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46 results about "Local irradiation" patented technology

Simple calculation method of target laser scattering characteristics under local irradiation

ActiveCN106770045ACalculation of Scattering Cross SectionEasy and fast scattering cross sectionScattering properties measurementsTarget surfaceScattering cross-section
The invention discloses a simple calculation method of target laser scattering characteristics under local irradiation, and belongs to the technical field of target detection, recognition, and stealth. By modifying the parameters of view-frustum, the simple calculation of scattering cross-section of a target laser radar under local irradiation can be realized. The method comprises the following steps: at first, obtaining the bidirectional reflectance distribution function of a target surface material; establishing a geometric model of a complicated target; reading the target geometric model file, according to the size and position of an irritation laser spot, setting the parameters of view-frustum; calling an OpenGL function to carry out target rendering and blanking to realize real-time display of a target under local irradiation; and finally obtaining each parameter of a target laser radar scattering cross-section calculation formula to complete the target laser radar scattering cross-section imitation calculation under local irradiation. Compared with the conventional algorithms, the adopted algorithm is easy to operate and is flexible; the size and irritation position of the irritation laser spot can be easily modified; and the target laser radar scattering cross-section imitation calculation can be realized under laser overall/local irradiation.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Baking lamp for surgical nursing

The invention provides a baking lamp for surgical nursing, and effectively solves the problems that an existing baking lamp is immobile during use, so that irradiation is non-uniform; scalds are possibly caused by excessive baking; a therapeutic effect is not realized possibly due to insufficient local irradiation. The baking lamp for surgical nursing is characterized by comprising a medical baking lamp main body; a supporting plate is fixed to the main body; a rotating shaft is arranged on the supporting plate; a shell is arranged at the lower end of the rotating shaft; a vertical barrel is arranged on the rotating shaft; a movable barrel is arranged at the lower end of the vertical barrel; an annular plate is arranged at the lower end of the movable barrel; two electrodes are arranged atthe lower end of the annular plate; first cylinders are arranged on the periphery of the shell; one sides of the first cylinders are provided with second cylinders; third cylinders are arranged on the first cylinders; one ends of the second cylinders are provided with revelation light covers; baking lamp bodies are arranged in the light covers; the upper side plate of the shell is provided with aplurality of groups of contacts; each group contains two contacts. The baking lamp for surgical nursing is ingenious in structure; the distance between the baking lamp and a wound can be adjusted; the wound is irradiated omni-directionally; uniform irradiation can be performed on the wound effectively; insufficient irradiation or scalds can be avoided; harm to tissues and the wound caused by excessive baking can be prevented.
Owner:HENAN PROVINCE HOSPITAL OF TCM THE SECOND AFFILIATED HOSPITAL OF HENAN UNIV OF TCM

Local paint baking device for mechanical equipment production

The invention discloses a local paint baking device for mechanical equipment production, and relates to the technical field of mechanical equipment production. The local paint baking device comprisesa base; a paint baking chamber is arranged at the upper end of the base; a rotating frame is arranged at the upper end of the inside of the paint baking chamber; an electric lifting rod is connected at the lower end of the rotating frame; a baking lamp is connected at the lower end of the electric lifting rod; and a fine adjustment mechanism is further arranged between the electric lifting rod andthe baking lamp. According to the local paint baking device, under the actions of the rotating frame and the electric lifting rod, the baking lamp is adjusted vertically and transversely, and in cooperation with the action of the fine adjustment mechanism, the longitudinal irradiation angle of the baking lamp can be adjusted, so that local irradiation of the baking lamp to irregular mechanical equipment is realized; through cooperation of a rotating disk and a limiting mechanism, the mechanical equipment can be limited and fixed conveniently, and the condition that the paint baking effect isaffected by shaking of the mechanical equipment during paint baking is avoided; and the local paint baking device is convenient to operate, high in adjustment precision and better in local paint baking effect on the mechanical equipment.
Owner:王莹燕

Target area adjustable type batch animal ionizing radiation local irradiation fixing and shielding device and method thereof

The invention discloses a target area adjustable type batch animal ionizing radiation local irradiation fixing and shielding device. The device comprises an animal fixing part and a ray shielding part, wherein the animal fixing part comprises an animal anesthesia fixing table, and the ray shielding part comprises a ray shielding table; an anesthesia induction box and a batch animal fixing box arearranged on the table top of the animal anesthesia fixing table; a transverse adjusting and controlling shielding device, an up-down adjusting and controlling shielding device and a transverse-longitudinal scale division plate are arranged on the table top of the ray shielding table; the transverse adjusting and controlling shielding device blocks redundant rays in the horizontal direction, and afirst gap with the adjustable size and position in the direction perpendicular to the ground is exposed; the up-down adjusting and controlling shielding device blocks redundant rays in the direction parallel to the ground, and a second gap with the adjustable size and position in the direction parallel to the ground is exposed; a rectangular area, namely an irradiation field, is formed at the intersection of the two gaps; through stepped connection, leakage caused when the rays pass through the transverse arrangement position of a shielding block is blocked, and incomplete blocking is avoided;and the position and area of the irradiation area are flexible, adjustable and accurate in irradiation.
Owner:THE NAVAL MEDICAL UNIV OF PLA

