The invention discloses a high-temperature high-density
plasma generation and
radiation opacity measurement method, which comprises the following steps: clamping a target material by using low-density low-Z-element foam to form a sandwich structure sample, and synchronously and directly driving the sandwich sample from two sides by using multiple beams of smooth
nanosecond laser, the preparation temperature reaches 1,000,000 DEG C, and the
electron density reaches 1 * 1023 pieces per cubic
centimeter; then generating an X-
ray source through the action of one or more
nanosecond laser beams and the high-Z material, measuring the absorption spectrum of the X-
ray source penetrating through the target
plasma, the backlight spectrum of the X-
ray source not penetrating through the target
plasma and the self-
emission spectrum of the target plasma through a
spectrograph, and finally realizing the measurement of the
radiation opacity of the high-temperature and high-density plasma. The high-temperature and high-density
plasma radiation opaqueness
measurement device has the beneficial effects that the high-temperature and high-density
plasma radiation opaqueness measurement of which the temperature reaches 1,000,000 DEG C and the
electron density reaches 1 * 1023 per cubic
centimeter is realized on a million-
joule nanosecond laser device.