The application provides a preparation method of nanometer
silicon, which comprises the following steps: mixing a reducing
metal and
silicon halide, heating under a sealed condition to maintain the reducing
metal in a
molten state, stirring, and obtaining a
reaction product; mixing the
reaction product with a higher
alcohol with hydrophobicity and then standing to obtain a reaction mixture; mixing the reaction mixture with water and stirring, standing to form a
water layer and a hydrophobic colloidal layer, obtaining the hydrophobic colloidal layer, and
drying to obtain nanometer
silicon. The application is based on a
molten metal reduction method, uses active reducing
metal and silicon
halide as raw materials, heats to maintain the reducing metal in a
molten state in the reaction process, and reacts with the silicon
halide to prepare nanometer silicon. Then, the prepared nanometer silicon is protected and separated by using the method of higher
alcohol grafting. The higher
alcohol can reduce the activity of the surface of the nanometer silicon, prevent the nanometer silicon from being oxidized in the process of air or
water washing, and reduce the generation of
silicon oxide impurities.