The application relates to the technical field of photovoltaic
monocrystalline silicon preparation, in particular to a
silicon rod growing method. The
silicon rod growing method provided by the application comprises the following steps: S1, using a
zone melting method to prepare a
monocrystalline silicon base rod; the
monocrystalline silicon base rod is sequentially subjected to
ion doping and annealing, a first
doping area is formed at the head and
tail of the monocrystalline
silicon base rod, and a primary mother
alloy rod is obtained; S2, the primary mother
alloy rod is
cut into a silicon core, the silicon core is uniformly mixed with high-purity intrinsic
polycrystalline silicon fragments, and a secondary
doping material is obtained; S3, high-purity intrinsic
polycrystalline silicon blocks are laid in a main
crucible, and then the secondary doping material is laid on the surface of the high-purity intrinsic
polycrystalline silicon blocks; and then heating and
crystal growth are sequentially performed. The method realizes high uniform distribution of the
dopant in the
molten silicon body, introduces less impurities, and can meet the requirements of the BC battery on high uniformity of the monocrystalline silicon resistivity,
low oxygen content and high minority
carrier lifetime.