achieving insulated clamping of the sample without affecting the cooling of the sample by the water box. The clamping device faces the plasma, is at the same potential as the sample, and is insulated from the sample holder. It is also larger than the sample holder and is fixed to the water box by molybdenum screws and silicon carbide insulating rings. Simultaneously, a bias voltage is applied to the sample through a plasma baffle via a bias column. This invention can simultaneously achieve the functions required for material samples during plasma irradiation, including sample insulation, cooling, temperature measurement, bias voltage application, and attitude adjustment.

The present invention is a patterning process including the steps of: forming a resist underlayer film on a substrate; forming a silicon-containing resist middle layer film on the resist underlayer film; forming a resist upper layer film on the silicon-containing resist middle layer film; forming a pattern in the resist upper layer film; forming a resist underlayer film pattern by etching multiple times while using the resist pattern as a mask; and subjecting the resist underlayer film pattern to plasma irradiation, where the composition for forming the resist underlayer film contains a resin having an aromatic ring, and a plasma used in the plasma irradiation etches the resist underlayer film less than an etching gas used in the step of forming the resist underlayer film pattern. This can provide a method for forming a resist underlayer film pattern that exhibits better edge roughness than a conventional organic underlayer film pattern by performing plasma irradiation.

The invention belongs to the technical field of cosmetics, and provides environment-friendly intelligent response water-based nail polish and a preparation method thereof. The compound hydrolyzed pearl protein and the tea polyphenol nano-liposome are used for replacing a synthesized film-forming agent and a chemical preservative to synergistically enhance the health protection of nails; the temperature-variable cholesteric liquid crystal and the light-variable titanium dioxide mica are introduced to realize environmental response color change; the compatibility of the material is improved by combining reprocessed plastic particles with plasma pretreatment; and finally, the super-hydrophobic wear-resistant layer is formed through low-temperature plasma irradiation. The product integrates natural active ingredients, intelligent interaction and ecological cycle technologies, and provides a safe and lasting multifunctional beauty makeup solution.

The invention discloses a diamond-like carbon layer film coated seawater oxygen evolution electrocatalyst as well as a preparation method and application thereof. Methane gas plasma irradiation is adopted, the surface of a NiFe-LDH nanosheet growing on foamed nickel in situ is rapidly reconstructed into NiFeOOH, and meanwhile a diamond-like carbon film covering layer is generated on the surface of the NiFe-LDH nanosheet. Strong electron interaction exists between the ultrathin diamond-like carbon layer and transition metal Ni and Fe in the catalyst structure, the catalytic performance of the transition metal can be improved, the diamond-like carbon film can prevent Cl from entering a catalytic interface, the adverse effects such as oxidation of Cl on an anode and erosion of the anode are effectively inhibited, and the catalytic performance of the catalyst is improved. And the OER catalytic performance and durability of the catalyst in an alkaline seawater medium are obviously improved. The catalyst shows excellent OER performance and durability under the normal temperature condition of alkaline simulated seawater (1 mol.L1 KOH + seawater) and the industrial condition of alkaline seawater (6 mol.L1 KOH + seawater, 60 DEG C and 500 mA * cm < 2 >).

To provide a method for manufacturing a workpiece with a film-like adhesive, a method for manufacturing a workpiece with a cured adhesive, a film-like adhesive, and a film-like adhesive composite sheet, which enable faster etching than conventional methods when cutting the film-like adhesive by plasma irradiation. [Solution] A method for manufacturing a workpiece with a film-like adhesive, comprising the steps of irradiating a film-like adhesive 13 exposed between multiple workpieces 90 with plasma from the side of the multiple workpieces 90 to dry etch the film-like adhesive 13 and cut the film-like adhesive 13 along the workpieces 90, wherein the film-like adhesive 13 contains a compound (c) having at least two radical-reactive groups.