Bone injury adjuvant therapy device based on infrared therapy

The invention provides a bone injury adjuvant therapy device based on infrared therapy. The problems that an infrared therapeutic apparatus needs to adjust the angle for multiple times to prevent the skin of a patient from being scalded, and operation is complex are solved. The bone injury adjuvant therapy device comprises a base, wherein a semicircular plate is hinged to the top of the base; a snakelike groove penetrates through the side wall of the semicircular plate; a therapy sliding block is installed in the snakelike groove in a sliding mode; a snakelike rack is fixedly installed on the outer side face of the semicircular plate along one side of the snakelike groove; a therapy gear meshed with the snakelike rack is rotationally installed at the top of the therapy sliding block; a therapy motor is fixedly installed at the bottom of the therapy sliding block; a rotating shaft of the therapy motor penetrates through the therapy sliding block to be fixedly connected with the therapy gear; an infrared therapeutic apparatus is fixedly installed at the bottom of the therapy motor; and multiple temperature sensors are fixedly installed on the inner side face of the semicircular plate. By means of the infrared therapeutic apparatus circularly moving in the snakelike groove, the irradiation position and angle of the skin of the patient can be automatically adjusted while infrared therapy is conducted on the skin of the patient, and the patient can be prevented from being scalded during long-time local irradiation.
Owner:ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY

Preparation method of interdigitated back contact solar cell

The invention provides a preparation method of an interdigitated back contact solar cell. The damage removing and cleaning process is performed on a silicon substrate; a local emitter and a back surface field are formed on the back surface; the front surface is textured; a front surface field is prepared; front passivation antireflection and back passivation are performed; the back surface is patterned so as to form an electrode paste layer including conductive material; the first thermal treatment process is performed; the second thermal treatment process is performed, wherein the laser localirradiation treatment process is used in the second thermal treatment process, and the laser local irradiation treatment process is to perform local irradiation on the electrode paste layer; and theelectrode and the semiconductor are enabled to form local contact through laser local irradiation treatment so that the influence of composite metal on the cell performance can be effectively reduced.The sintering temperature can be reduced, the cell sintering process window can be expanded and the optimal passivation performance and the contact performance can be simultaneously realized so thatthe better cell conversion efficiency can be achieved; and perforating in advance and other complex process flow can be omitted.
Owner:TAIZHOU LERRISOLAR TECH CO LTD

Oven Lamps for Surgical Nursing

The invention provides a baking lamp for surgical nursing, and effectively solves the problems that an existing baking lamp is immobile during use, so that irradiation is non-uniform; scalds are possibly caused by excessive baking; a therapeutic effect is not realized possibly due to insufficient local irradiation. The baking lamp for surgical nursing is characterized by comprising a medical baking lamp main body; a supporting plate is fixed to the main body; a rotating shaft is arranged on the supporting plate; a shell is arranged at the lower end of the rotating shaft; a vertical barrel is arranged on the rotating shaft; a movable barrel is arranged at the lower end of the vertical barrel; an annular plate is arranged at the lower end of the movable barrel; two electrodes are arranged atthe lower end of the annular plate; first cylinders are arranged on the periphery of the shell; one sides of the first cylinders are provided with second cylinders; third cylinders are arranged on the first cylinders; one ends of the second cylinders are provided with revelation light covers; baking lamp bodies are arranged in the light covers; the upper side plate of the shell is provided with aplurality of groups of contacts; each group contains two contacts. The baking lamp for surgical nursing is ingenious in structure; the distance between the baking lamp and a wound can be adjusted; the wound is irradiated omni-directionally; uniform irradiation can be performed on the wound effectively; insufficient irradiation or scalds can be avoided; harm to tissues and the wound caused by excessive baking can be prevented.
Owner:HENAN PROVINCE HOSPITAL OF TCM THE SECOND AFFILIATED HOSPITAL OF HENAN UNIV OF TCM

Laser etching method of MEMS silicon structure

The invention belongs to the technical field of microprocessing, and relates to a laser etching method of an MEMS silicon structure. The laser etching method comprises the following steps: a laser beam conducts local irradiation on the surface of a silicon material through an objective lens, and the silicon material absorbs part of energy and then is heated; the surface of an irradiation area is molten into a molten area, part of the molten silicon material is vaporized into a smoke plume and molten splashes, and the molten part is scattered on the processed surface of the silicon material toform solid splashes; and laser irradiation is completed, the silicon material is condensed, and heat affected areas and cracks appear on the irradiation area of the silicon material. Under the condition that the average power and pulse width of the laser beam are not changed, influences of recast layers and pollution of the surrounding splashes can be reduced by decreasing the repetition frequencyof a laser device and increasing single-time pulse energy; through defocusing amount compensation, the maximum local irradiation intensity and the minimum etching diameter are obtained, and etching splashing is relieved; and through an auxiliary vacuum environment, dissipation in the laser transmitting process is reduced, the relatively-high irradiation intensity is obtained, and the heat affected areas are reduced.
Owner:BEIJING AUTOMATION CONTROL EQUIP INST
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