278 results about "Helical resonator" patented technology

A RF device such as a tower mounted amplifier (TMA), mast-head amplifier (MHA), or Tower Mounted Boosters (TMB) includes a housing having a plurality of cavities and an input and an output, the input being coupled to the antenna and the output being coupled to a base station. The housing includes a transmission path holding multiple coaxial resonators. The housing further includes multiple receive paths including at least one path having a plurality of cavities, each cavity containing a dielectric resonator. The metallic transmit resonator nearest the antenna input is coupled to the first dielectric resonator via a common resonant wire. The last dielectric resonator in the receive path is coupled to a first metallic resonator of a downstream clean-up filter via another common resonant wire.

A wavelength tunable laser comprising a laser diode and a closed external cavity formed by one or more optical resonators either horizontally or vertically coupled to adjacent waveguides. The optical resonator primarily functions as a wavelength selector and may be in the form of disk, ring or other closed cavity geometries. The emission from one end of the laser diode is coupled into the first waveguide using optical lens or butt-joint method and transferred to the second waveguide through evanescent coupling between the waveguides and optical resonator. A mirror system or high reflection coating at the end of the second waveguide reflects the light backwards into the system resulting in a closed optical cavity. Lasing can be achieved when the optical gain overcomes the optical loss in this closed cavity for a certain resonance wavelength which is tunable by changing the resonance condition of the optical resonator through reversed biased voltage or current injection. Multiple optical resonators may be used to reduce the lasing threshold and provide higher power output. With monolithic integration, more optical devices can be integrated with the tunable laser into the same substrate to produce optical devices that are capable of more complex functions, such as tunable transmitters or waveguide buses.

A hybrid filter assembly is provided having a first ceramic triple-mode mono-block resonator, a second ceramic triple-mode mono-block resonator and at least one metallic resonator coupled to at least one of the first and second mono-block resonators. Each triple-mode mono-block resonator supports three resonant modes and each metallic resonator supports an additional mode, thereby providing a hybrid filter assembly of reduced size having more than six poles.

The invention provides an optical fiber photodetector including a photoconductive element, such as a semiconducting element, having a fiber length. The semiconducting element is characterized as a non-composite material in at least one fiber direction. At least one pair of conducting electrodes is in contact with the semiconducting element along the fiber length, and an insulator is provided along the fiber length. An optical resonator can be disposed along the fiber length and along a path of illumination to the semiconducting element. The resonator is dimensioned to substantially reflect all illumination wavelengths except for a prescribed range of wavelengths transmitted to the semiconducting element. The fiber photodetector can be arranged in a photodetecting fiber grid, photodetecting fiber fabric, or other configuration for detecting incident illumination.

The invention discloses a spiral resonator plasma processing equipment. The plasma processing apparatus includes: a processing chamber having a substrate holder supporting a substrate to be processed; a dielectric tube disposed on the processing chamber so as to communicate with an interior space of the processing chamber; a helical coil wound around the outer tube of the dielectric tube; and an RF power supply that supplies RF power to the helical coil. The dielectric tube is in the form of a double tube, including an inner tube and an outer tube. A plasma source gas inlet is arranged in the outer tube to supply the plasma source gas into the space between the inner tube and the outer tube. A control electrode is arranged in the dielectric tube to control the plasma potential. This plasma processing apparatus provides a uniform plasma density distribution along the radial direction of the wafer and facilitates control of the plasma potential within the processing chamber.