The application discloses a preparation method of SnO2 / SnIn4S8
heterojunction photocatalytic film and application thereof. The preparation method comprises the following steps: taking
borosilicate glass as a substrate, firstly, depositing SnCl2.2H2O
powder on the surface of the substrate by a
gas phase deposition method to form a SnO2 film, and then, placing the substrate in a precursor solution containing SnCl4.5H2O, InCl3,
ascorbic acid and
thioacetamide, and growing a SnIn4S8 film on the surface of the SnO2 film in situ through a
hydrothermal reaction to obtain the SnO2 / SnIn4S8
heterojunction photocatalytic film. The SnO2 / SnIn4S8
heterojunction photocatalytic film is prepared by using a two-
step method, i.e., a
gas phase deposition method and a hydrothermal
crystallization method, and has the advantages of simple preparation process, low cost and easy availability of raw materials. The prepared SnO2 / SnIn4S8 heterojunction photocatalytic film has the advantages of high
catalytic degradation reaction rate,
reusability, wide application range, low cost and industrialization.