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154results about How to "Improve optical output power" patented technology

Nitrogen polar surface LED based on metal nitride semiconductor and preparation method

ActiveCN104835893ALower turn-on voltageReduce built-in electric field strengthSemiconductor devicesDevice materialOhmic contact
The invention discloses a nitrogen polar surface LED based on a metal nitride semiconductor, belonging to the technical field of semiconductor devices. The LED successively comprises an n-type semiconductor layer of the nitrogen polar surface, a multi-quantum well active region of the nitrogen polar surface, an electron barrier layer of the nitrogen polar surface and a p-type semiconductor layer of the nitrogen polar surface from bottom to top, and the upper layer of the p-type semiconductor layer of the nitrogen polar surface is provided with a p-type electrode. The LED further comprises an n-type semiconductor layer of a metal polar surface, the n-type semiconductor layer of the metal polar surface is arranged at the lateral side of the n-type semiconductor layer of the nitrogen polar surface and completely bonded to the n-type semiconductor layer of the nitrogen polar surface, and the upper surface of the n-type semiconductor layer of the metal polar surface is provided with an n-type electrode. Compared with the prior art, the n-type semiconductor layer of the metal polar surface serves as an ohmic contact layer of the n-type semiconductor layer of the nitrogen polar surface LED, so as to overcome the problem that an ohmic electrode is not easy to prepare on the n-type semiconductor layer of the nitrogen polar surface, the preparation technology is simple, and the cost is low.
Owner:SOUTHEAST UNIV

Phase-change radiating device

The invention provides a phase-change heat dissipating device and a laser. The phase-change heat dissipating device comprises a vaporizing chamber, a condensation chamber, and a heat conducting end for conducting heat generated by an object to the vaporizing chamber, wherein the heat conducting end comprises a heat absorption assembly covering the object. According to the above technical scheme, the phase-change heat dissipation device has the advantages of simple structure, high heat dissipation efficiency, uniform heat dissipation, high reliability, wide application range, etc., and can be used for dissipating heat of large-power optical components, such as laser crystals, nonlinear optical crystals or semiconductor laser chip of a large-power laser, thereby uniformly dissipating heat, improving the heat dissipation efficiency, effectively improving the light emission efficiency, light output power, beam quality and service life of the large-power laser, and achieving more stable and reliable performance. In addition, the heat dissipating device has relative simple structure, wide application range, environment-friendly energy source and actual value for scale production, and can effectively reduce the size of the large-power laser.
Owner:PHOEBUS VISION OPTO ELECTRONICS TECH +1

Nano coarsening composite graphical sapphire substrate and manufacturing method

Provided are a nano coarsening composite graphical sapphire substrate and a manufacturing method thereof. The sapphire substrate is provided with a composite graphic formed by combining micron dimension graphics with nano dimension graphics, and the nano dimension graphics are arranged on the micron dimension graphics. The manufacturing method includes the steps that (1) the micron dimension graphics are manufactured on the sapphire substrate; (2) a silicon dioxide film is deposited on the micron dimension graphics; (3) a silver film is further deposited on the silicon dioxide film; (4) the silver film is agglomerated into silver nanoparticles; (5) silver nanoparticle graphics are transferred onto the silicon dioxide film; (6) the silver nanoparticles are corroded; (7) the nano dimension graphics are manufactured on the sapphire micron graphics; (8) a silicon dioxide mask layer is removed in a corroded mode; (9) the substrate is cleaned. Nano coarsening is carried out on the micron dimension graphics, the light propagation direction can be changed more efficiently, the light escape probability is increased, and the light extraction efficiency and light output power of a GaN-based LED of the sapphire substrate are improved.
Owner:SHANDONG INSPUR HUAGUANG OPTOELECTRONICS

High-voltage direct-current GaN-based light emitting diode and preparation method thereof

The invention provides a high-voltage direct-current GaN-based light emitting diode and a preparation method of the high-voltage direct-current GaN-based light emitting diode. The high-voltage direct-current GaN-based light emitting diode comprises a substrate and a plurality of epitaxial layers arranged on the substrate, wherein the epitaxial layer comprises a GaN buffer layer, an n-type GaN layer, a multiple quantum well active layer and a p-type GaN layer, which are sequentially arranged on the surface of the substrate, an ITO (Indium Tin Oxide) transparent conductive layer is arranged on the epitaxial layer to form an LED unit cell, and the adjacent LED unit cells are interconnected by a metal wire. Compared with the prior art, the high-voltage direct-current GaN-based light emitting diode has the beneficial effects that: the three-dimensional ITO transparent conductive layer can effectively improve the light output power, the ICP (Inductively Coupled Plasma) etching process parameter is adjusted to make the base angle of a trapezoid-shaped isolating groove to be 120-150 degrees, and the interconnected metal wire can be conformally covered onto the isolating groove, so that the overall yield is improved.
Owner:SHANGHAI JIAO TONG UNIV
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