Optical lighting device and optical modification equipment

Abstract

The invention discloses an optical lighting device and optical modification equipment, the optical lighting device comprises two line light sources and a scanning reflection part, the scanning reflection part is provided with two reflection surfaces, each line light source is provided with a light modulation part, and the light modulation part is provided with a light source. The light modulation component is used for modulating light rays emitted by the line light source into parallel light and homogenizing the parallel light to form light bands with set lengths, and the two reflecting surfaces are respectively used for receiving the two light bands and reflecting the two light bands to a working surface of the same processing piece; the device further comprises a driving part, the driving part is used for driving the scanning reflection part to move in a reciprocating mode in the set direction, and the set direction is parallel to the working face. The structural arrangement of the optical lighting device can improve the local irradiation energy density, so that the total auxiliary energy borne by different areas of the target working face is relatively uniform, and meanwhile, the productivity can be improved.

Description

technical field [0001] The invention relates to the technical field of optical modification treatment, in particular to an optical lighting device and optical modification equipment. Background technique [0002] The optical modification of thin films in the semiconductor industry, or the optical modification of thin films in the LED and flat panel display industries, is usually carried out using optical modification equipment. [0003] Taking ultraviolet light modification equipment as an example, its ultraviolet lighting device generally adopts the scheme of surface light source to assist the rotation of the lighting head. In engineering design, one or two ultraviolet lamp tubes are used as the light source to cooperate with the optical path design to achieve the effect of surface light source. The irradiance intensity of such a surface light source on different areas of the target working surface is very different, and the time integral of the local light intensity on the...

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Problems solved by technology

[0003] Taking ultraviolet light modification equipment as an example, its ultraviolet lighting device generally adopts the scheme of surface light source to assist the rotation of the lighting head. In engineering design, one or two ultraviolet lamp tubes are used as the light source to cooperate with the optical path design to achieve the effect of surface light source. The irradiance intensity of such a surface light source on different areas of the target working surface is very different, and the time integral of the local light intensity on the working surface can only be achieved by rotating the lighting head to achieve a certain uniformity, that is, the working surface is uniform during the entire process. The total irradiance metering in the upper local area is close to uniform, and it is difficult to achieve better uniformity in practice

[0004] Since the uniformity of the overall irradiance intensity of the surface light source is poor when the lighting head does not rotate, for the working surface receiving light treatment, different areas have different queuing effects. In actual settings, the rotation speed of the lighting head is relatively slow , resulting in a significant queuing effect

[0005] In addition, in practical applications, due to the uniformity adjustment of the surface light source, part of the light emitted by the ultraviolet lamp is discarded. Under normal circumstances, the effective utilization rate of light is about 40% to 50%, and the energy efficiency ratio is poor. In terms of light processing of wafers, one wafer needs to be equipped with two lamps, which directly pushes up the cost

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