The invention belongs to the technical field of
semiconductor lasers, discloses an elliptic ring microcavity
laser with a high-resistance area, and aims to solve the problems that existing elliptic plate microcavity lasers are high in
laser emission threshold, low in electro-optical conversion efficiency, high in temperature rise and low in light output power and existing elliptic ring microcavity
semiconductor lasers are low in yield and difficult in realization of high light output power. The elliptic ring microcavity
laser with the high-resistance area comprises an upper
electrode, an upper
waveguide layer, an active
gain layer, a lower
waveguide layer, a substrate and a lower
electrode sequentially from top to bottom. The lower
electrode is welded onto a
copper heat sink, the upper electrode, the upper
waveguide layer, the active
gain layer and the lower waveguide layer are shaped in elliptic plates, and one end of an
ellipse minor axis at the outer boundary of the active
gain layer is provided with a semi-elliptic
cut. The elliptic ring microcavity laser is characterized in that a central area of the upper waveguide layer is the high-resistance area, and the high-resistance area is formed by means of
photomask and
protonation before the upper electrode is made on the upper waveguide layer.