Method for preparing silicon nanocrystalline with optical gain which can be improved by high-pressure hydrogen passivation
A silicon nanocrystal, high-pressure hydrogen technology, applied in chemical instruments and methods, nanotechnology, inorganic chemistry, etc., can solve the problems of destroying the structure of the light-emitting layer, increasing the quenching center, structural defects, etc., to achieve the effect of improving light gain
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Embodiment 1
[0030] 1. Raw material and formula
[0031] Substrate: polished on both sides, volume is 10×10×0.1mm 3 High temperature resistant quartz substrate;
[0032] Precursor material: Dow Corning FOx-1x and FOx-2x Flowable Oxides, Dow Corning Corporation;
[0033] Substrate cleaning solution: alcohol (analytical grade), Sinopharm Chemical Reagent Co., Ltd.;
[0034] 2. Process parameter setting
[0035] Film throwing conditions: room temperature, clean environment;
[0036] Annealing temperature: 1000°C;
[0037] Annealing time: 50 minutes
[0038] Subsequent cooling parameters: in-tube cooling after power failure, 1 hour
[0039] Passivation temperature: 100°C
[0040] Passivation duration: 24, 72, 120, 240 hours;
[0041] 3. Production device
[0042] VD650 ultra-clean workbench, Suzhou Su Clean Equipment Co., Ltd.
[0043] SK2-4-12 program-controlled tubular resistance furnace, Shanghai Shiyan Electric Furnace Co., Ltd.
Embodiment 2
[0053] 1. Raw material and formula
[0054] Substrate: polished on both sides, volume is 20×20×0.2mm 3 High temperature resistant quartz substrate;
[0055] Precursor material: Dow Corning FOx-1x and FOx-2x Flowable Oxides, Dow Corning Corporation;
[0056] Substrate cleaning solution: alcohol (analytical grade), Sinopharm Chemical Reagent Co., Ltd.;
[0057] 2. Process parameter setting
[0058] Film throwing conditions: room temperature, clean environment;
[0059] Annealing temperature: 1150°C;
[0060] Annealing time: 90 minutes
[0061]Subsequent cooling parameters: in-tube cooling after power failure, 3 hours
[0062] Passivation temperature: 300°C
[0063] Passivation duration: 24, 72, 120, 240 hours;
[0064] 3. Production device
[0065] VD650 ultra-clean workbench, Suzhou Su Clean Equipment Co., Ltd.
[0066] SK2-4-12 program-controlled tubular resistance furnace, Shanghai Shiyan Electric Furnace Co., Ltd.
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