The invention belongs to the technical field of
optical communication, and particularly relates to a high-concentration
erbium-doped high-brightness communication band
silicon-based light-emitting film and a preparation method thereof. According to the invention, HSQ is taken as a
solvent,
erbium nitrate pentahydrate is taken as a source of
erbium element, and the erbium-doped
silicon-based luminescent film with high brightness is obtained through co-
doping of
ytterbium ions and independent
silicon quantum dots, stirring, spin-
coating and high-temperature annealing. The HSQ
photoresist is used as a precursor material for preparing the silicon nanocrystalline thin film, and after erbium is doped, high-temperature annealing is carried out, so that the formed thin film contains a large amount of silicon nanocrystalline. The
silicon nanocrystal serves as a sensitizer in the
energy transfer process, absorbs incident
photon energy and then transfers and activates
erbium ions, and
photoluminescence with the emission center
wavelength being 1.54 microns is achieved. According to the method, a large number of defects generated by an
ion implantation method are avoided, the high vacuum degree does not need to be maintained, the prepared erbium-doped thin film has the
advantage that the concentration of
silicon nanocrystals serving as an erbium light-emitting sensitizer is high, the preparation steps are simple, and operation is safe.